Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.

Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.

Abstract: Feeding stock used to form a tapered structure into a curving device such that each point on the stock undergoes rotational motion about a peak location of the tapered structure; and the stock meets a predecessor portion of stock along one or more adjacent edges.

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Abstract: An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an inner space with backfill gas under pressure, using distribution trenches and walls (e.g., flow restriction dams), rather than providing uniform backfill gas pressure across the entire reticle. In another method, the perimeter of inner space can be chosen to reduce the expansion variation across the reticle based on the functional relationship between expansion and temperature for the reticle material. In an optional or alternative approach, reduced temperature variation across the reticle can be obtained by selectively filling cavities in the interior of the fluid cooled chuck with backfill gas.

Abstract: A lithographic apparatus is described that comprises a support structure (300) to hold an object (210). The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck (321), on which the object is supported, and an array of shear-compliant elongated elements (325) normal to the chuck and the stage (230), such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Abstract: The transfer apparatus is directed toward electrical transfer components providing an electrical connection to a rotating object. The transfer apparatus includes a stator base mounted proximate to the rotating object. An axle rotatably mounts at least one conductive disk to the stator base. The conductive disk is held against the rotating object. As the rotating object rotates about a first axis, the conductive disk is made to rotate about a second axis, the second axis otherwise maintaining a static position. A rotationally immobile contact is maintained in substantial electronic contact with the conductive disk whereby a lead wire may be connected to the immobile contact.

Abstract: The transfer apparatus is directed toward electrical transfer components providing an electrical connection to a rotating object. The transfer apparatus includes a stator base mounted proximate to the rotating object. An axle rotatably mounts at least one conductive disk to the stator base. The conductive disk is held against the rotating object. As the rotating object rotates about a first axis, the conductive disk is made to rotate about a second axis, the second axis otherwise maintaining a static position. A rotationally immobile contact is maintained in substantial electronic contact with the conductive disk whereby a lead wire may be connected to the immobile contact.

Abstract: A modular weaving machine includes a loom chassis and a plurality of modular warp units. The warp units are each configured for supporting a plurality of removable bobbins thereon, the bobbins being pre-loadable with a plurality of warp threads. The loom chassis is configured to receivably support the warp units thereon, so that the warp threads are disposed in parallel, spaced relation to one another, extending in a downstream direction. A plurality of shedding actuators are coupled to the loom chassis and configured to form a shed with warp threads of each of the warp units. A weft insertion module is configured to insert a weft thread through the shed.

Abstract: A modular weaving machine includes a loom chassis and a plurality of modular warp units. The warp units are each configured for being pre-loaded with a plurality of warp threads. The loom chassis is configured to receivably support the warp units thereon, so that the warp threads are disposed in parallel, spaced relation to one another, extending in a downstream direction. A plurality of shedding actuators are coupled to the loom chassis and configured to form a shed with warp threads of each of the warp units. A weft insertion module is configured to insert a weft thread through the shed.

Abstract: A bias-weaving machine is provided. In one embodiment, the bias-weaving machine includes a plurality of yarn carriers, each holding a yarn under tension that extends in a downstream direction towards a woven product. The yarn carriers are translatable in at least one direction other than the downstream direction. The apparatus further includes a plurality of reeds disposed to comb the yarns in a downstream direction. The reeds have a range of motion extending between positions upstream and downstream of the yarn carriers. Embodiment of this invention may advantageously be utilized to weave three-dimensional woven products, such as textile preforms for aerospace composites.

Abstract: A loom for weaving three dimensional woven structures which include interwoven bias fibers and at least one integrally woven junction. The loom includes bias fiber holders, bias shuttles, and independently controllable bias arms to interweave the bias fibers. Each bias fiber holder holds a bias fiber under tension. The bias shuttles may releasably grip a number of the bias fiber holders and translate them horizontally between a plurality of predetermined horizontal positions. Each bias shuttle is at a separate vertical position. At least one bias shuttle translates above the shed and at least one bias shuttle translates below the shed. Each independently controllable bias arm may releasably grip one of the bias fiber holders and translate it vertically, at one of the predetermined horizontal positions, with a range of motion extending at least between two of the bias shuttles.