Patents by Inventor Satoshi Asai

Satoshi Asai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7052835
    Abstract: The present invention provides a method of screening genes based on expression information differing from gene expression information obtainable by DNA chip/DNA microarray techniques. The method of screening genes comprises performing in situ hybridization in respect of a tissue or cell sample from an organism using a probe which specifically hybridizes with mRNA and/or expression sequence tag being a product of gene expression, and examining localization of the mRNA and/or expression sequence tag in the tissue or cell.
    Type: Grant
    Filed: January 8, 2002
    Date of Patent: May 30, 2006
    Assignee: Nihon University, School Juridical Person
    Inventors: Satoshi Asai, Toshihito Nagata, Yasuo Takahashi, Yukimoto Ishii, Koichi Ishikawa
  • Patent number: 6899991
    Abstract: A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbon, n is an integer of 1-1,000, and X is and having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R11)mSi(OR12)4?m wherein R11 is monovalent C1-C9 hydrocarbon, R12 is C1-C4 alkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: May 31, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideto Kato, Kazumi Noda, Toshihiko Fujii, Kazuhiro Arai, Satoshi Asai
  • Patent number: 6867325
    Abstract: An organosiloxane polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-500,000 is novel. R1 to R4 are monovalent hydrocarbon groups, n is an integer of 1-2,000, X has a structure of the formula: and R5 is an acrylic functional organic group of the formula: wherein R? is H or methyl and R? is a divalent hydrocarbon group. A photo-curable resin composition comprising the organosiloxane polymer and a sensitizer can be cured with a wide wavelength range of light.
    Type: Grant
    Filed: August 6, 2002
    Date of Patent: March 15, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideto Kato, Satoshi Asai, Toshihiko Fujii
  • Publication number: 20050006077
    Abstract: The present invention provides an adhesive sheet which exhibits bonding strength without formation of lifting even in a curved section and excels in heat resistance. The multi-layered adhesive sheet includes a metal sheet and at least two thermosetting resin layers having different functions on at least one side of the metal sheet.
    Type: Application
    Filed: June 21, 2004
    Publication date: January 13, 2005
    Applicants: Somar Corporation, Denso Corporation
    Inventors: Tetsushi Takata, Satoshi Asai, Shoei Teshima, Masumi Kuroyama
  • Publication number: 20040142276
    Abstract: A novel organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane, an alkenyl-containing organopolysiloxane and an unsaturated compound of formula (3) or (4). Using the organosiloxane polymer, a photo-curable resin composition is prepared which can be exposed to radiation having a wide range of wavelength and developed to form a pattern.
    Type: Application
    Filed: January 8, 2004
    Publication date: July 22, 2004
    Inventors: Kazuhiro Arai, Hideto Kato, Satoshi Asai
  • Patent number: 6749643
    Abstract: The invention discloses a novel method for dry cleaning of a fabric material characterized by the use of a unique dry cleaning solvent which is a tris(trimethylsiloxy) silane compound represented by the general formula of RSi(—O—SiMe3)3, in which Me is a methyl group and R is a monovalent hydrocarbon group of 1 to 6 carbon atoms or, preferably, a methyl group, or a mixture thereof with a petroleum-based hydrocarbon solvent in a limited proportion. In addition to the excellent effect of dry cleaning equivalent to that of conventional dry cleaning solvents and little unpleasant smell remaining on the fabric material, the solvent used in the inventive method is little liable for the problems of environmental pollution against public and workers' health and the problem of ozone layer destruction in the aerosphere due to emission of vapors of halogenated hydrocarbon solvents can be solved by the inventive method.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: June 15, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Satoshi Asai
  • Publication number: 20040034187
    Abstract: An epoxy resin composition comprising (i) a compound having at least two epoxy groups in a molecule as a main component, (ii) a fluorene skeleton-bearing, silicone-modified phenolic resin as a curing agent, and (iii) an organophosphorus compound, amine compound or imidazole compound as a cure accelerator cures into an elastomeric product having a low elasticity, toughness and low dielectric properties.
    Type: Application
    Filed: August 13, 2003
    Publication date: February 19, 2004
    Inventors: Kazuhiro Arai, Satoshi Asai, Hideto Kato
  • Publication number: 20030152928
    Abstract: The present invention provides a method of screening genes based on expression information differing from gene expression information obtainable by DNA chip/DNA microarray techniques. The method of screening genes comprises performing in situ hybridization in respect of a tissue or cell sample from an organism using a probe which specifically hybridizes with mRNA and/or expression sequence tag being a product of gene expression, and examining localization of the mRNA and/or expression sequence tag in the tissue or cell.
    Type: Application
    Filed: January 8, 2002
    Publication date: August 14, 2003
    Inventors: Satoshi Asai, Toshihito Nagata, Yasuo Takahashi, Yukimoto Ishii, Koichi Ishikawa
  • Patent number: 6596892
    Abstract: A low molecular weight branched siloxane, typically methyltris(trimethylsiloxy)silane is effectively prepared in high yields by reacting a trichlorosilane, typically methyltrichlorosilane with a disiloxane, typically hexamethyldisiloxane in the presence of a linear phosphonitrilic chloride (LPNC) catalyst.
    Type: Grant
    Filed: March 14, 2002
    Date of Patent: July 22, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Asai, Kazumasa Tsukioka
  • Publication number: 20030113662
    Abstract: A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): 1
    Type: Application
    Filed: October 9, 2002
    Publication date: June 19, 2003
    Inventors: Hideto Kato, Kazumi Noda, Toshihiko Fujii, Kazuhiro Arai, Satoshi Asai
  • Publication number: 20030064168
    Abstract: An organosiloxane polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-500,000 is novel.
    Type: Application
    Filed: August 6, 2002
    Publication date: April 3, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideto Kato, Satoshi Asai, Toshihiko Fujii
  • Publication number: 20020133035
    Abstract: A low molecular weight branched siloxane, typically methyltris(trimethylsiloxy)silane is effectively prepared in high yields by reacting a trichlorosilane, typically methyltrichlorosilane with a disiloxane, typically hexamethyldisiloxane in the presence of a linear phosphonitrilic chloride (LPNC) catalyst.
    Type: Application
    Filed: March 14, 2002
    Publication date: September 19, 2002
    Inventors: Satoshi Asai, Kazumasa Tsukioka
  • Publication number: 20020116769
    Abstract: The invention discloses a novel method for dry cleaning of a fabric material characterized by the use of a unique dry cleaning solvent which is a tris(trimethylsiloxy) silane compound represented by the general formula of RSi(—O—SiMe3)3, in which Me is a methyl group and R is a monovalent hydrocarbon group of 1 to 6 carbon atoms or, preferably, a methyl group, or a mixture thereof with a petroleum-based hydrocarbon solvent in a limited proportion. In addition to the excellent effect of dry cleaning equivalent to that of conventional dry cleaning solvents and little unpleasant smell remaining on the fabric material, the solvent used in the inventive method is little liable for the problems of environmental pollution against public and workers' health and the problem of ozone layer destruction in the aerosphere due to emission of vapors of halogenated hydrocarbon solvents can be solved by the inventive method.
    Type: Application
    Filed: December 26, 2001
    Publication date: August 29, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Satoshi Asai