Mask for respirator

- Teijin Pharma Limited
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Description

FIG. 1 is a front perspective view of a mask for respiratory showing our new design;

FIG. 2 is a rear perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof; the left side elevational view is a mirror image of the right side elevational view;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask for respirator, as shown and described.

Referenced Cited
U.S. Patent Documents
5884624 March 23, 1999 Barnett et al.
D423096 April 18, 2000 Kwok
D428988 August 1, 2000 Smart
D464426 October 15, 2002 Palkon et al.
D494675 August 17, 2004 Guney et al.
D498529 November 16, 2004 Kwok et al.
D507348 July 12, 2005 Moore et al.
D530007 October 10, 2006 Guney et al.
Foreign Patent Documents
D1109143 May 2001 JP
131674 March 1990 TW
150165 January 1991 TW
523367 March 2003 TW
Patent History
Patent number: D582545
Type: Grant
Filed: Sep 7, 2007
Date of Patent: Dec 9, 2008
Assignee: Teijin Pharma Limited (Tokyo)
Inventors: Keiko Omura (Hino), Takamitsu Okayama (Hino), Masahide Takishita (Hino), Tongoh Chin (Hino), Shinya Fujimoto (Ibaraki), Hideharu Shimura (Osaka), Satoe Matsunaga (Ibaraki), Toru Hikosaka (Ibaraki)
Primary Examiner: Ian Simmons
Assistant Examiner: Christopher Lee
Attorney: Sughrue Mion, PLLC
Application Number: 29/287,675
Classifications
Current U.S. Class: Mask (D24/110.1)