Patents by Inventor Seiichi Murayama
Seiichi Murayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7740753Abstract: A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.Type: GrantFiled: February 13, 2008Date of Patent: June 22, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Norimitsu Abe, Takeshi Ide, Takeshi Matsushiro, Hiroyuki Suzuki, Seiichi Murayama
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Publication number: 20090166276Abstract: Disclosed is a water treatment system including a raw water tank, a module which includes a filtration membrane, a feed pump, a filtered water tank, a backwash pump which flows filtered water backward from the filtered water tank to the module, a valve and a channel which switch the direction of the water flow between the forward and reverse directions, a controller which suspends the supply of raw water from the raw water tank to the module, switches the valve and channel to the reverse direction, makes the backwash pump to supply filtered water from the filtered water tank to the module thereby backwashing the filtration membrane, and washing drainage treatment line including which treats backwashing drainage generated by backwashing of the filtration membrane, and returns the water to the raw water tank.Type: ApplicationFiled: December 19, 2008Publication date: July 2, 2009Inventors: Norimitsu ABE, Seiichi Murayama, Takeshi Ide, Akira Morikawa, Shojiro Tamaki
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Publication number: 20080210608Abstract: A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.Type: ApplicationFiled: February 13, 2008Publication date: September 4, 2008Applicant: Kabushiki Kaisha ToshibaInventors: Norimitsu Abe, Takeshi Ide, Takeshi Matsushiro, Hiroyuki Suzuki, Seiichi Murayama
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Publication number: 20080203004Abstract: An ultraviolet irradiation water treatment apparatus includes a vessel having a cylindrical side portion, and plural rod-shaped ultraviolet lamps are disposed in parallel with a central axis of the side portion in the vessel. A water inlet pipe through which water flows into the vessel is provided in an outer wall of the side portion at a position in a tangential direction of an inner periphery of the side portion.Type: ApplicationFiled: April 21, 2008Publication date: August 28, 2008Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Norimitsu Abe, Takeshi Ide, Takahiro Soma, Seiichi Murayama, Masao Kaneko, Shojiro Tamaki, Masumi Nakadate, Akira Morikawa
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Publication number: 20060219630Abstract: A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.Type: ApplicationFiled: March 14, 2006Publication date: October 5, 2006Inventors: Norimitus Abe, Takeshi Ide, Takeshi Matsushiro, Hiroyuki Suzuki, Seiichi Murayama
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Publication number: 20060108268Abstract: A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.Type: ApplicationFiled: January 11, 2006Publication date: May 25, 2006Applicant: Kabushiki Kaisha ToshibaInventors: Seiichi Murayama, Futoshi Kurokawa, Masao Kaneko, Kotaro Iyasu, Kenji Taguchi, Kie Kubo, Shojiro Tamaki, Akira Hiramoto, Takumi Hayashi, Nobuyoshi Kaiga
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Patent number: 7014752Abstract: A water treatment control system for minimizing trihalomethane formation includes chlorine injection equipment having a plurality of chlorine injectors (11d, 12, 13), a fluorescence analyzer 7 provided on the upstream of the chlorine injectors, and a water flowmeter 6. An chlorine injection rate necessary to reduce a trihalomethane formation potential is calculated by a chlorine injection rate calculating apparatus 14a based on a measured value from the fluorescence analyzer 7. An chlorine injection amount from the chlorine injectors is controlled by chlorine injection amount control apparatuses 15a–15c based on the chlorine injection rate and a measured value from the flowing water flowmeter 6.Type: GrantFiled: August 14, 2003Date of Patent: March 21, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Seiichi Murayama, Futoshi Kurokawa, Masao Kaneko, Kotaro Iyasu, Kenji Taguchi, Kie Kubo, Shojiro Tamaki, Akira Hiramoto, Takumi Hayashi, Nobuyoshi Kaiga
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Patent number: 6921476Abstract: A UV-assisted advanced-ozonation water treatment system comprises a water treating tank 1, an ozonic water tank 2, an ozonized gas generator 3, and a UV light source 4 disposed in the water treating tank 1 and having a UV-radiating surface 4a, and an ozonic water jetting device including jetting nozzles 5 for jetting the ozonic water onto the UV-radiating surface of the UV light source. An ozonized gas diffusing device 12 is placed in the ozonic water tank 2. An ozonized gas generated by the ozonized gas generator 3 and compressed by a compressor 13 at a pressure in the range of about 2 to about 3 kg/cm2 is diffused into the ozonic water tank 2 by the ozonized gas diffusing device 12. A high-pressure, a high-ozone-concentration ozonic water produced in the ozonized water tank 2 is jetted through the jetting nozzles 5 onto the UV-radiating surface 4a.Type: GrantFiled: August 20, 2003Date of Patent: July 26, 2005Assignee: Kabushiki Kaisha ToshibaInventors: Norimitsu Abe, Setsuo Suzuki, Seiichi Murayama, Kotaro Iyasu, Kie Kubo, Kenji Taguchi
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Publication number: 20040045886Abstract: A UV-assisted advanced-ozonation water treatment system comprises a water treating tank 1, an ozonic water tank 2, an ozonized gas generator 3, and a UV light source 4 disposed in the water treating tank 1 and having a UV-radiating surface 4a, and an ozonic water jetting device including jetting nozzles 5 for jetting the ozonic water onto the UV-radiating surface of the UV light source. An ozonized gas diffusing device 12 is placed in the ozonic water tank 2. An ozonized gas generated by the ozonized gas generator 3 and compressed by a compressor 13 at a pressure in the range of about 2 to about 3 kg/cm2 is diffused into the ozonic water tank 2 by the ozonized gas diffusing device 12. A high-pressure, a high-ozone-concentration ozonic water produced in the ozonized water tank 2 is jetted through the jetting nozzles 5 onto the UV-radiating surface 4a.Type: ApplicationFiled: August 20, 2003Publication date: March 11, 2004Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Norimitsu Abe, Setsuo Suzuki, Seiichi Murayama, Kotaro Iyasu, Kie Kubo, Kenji Taguchi
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Publication number: 20040045880Abstract: A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.Type: ApplicationFiled: August 14, 2003Publication date: March 11, 2004Applicant: Kabushiki Kaisha ToshibaInventors: Seiichi Murayama, Futoshi Kurokawa, Masao Kaneko, Kotaro Iyasu, Kenji Taguchi, Kie Kubo, Shojiro Tamaki, Akira Hiramoto, Takumi Hayashi, Nobuyoshi Kaiga
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Patent number: 6638421Abstract: A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.Type: GrantFiled: November 29, 2001Date of Patent: October 28, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Seiichi Murayama, Futoshi Kurokawa, Masao Kaneko, Kotaro Iyasu, Kenji Taguchi, Kie Kubo, Shojiro Tamaki, Akira Hiramoto, Takumi Hayashi, Nobuyoshi Kaiga
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Publication number: 20020104787Abstract: A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.Type: ApplicationFiled: November 29, 2001Publication date: August 8, 2002Inventors: Seiichi Murayama, Futoshi Kurokawa, Masao Kaneko, Kotaro Iyasu, Kenji Taguchi, Kie Kubo, Shojiro Tamaki, Akira Hiramoto, Takumi Hayashi, Nobuyoshi Kaiga
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Patent number: 5372916Abstract: In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.Type: GrantFiled: July 6, 1992Date of Patent: December 13, 1994Assignee: Hitachi, Ltd.Inventors: Taro Ogawa, Kozo Mochiji, Seiichi Murayama, Hiroaki Oizumi, Takashi Soga, Seiji Yamamoto, Isao Ochiai
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Patent number: 5034655Abstract: A fluorescent lamp has at least a pair of electrodes, at least two circular discharge tubes connected to said electrodes and enclosing rare gas and mercury therein, and a phosphor coating provided on an inside wall of each of said discharge tubes, the two circular discharge tubes being arranged coaxially circularly on one and the same plane, the diameter of each of the discharge tubes being selected to have a value within a range of from 5 mm to 25 mm both inclusive, the luminance on surface of each of the discharge tubes being selected to have a value within a range of from 2.times.10.sup.4 Cd/m.sup.2 to 6.times.10.sup.4 Cd/m.sup.2.Type: GrantFiled: August 24, 1989Date of Patent: July 23, 1991Assignee: Hitachi, Ltd.Inventors: Seiichi Murayama, Hiromitsu Matsuno, Tetsuo Ono, Yasusuke Seki, Atsuo Koyama, Churyo Kodama, Tsuyoshi Kobayashi
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Patent number: 4963735Abstract: A plasma source mass spectrometer in which ions in a plasma generated in a high pressure (.ltoreq.1 atm) region are introduced into a low pressure (.ltoreq.10.sup.-5 Torr) region to analysis the ion mass includes a moderate pressure (.gtoreq.10.sup.-3 Torr) region which is provided between the high pressure region and the low pressure region. The plasma generated in the high pressure region is diffused to the moderate pressure region in order to produce a diffused plasma. Ions are extracted from the diffused plasma by an ion extraction electrode having an ion extraction opening. In the vicinity of the ion extraction opening a convex-shaped toward the diffused plasma whereby ion sheath is formed, whereby the ions can be extracted toward the low pressure region with a high efficiency.Type: GrantFiled: November 7, 1989Date of Patent: October 16, 1990Assignee: Hitachi, Ltd.Inventors: Yukio Okamoto, Tsutomu Komoda, Satoshi Shimura, Seiichi Murayama, Masataka Koga
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Patent number: 4936252Abstract: An equipment for manufacturing semiconductor devices has: a reaction chamber in which a substrate to be processed is placed; means for evacuating the reaction chamber; means for introducing a reaction gas into the reaction chamber; means for applying polarized light to the surface of the substrate for the purpose of depositing a thin film on the surface of the substrate using a photochemical reaction between the light and the reaction gas; and means for adjusting the direction of polarization of the light so as to be substantially perpendicular to the longitudinal axis of a stepped circuit pattern present on the surface of the substrate for the purpose of flattening the circuit pattern.Type: GrantFiled: April 11, 1988Date of Patent: June 26, 1990Assignee: Hitachi, Ltd.Inventors: Yusuke Yajima, Hidekazu Okuhira, Kanji Tsujii, Seiichi Murayama, Akira Shintani, Yasuo Wada
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Patent number: 4933602Abstract: A light source apparatus for irradiating a large area with high intensity of light comprises a microwave cavity having a section of a flat shape and a plurality of electrodeless lamps disposed within the cavity in juxtaposition with one another in a flat array.Type: GrantFiled: February 12, 1988Date of Patent: June 12, 1990Assignee: Hitachi, Ltd.Inventors: Tetsuo Ono, Kenji Sekine, Seiichi Murayama
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Patent number: 4908492Abstract: A microwave plasma production apparatus according to the present invention is so configured that a cylindrical coaxial wave guide is formed by a cylindrical outer conductor and a helical coil shaped inner conductor, and at least a part of a nonconductive discharge tube is disposed inside said inner conductor, microwave being applied between said outer conductor and said inner conductor.Type: GrantFiled: May 5, 1989Date of Patent: March 13, 1990Assignee: Hitachi, Ltd.Inventors: Yukio Okamoto, Seiichi Murayama
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Patent number: 4902099Abstract: A plasma trace element spectrometer comprises a microwave generator for generating microwave power, a microwave feeder for guiding and transforming the generated microwave power into microwave power of TE.sub.01 mode and supplying the microwave power of TE.sub.01 mode, a plasma producer having, at one end, an introduction port for a carrier gas and a sample and at the other end an opening and being cooperative with the supplied microwave power of TE.sub.01 mode to produce plasma of the carrier gas and sample introduced through the introduction port, and a spectrometer for analyzing constituent elements of the sample by measuring the produced plasma by way of the opening.Type: GrantFiled: December 16, 1988Date of Patent: February 20, 1990Assignee: Hitachi, Ltd.Inventors: Yukio Okamoto, Makoto Yasuda, Seiichi Murayama, Masataka Koga
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Patent number: 4879493Abstract: Disclosed is a low-pressure discharge lamp comprising a discharge vessel defining an airtight space therein, at least one pair of electrodes disposed in the discharge vessel, and discharge gases enclosed in the discharge vessel, one of the electrodes which acts as an anode being located in a zone of negative glow.Type: GrantFiled: November 30, 1987Date of Patent: November 7, 1989Assignee: Hitachi, Ltd.Inventors: Hiromistu Mastuno, Seiichi Murayama, Tetsuo Ono, Yoshio Watanabe