Abstract: A chemically amplified positive resist composition is provided comprising (A) a polymer adapted to tarn soluble in alkaline aqueous solution under the action, of acid, (B) a photoacid generator, (C) a car boxy lie acid, and (D) a benzotriazole compound and/or an imidazole compound. When the resist composition is coated on a copper substrate as a thick film of 5-250 ?m thick and lithographically processed into a pattern, a high resolution is available and the pattern is of rectangular profile.

Abstract: An information processing apparatus according to an embodiment of the present technology includes a detection unit, an acceptance unit, and an image control unit. The detection unit is capable of detecting whether or not each of a plurality of reproduction apparatuses constitutes a group related to reproduction of content, each of the plurality of reproduction apparatuses being connected to a network, each of the plurality of reproduction apparatuses being capable of reproducing the content. The acceptance unit accepts a user operation related to constitution of the group. The image control unit outputs a group state image on the basis of a detection result by the detection unit, the group state image representing a constitution state of the group, the group state image including an image of each of the plurality of reproduction apparatuses, and controls the group state image in response to the accepted user operation related to constitution of the group.

Abstract: A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.

Abstract: A photosensitive resin composition comprising a polymer containing a silphenylene skeleton and a fluorene skeleton and having a crosslinkable site in the molecule, a phenol compound having a Mw of 300-10,000, a photoacid generator, and a benzotriazole or imidazole compound has improved film properties. Even from a thick film, a fine size pattern can be formed.

Abstract: An acoustic wave device and an electronic component are disclosed. The acoustic wave device includes a substrate, excitation electrodes on the substrate and a cover. The cover comprises a frame member on the substrate, and a lid member. The frame member surrounds the excitation electrodes and includes an inner wall, top surface and an outer wall. The lid member is disposed on the top surface, and includes first and second surfaces opposite to each other, and a descending part on the second surface. The second surface faces the substrate. The descending part extends downward from the second surface, and covers at least a part of the inner wall or at least a part of the outer wall. The electronic component includes the acoustic wave device on a mounting substrate via an electrically conductive bonding member, and molding resin covering the device.

Abstract: The present technology relates to an information processing device, a program, and an information processing system capable of displaying enormous data so as to be easily understood. The information processing device is provided with a data obtaining unit which obtains a predetermined number of data, and an output unit which outputs image control data which controls to display a particle stereoscopic image in which particles corresponding to the data are stereoscopically distributed with a particle size determined according to the number of data of the obtained data. The present technology is applicable to, for example, the information processing device which displays data and the like.

Abstract: A laminate comprising a thermoplastic film and a chemically amplified positive resist film thereon is provided, the resist film comprising (A) a base polymer having a hydroxyphenyl group and a protective group, the polymer turning alkali soluble as a result of the protective group being eliminated under the action of acid, (B) a photoacid generator, (C) an organic solvent, and (D) a polymer having an ester bond in its backbone. The resist film may be transferred to a stepped support without forming voids.

Abstract: A method for manufacturing a semiconductor apparatus, including preparing a first substrate provided with a pad optionally having a plug and a second substrate or device provided with a plug, forming a solder ball on at least one of the pad or plug of first substrate and the plug of second substrate or device, covering at least one of a pad-forming surface of first substrate and a plug-forming surface of second substrate or device with a photosensitive insulating layer, forming an opening on the pad or plug of the substrate or device that has been covered with photosensitive insulating layer by lithography, pressure-bonding the second substrate or device's plug to the pad or plug of first substrate with the solder ball through the opening, electrically connecting pad or plug of first substrate to second substrate or device's plug by baking, and curing photosensitive insulating layer by baking.

Abstract: A film material includes a support film having a transmittance of at least 60% with respect to light of wavelength 300-450 nm, and a resin layer containing 0.001-10 wt % of a basic compound with a molecular weight of up to 10,000, and having a thickness of 1-100 ?m. A pattern is formed by attaching the resin layer in the film material to a chemically amplified negative resist layer on a wafer, exposing, baking, and developing the resist layer. The profile of openings in the pattern is improved.

Abstract: A semiconductor apparatus includes a semiconductor device, on-semiconductor-device metal pad and metal interconnect each electrically connected to the semiconductor device, a through electrode and a solder bump each electrically connected to the metal interconnect, a first insulating layer on which the semiconductor device is placed, a second insulating layer formed on the semiconductor device, a third insulating layer formed on the second layer. The metal interconnect is electrically connected to the semiconductor device via the on-semiconductor-device metal pad at an upper surface of the second layer, penetrates the second layer from its upper surface, and is electrically connected to the through electrode at an lower surface of the second layer, and an under-semiconductor-device metal interconnect is between the first layer and the semiconductor device, and the under-semiconductor-device metal interconnect is electrically connected to the metal interconnect at the lower surface of the second layer.

Abstract: There is provided an image processing apparatus, an image processing method, and a program which can cause an image adapted to an object located between an operation unit and a drawing destination (30) to be drawn on the drawing destination, the image processing apparatus including: an image generating unit configured to generate a drawn image to be drawn on a drawing destination on a basis of a position of an operation unit. The image generating unit generates the drawn image on a basis of detected information of a stencil target (40) located between the operation unit and the drawing destination.

Abstract: The present technology relates to an information processing device, a program, and an information processing system capable of displaying enormous data so as to be easily understood. The information processing device is provided with a data obtaining unit which obtains a predetermined number of data, and an output unit which outputs image control data which controls to display a particle stereoscopic image in which particles corresponding to the data are stereoscopically distributed with a particle size determined according to the number of data of the obtained data. The present technology is applicable to, for example, the information processing device which displays data and the like.

Abstract: An optical transmission substrate of the disclosure includes a wiring substrate and an optical transmission line. The wiring substrate includes one main surface which includes a mounting area for a photoelectric conversion element. The optical transmission line includes a first cladding portion which is disposed on the one main surface of the wiring substrate and has a layer shape, at least one core portion which is disposed on the first cladding portion and has a strip shape, and a second cladding portion which is disposed on a part of the at least one core portion. The optical transmission line includes an end portion which is positioned in the mounting area. The end portion includes a part of the at least one core portion.

Abstract: A semiconductor apparatus including a semiconductor device, an on-semiconductor-device metal pad and a metal interconnect each electrically connected to the semiconductor device, a through electrode and a solder bump each electrically connected to the metal interconnect, a first insulating layer on which the semiconductor device is placed, a second insulating layer formed on the semiconductor device, a third insulating layer formed on the second insulating layer, wherein the metal interconnect is electrically connected to the semiconductor device via the on-semiconductor-device metal pad at an upper surface of the second insulating layer, and the metal interconnect penetrates the second insulating layer from its upper surface and is electrically connected to the through electrode at an lower surface of the second insulating layer. This semiconductor apparatus can be easily placed on a circuit board and stacked, and can reduce its warpage even with dense metal interconnects.

Abstract: A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.

Abstract: There is provided an image processing apparatus, an image processing method, and a program which can cause an image adapted to an object located between an operation unit and a drawing destination (30) to be drawn on the drawing destination, the image processing apparatus including: an image generating unit configured to generate a drawn image to be drawn on a drawing destination on a basis of a position of an operation unit. The image generating unit generates the drawn image on a basis of detected information of a stencil target (40) located between the operation unit and the drawing destination.

Abstract: A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt % of a component having a boiling point of 55-250° C. under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.

Abstract: A laminate comprising a thermoplastic film and a chemically amplified positive resist film thereon is provided, the resist film comprising (A) a base polymer having a hydroxyphenyl group and a protective group, the polymer turning alkali soluble as a result of the protective group being eliminated under the action of acid, (B) a photoacid generator, (C) an organic solvent, and (D) a polymer having an ester bond in its backbone. The resist film may be transferred to a stepped support without forming voids.

Abstract: The present invention is a photo-curable resin composition containing (A) a silicone polymer compound having repeating units shown by the formulae (1) and (2), (B) a photosensitive acid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm, (C) one or more compounds selected from an amino condensate modified with formaldehyde or formaldehyde-alcohol, a phenol compound having on average two or more methylol groups or alkoxymethylol groups per molecule, and a polyhydric phenol compound whose phenolic hydroxyl group is substituted with a glycidoxy group, and (D) one or more compounds selected from polyhydric phenols having 3 or more hydroxyl groups. As a result, there is provided a photo-curable resin composition that can facilitate thick and fine patterning when the composition is used in patterning.