Patents by Inventor Satoshi Shimizu

Satoshi Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210332394
    Abstract: Provided is a method which enables efficient separation of a component such as microorganisms from an organic substance-containing liquid obtained by microbial fermentation. Disclosed is a method for producing an organic substance comprising a microbial fermentation step of obtaining an organic substance-containing liquid and a separation step of heating the organic substance-containing liquid and separating into a liquid or solid component containing microorganisms and a gaseous component containing the organic substance.
    Type: Application
    Filed: August 27, 2019
    Publication date: October 28, 2021
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Satoshi SHIMIZU, Kokoro HAMACHI
  • Publication number: 20210330528
    Abstract: An assistance system includes an assistance device configured to assist movement of a care receiver; a microphone provided on the assistance device; a speech analyzer configured to analyze speech of at least one of a caregiver or the care receiver included in sound data acquired by the microphone and acquire information related to an action; an echo analyzer configured to analyze an echo included the sound data and acquire information related to a location; and an action history information generator configured to generate action history information of at least one of the caregiver or the care receiver based on the information related to the action and the information related to the location.
    Type: Application
    Filed: August 1, 2018
    Publication date: October 28, 2021
    Applicant: FUJI CORPORATION
    Inventors: Joji ISOZUMI, Satoshi SHIMIZU
  • Patent number: 11141954
    Abstract: According to one embodiment, a wet-area device includes a main part and a first layer. The first layer is provided on an outer surface of the main part. The main part includes a main part unevenness at a side of the outer surface of the main part. The main part unevenness includes a plurality of main part recesses and a plurality of main part protrusions. The first layer includes a first unevenness at a side of an outer surface of the first layer. The first unevenness includes a plurality of first recesses and a plurality of first protrusions. The first unevenness is arranged along the main part unevenness. An average height of the main part unevenness is less than an average length of the main part unevenness.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: October 12, 2021
    Assignee: TOTO LTD.
    Inventors: Tomoki Baba, Satoshi Shimizu, Takuma Kawasaki
  • Publication number: 20210304971
    Abstract: A solar battery unit (100) is provided that includes: a substrate (120); a sola battery (110) attached to a back face of the substrate (120); and a communications module (130) attached to the substrate (120). The communications module (130) includes an antenna (132) disposed so as not to overlap solar cells (115) in the solar battery (110) in a front view.
    Type: Application
    Filed: July 1, 2019
    Publication date: September 30, 2021
    Inventors: MASAYUKI NAKANO, SATOSHI SHIMIZU, MASATO SASAKI, YUKI WATANABE, TOMOHISA YOSHIE, TETSUYA IKEMOTO, DAISUKE TOYOSHIMA
  • Patent number: 11127655
    Abstract: An alternating stack of insulating layers and spacer material layers is formed over a substrate. At least one dielectric material portion is formed over the substrate adjacent to the alternating stack. Memory stack structures are formed through the alternating stack. A trench extending through the alternating stack and a via cavity extending through the at least one dielectric material portion are formed using a same anisotropic etch process. The via cavity is deeper than the trench and the via cavity extends into an upper portion of the substrate. The sacrificial material layers are replaced with electrically conductive layers using the trench as a conduit for an etchant and a reactant. A trench fill structure is formed in the trench, and a via structure assembly is formed in the via cavity using simultaneous deposition of material portions. A bonding pad may be formed on the bottom surface of the via structure assembly.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: September 21, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Takumi Moriyama, Hiroshi Sasaki, Yohei Masamori, Satoshi Shimizu
  • Patent number: 11103399
    Abstract: An assistance device that enables appropriate evaluation of to what extent a care receiver is using their own leg power. The assistance device is provided with: a body supporting member configured to support the upper body of the care receiver; a first load detecting device provided on the body supporting member, and configured to detect a first load applied by the care receiver; a second load detecting apparatus provided on the body supporting member at a position rearwards of the first load detecting device, and configured to detect a second load applied by the care receiver; and an effort level calculating device configured to calculate effort levels representing to what extent the care receiver is using their own leg power during the standing assistance based on a relationship between the first load and the second load.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: August 31, 2021
    Assignee: FUJI CORPORATION
    Inventors: Satoshi Shimizu, Takehiro Noguchi, Takehiro Hiraoka
  • Patent number: 11096848
    Abstract: An assistance device that more appropriately identifies a user using speech. The assistance device is provided with a speech detector, a name acquiring section that acquires a name of a person based on speech detected by the speech detector, and a user identifying section that identifies a care receiver who is a user of the assistance device based on the name acquired by the name acquiring device.
    Type: Grant
    Filed: September 12, 2016
    Date of Patent: August 24, 2021
    Assignee: FUJI CORPORATION
    Inventors: Joji Isozumi, Satoshi Shimizu, Nobuyuki Nakane
  • Publication number: 20210228110
    Abstract: A management device is used in an assistive device configured to assist an erecting action and a seating action of a care receiver and records, as a log data, an action history including erecting actions and seating actions. The management device for the assistive device includes a detecting section for detecting, in the log data, a cycle action executed in the order of the erecting action and then the seating action, and a determination section for determining, based on the log data, whether the cycle action detected is a transfer action in which the care receiver is transferred.
    Type: Application
    Filed: June 5, 2018
    Publication date: July 29, 2021
    Applicant: FUJI CORPORATION
    Inventors: Yuki KAMIYA, Ryu TAKAHASHI, Satoshi SHIMIZU, Takehiro HIRAOKA, Takahiro KATSUKI
  • Publication number: 20210214270
    Abstract: Disclosed is an article provided with a glaze layer having a mat tone surface having excellent texture. This article is provided with a substrate and a glaze layer provided on the surface of the substrate. The 60° glossiness of the surface of the glaze layer is greater than 20 and equal to or less than 50. The article has properties such that: the coefficient of variation of the root mean square slope (R?q) of the roughness curve is 0.4-1 inclusive which is obtained by using a stylus type surface roughness measuring device according to JISB0651(2001) under a condition separately specified in JISB0601(2001); and the arithmetic average roughness (Ra) is 0.0-0.5 ?m inclusive. The article has softness and warmness, is sensed to be moisturized and have high quality, and has improved touch feeling.
    Type: Application
    Filed: March 26, 2021
    Publication date: July 15, 2021
    Inventors: Satoshi SHIMIZU, Ayako HASEGAWA
  • Publication number: 20210162712
    Abstract: According to one embodiment, a wet-area device includes a main part and a first layer. The first layer is provided on an outer surface of the main part. The main part includes a main part unevenness at a side of the outer surface of the main part. The main part unevenness includes a plurality of main part recesses and a plurality of main part protrusions. The first layer includes a first unevenness at a side of an outer surface of the first layer. The first unevenness includes a plurality of first recesses and a plurality of first protrusions. The first unevenness is arranged along the main part unevenness. An average height of the main part unevenness is less than an average length of the main part unevenness.
    Type: Application
    Filed: August 26, 2020
    Publication date: June 3, 2021
    Inventors: Tomoki BABA, Satoshi SHIMIZU, Takuma KAWASAKI
  • Publication number: 20210164206
    Abstract: According to one embodiment, a wet-area device includes a main part, a first layer, and a second layer. The first layer is provided on an outer surface of the main part. The second layer is provided on an outer surface of the first layer. A hardness of the second layer is greater than a hardness of the first layer. The first layer includes a first unevenness at a side of the outer surface of the first layer. The first unevenness includes a plurality of recesses and a plurality of protrusions. The second layer includes a second unevenness at a side of an outer surface of the second layer. The second unevenness includes a plurality of recesses and a plurality of protrusions. The second unevenness is arranged along the first unevenness. An average height of the first unevenness is less than an average length of the first unevenness.
    Type: Application
    Filed: August 25, 2020
    Publication date: June 3, 2021
    Inventors: Tomoki BABA, Satoshi SHIMIZU, Takuma KAWASAKI
  • Patent number: 11024645
    Abstract: An alternating stack of insulating layers and sacrificial material layers is formed over a substrate. A memory opening is formed through the alternating stack. A memory film including a silicon nitride layer and a tunneling dielectric layer is formed in the memory opening, and an opening is formed through the memory film. A chemical oxide layer is formed on a physically exposed surface of an underlying semiconductor material portion. A silicon nitride ring can be formed by selectively growing a silicon nitride material from an annular silicon nitride layer portion of the silicon nitride layer while suppressing deposition of the silicon nitride material on the tunneling dielectric layer and on the chemical oxide layer. A vertical semiconductor channel can be formed by depositing a continuous semiconductor material layer on the underlying semiconductor material portion and the tunneling dielectric layer and on the silicon nitride ring.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: June 1, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Takumi Moriyama, Yasushi Dowaki, Yuki Kasai, Satoshi Shimizu, Jayavel Pachamuthu
  • Publication number: 20210131936
    Abstract: A thermal analyzer includes heating section including a heating furnace in which a sample is contained, and a weight measurement section configured to measure a weight of the sample. The weight of the sample is measured by the weight measurement section while the sample is heated by the heating section. The thermal analyzer further includes: a light emitting indicator that is provided in front of the exterior of the thermal analyzer, and includes a plurality of light emitting diode elements; an analysis controller configured to control heating by the heating section in accordance with a predetermined measurement program, and to acquire weight data of the sample from the weight measurement section in a predetermined time period; and an indication controller configured to drive the light emitting indicator to flash at least during a time period in which the weight data is acquired.
    Type: Application
    Filed: September 30, 2020
    Publication date: May 6, 2021
    Applicant: SHIMADZU CORPORATION
    Inventors: Hajime TOMITA, Kiminori Sato, Satoshi Shimizu, Kaori Nishibata
  • Publication number: 20210113556
    Abstract: The present invention provides a heterocyclic compound represented by the general formula (1): The compound of the present invention has a wide treatment spectrum for mental disorders including central nervous system disorders, no side effects and high safety.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 22, 2021
    Applicant: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Hiroshi YAMASHITA, Nobuaki ITO, Shin MIYAMURA, Kunio OSHIMA, Jun MATSUBARA, Hideaki KURODA, Haruka TAKAHASHI, Satoshi SHIMIZU, Tatsuyoshi TANAKA
  • Patent number: 10957648
    Abstract: A dielectric spacer assembly including an annular dielectric isolation structure is formed through in-process source-level material layers. An alternating stack of insulating layers and spacer material layers is formed over the in-process source-level material layers. A contact via cavity is formed through the dielectric spacer assembly, and is filled within a dielectric spacer and a sacrificial via fill structure. The dielectric spacer assembly protects the dielectric spacer during replacement of a source-level sacrificial layer with a source contact layer. The sacrificial via fill structure is subsequently replaced with a through-memory-level contact via structure.
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: March 23, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Yu-Hsien Hsu, Satoshi Shimizu, Shunsuke Akimoto
  • Patent number: 10951141
    Abstract: A position management apparatus includes motors connected to a power supply; a position detecting device connected to the power supply and detecting the rotational position of the motors or the drive position of driving members driven by the motors; position storage devices connected to the power supply and storing the rotational position or the drive position detected by the position detecting devices; and a power cut-off delay circuit for keeping the position detecting devices and the position storage devices connected to the power supply even if the power switch is shut off from a conducting state, and for storing the rotational position or the drive position of the position storage devices after the motor has lost its rotational speed.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: March 16, 2021
    Assignee: FUJI CORPORATION
    Inventor: Satoshi Shimizu
  • Patent number: 10923498
    Abstract: A source-level sacrificial layer and an alternating stack of insulating layers and sacrificial material layers are formed over a substrate. Memory openings are formed through the alternating stack, and a source cavity is formed by removing the source-level sacrificial layer. A memory film is formally formed by a conformal deposition process, and a source contact layer is formed in the source cavity. Vertical semiconductor channels and drain regions are formed in remaining volumes of the memory openings on sidewalls of the source contact layer. A backside contact via structure is formed through the alternating stack and directly on a sidewall of the source contact layer.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: February 16, 2021
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Yoshitaka Otsu, Satoshi Shimizu, Makoto Koto
  • Patent number: D925441
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: July 20, 2021
    Assignees: Sharp Kabushiki Kaisha, Kobata Gauge Manufacturing Co., Ltd.
    Inventors: Masayuki Nakano, Satoshi Shimizu, Tomohisa Yoshie, Iwao Kobata, Yoshiyuki Nakai, Daisuke Toyoshima
  • Patent number: D926417
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: July 27, 2021
    Assignee: FUJI CORPORATION
    Inventors: Hideaki Nomura, Takeshi Sato, Nobuyuki Nakane, Kuniyasu Nakane, Ryu Takahashi, Satoshi Shimizu
  • Patent number: D931897
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: September 28, 2021
    Assignee: FUJITSU LIMITED
    Inventors: Hirohisa Naito, Kazuhiro Arima, Tomohiro Takizawa, Satoshi Shimizu, Ayako Kawahito