Patents by Inventor Sang-Mun Chon

Sang-Mun Chon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same
    Patent number: 5846921
    Abstract: Cleaning solutions for application to semiconductor substrates comprise hydrofluoric acid, hydrogen peroxide, isopropyl alcohol, and water. Methods of cleaning semiconductor substrates comprise contacting the semiconductor substrates having contaminants contained thereon with cleaning solutions comprising hydrofluoric acid, hydrogen peroxide, isopropyl alcohol, and water; contacting the semiconductor substrates with first baths of water to remove the cleaning solutions contained on the semiconductor substrates; contacting the semiconductor substrates with second baths containing water to remove the contaminants contained on the semiconductor substrates; and rotating the semiconductor substrates to remove water remaining thereon to clean the semiconductor substrates.
    Type: Grant
    Filed: February 27, 1997
    Date of Patent: December 8, 1998
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: June-ing Gil, Seok-ho Yi, Sang-mun Chon, Ho-kyoon Chung