Patents by Inventor Seiichi Murayama

Seiichi Murayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4841556
    Abstract: A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.
    Type: Grant
    Filed: February 10, 1987
    Date of Patent: June 20, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Kato, Isao Ochiai, Yoshio Watanabe, Seiichi Murayama
  • Patent number: 4803401
    Abstract: Disclosed is a compact fluorescent lamp which comprises an airtight outer bulb filled with a rare gas and mercury; inner tube means provided within the outer bulb, said means having opening to a space of the inside of the outer bulb, and a coating formed onto at least one of an inner surface of said outer bulb and an outer surface of said inner tube means, said coating being so transparent as substantially not to scater visible rays and which consists of at least one material of an oxide and a phosphate.A compact fluorescent lamp mostly in the electric bulb shape of the present invention has been remarkably improved in the so-called lumen output maintenance without lowering of the initial lumen output.
    Type: Grant
    Filed: July 16, 1986
    Date of Patent: February 7, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Hiromitsu Matsuno, Tetsuo Ono, Seiichi Murayama
  • Patent number: 4803406
    Abstract: A high-pressure discharge lamp operating circuit performs a low-frequency AC operating at an early stage of operating and thereafter performs a high-frequency AC operation or DC operation during the steady-state of lamp operation. This circuit comprises a circuit for effecting a transition from the low-frequency AC operation to the high-frequency AC operation or DC operation either at the time which is a predetermined time period after the ignition of discharge before the high-pressure discharge lamp reaches the steady-state of operation, or after having detected at least one of predetermined lamp characteristics, thereby providing a stabilized light output.
    Type: Grant
    Filed: November 5, 1985
    Date of Patent: February 7, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yasuda, Tsune Miyashita, Seiichi Murayama, Yoji Arai, Fuzio Yamada
  • Patent number: 4716852
    Abstract: An apparatus according to the present invention for thin film formation using a photo-induced chemical reaction comprises a reaction chamber in which a substrate can be set, means to introduce a reactive gas into the reaction chamber for the purpose of causing a surface of the substrate to adsorb the reactive gas, means to evacuate the reaction chamber, means to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucleus required for growing a film on the substrate surface, means to generate metastable excited molecules which can react with the reactive gas to decompose it, and means to introduce the reactive gas and the metastable excited molecules into the reaction chamber for the purpose of growing the film on the substrate formed with the nucleus on the basis of the nucleus.
    Type: Grant
    Filed: April 7, 1986
    Date of Patent: January 5, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Kanji Tsujii, Yusuke Yajima, Seiichi Murayama
  • Patent number: 4715054
    Abstract: A plasma X-ray source comprises inner and outer cylindrical electrodes disposed coaxially and with a certain distance with respect to each other, an electrical insulator disposed between end portions of the inner and outer cylindrical electrodes, and a discharge vessel disposed to envelop the inner and outer cylindrical electrodes. A pulse voltage is applied between the inner and outer cylindrical electrodes to produce plasma in the discharge vessel. An electrically conductive spherical shield is disposed to envelop a space where the plasma is pinched, and the spherical shield is maintained at a potential equal to that applied to the outer cylindrical electrode.
    Type: Grant
    Filed: November 7, 1985
    Date of Patent: December 22, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Kato, Kunio Harada, Shigeo Kubota, Yoshio Watanabe, Seiichi Murayama
  • Patent number: 4697121
    Abstract: A low-pressure mercury vapor discharge lamp in which a rare gas and mercury are provided in an outer bulb, which in turn contains therein a plurality of bent inner tubes, each having an opening at an end and an electrode at the other end thereof. A starting probe is provided between the openings in the outer bulb. An operating circuit or starter is connected to the electrodes. Further, a starting probe circuit is connected to the starting probe to apply a high voltage to the starting probe at the time of ignition.
    Type: Grant
    Filed: September 8, 1986
    Date of Patent: September 29, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Kato, Tetsuo Ono, Yoshio Watanabe, Seiichi Murayama, Shigeo Mikoshiba, Hiromitsu Matsuno
  • Patent number: 4678536
    Abstract: A method of photochemically treating a surface of a material is disclosed which includes a step of introducing a reaction gas into a reaction chamber having a substrate therein, to make the reaction gas be adsorbed on the surface of the substrate, and a step of exposing the substrate to radiation of a wavelength at which the absorption of radiation energy by the reaction gas existing in the inner space of the reaction chamber is negligibly small and the radiation energy is absorbed by the reaction gas adsorbed on the surface of the substrate, wherein the kind of the reaction gas and the wavelength of the radiation are selected so that the surface of a predetermined material forming a pattern on the substrate can be selectively treated.
    Type: Grant
    Filed: November 20, 1985
    Date of Patent: July 7, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Seiichi Murayama, Kanji Tsujii, Yusuke Yajima
  • Patent number: 4653908
    Abstract: The present invention consists in a grazing incidence reflection spectrometer wherein light is caused to incide on a surface of a sample, and an intensity of light reflected from the sample surface is detected, thereby to measure an electronic absorption spectrum of a material adsorbed to the sample surface, characterized in that the incident light is visible light or ultraviolet light, and that the incident light has a predetermined glancing angle to the sample surface.
    Type: Grant
    Filed: December 3, 1984
    Date of Patent: March 31, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Yajima, Seiichi Murayama, Kanji Tsujii
  • Patent number: 4643799
    Abstract: A dry etching method according to the present invention is composed of the steps of evacuating the reaction chamber in which a substrate to be etched is set, introducing etching gas into the reaction chamber, causing the substrate to adsorb the introduced etching gas and thereafter evacuate the etching gas remaining in the reaction chamber, and irradiating the surface of the substrate to be etched with photon energy through a light window provided in the reaction chamber.
    Type: Grant
    Filed: December 16, 1985
    Date of Patent: February 17, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Kanji Tsujii, Yusuke Yajima, Seiichi Murayama
  • Patent number: 4642512
    Abstract: A low-pressure mercury vapor discharge lamp comprising a glass tube in which a metal oxide or phosphate layer and then a phosphor layer are formed on its inner surface, in which during operation of the lamp, the lowest temperature of the wall of the glass tube along its discharge path is kept at 80.degree. C. or above.
    Type: Grant
    Filed: November 1, 1984
    Date of Patent: February 10, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Hiromitsu Matsuno, Seiichi Murayama, Tetsuo Ono
  • Patent number: 4627086
    Abstract: A plasma X-ray source is operable, like the plasma focus type source, to generate impulse discharge through a gas filled in a discharge tube. A relatively small amount of the gas is continuously supplied to and evacuated from the discharge tube in accordance with an occurrence frequency of discharge, without operating evacuation and filling of the gas at each cycle of discharge, under the regulation to make constant the pressure within the discharge tube, thereby eliminating the time for exchange of gas contaminated by discharge, reducing the amount of gas used, and improving reproducibility of discharge.
    Type: Grant
    Filed: September 5, 1985
    Date of Patent: December 2, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Kato, Yoshio Watanabe, Seiichi Murayama
  • Patent number: 4622493
    Abstract: A high intensity ultraviolet light-source comprises an arc tube having a pair of electrodes, filled with certain amounts of mercury, tantalum halide and rare gas, and provided with a tube loading of at least 13 Watt/cm.sup.2.
    Type: Grant
    Filed: March 22, 1983
    Date of Patent: November 11, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yasuda, Seiichi Murayama
  • Patent number: 4622485
    Abstract: A discharge lamp comprising an inner arc tube and an outer tube enclosing the inner tube. The outer tube is filled with neon at a pressure of 0.1 atm or more, or a gas mixture of neon in 80 pressure percent or more and breakdown suppressing gas.
    Type: Grant
    Filed: February 11, 1985
    Date of Patent: November 11, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Tsune Miyashita, Makoto Yasuda, Seiichi Murayama, Yoji Arai
  • Patent number: 4615756
    Abstract: An etching apparatus according to the present invention comprises means to generate metastable excited species such as of nitrogen or rare gas molecules, means to transfer the metastable excited species into a reaction chamber in which a substrate to-be-etched is set, and means to introduce a reactive gas for etching into the reaction chamber in which the substrate to-be-etched is set; the reactive gas being activated by collision between the metastable excited species and the reactive gas so as to etch the substrate to-be-etched owing to a reaction between the activated reactive gas and the substrate to-be-etched. Further, a light source for photo-exciting the substrate to-be-etched may well be added.
    Type: Grant
    Filed: July 11, 1985
    Date of Patent: October 7, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Kanji Tsujii, Yusuke Yajima, Seiichi Murayama
  • Patent number: 4611148
    Abstract: A low-pressure mercury vapor discharge lamp in which a rare gas and mercury are provided in an outer bulb, which in turn contains therein a plurality of bent inner tubes, each having an opening at an end and an electrode at the other end thereof. A starting probe is provided between the openings in the outer bulb. An operating circuit or starter is connected to the electrodes. Further, a starting probe circuit is connected to the starting probe to apply a high voltage to the starting probe at the time of ignition.
    Type: Grant
    Filed: February 6, 1984
    Date of Patent: September 9, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Kato, Tetsuo Ono, Yoshio Watanabe, Seiichi Murayama, Shigeo Mikoshiba, Hiromitsu Matsuno
  • Patent number: 4587460
    Abstract: A high pressure discharge lamp in which discharge between a pair of main electrodes in an arc tube of the discharge lamp is sustained by a D.C. or high frequency current. The circuit comprises discharge mode controller for controlling the discharge such that mainly a low-frequency discharge is produced between the main electrodes at least within a predetermined time from initiation of the discharge within the arc tube, and subsequently transferred to the D.C. or high-frequency discharge.
    Type: Grant
    Filed: April 24, 1984
    Date of Patent: May 6, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Seiichi Murayama, Makoto Yasuda, Tsune Miyashita, Yoji Arai, Kenichi Kawasumi, Kazunori Kinoshita
  • Patent number: 4587453
    Abstract: A low-pressure mercury vapor discharge lamp comprising an envelope forming a gas-tight closed space and a pair of inner tubes provided in the closed space and having an end thereof sealed at the first end of the outer envelope, the other end thereof being opened into the closed space, and electrodes provided at the sealed end sides in the inner tubes. The temperature of the coldest spot of the envelope is in a range between 45.degree. C. and 65.degree. C. at an ambient temperature of 25.degree. C.
    Type: Grant
    Filed: July 25, 1983
    Date of Patent: May 6, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Tetsuo Ono, Yoshio Watanabe, Hiromitsu Matsuno, Yasuo Kato, Seiichi Murayama, Shigeo Mikoshiba
  • Patent number: 4523096
    Abstract: A liquid chromatography apparatus comprises a detector part having as a light source a metal halide lamp filled with tantalum halide, mercury and rare gas.
    Type: Grant
    Filed: December 10, 1982
    Date of Patent: June 11, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yasuda, Seiichi Murayama
  • Patent number: 4339201
    Abstract: Disclosed is a system for controlling the temperature of an atomizer for an element analyzer, said system comprising a birefringent prism arranged on the optical axis of radiant light emitted out of the atomizer, and a light sensor for detecting the radiant light which passes through said birefringent prism.
    Type: Grant
    Filed: April 1, 1980
    Date of Patent: July 13, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yasuda, Seiichi Murayama, Masaru Ito
  • Patent number: 4298284
    Abstract: In measuring a change in the polarization state of light attributed to magnetooptic anisotropy, a means for generating optic anisotropy is added to a light source or onto an optical path extending from the light source to a polarization analyzer. This allows high precision analysis of the polarization state of light emergent from the polarization analyzer.
    Type: Grant
    Filed: December 14, 1978
    Date of Patent: November 3, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Manabu Yamamoto, Seiichi Murayama, Masaru Ito, Kounosuke Oishi