Patents by Inventor Satoe Matsunaga

Satoe Matsunaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090014008
    Abstract: According to the present invention, there is provided a nasal respiratory mask contacting with the face of a user for supplying respiratory positive-pressure gas to the nose of the user, comprising at least a part attached tightly to the face that is attached tightly to the face of the user; a frame-fitting part for fitting to a frame; and an elastic connecting part that connects elastically the part attached tightly to the face with the frame-fitting part, wherein a facial side of the elastic connecting part is kept apart from the frame-fitting part side thereof for a required distance even in the absence of applied respiratory positive pressure. The nasal respiratory mask has advantages that it can be worn in an appropriate position without applying positive pressure at the start of wearing, scarcely disturbs the visual field during wearing, and can prevent prolongation of the time required for drying or occurrence of unsanitary condition after routine cleaning by washing with water.
    Type: Application
    Filed: March 23, 2007
    Publication date: January 15, 2009
    Applicant: Teijin Pharma Limited
    Inventors: Masahide Takishita, Keiko Omura, Tongoh Chin, Takamitsu Okayama, Hideharu Shimura, Shinya Fujimoto, Toru Hikosaka, Satoe Matsunaga
  • Patent number: D582545
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: December 9, 2008
    Assignee: Teijin Pharma Limited
    Inventors: Keiko Omura, Takamitsu Okayama, Masahide Takishita, Tongoh Chin, Shinya Fujimoto, Hideharu Shimura, Satoe Matsunaga, Toru Hikosaka
  • Patent number: D582546
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: December 9, 2008
    Assignee: Teijin Pharma Limited
    Inventors: Kazuaki Fujiura, Toshiki Nakamura, Naoki Kurai, Keiko Omura, Takamitsu Okayama, Masahide Takishita, Tongoh Chin, Shinya Fujimoto, Satoe Matsunaga, Hideharu Shimura, Toru Hikosaka