Abstract: A block studying tool for an infant, includes: a block body having a hexahedral shape, a lower portion of which is opened; and a plurality of unit assembling portions disposed to protrude from an upper portion of the block body upward and disposed to be spaced a predetermined distance apart from each other, wherein a divider is disposed at an inside of the lower portion of the block body and forms an assembling space in which the plurality of unit assembling portions of the adjacent block body are to be assembled according to positions.

Abstract: A display device having a display panel including a plurality of data lines; a data driver including at least one data driving circuit chip which transmits data signals to the plurality of data lines; and a signal controller transmitting a dummy control signal and an output image signal to a first data driving circuit chip of at least one data driving circuit chip. The first data driving circuit chip may include zero or more dummy channels which are not connected with the data lines, and the dummy control signal includes information on positions of the dummy channels included in the first data driving circuit chip and information regarding the number of dummy channels.

Abstract: In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

Abstract: Provided is a liquid composition for treating stomatitis, the liquid composition including: an epidermal growth factor; an adhesive polymer; and at least one stabilizer selected from the group consisting of ethylenediaminetetraacetic acid (EDTA) and salts thereof, histidine, lysine and inorganic acid salts thereof, arginin and inorganic acid salts thereof, and dextran. The liquid composition includes a stabilizer selected from EDTA (or salts thereof) and a certain amino acid (or inorganic acid salts thereof) and thus, physicochemical and biological stability of the epidermal growth factor can be substantially increased. Thus, the liquid composition can be stored and distributed for a long period of time. The stabilized composition includes an adhesive polymer, and thus, when ejected in a spray form in the mouth of a user, the liquid composition can be quickly attached to an inflammation site and exhibits effectiveness for a long period of time.

Abstract: An apparatus and a method for indirectly cooling a superconducting quantum interference device (SQUID) are provided. The apparatus includes an outer container extending in a vertical direction; a metallic inner container inserted into the outer container to store a liquid coolant, the metal inner container including a top plate; a SQUID sensor module disposed between a bottom surface of the outer container and a bottom surface of the inner container; a heat transfer pillar adapted to cool the SQUID sensor module, the heat transfer pillar having one end connected to the bottom surface of the inner container and the other end directly or indirectly connected to the SQUID sensor module; a magnetic shield part formed of a superconductor covering a top surface of the SQUID sensor module; and a heat conduction plate being in thermal contact with the other end of the heat transfer pillar.

Abstract: A process management system can include a processing device that can be configured to perform a semiconductor process on a plurality of wafers, the processing device controlled by a process parameter. A control device can be configured to acquire statistical data relating to the process parameter and can be configured to select a reference wafer from the plurality of wafers. The control device can be configured to compare a respective process parameter used for the reference wafer with the statistical data and can be configured to set a reference condition for the process parameter.

Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.

Abstract: Provided are a low-temperature cooling apparatus and a superconducting quantum interference device (SQUID) sensor module. The low-temperature cooling apparatus includes an outer container; an inner container disposed inside the outer container, the inner container including a neck portion having a first diameter and a body portion having a second diameter greater than the first diameter; an insert inserted into the neck portion of the inner container; and a plurality of SQUID sensor modules inserted into the body portion of the inner container. Each of the SQUID sensor modules is in the form of a fan-shaped pillar and is fixedly coupled with an inner bottom plate of the inner container.

Abstract: A method of inspecting a wafer includes performing a fabricating process on a wafer, irradiating broadband light on the wafer, such that the light is reflected from the wafer, generating a spectral cube by using the light reflected from the wafer, extracting a spectrum of a desired wafer inspection region from the spectral cube, and inspecting the desired wafer inspection region by analyzing the extracted spectrum.

Abstract: A method of measuring an overlay offset using a scanning electron microscope system includes: scanning an in-cell region, which includes a lower structure and an upper structure stacked in a sample, using a primary electron beam with a landing energy of at least 10 kV; detecting electrons emitted from the scanned in-cell region; and measuring an overlay offset with respect to overlapping patterns included in the in-cell region using an image of the in-cell region that is generated based on the detected electrons emitted from the scanned in-cell region.

Abstract: In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

Abstract: Disclosed is a side curtain airbag and an airbag system including the same. The side curtain airbag according to the present invention comprises an inflating part having gas inflation, a non-inflating part supporting the inflating part, and an adhered part constituting a boundary between the inflating part and the non-inflating part. The adhered part is coated with a seam sealant and sewed. The initial maximum pressure of the inflating part is 40 kPa or more when injecting a gas therein with an instant pressure of at least 10 bar, and the pressure after 6 seconds is 25 kPa or more. The side curtain airbag may optimize to apply the method of seam sealant coating and sewing on the adhered part constituting a boundary between the inflating part and the non-inflating part. Thus, it can keep the internal gas pressure of the airbag to the extent of protecting passengers safely at rollover.

Abstract: A defect inspection apparatus comprises a table on which a substrate is placed, a first detection unit which is disposed above the table to detect an optical signal from the substrate, a second detection unit which is disposed above the table to detect an electrical signal from the substrate, and a signal processing unit which is connected to the first detection unit and the second detection unit to detect a chemical defect using the optical signal and the electrical signal.

Abstract: A broadband light illuminator of an optical inspector for optically detecting defects of an inspection object may include an electrode-less chamber including a plasma area from which broadband light is generated; a first energy provider, exterior to the chamber, configured to provide first energy for ionizing high pressure gases to form ionized gases in the chamber; a second energy provider, exterior to the chamber, configured to provide second energy for transforming the ionized gases into a plasma state to form the plasma area at a central portion of the chamber; an elliptical reflector having a first focus at which the chamber is positioned and a second focus such that the broadband light is reflected from the elliptical reflector toward the second focus; and a lens unit focusing the reflected broadband light onto the inspection object to form an inspection light for detecting the defects of the inspection object.

Abstract: Disclosed is a fabric for an airbag including a polyester fiber, and particularly to a polyester fabric for an airbag of which toughness is 3.5 to 6.0 kJ/m3 and tearing strength measured according to the ASTM D 2261 TONGUE method is 18 to 30 kgf, wherein the fabric includes polyester fiber of which toughness is 70 to 95 J/m3, a method of preparing the same, and an airbag for a car including the same.

Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen received from the liquid nitrogen dewar into second gaseous nitrogen. Related methods are also disclosed.

Abstract: A method of measuring a step height of a device using a scanning electron microscope (SEM), the method may include providing a device which comprises a first region and a second region, wherein a step is formed between the first region and the second region, obtaining a SEM image of the device by photographing the device using a SEM, wherein the SEM image comprises a first SEM image region for the first region and a second SEM image region for the second region, converting the SEM image into a gray-level histogram and calculating a first peak value related to the first SEM image region and a second peak value related to the second SEM image region, wherein the first peak value and the second peak value are repeatedly calculated by varying a focal length of the SEM, and determining a height of the step by analyzing a trend of changes in the first peak value according to changes in the focal length and a trend of changes in the second peak value according to the changes in the focal length.

Abstract: A multi-chip package may include a system on a chip (SOC) and a plurality of memory devices arranged in the same layer on the SOC. Accordingly, as the multi-chip package may not need to use a TSV, so that manufacturing cost of the multi-chip package is reduced. Moreover, a memory bandwidth between the SOC and the first and second memory devices may increase.

Abstract: Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen. Related methods are also disclosed.

Abstract: In a method of generating a three-dimensional process window qualification, a photoresist layer is coated on a substrate including an underlying structure. A plurality of circular-shaped regions of the substrate are distinguished into 1 to n regions to partition the substrate into a center portion and an edge portion, n being a natural number greater than 2. 1 to n exposing ranges are set, including a common exposing condition for the 1 to n regions. A photoresist pattern is fox led by exposing each shot portion in the 1 to n regions using a split exposing condition in the 1 to n exposing ranges. The photoresist pattern is detected, and a normal photoresist pattern with respect to each of the 1 to n regions is selected to generate the three-dimensional process window qualification.