Abstract: A chemical state analysis apparatus 10 includes: an excitation source 11 configured to irradiate an irradiation region A of a predetermined surface in a sample S containing a battery material with an excitation rays for generating characteristic X-rays of the battery material; an analyzing crystal 13 of a flat plate arranged so as to face the irradiation region A; a slit 12 arranged between the irradiation region A and the analyzing crystal 13, the slit being arranged in parallel to the irradiation region A and a predetermined crystal plane of the analyzing crystal 13; an X-ray linear sensor 15 in which linear detecting elements 151 each having a length in a direction parallel to the slit 12 are arranged in a direction perpendicular to the slit; a wavelength spectrum generation unit 161 configured to generate a wavelength spectrum based on intensity of the characteristic X-rays detected by the X-ray linear sensor 15; a peak wavelength determination unit 162 configured to determine a peak wavelength which is a

Abstract: An information processing apparatus includes an interface and a processor. The interface may acquire an image, such as by scanning or received via an interface, such as a facsimile machine. The processor may use a character recognition engine to execute a character recognition process on the image. The process is configured to stop the character recognition process on the image when the elapsed recognition process time exceeds a predetermined threshold value. The processor is further configured to restart the character recognition process on the image when a restart condition is satisfied. As such, the processor thus may skip certain images that require unusually long processing time for character recognition and the processor may process and send out results on other images that do not require excessive character recognition processing time.

Abstract: In this X-ray phase imaging apparatus, at least one of a plurality of gratings is composed of a plurality of grating portions arranged along a third direction perpendicular to a first direction along which a subject or an imaging system is moved by a moving mechanism and a second direction along which an X-ray source, a detection unit, and a plurality of grating portions are arranged. The plurality of grating portions are arranged such that adjacent grating portions overlap each other when viewed in the first direction.

Abstract: An X-ray spectrometer includes: an excitation source that irradiates a predetermined irradiation region on a surface of a sample with an excitation ray generating a characteristic X-ray; a flat plate analyzing crystal facing the irradiation region; a slit provided between the irradiation region and the analyzing crystal, the slit being parallel to a predetermined crystal plane of the analyzing crystal; a linear sensor including linear detection elements having a length in a direction parallel to the slit are arranged in a direction perpendicular to the slit; and an energy calibration unit that measures two characteristic X-rays in which energy is known by irradiating a surface of a standard sample generating the two characteristic X-rays with the excitation ray from the excitation source, and calibrates the energy of the characteristic X-ray detected by each detection element of the X-ray linear sensor based on the measured energies of the two characteristic X-rays.

Abstract: A document reading apparatus includes a scanner, an input device receiving an input of a width and length, and a processor configured to scan an area specified based on the input length and generate a first image, generate a second image by removing a part of the first image so that a width of the second image is equal to or greater than the input width, detect a background or non-background area in the second image, determine whether the input is appropriate based on whether all sides of an area specified based on the input width and length overlap the background area or none of the sides overlaps the non-background area on the second image, and when the input is appropriate, output a third image in which the background area is removed or the non-background area is extracted from the second image.

Abstract: The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.

Abstract: A document reading apparatus includes a scanner, an input device receiving an input of a width and length, and a processor configured to scan an area specified based on the input length and generate a first image, generate a second image by removing a part of the first image so that a width of the second image is equal to or greater than the input width, detect a background or non-background area in the second image, determine whether the input is appropriate based on whether all sides of an area specified based on the input width and length overlap the background area or none of the sides overlaps the non-background area on the second image, and when the input is appropriate, output a third image in which the background area is removed or the non-background area is extracted from the second image.

Abstract: A document reading apparatus includes a scanner, an input device receiving an input of a width and length, and a processor configured to scan an area specified based on the input length and generate a first image, generate a second image by removing a part of the first image so that a width of the second image is equal to or greater than the input width, detect a background or non-background area in the second image, determine whether the input is appropriate based on whether all sides of an area specified based on the input width and length overlap the background area or none of the sides overlaps the non-background area on the second image, and when the input is appropriate, output a third image in which the background area is removed or the non-background area is extracted from the second image.

Abstract: In a method for manufacturing a radiation detector, counter pixel electrodes 33 are formed on a counter substrate 2 at positions facing a plurality of pixel electrodes formed on a signal reading substrate, and wall bump electrodes 34 are further formed on the counter pixel electrodes 33. In order to achieve the above, a resist R is applied, and the resist R is exposed to light to form openings O. When Au sputter deposition is performed on the openings O, only some of the Au is deposited on the bottom surface in the openings O as the counter pixel electrodes 33. The rest of the Au is not deposited on the bottom surface in the openings O, and the most of the remaining Au adheres to the inner walls of the openings O to form wall bump electrodes 34. The bump electrodes 34 are cylindrical, making it possible to reduce the pressure acting on the signal reading substrate by an extent corresponding to the decrease in the bonding area in comparison to conventional bump-shaped bump electrodes.

Abstract: In a radiation detector, a Schottky electrode is formed such that an interdiffusion coefficient between the material of an outermost surface electrode formed on the Schottky electrode and the material of the Schottky electrode is smaller than an interdiffusion coefficient between the material of the outermost surface electrode and Al (aluminum). Consequently, the material of the outermost surface electrode does not diffuse into the Schottky electrode, and Schottky functions can be maintained, and at the same time, the material of the Schottky electrode does not diffuse into the outermost surface electrode, and the outermost surface electrode can be prevented from alloying.

Abstract: In a method for manufacturing a radiation detector, counter pixel electrodes 33 are formed on a counter substrate 2 at positions facing a plurality of pixel electrodes formed on a signal reading substrate, and wall bump electrodes 34 are further formed on the counter pixel electrodes 33. In order to achieve the above, a resist R is applied, and the resist R is exposed to light to form openings O. When Au sputter deposition is performed on the openings O, only some of the Au is deposited on the bottom surface in the openings O as the counter pixel electrodes 33. The rest of the Au is not deposited on the bottom surface in the openings O, and the most of the remaining Au adheres to the inner walls of the openings O to form wall bump electrodes 34. The bump electrodes 34 are cylindrical, making it possible to reduce the pressure acting on the signal reading substrate by an extent corresponding to the decrease in the bonding area in comparison to conventional bump-shaped bump electrodes.

Abstract: In a radiation detector, a Schottky electrode is formed such that an interdiffusion coefficient between the material of an outermost surface electrode formed on the Schottky electrode and the material of the Schottky electrode is smaller than an interdiffusion coefficient between the material of the outermost surface electrode and Al (aluminum). Consequently, the material of the outermost surface electrode does not diffuse into the Schottky electrode, and Schottky functions can be maintained, and at the same time, the material of the Schottky electrode does not diffuse into the outermost surface electrode, and the outermost surface electrode can be prevented from alloying.

Abstract: The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.

Abstract: According to one embodiment, an image processing apparatus includes an acquisition unit that acquires original document image data, a communication interface that is disposed in order to communicate an external device which performs a first optical character recognition process on the original document image data, an optical character recognition processing unit that performs a second optical character recognition process which is a simpler process than the first optical character recognition process, and a controller that determines whether or not to perform the first optical character recognition process, based on a recognition result obtained by the second optical character recognition process, and that generates a document file by using at least any one of a result of the first optical character recognition process and a result of the second optical character recognition process in accordance with a determination result.

Abstract: Generally, a scanner of the present embodiment, which reads a first surface with a first reading section configured to read the first surface of a sheet and a second surface with a second reading section configured to read the second surface opposite to the first surface of the sheet, executes individual processing on a first reading image of the first surface and a second reading image of the second surface.

Abstract: A graphite substrate is processed to have surface unevenness in a range of 1 ?m to 8 ?m. Thereby, a semiconductor film to be laminated on the graphite substrate has a stable film quality, and thus adhesion of the graphite substrate and the semiconductor layer can be enhanced. When an electron blocking layer is interposed between the graphite substrate and the semiconductor layer, the electron blocking layer is thin and thus the surface unevenness of the graphite substrate is transferred onto the electron blocking layer. Consequently, the electron blocking layer also has surface unevenness approximately in such range. Thus, almost the same effect as a configuration in which the semiconductor layer is directly connected to the graphite substrate can be produced.

Abstract: Generally, a scanner of the present embodiment, which reads a first surface with a first reading section configured to read the first surface of a sheet and a second surface with a second reading section configured to read the second surface opposite to the first surface of the sheet, executes individual processing on a first reading image of the first surface and a second reading image of the second surface.

Abstract: Generally, a scanner of the present embodiment, which reads a first surface with a first reading section configured to read the first surface of a sheet and a second surface with a second reading section configured to read the second surface opposite to the first surface of the sheet, executes individual processing on a first reading image of the first surface and a second reading image of the second surface.

Abstract: Provided is a structure configured such that even when resin, such as methacryl resin, exhibiting a low adhesion to a metal thin film is used, the resin and the metal thin film are firmly stacked in close contact with each other, and a film formation method capable of manufacturing a structure in which a metal thin film is, with a high adhesion, formed on a resin work exhibiting a low adhesion to the metal thin film, wherein the structure is configured such that an Al thin film 102 is, by sputtering, formed on a work W made of methacryl resin to form a stack of the work W and the Al thin film 102, and has a mixed region 101 of Al, Si, O, and C between the work W and the Al thin film 102. In the mixed region 101, Al is covalently bound to any one of Si, O, and C, or Al, Si, O, and C form a diffusion mixed layer.

Abstract: A film formation device for forming a metal thin film on a polycarbonate work molded by a resin molding machine, comprises: a film former including a chamber configured to house the work, and a sputtering electrode including a target material and disposed in the chamber; and a carrier configured to carry the work molded by the resin molding machine from the resin molding machine to the chamber within such a short time period that no moisture adheres to a surface of the work.