Patents by Inventor Seung Min SHIN

Seung Min SHIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11700409
    Abstract: A display apparatus and a server which implements an interactive system are disclosed. The server includes a communicator which receives text information corresponding to a user voice collected at the display apparatus from the display apparatus, and a controller which extracts an utterance component from the text information and controls so that a query to search contents is generated using the extracted utterance component and transmitted to an external server which categorizes metadata of the content under each item and stores the same, in which the controller generates the query by adding a preset item to a criteria to search a content, when a number of criteria to categorize the content under an item corresponding to the extracted utterance component is less than a preset number.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: July 11, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong-wook Shin, Seung-min Shin, Sung-wook Choi, Hye-jeong Lee, Ji-hye Chung
  • Publication number: 20230197481
    Abstract: An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.
    Type: Application
    Filed: August 22, 2022
    Publication date: June 22, 2023
    Applicants: SAMSUNG ELECTRONICS CO., LTD., SEMES CO., LTD.
    Inventors: Seung Min SHIN, Sang Jin PARK, Hae Won CHOI, Jang Jin LEE, Ji Hwan PARK, Kun Tack LEE, Koriakin ANTON, Joon Ho WON, Jin Yeong SUNG, Pil Kyun HEO
  • Publication number: 20230154743
    Abstract: A wafer cleaning apparatus, a method of cleaning wafer and a method of fabricating a semiconductor device are provided. The method of fabricating the semiconductor device includes disposing a wafer on a rotatable chuck, irradiating a lower surface of the wafer with a laser to heat the wafer, and supplying a chemical to an upper surface of the wafer to clean the wafer, wherein the laser penetrates an optical system including an aspheric lens array, the laser penetrates a calibration window, which includes a first window structure including a first light projection window including first and second regions different from each other, a first coating layer covering the first region of the first light projection window, and a second coating layer covering the second region of the first light projection window, and the first coating layer and the second coating layer have different light transmissivities from each other.
    Type: Application
    Filed: January 18, 2023
    Publication date: May 18, 2023
    Inventors: SeongKeun CHO, Young Hoo KIM, Seung Min SHIN, Tae Min EARMME, Kun Tack LEE, Hun Jae JANG, Eun Hee JEANG
  • Patent number: 11648594
    Abstract: A wafer cleaning apparatus is provided. The wafer cleaning apparatus includes comprising a chamber configured to be loaded with a wafer, a nozzle on the wafer and configured to provide liquid chemicals on an upper surface of the wafer, a housing under the wafer, a laser module configured to irradiate laser on the wafer, a transparent window disposed between the wafer and the laser module, and a controller configured to control on/off of the laser module, wherein the controller is configured to control repetition of turning the laser module on and off, and retain temperature of the wafer within a temperature range, and a ratio of time when the laser module is on in one cycle including on/off of the laser module is 30% to 50%.
    Type: Grant
    Filed: June 2, 2020
    Date of Patent: May 16, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung Min Shin, Hun Jae Jang, Seok Hoon Kim, Young-Hoo Kim, In Gi Kim, Tae-Hong Kim, Kun Tack Lee, Ji Hoon Cha, Yong Jun Choi
  • Publication number: 20230131222
    Abstract: A substrate processing apparatus and a substrate processing method are provided, in which a flow rate of CO2 injected into a supercritical drying vessel is controlled through multi-level pressure control. The substrate processing method includes disposing a substrate coated with a chemical liquid in a process chamber, that includes a space in which the substrate is processed; drying the substrate by using a supercritical fluid; and taking the substrate out of the process chamber when the substrate is dried.
    Type: Application
    Filed: July 28, 2022
    Publication date: April 27, 2023
    Applicants: SAMSUNG ELECTRONICS CO., LTD., SEMES CO., LTD.
    Inventors: Hae Won CHOI, Seung Min Shin, Sang Jine Park, Jae Won Shin, Ji Hwan Park, Kun Tack Lee, Koriakin Anton, Joon Ho Won, Pil Kyun Heo
  • Patent number: 11631599
    Abstract: An apparatus is provided. The apparatus includes a spinner configured to hold a wafer, a nozzle configured to supply a liquid chemical onto an upper surface of the wafer, and a laser module configured to heat the wafer by radiating a laser beam to a lower surface of the wafer while the nozzle supplies the liquid chemical onto the upper surface of the wafer.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: April 18, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji Hoon Cha, Jinwoo Lee, Seok Hoon Kim, In Gi Kim, Seung Min Shin, Yong Jun Choi
  • Patent number: 11605545
    Abstract: A wafer cleaning equipment includes a housing to be positioned adjacent to a wafer, a hollow region in the housing, a laser module that outputs a laser beam having a profile of the laser beam includes a first region having a first intensity and a second region having a second intensity greater than the first intensity, the laser beam being output into the hollow region, and a transparent window that covers an upper part of the hollow region and transmits the laser beam to be incident on an entirety of a lower surface of the wafer.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: March 14, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hun Jae Jang, Seung Min Shin, Seok Hoon Kim, In Gi Kim, Tae-Hong Kim, Kun Tack Lee, Jinwoo Lee, Ji Hoon Cha, Yong Jun Choi
  • Patent number: 11581182
    Abstract: A wafer cleaning apparatus, a method of cleaning wafer and a method of fabricating a semiconductor device are provided. The method of fabricating the semiconductor device includes disposing a wafer on a rotatable chuck, irradiating a lower surface of the wafer with a laser to heat the wafer, and supplying a chemical to an upper surface of the wafer to clean the wafer, wherein the laser penetrates an optical system including an aspheric lens array, the laser penetrates a calibration window, which includes a first window structure including a first light projection window including first and second regions different from each other, a first coating layer covering the first region of the first light projection window, and a second coating layer covering the second region of the first light projection window, and the first coating layer and the second coating layer have different light transmissivities from each other.
    Type: Grant
    Filed: September 17, 2021
    Date of Patent: February 14, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seongkeun Cho, Young Hoo Kim, Seung Min Shin, Tae Min Earmme, Kun Tack Lee, Hun Jae Jang, Eun Hee Jeang
  • Publication number: 20220319878
    Abstract: A wet etching apparatus includes a process bath having an internal space configured to receive an etchant and having a support unit, on which a wafer is disposed to be in contact with the etchant. A laser unit is disposed above the process bath and is configured to direct a laser beam to the wafer and to heat the wafer thereby. An etchant supply unit is configured to supply the etchant to the internal space of the process bath.
    Type: Application
    Filed: June 16, 2022
    Publication date: October 6, 2022
    Inventors: JIN WOO LEE, YONG JUN CHOI, SEOK HOON KIM, SEUNG MIN SHIN, JI HOON CHA
  • Publication number: 20220262621
    Abstract: A wafer cleaning apparatus, a method of cleaning wafer and a method of fabricating a semiconductor device are provided. The method of fabricating the semiconductor device includes disposing a wafer on a rotatable chuck, irradiating a lower surface of the wafer with a laser to heat the wafer, and supplying a chemical to an upper surface of the wafer to clean the wafer, wherein the laser penetrates an optical system including an aspheric lens array, the laser penetrates a calibration window, which includes a first window structure including a first light projection window including first and second regions different from each other, a first coating layer covering the first region of the first light projection window, and a second coating layer covering the second region of the first light projection window, and the first coating layer and the second coating layer have different light transmissivities from each other.
    Type: Application
    Filed: September 17, 2021
    Publication date: August 18, 2022
    Inventors: Seongkeun CHO, Young Hoo KIM, Seung Min SHIN, Tae Min EARMME, Kun Tack LEE, Hun Jae JANG, Eun Hee JEANG
  • Patent number: 11306523
    Abstract: The present invention provides a pinch-preventing safety hinge for a hinged door, which connects a door to a doorjamb mounted in a wall so that the door is opened or closed while rotating about the doorjamb and which includes a hinge unit including a fixing member secured to the doorjamb and a rotary member secured to one side end of the door and hingedly coupled to the fixing member so as to rotate, and a shielding unit rotatably coupled to a rotary shaft of the fixing member or the rotary member, the shielding unit being fixed to the fixing member by hinge motion of the hinge unit.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: April 19, 2022
    Assignee: ZEOMADE CO., LTD.
    Inventors: Seung Min Shin, Tae Young Jeong, Hyun Soo Kim, Young Kwang Kim
  • Publication number: 20220084812
    Abstract: A wafer cleaning method is provided. The wafer cleaning method includes providing a wafer on a stage that is inside of a chamber. The wafer is fixed to the stage by moving a grip pin connected to an edge of the stage. First ultrapure water is supplied onto the wafer while the wafer is rotating at a first rotation speed. The grip pin is released from the wafer by moving the grip pin. A development process is performed by supplying liquid chemical onto the wafer while the wafer is rotating at a second rotation speed that is less than the first rotation speed.
    Type: Application
    Filed: May 12, 2021
    Publication date: March 17, 2022
    Inventors: Sung Hyun Park, Seo Hyun Kim, Seung Ho Kim, Young Chan Kim, Young-Hoo Kim, Tae-Hong Kim, Hyun Woo Nho, Seung Min Shin, Kun Tack Lee, Hun Jae Jang
  • Patent number: 11241635
    Abstract: The present disclosure according to at least one embodiment relates to, in the learning process of a child using smart toys, a method and system for providing an interactive service by using a smart toy, which provide more accurate classified emotional state of the child based on at least one or more sensed data items of an optical image, a thermal image, and voice data of the child, as well as adaptively provide a flexible and versatile interactive service according to classified emotions.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: February 8, 2022
    Inventors: Heui Yul Noh, Myeong Ho Roh, Chang Woo Ban, Oh Soung Kwon, Seung Pil Lee, Seung Min Shin
  • Publication number: 20210343552
    Abstract: A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.
    Type: Application
    Filed: July 15, 2021
    Publication date: November 4, 2021
    Inventors: Seung-Min SHIN, Seok-Hoon KIM, Young-Hoo KIM, In-Gi KIM, Tae-Hong KIM, Sung-Hyun PARK, Jin-Woo LEE, Ji-Hoon CHA, Yong-Jun CHOI
  • Publication number: 20210308593
    Abstract: The present disclosure according to at least one embodiment relates to, in the learning process of a child using smart toys, a method and system for providing an interactive service by using a smart toy, which provide more accurate classified emotional state of the child based on at least one or more sensed data items of an optical image, a thermal image, and voice data of the child, as well as adaptively provide a flexible and versatile interactive service according to classified emotions.
    Type: Application
    Filed: November 15, 2019
    Publication date: October 7, 2021
    Inventors: Heui Yul NOH, Myeong Ho ROH, Chang Woo BAN, Oh Soung KWON, Seung Pil LEE, Seung Min SHIN
  • Patent number: 11140181
    Abstract: A web traffic logging system includes: a log setting unit which performs setting for collecting log from at least one of a web server and a web server operating system; a log gathering unit which creates log information including the log collected in accordance with the setting; and a log transmitting unit which transmits the log information to a cloud server.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: October 5, 2021
    Assignee: QUBIT SECURITY INC.
    Inventor: Seung Min Shin
  • Patent number: 11087996
    Abstract: A dry cleaning apparatus includes a chamber, a substrate support supporting a substrate within the chamber, a shower head arranged in an upper portion of the chamber to supply a dry cleaning gas toward the substrate, the shower head including an optical window transmitting a laser light therethrough toward the substrate support, a plasma generator generating plasma from the dry cleaning gas, and a laser irradiator irradiating the laser light on the substrate through the optical window and the plasma to heat the substrate.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: August 10, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-Min Shin, Seok-Hoon Kim, Young-Hoo Kim, In-Gi Kim, Tae-Hong Kim, Sung-Hyun Park, Jin-Woo Lee, Ji-Hoon Cha, Yong-Jun Choi
  • Publication number: 20210226967
    Abstract: A web traffic logging system includes: a log setting unit which performs setting for collecting log from at least one of a web server and a web server operating system; a log gathering unit which creates log information including the log collected in accordance with the setting; and a log transmitting unit which transmits the log information to a cloud server.
    Type: Application
    Filed: September 7, 2018
    Publication date: July 22, 2021
    Applicant: QUBIT SECURITY INC.
    Inventor: Seung Min SHIN
  • Publication number: 20210204013
    Abstract: A display apparatus and a server which implements an interactive system are disclosed. The server includes a communicator which receives text information corresponding to a user voice collected at the display apparatus from the display apparatus, and a controller which extracts an utterance component from the text information and controls so that a query to search contents is generated using the extracted utterance component and transmitted to an external server which categorizes metadata of the content under each item and stores the same, in which the controller generates the query by adding a preset item to a criteria to search a content, when a number of criteria to categorize the content under an item corresponding to the extracted utterance component is less than a preset number.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 1, 2021
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong-wook Shin, Seung-min Shin, Sung-wook Choi, Hye-jeong Lee, Ji-hye Chung
  • Patent number: 10986391
    Abstract: A display apparatus and a server which implements an interactive system are disclosed. The server includes a communicator which receives text information corresponding to a user voice collected at the display apparatus from the display apparatus, and a controller which extracts an utterance component from the text information and controls so that a query to search contents is generated using the extracted utterance component and transmitted to an external server which categorizes metadata of the content under each item and stores the same, in which the controller generates the query by adding a preset item to a criteria to search a content, when a number of criteria to categorize the content under an item corresponding to the extracted utterance component is less than a preset number.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: April 20, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong-wook Shin, Seung-min Shin, Sung-wook Choi, Hye-jeong Lee, Ji-hye Chung