Abstract: Discussed is a bolting device that effectively protects an internal configuration of a battery pack and increases manufacturing efficiency during a bolting operation. The bolting device for manufacturing a battery pack includes an electric screwdriver provided with a rotation motor; a driver bit connected to the rotation motor to enable a rotation movement and configured to rotate a bolt; a bit guide member provided with a hollow tube such that the driver bit is inserted into an inside of the hollow tube to be movable; and a guide jig provided with a main body configured to be mounted on an upper portion of a pack housing, the main body having a plate shape and having at least one through hole, and a fixing member inserted into the through hole and mounted therein, and having an insertion hole.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: A backlight unit includes a light source providing a blue light; a light guide plate of glass at a side of the light source; an optical sheet on the light guide plate; a reflective sheet under the light guide plate; and an optic change part including a yellow fluorescent material, wherein the blue light is changed into a white light by the optical change part.

Abstract: Disclosed is a display device. The display device includes a display panel, a plurality of fixers arranged at certain intervals and adhered to a bottom edge of the display panel, a guide panel configured to support the plurality of fixers, a rear cover configured to support the guide panel, a side cover configured to surround a side of the rear cover and constrain positions of the plurality of fixers, a plurality of panel supporting parts configured to support a bottom of the display panel to which the plurality of fixers are not adhered and which is disposed between the plurality of fixers, and a plurality of ribs provided at the guide panel or the side cover configured to support the plurality of panel supporting parts.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: A backlight unit includes a light source providing a blue light; a light guide plate of glass at a side of the light source; an optical sheet on the light guide plate; a reflective sheet under the light guide plate; and an optic change part including a yellow fluorescent material, wherein the blue light is changed into a white light by the optical change part.

Abstract: Disclosed is a display device. The display device includes a display panel, a plurality of fixers arranged at certain intervals and adhered to a bottom edge of the display panel, a guide panel configured to support the plurality of fixers, a rear cover configured to support the guide panel, a side cover configured to surround a side of the rear cover and constrain positions of the plurality of fixers, a plurality of panel supporting parts configured to support a bottom of the display panel to which the plurality of fixers are not adhered and which is disposed between the plurality of fixers, and a plurality of ribs provided at the guide panel or the side cover configured to support the plurality of panel supporting parts.

Abstract: A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.

Abstract: Methods of forming photoresist patterns may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: Disclosed is an LCD module that has a cushion member, or a plurality of buffer structures, which prevents mechanical deformation of the LCD panel, and the light leakage that results from the mechanical deformation. The plurality of cushion members are bonded to only a single inside edge of the panel guide and evenly distanced such that they provide a cushion to the LCD panel to reduce a concentrated weight generated by pressing due to the weight of the LCD panel. The cushion member, or the plurality of buffer structures, prevents mechanical deformation by distributing the weight of the LCD panel. The LCD module comprises an LCD panel, a backlight assembly, and a guide panel having the cushion member or buffer structures.

Abstract: A backlight unit capable of preventing an initial driving malfunction is disclosed. The backlight unit includes a bottom cover opened upwardly, a reflective sheet disposed in the inner surface of the bottom cover; a plurality of lamps arranged at a fixed interval on the reflective sheet; an auxiliary light source disposed at the outer side surface of the bottom cover; and a light guide member, opposite to the emitting surface of the auxiliary light source, configured to guide light emitted from the auxiliary light source to the lamps through first and second penetration holes formed on one of the side walls of the bottom cover and the reflective sheet.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.

Abstract: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

Abstract: A method of forming fine patterns of a semiconductor device by using carbon (C)-containing films includes forming an etching target film on a substrate including first and second regions; forming a plurality of first C-containing film patterns on the etching target film in the first region; forming a buffer layer which covers top and side surfaces of the plurality of first C-containing film patterns; forming a second C-containing film; removing the second C-containing film in the second region; exposing the plurality of first C-containing film patterns by removing a portion of the buffer layer in the first and second regions; and etching the etching target film by using the plurality of first C-containing film patterns, and portions of the second C-containing film which remain in the first region, as an etching mask.

Abstract: A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers.

Abstract: A method of forming a mask pattern, a method of forming a minute pattern, and a method of manufacturing a semiconductor device using the same, the method of forming the mask pattern including forming first mask patterns on a substrate; forming first preliminary capping layers on the first mask patterns; irradiating energy to the first preliminary capping patterns to form second preliminary capping layers ionically bonded with the first mask patterns; applying an acid to the second preliminary capping layers to form capping layers; forming a second mask layer between the capping layers, the second mask layer having a solubility lower than that of the capping layers; and removing the capping layers to form second mask patterns.

Abstract: A semiconductor device and a method of fabricating a semiconductor device provide high quality cylindrical capacitors. The semiconductor device includes a substrate defining a cell region and a peripheral circuit region, a plurality of capacitors in the cell region, and supports for supporting lower electrodes of the capacitors. The lower electrodes are disposed in a plurality of rows each extending in a first direction. A dielectric layer is disposed on the lower electrodes, and an upper electrode is disposed on the dielectric layer. The supports are in the form of stripes extending longitudinally in the first direction and spaced from each other along a second direction. Each of the supports engages the lower electrodes of a respective plurality of adjacent rows of the lower electrodes. Each one of the supports is also disposed at a different level in the device from the support that is adjacent thereto in the second direction.