Patents by Inventor Seunghun Hong
Seunghun Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100040847Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN and kits for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip.Type: ApplicationFiled: October 31, 2007Publication date: February 18, 2010Inventors: Chad A MIRKIN, Richard Piner, Seunghun Hong
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Publication number: 20100035186Abstract: Techniques for manufacturing a graphene structure solution and a graphene device are provided. A uniform graphene nanostructure solution is produced by applying anisotropic etching on a multi-layered graphene using an oxide nanowire as a mask. A graphene device is manufactured by dipping a substrate with a pattern of a molecule layer in a graphene nanostructure solution so that graphenes are aligned on the substrate with the pattern.Type: ApplicationFiled: September 15, 2008Publication date: February 11, 2010Applicant: Seoul National University Research & Development Business Foundation (SNU R&DB FOUNDATION)Inventors: Seunghun Hong, Juntae Koh
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Publication number: 20100032719Abstract: Disclosed are probes for scanning probe microscopy comprising a semiconductor heterostructure and methods of making the probes. The semiconductor heterostructure determines the optical properties of the probe and allows for optical imaging with nanometer resolution.Type: ApplicationFiled: October 9, 2008Publication date: February 11, 2010Inventors: Seunghun HONG, Taekyeong KIM
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Publication number: 20100032409Abstract: Nanoscale graphene structure fabrication techniques are provided. An oxide nanowire useful as a mask is formed on a graphene layer and then ion beam etching is performed. A nanoscale graphene structure is fabricated by removing a remaining oxide nanowire after the ion beam etching.Type: ApplicationFiled: September 15, 2008Publication date: February 11, 2010Applicant: Seoul National University Research & Development Business Foundation (SNU R&DB FOUNDATION)Inventors: Seunghun Hong, Joohyung Lee, Tae Hyun Kim
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Publication number: 20100028814Abstract: Techniques for manufacturing cross-structures of nanostructures, such as nanowires and carbon nanotubes are provided. In one embodiment, a method for manufacturing cross-structures of nanostructures include providing a substrate, patterning a first mask layer on the substrate, adsorbing first nanostructures onto surface regions of the substrate where the first mask layer does not exist, removing the first mask layer from the substrate, patterning a second mask layer on the substrate to which the first nanostructures are adsorbed, and adsorbing second nanostructures onto the surface regions of the substrate where the second mask layer does not exist, under conditions effective to manufacture cross-structures of nanostructures on the substrate.Type: ApplicationFiled: September 25, 2008Publication date: February 4, 2010Applicant: Seoul National University Research & Development Business Foundation ("SNU R&DB FOUNDATION")Inventors: Seunghun Hong, Sung Young Park, Seon Namgung
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Patent number: 7569252Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN and kits for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip.Type: GrantFiled: June 2, 2003Date of Patent: August 4, 2009Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Richard Piner, Seunghun Hong
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Patent number: 7524534Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN), which utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid-state substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.Type: GrantFiled: September 10, 2004Date of Patent: April 28, 2009Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Richard Piner, Seunghun Hong
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Publication number: 20090101962Abstract: A semiconductor device and methods of manufacturing and operating the semiconductor device may be disclosed. The semiconductor device may comprise different nanostructures. The semiconductor device may have a first element formed of nanowires and a second element formed of nanoparticles. The nanowires may be ambipolar carbon nanotubes (CNTs). The first element may be a channel layer. The second element may be a charge trap layer. In this regard, the semiconductor device may be a transistor or a memory device.Type: ApplicationFiled: October 20, 2008Publication date: April 23, 2009Inventors: Seunghun Hong, Sung Myung, Jiwoon Im, Minbaek Lee
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Patent number: 7446324Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.Type: GrantFiled: September 28, 2004Date of Patent: November 4, 2008Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Richard Piner, Seunghun Hong
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Publication number: 20080113099Abstract: In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.Type: ApplicationFiled: October 31, 2007Publication date: May 15, 2008Inventors: Chad Mirkin, Seunghun Hong, Vinayak P. Dravid
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Patent number: 7291284Abstract: Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au/Ti/SiOx/Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate.Type: GrantFiled: December 3, 2003Date of Patent: November 6, 2007Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Hua Zhang, Dana Weinberger, Seunghun Hong
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Patent number: 7182996Abstract: Processes for depositing nanowires on a substrate and nanowire-based devices that can be formed using these processes are described. In one embodiment, a process includes forming an organic layer on an electrically conductive layer formed on the substrate. The organic layer includes a first region and a second region. The first region has an affinity for the nanowires and is electrically conductive. The process also includes contacting the organic layer with a composition including the nanowires dispersed in a compatible solvent for a time sufficient to selectively deposit at least one of the nanowires on the first region of the organic layer.Type: GrantFiled: November 21, 2003Date of Patent: February 27, 2007Assignee: Florida State University Research Foundation, Inc.Inventor: Seunghun Hong
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Patent number: 7014823Abstract: This invention relates to actuators having biologically-based components, and methods of making and using the same. The actuator of the invention has a movable member that moves substantially linearly as a result of a biomolecular interaction of biologically-based components within the actuator. These actuators can be utilized in nanoscale mechanical devices to, e.g., pump fluids, open and close valves, and provide translational movement.Type: GrantFiled: October 17, 2003Date of Patent: March 21, 2006Assignee: Florida State University Research Foundation, Inc.Inventors: P. Bryant Chase, Seunghun Hong, Timothy S. Moerland, Stephan Von Molnar, Peng Xiong
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Publication number: 20060014001Abstract: Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid (MHA), on Au/Ti/SiOx/Si substrates and then wet chemical etching to remove the exposed gold. These are the smallest Au structures prepared by a wet chemical etching strategy. Also, Dip-Pen Nanolithography (DPN) has been used to generate resist layers on Au, Ag, and Pd that when combined with wet chemical etching can lead to nanostructures with deliberately designed shapes and sizes. Monolayers of mercaptohexadecanoic acid (MHA) or octadecanethiol (ODT), patterned by DPN, were explored as etch resists. They work comparably well on Au and Ag, but ODT is the superior material for Pd. MHA seems to attract the FeCl3 etchant and results in nonuniform etching of the underlying Pd substrate.Type: ApplicationFiled: December 3, 2003Publication date: January 19, 2006Inventors: Hua Zhang, Chad Mirkin, Dana Weinberger, Seunghun Hong
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Publication number: 20050191434Abstract: In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.Type: ApplicationFiled: April 7, 2005Publication date: September 1, 2005Inventors: Chad Mirkin, Seunghun Hong, Vinayak Dravid
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Publication number: 20050181132Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substratte as “ink.” Capillary transport of molecules from the SPM tip to thee solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the facrication of a variety of microscale and nanoscale devices. The invention also provices substrates patterened by DPN, including submirocmeter combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.Type: ApplicationFiled: September 10, 2004Publication date: August 18, 2005Inventors: Chad Mirkin, Richard Piner, Seunghun Hong
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Publication number: 20050172704Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.Type: ApplicationFiled: September 28, 2004Publication date: August 11, 2005Inventors: Chad Mirkin, Richard Piner, Seunghun Hong
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Patent number: 6827979Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.Type: GrantFiled: May 24, 2001Date of Patent: December 7, 2004Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Richard Piner, Seunghun Hong
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Publication number: 20040203071Abstract: This invention relates to actuators having biologically-based components, and methods of making and using the same. The actuator of the invention has a movable member that moves substantially linearly as a result of a biomolecular interaction of biologically-based components within the actuator. These actuators can be utilized in nanoscale mechanical devices to, e.g., pump fluids, open and close valves, and provide translational movement.Type: ApplicationFiled: October 17, 2003Publication date: October 14, 2004Inventors: P. Bryant Chase, Seunghun Hong, Timothy S. Moerland, Stephan Von Molnar, Peng Xiong
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Publication number: 20040166233Abstract: Processes for depositing nanowires on a substrate and nanowire-based devices that can be formed using these processes are described. In one embodiment, a process includes forming an organic layer on an electrically conductive layer formed on the substrate. The organic layer includes a first region and a second region. The first region has an affinity for the nanowires and is electrically conductive. The process also includes contacting the organic layer with a composition including the nanowires dispersed in a compatible solvent for a time sufficient to selectively deposit at least one of the nanowires on the first region of the organic layer.Type: ApplicationFiled: November 21, 2003Publication date: August 26, 2004Inventor: Seunghun Hong