Mask for respirator

- Teijin Pharma Limited
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Description

FIG. 1 is a perspective view of a mask for respirator showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof; the left side elevational view is a mirror image of the right side elevational view;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a bottom plan view thereof.

The broken lines shown in FIGS. 1 to 6 are for illustrative purposes only and form no part of the claimed design.

Claims

The ornamental design for a mask for respirator, as shown and described.

Referenced Cited
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Foreign Patent Documents
D1109143 May 2001 JP
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Other references
  • U.S. Appl. No. 29/287,675, filed Sep. 7, 2007.
Patent History
Patent number: D582546
Type: Grant
Filed: Sep 7, 2007
Date of Patent: Dec 9, 2008
Assignee: Teijin Pharma Limited (Tokyo)
Inventors: Kazuaki Fujiura (Tokyo), Toshiki Nakamura (Tokyo), Naoki Kurai (Tokyo), Keiko Omura (Hino), Takamitsu Okayama (Hino), Masahide Takishita (Hino), Tongoh Chin (Hino), Shinya Fujimoto (Ibaraki), Satoe Matsunaga (Ibaraki), Hideharu Shimura (Osaka), Toru Hikosaka (Ibaraki)
Primary Examiner: Ian Simmons
Assistant Examiner: Christopher Lee
Attorney: Sughrue Mion, PLLC
Application Number: 29/287,676
Classifications