Patents by Inventor Satoshi Takagi

Satoshi Takagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11424473
    Abstract: A fuel cell stack includes a stack body formed by stacking a plurality of power generation cells together in a stacking direction, the power generation cells each having a separator, and a pair of end plates provided at both ends of the stack body in the stacking direction. Further, the fuel cell stack includes a support bar extending between the pair of end plates in the stacking direction and configured to engage with an outer peripheral portion of the separator. The width of the support bar is decreased gradually from one end and the other end toward a central portion in an extension direction in which the support bar extends.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: August 23, 2022
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Hideharu Naito, Kosuke Takagi, Satoshi Kasagami
  • Patent number: 11424143
    Abstract: Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: August 23, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koji Yoshii, Tatsuya Yamaguchi, Hiroyuki Hayashi, Mitsuhiro Okada, Satoshi Takagi, Toshihiko Takahashi, Masafumi Shoji, Kazuya Kitamura
  • Patent number: 11410327
    Abstract: A position determination apparatus for determining, from a first image that is an image including at least a desired first subject, a position of the desired first subject, includes: a feature amount acquisition unit that acquires a first feature amount representing a predetermined feature of the first image; an estimation unit in which a second feature amount representing the predetermined feature obtained from a second image including a second subject is associated with a selected feature map that is a feature map corresponding to the second subject among a plurality of feature maps that are a set of feature maps that are maps representing features of the second image; an estimated first feature map that is estimated by the estimation unit to be associated with the first feature amount: and a position determination unit that determines the position of the desired first subject using the estimated first feature map.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: August 9, 2022
    Assignee: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Satoshi Suzuki, Takehito Miyazawa, Motohiro Takagi, Kazuya Hayase, Tokinobu Mitasaki, Atsushi Shimizu
  • Publication number: 20220240781
    Abstract: A palpation support device according to an embodiment includes: a palpation data acquiring part configured to acquire a palpation data based on a plurality of pressure values applied to fingers of an examiner; and a diagnosis support information output part configured to output diagnosis support information based on the palpation data.
    Type: Application
    Filed: February 4, 2022
    Publication date: August 4, 2022
    Applicant: CANON MEDICAL SYSTEMS CORPORATION
    Inventors: Seiji MIKAMI, Shingo TAKAGI, Kei YAMAJI, Seito IGARASHI, Norimasa MUROI, Hiroshi KUROSAWA, Satoshi OKUYAMA
  • Patent number: 11404607
    Abstract: A display apparatus, including a light-emitting device including a device-side electrode; a driving substrate configured to drive the light-emitting device; a driver-side electrode provided on the driving substrate; and a metal layer configured to connect the device-side electrode to the driver-side electrode, and including a first interface between the metal layer and the device-side electrode, and a second interface between the metal layer and the driver-side electrode, wherein at least one of the first interface and the second interface includes an intermetallic compound.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: August 2, 2022
    Assignee: SAMSUNG ELECTRONICS CO.. LTD.
    Inventors: Satoshi Yanagisawa, Takashi Takagi
  • Publication number: 20220237734
    Abstract: An image processing device includes an image processing unit configured to execute image processing on an image based on an input image, and output a result of the image processing. The input image is a post-conversion image obtained by performing image conversion on an original image. The image conversion includes image conversion for further reducing a data size of the original image while maintaining a feature acquired from the original image and related to an object similar to a subject captured in the original image and maintaining processing accuracy of the image processing.
    Type: Application
    Filed: June 6, 2019
    Publication date: July 28, 2022
    Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Satoshi SUZUKI, Motohiro TAKAGI, Kazuya HAYASE, Takayuki ONISHI, Atsushi SHIMIZU
  • Publication number: 20220238374
    Abstract: A method for manufacturing a semiconductor device is provided. In the method, a silicon-containing gas is supplied to a substrate having a recess in a surface thereof at a predetermined film deposition temperature, thereby depositing a first silicon film in the recess. Chlorine and hydrogen are supplied to the substrate while maintaining the predetermined film deposition temperature, thereby etching the first silicon film deposited in the recess to expand an opening width of the first silicon film. The silicon-containing gas is supplied to the substrate while maintaining the predetermined film deposition temperature, thereby further depositing a second silicon film on the first silicon film in the recess.
    Type: Application
    Filed: January 24, 2022
    Publication date: July 28, 2022
    Inventors: Yutaka Motoyama, Satoshi Takagi, Akari Matsunaga, Keisuke Fujita
  • Patent number: 11373876
    Abstract: A film forming method includes: removing a natural oxide film formed on a front surface of a metal-containing film by supplying a hydrogen fluoride gas to a substrate accommodated in a processing container, the substrate having the metal-containing film formed thereon, and the metal-containing film including no metal oxide film; and forming a silicon film on the metal-containing film by supplying a silicon-containing gas into the processing container, wherein the step of forming the silicon film occurs after the step of removing the natural oxide film.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: June 28, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Satoshi Takagi
  • Publication number: 20220189785
    Abstract: A method for manufacturing a semiconductor device is provided. In the method, an amorphous silicon film is deposited in a recess provided in a surface of a substrate by supplying a silicon-containing gas to the substrate. The amorphous silicon film is etched by supplying an etching gas to the substrate so as to leave the amorphous silicon film on a bottom of the recess. A silicon film is deposited on the amorphous silicon film by supplying dichlorosilane to the substrate.
    Type: Application
    Filed: November 26, 2021
    Publication date: June 16, 2022
    Inventors: Yutaka MOTOYAMA, Hiroaki IKEGAWA, Satoshi TAKAGI, Daisuke SUZUKI
  • Patent number: 11251034
    Abstract: There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: February 15, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroyuki Hayashi, Rui Kanemura, Satoshi Takagi, Mitsuhiro Okada
  • Patent number: 11211265
    Abstract: A heat treatment apparatus includes a processing container that accommodates a plurality of substrates, a gas supply unit that supplies a raw material gas into the processing container, an exhaust unit that exhausts the raw material gas in the processing container, and a heating unit that heats the plurality of substrates. The gas supply unit includes a gas supply pipe including: a first straight pipe portion that extends upward along a longitudinal direction of an inner wall surface of the processing container; a bent portion where a distal end side that extends above the first straight pipe portion is bent downward; a second straight pipe portion that extends downward from the bent portion; and a plurality of gas ejecting holes formed on the second straight pipe portion. The first straight pipe portion has a larger cross-sectional area than the second straight pipe portion.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: December 28, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Takagi, Hiroyuki Hayashi, Hsiulin Tsai
  • Patent number: 11177133
    Abstract: A method of filling a recess according to one embodiment of the present disclosure comprises heating an amorphous semiconductor film without crystallizing the amorphous semiconductor film by radiating laser light to the amorphous semiconductor film embedded in the recess.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: November 16, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Takagi, Yoshimasa Watanabe
  • Patent number: 11134300
    Abstract: An information processing device including a sound output control unit that performs control related to sound output, in a case where an image captured at a first frame rate is subjected to display reproduction at a second frame rate lower than the first frame rate, on the basis of at least one of an input image signal, an input sound signal, reproduction speed information indicating a ratio between the first frame rate and the second frame rate, or user input information, in which the control related to the sound output performed by the sound output control unit includes switching control that selects one sound output method from a plurality of sound output methods and performs switching, or mixing control that performs mixing of sound signals obtained by the plurality of sound output methods.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: September 28, 2021
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventor: Satoshi Takagi
  • Publication number: 20210098254
    Abstract: There is provided a film forming method including: adsorbing fluorine onto a substrate on which a region in which a nitride film is exposed and a region in which an oxide film is exposed are provided adjacent to each other by supplying a fluorine-containing gas to the substrate, and forming a stepped surface on a side surface of the oxide film by selectively etching the nitride film, among the nitride film and the oxide film, so as to cause a surface of the nitride film to be more deeply recessed than a surface of the oxide film; and after the adsorbing the fluorine onto the substrate and forming the stepped surface, selectively forming a semiconductor film on the nitride film, among the nitride film and the oxide film, by supplying a raw material gas including a semiconductor material to the substrate.
    Type: Application
    Filed: September 25, 2020
    Publication date: April 1, 2021
    Inventors: Satoshi TAKAGI, Kazuya KITAMURA, Hsiulin TSAI
  • Publication number: 20210079095
    Abstract: The present invention provides an anti-PD-L1 antibody capable of staining tumor cells such as melanoma cells. An anti-PD-L1 antibody comprising (a) a light chain comprising CDR1 having the amino acid sequence of KSISKY (SEQ ID NO: 1), CDR2 having the amino acid sequence of SGS and CDR3 having the amino acid sequence of QQHNEYPLT (SEQ ID NO: 2) and (b) a heavy chain comprising CDR1 having the amino acid sequence of GYTFTDYI (SEQ ID NO: 3), CDR2 having the amino acid sequence of INPDSGGN (SEQ ID NO: 4) and CDR3 having the amino acid sequence of ARGITMMVVISHWKFDF (SEQ ID NO: 5). A composition for detecting PD-L1, comprising the above antibody as an active ingredient. A method for preparing the above antibody is also provided.
    Type: Application
    Filed: October 28, 2020
    Publication date: March 18, 2021
    Inventors: Satoru Konnai, Kazuhiko Ohashi, Shiro Murata, Tomohiro Okagawa, Asami Nishimori, Naoya Maekawa, Satoshi Takagi, Yumiko Kagawa, Yasuhiko Suzuki, Chie Nakajima
  • Publication number: 20210009683
    Abstract: A novel domain of Aggrus involved in the binding to CLEC-2 was searched for, and monoclonal antibodies recognizing the domain were obtained. The newly found PLAG4 domain is important for Aggrus binding to CLEC-2. Monoclonal antibodies recognizing this region were further developed. The present invention can provide novel Aggrus-CLEC-2 binding inhibitors, platelet aggregation inhibitors, cancer metastasis inhibitors, and tumor growth inhibitors using these antibodies.
    Type: Application
    Filed: June 16, 2020
    Publication date: January 14, 2021
    Inventors: Naoya Fujita, Takaya Sekiguchi, Satoshi Takagi
  • Publication number: 20210006856
    Abstract: To provide an information processing device and a program. Provided is an information processing device including a sound output control unit that performs control related to sound output, in a case where an image captured at a first frame rate is subjected to display reproduction at a second frame rate lower than the first frame rate, on the basis of at least one of an input image signal, an input sound signal, reproduction speed information indicating a ratio between the first frame rate and the second frame rate, or user input information, in which the control related to the sound output performed by the sound output control unit includes switching control that selects one sound output method from a plurality of sound output methods and performs switching, or mixing control that performs mixing of sound signals obtained by the plurality of sound output methods.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 7, 2021
    Inventor: SATOSHI TAKAGI
  • Patent number: 10865246
    Abstract: The present invention provides an anti-PD-L1 antibody capable of staining tumor cells such as melanoma cells. An anti-PD-L1 antibody comprising (a) a light chain comprising CDR1 having the amino acid sequence of KSISKY (SEQ ID NO: 1), CDR2 having the amino acid sequence of SGS and CDR3 having the amino acid sequence of QQHNEYPLT (SEQ ID NO: 2) and (b) a heavy chain comprising CDR1 having the amino acid sequence of GYTFTDYI (SEQ ID NO: 3), CDR2 having the amino acid sequence of INPDSGGN (SEQ ID NO: 4) and CDR3 having the amino acid sequence of ARGITMMVVISHWKFDF (SEQ ID NO: 5). A composition for detecting PD-L1, comprising the above antibody as an active ingredient. A method for preparing the above antibody is also provided.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: December 15, 2020
    Assignees: Fuso Pharmaceutical Industries, Ltd., National University Corporation Hokkaido University
    Inventors: Satoru Konnai, Kazuhiko Ohashi, Shiro Murata, Tomohiro Okagawa, Asami Nishimori, Naoya Maekawa, Satoshi Takagi, Yumiko Kagawa, Yasuhiko Suzuki, Chie Nakajima
  • Patent number: 10854449
    Abstract: A method of forming a silicon film in a recess formed in a target substrate includes: preparing a target substrate having a recess in which a plurality of different bases is exposed; forming an atomic layer seed on at least an inner surface of the recess by sequentially supplying a raw material gas adapted to the plurality of different bases and a reaction gas reacting with the raw material gas to the target substrate one or more times while heating the target substrate to a first temperature; and forming a silicon film on a surface of the atomic layer seed so as to fill the recess by supplying a first silicon raw material gas to the target substrate while heating the target substrate to a second temperature.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: December 1, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Takagi, Hiroyuki Hayashi, Hsiulin Tsai
  • Patent number: 10730939
    Abstract: A novel domain of Aggrus involved in the binding to CLEC-2 was searched for, and monoclonal antibodies recognizing the domain were obtained. The newly found PLAG4 domain is important for Aggrus binding to CLEC-2. Monoclonal antibodies recognizing this region were further developed. The present invention can provide novel Aggrus-CLEC-2 binding inhibitors, platelet aggregation inhibitors, cancer metastasis inhibitors, and tumor growth inhibitors using these antibodies.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: August 4, 2020
    Assignee: JAPANESE FOUNDATION FOR CANCER RESEARCH
    Inventors: Naoya Fujita, Takaya Sekiguchi, Satoshi Takagi