Abstract: A method of manufacturing step of a device having a gate and a silicon substrate that are insulation-isolated from each other. In the method, germanium compositions of a silicon germanium sacrificial layer for forming a stacked channel and a germanium composition of a silicon germanium sacrificial layer for insulation-isolating the gate and the substrate are not changed. After the stacked film is etched, a protective dielectric film is formed on a sidewall of the stacked film, which is repeated using different protective film materials. Thereafter, a silicon sacrificial layer and a silicon germanium sacrificial layer remaining in a lower portion are removed by isotropic etching to form a region in which the insulating isolation film is embedded. The steps from the formation of the stacked film of the protective dielectric films to the removal of the sacrificial layer by etching in the continuous process use the same apparatus.

Abstract: A drive range can be expanded even when the number of selectable ranks of main drive pulses is limited.

Abstract: A manufacturing process for a three-dimensional structure device having stacked channels in which channels having a shape of a thin line or a sheet are stacked in a direction vertical to a substrate, a work function control metal is separately formed without expanding a space between FETS having different threshold voltages, and including a first step of performing anisotropic etching to open the mask material until the work function control metal film is exposed; a second step of depositing a protective film; a third step of performing anisotropic etching to remove the protective film while remaining the protective film deposited on sidewalls of the mask material opened in the first step; and a fourth step of performing isotropic etching to selectively remove the mask material between the channels relative to the protective film and the work function control metal film are executed.

Abstract: A plasma processing apparatus includes a stage disposed in a processing chamber for mounting a wafer, a plasma generation chamber disposed above the processing chamber for plasma generation using process gas, a plate member having multiple introduction holes, made of a dielectric material, disposed above the stage and between the processing chamber and the plasma generation chamber, and a lamp disposed around the plate member for heating the wafer. The plasma processing apparatus further includes an external IR light source, an emission fiber arranged in the stage, that outputs IR light from the external IR light source toward a wafer bottom, and a light collection fiber for collecting IR light from the wafer. Data obtained using only IR light from the lamp is subtracted from data obtained also using IR light from the external IR light source during heating of the wafer. Thus, a wafer temperature is determined.

Abstract: For a machine learning model that receives control parameters of a semiconductor processing device and outputs shape parameters that express a processed shape of a semiconductor sample processed by the semiconductor processing device, an experiment point obtaining learning data is recommended. A contribution of each control parameter to the prediction of the machine learning model is evaluated from feature quantity data that is a value of a control parameter of the learning data used for learning of the machine learning model, and the experiment point is recommended based on a stability evaluation and an uncertainty evaluation of the prediction by the machine learning model in a space defined by the control parameters selected based on the contribution as axes.

Abstract: An electric current detection apparatus, the electric current detection apparatus is configured to detect an electric current flowing in a solenoid configured to be electrified by a PWM control, the apparatus includes a switch, an electric current value detection portion configured to detect a first electric current value at a first timing corresponding to a timing when the switch transitions from a closed state to an open state, the electric current value detection portion being configured to detect a third electric current value at a third timing, and a second electric current value calculation portion configured to calculate a second electric current value on the basis of the first electric current value and the third electric current value, the second electric current value being an electric current value of the electric current at the second timing.

Abstract: In a vacuum processing apparatus including: a vacuum container including a processing chamber therein; a plasma formation chamber; plate members being arranged between the processing chamber and the plasma formation chamber; and a lamp and a window member being arranged around the plate members, in order that a wafer and the plate members are heated by electromagnetic waves from the lamp, a bottom surface and a side surface of the window member is formed of a member transmitting the electromagnetic waves therethrough.

Abstract: A motor driving apparatus including a driving circuit for supplying a first pulse with which a first coil included in a two-phase stepping motor generates a first magnetic flux, a second pulse with which a second coil included in the stepping motor generates a second magnetic flux opposite to the first magnetic flux, a third pulse with which the first coil generates the second magnetic flux, and a fourth pulse with which the second coil generates the first magnetic flux, to the stepping motor. The driving circuit supplies the second pulse, the third pulse, and the fourth pulse in this order to the stepping motor in a state of being stopped to start the stepping motor, and supplies the first pulse, the second pulse, the third pulse, and the fourth pulse in this order to the stepping motor after starting to continuously drive the stepping motor.

Abstract: A contact point device includes: a fixed contact; a movable contactor that has a movable contact capable of being in contact with the fixed contact by moving in parallel with a first direction, and extended along a second direction orthogonal to the first direction; a containing chamber that contains the fixed contact and the movable contact; and a shielding wall disposed inside the containing chamber. The containing chamber has a first space and a second space, the shielding wall faces the first space or the second space, the shielding wall includes a partition wall located between the first space and the second space, the first space and the second space are disposed side by side in a third direction orthogonal to the first direction and the second direction, and the partition wall is located in the first direction from the fixed contact and the movable contact.

Abstract: A contact point device includes a fixed contact, a movable contactor that has a movable contact capable of being in contact with the fixed contact by moving in parallel with a first direction, a containing chamber that contains the fixed contact and the movable contact, and a shielding wall disposed inside the containing chamber. The shielding wall is located in the first direction from the fixed contact and the movable contact when viewed in a second direction orthogonal to the first direction, the shielding wall extends along the first direction, and the shielding wall is provided with one or a plurality of through holes that penetrate the shielding wall.

Abstract: An electromagnetic device includes a fixed iron core through which a first magnetic flux flows, a movable iron core that reciprocates to separate from the fixed iron core by a predetermined gap when a current applied to a coil, which generates the first magnetic flux, is stopped and move to the fixed iron core by an attractive force when the current is applied to the coil. The electromagnetic device also includes a permanent magnet that generates a second magnetic flux. The opposed surface of the fixed iron core and the opposed surface of the movable iron core may be opposed in a reciprocating direction of the movable iron core. The permanent magnet may be attached to the fixed iron core such that a magnetized surface of the permanent magnet is opposed and exposed to the opposed surface of the movable iron core.

Abstract: An electric current detection apparatus, the electric current detection apparatus is configured to detect an electric current flowing in a solenoid configured to be electrified by a PWM control, the apparatus includes a switch, an electric current value detection portion configured to detect a first electric current value at a first timing corresponding to a timing when the switch transitions from a closed state to an open state, the electric current value detection portion being configured to detect a third electric current value at a third timing, and a second electric current value calculation portion configured to calculate a second electric current value on the basis of the first electric current value and the third electric current value, the second electric current value being an electric current value of the electric current at the second timing.

Abstract: An electromagnetic device includes a coil, a fixed iron core, a movable iron core configured to reciprocate to separate from the fixed iron core by a predetermined gap when a current applied to the coil is stopped and move to the fixed iron core by an attractive force when the current is applied to the coil, and a permanent magnet. The permanent magnet is arranged so that the permanent magnet is opposed to the gap in a second direction perpendicular to a first direction and separated from the fixed iron core and the movable iron core with a space interposed therebetween. A direction of a second magnetic flux generated by the permanent magnet conforms to a direction of the first magnetic flux between opposed surfaces of the fixed iron core and the movable iron core.

Abstract: A contact point device includes a fixed contact, a movable contactor that has a movable contact capable of being in contact with the fixed contact by moving in parallel with a first direction, a containing chamber that contains the fixed contact and the movable contact, and a shielding wall disposed inside the containing chamber. The shielding wall is located in the first direction from the fixed contact and the movable contact when viewed in a second direction orthogonal to the first direction, the shielding wall extends along the first direction, and the shielding wall is provided with one or a plurality of through holes that penetrate the shielding wall.

Abstract: A contact point device includes: a fixed contact; a movable contactor that has a movable contact capable of being in contact with the fixed contact by moving in parallel with a first direction, and extended along a second direction orthogonal to the first direction; a containing chamber that contains the fixed contact and the movable contact; and a shielding wall disposed inside the containing chamber. The containing chamber has a first space and a second space, the shielding wall faces the first space or the second space, the shielding wall includes a partition wall located between the first space and the second space, the first space and the second space are disposed side by side in a third direction orthogonal to the first direction and the second direction, and the partition wall is located in the first direction from the fixed contact and the movable contact.

Abstract: A system for augmented reality layout includes an augmented reality layout server and an augmented reality layout device, including a processor; a non-transitory memory; an input/output; a model viewer providing two-dimensional top, three-dimensional, and augmented reality views of a design model; a model editor; a model synchronizer, which aligns and realigns the design model with a video stream of an environment; a model cache; and an object cache. Also disclosed is method for augmented reality layout including creating model outline, identifying alignment vector, creating layout, verifying design model, editing design model, and realigning design model.

Abstract: A timepiece includes a stepping motor having a rotor and a coil, and a drive circuit that applies a first drive pulse having a stable stationary position at a rotor rotation angle of 90 degrees or less from a reference position and a second drive pulse having the stable stationary position at a rotor rotation angle of 90 degrees or more from the reference position, as a pulse for driving the rotor, to the coil. When a period during which the pulse is not applied to the coil is assumed as a waiting period, the drive circuit generates the waiting period after a first application of the second drive pulse after an application of the pulse to the coil is started and rotates the rotor by one or more turns without passing through the waiting period at at least one predetermined timing after the waiting period.

Abstract: In a manufacturing process of a three-dimensional structure device such as a GAA type FET or a nanosheet fork type FET having stacked channels in which channels having a shape of a wire or a sheet are stacked in a direction vertical to a substrate, a work function control metal is separately formed without expanding a space between FETs having different threshold voltages. Therefore, a first step S10 of performing anisotropic etching to open the mask material 23 until the work function control metal film 22 is exposed; a second step S11 of depositing a protective film 26; a third step S12 of performing anisotropic etching to remove the protective film while remaining the protective film deposited on sidewalls of the mask material opened in the first step; and a fourth step S13 of performing isotropic etching to selectively remove the mask material between the channels relative to the protective film and the work function control metal film are executed.

Abstract: In a vacuum processing apparatus including: a vacuum container including a processing chamber therein; a plasma formation chamber; plate members being arranged between the processing chamber and the plasma formation chamber; and a lamp and a window member being arranged around the plate members, in order that a wafer and the plate members are heated by electromagnetic waves from the lamp, a bottom surface and a side surface of the window member is formed of a member transmitting the electromagnetic waves therethrough.

Abstract: A contact device includes a pair of fixed contacts, a movable contactor, a contactor holder, a movable shaft, and a base. The pair of fixed contacts are aligned in a first direction. The movable contactor comes into or out of contact with the pair of fixed contacts in a second direction orthogonal to the first direction. The contactor holder holds the movable contactor. The movable shaft moves the contactor holder in the second direction so that the movable contactor comes into or out of contact with the fixed contacts. The base accommodates the fixed contacts, the movable contactor, and the contactor holder. The base has a projection projecting from a position opposing the contactor holder in a third direction orthogonal to both the first and second directions.