Abstract: A catalyst for removing nitrogen oxides and a manufacturing method thereof are provided. The catalyst for removing nitrogen oxides according to embodiments of the present invention is manufactured by mixing and grinding a metal catalyst and a zeolite. The zeolite has a carbon layer formed on the surface of the zeolite. The manufacturing method of a catalyst for removing nitrogen oxides according to embodiments of the present invention comprises preparing a zeolite, forming a carbon layer on the surface of the zeolite, and mixing and grinding the zeolite having the carbon layer with a metal catalyst.

Abstract: In a method for treating a cancer expressing secreted protein acidic and rich in cysteine (SPARC), a composition including an albumin and at least one cysteine bound thereto is administered to a subject in need thereof. The cancer expressing the SPARC may be at least one selected from the group consisting of a brain tumor, melanoma, breast cancer, rectal cancer and stomach cancer.

Abstract: An X-ray imaging apparatus includes an imaging device configured to capture a camera image of a target; a controller configured to stitch a plurality of X-ray images of respective divided regions of the target to generate one X-ray image of the target; and a display configured to display a settings window that provides a GUI for receiving a setting of an X-ray irradiation condition for the respective divided regions, and display the camera image in which positions of the respective divided regions are displayed.

Abstract: A display device includes: a first substrate including a pixel area and a transmissive area; a thin-film transistor on the first substrate; a planarization layer on the thin-film transistor; a first light emitting electrode on the planarization layer; a bank covering a part of the first light emitting electrode; a light emitting layer on the first light emitting electrode; and a second light emitting electrode on the light emitting layer and the bank. The transmissive area includes a transmissive hole penetrating the bank and the planarization layer.

Abstract: A method for synthesizing a pre-hydrolyzed polysilicate, wherein a polysilicate is applied as a reactant when synthesizing the pre-hydrolyzed polysilicate, and the total amount of water added in the reaction system is specified. The method is capable of omitting a condensation reaction by applying a polysilicate as a reactant, thereby significantly shortening synthesis time and reducing production costs when compared with a typical synthesis method in which alkoxysilane-based monomer compound is used as a reactant. In addition, the gelation reaction time and the weight average molecular weight can be easily controlled, and a pre-hydrolyzed polysilicate excellent in storage stability and processability can be synthesized.

Abstract: An electronic device includes an internal mode control circuit suitable for generating a burst control signal, a blocking control signal and an internal voltage control signal based on a refresh cycle when an internal mode is performed in a self-refresh operation, a refresh control circuit suitable for generating a refresh signal for performing a refresh operation every refresh cycle when the self-refresh operation is performed, generating the refresh signal every set cycle based on the burst control signal when the internal mode is performed, and blocking the generation of the refresh signal based on the blocking control signal, and an internal voltage generation circuit suitable for adjusting a level of an internal voltage for the refresh operation based on the internal voltage control signal.

Abstract: A power control circuit includes a power control signal generation circuit configured to generate a voltage control signal according to a deep sleep command for operating a semiconductor apparatus in a deep sleep mode; a voltage divider circuit having a division ratio that is changed according to the voltage control signal, and configured to generate a divided voltage by dividing an internal voltage at the changed division ratio; a comparator configured to generate a detection signal by comparing a reference voltage to the divided voltage; an oscillator configured to generate an oscillation signal according to the detection signal; and a pump configured to generate the internal voltage according to the oscillation signal.

Abstract: In one aspect, the invention is formulations comprising both organoaminohafnium and organoaminosilane precursors that allows anchoring both silicon-containing fragments and hafnium-containing fragments onto a given surface having hydroxyl groups to deposit silicon doped hafnium oxide having a silicon doping level ranging from 0.5 to 8 mol %, preferably 2 to 6 mol %, most preferably 3 to 5 mol %, suitable as ferroelectric material. In another aspect, the invention is methods and systems for depositing the silicon doped hafnium oxide films using the formulations.

Abstract: An electronic device includes a drive control signal generation circuit and an internal voltage drive circuit. The drive control signal generation circuit detects a level of an internal voltage to generate a drive control signal that adjusts a level of the internal voltage. The internal voltage drive circuit drives the internal voltage based on the drive control signal.

Abstract: A voltage generation circuit includes an operation voltage driving circuit configured to drive an operation voltage based on a calibration voltage and a feedback voltage and generate the feedback voltage from the operation voltage. The voltage generation circuit also includes a reference voltage calibration circuit configured to generate the calibration reference voltage, wherein the calibration reference voltage varies based on a set value calculated according to the feedback voltage and a reference voltage.

Abstract: A voltage generation circuit includes an operation voltage driving circuit configured to drive an operation voltage based on a calibration voltage and a feedback voltage and generate the feedback voltage from the operation voltage. The voltage generation circuit also includes a reference voltage calibration circuit configured to generate the calibration reference voltage, wherein the calibration reference voltage varies based on a set value calculated according to the feedback voltage and a reference voltage.

Abstract: In one aspect, the invention is formulations comprising both organoaminohafnium and organoaminosilane precursor compounds that allow anchoring both silicon-containing fragments and hafnium-containing fragments onto a given surface having hydroxyl groups to deposit silicon doped hafnium oxide having a silicon doping level ranging from about 3 to about 5 mol. %, suitable for forming a ferroelectric material. In another aspect, the invention is methods and systems for depositing the silicon doped hafnium oxide films suitable for forming ferroelectric materials using the formulations.

Abstract: In one aspect, the invention is formulations comprising both organoaminohafnium and organoaminosilane precursors that allows anchoring both silicon-containing fragments and hafnium-containing fragments onto a given surface having hydroxyl groups to deposit silicon doped hafnium oxide having a silicon doping level ranging from 0.5 to 8 mol %, preferably 2 to 6 mol %, most preferably 3 to 5 mol %, suitable as ferroelectric material. In another aspect, the invention is methods and systems for depositing the silicon doped hafnium oxide films using the formulations.

Abstract: An electronic device includes a drive control signal generation circuit and an internal voltage drive circuit. The drive control signal generation circuit detects a level of an internal voltage to generate a drive control signal that adjusts a level of the internal voltage. The internal voltage drive circuit drives the internal voltage based on the drive control signal.

Abstract: An electronic device includes an internal mode control circuit suitable for generating a burst control signal, a blocking control signal and an internal voltage control signal based on a refresh cycle when an internal mode is performed in a self-refresh operation, a refresh control circuit suitable for generating a refresh signal for performing a refresh operation every refresh cycle when the self-refresh operation is performed, generating the refresh signal every set cycle based on the burst control signal when the internal mode is performed, and blocking the generation of the refresh signal based on the blocking control signal, and an internal voltage generation circuit suitable for adjusting a level of an internal voltage for the refresh operation based on the internal voltage control signal.

Abstract: A power control circuit includes a power control signal generation circuit configured to generate a voltage control signal according to a deep sleep command for operating a semiconductor apparatus in a deep sleep mode; a voltage divider circuit having a division ratio that is changed according to the voltage control signal, and configured to generate a divided voltage by dividing an internal voltage at the changed division ratio; a comparator configured to generate a detection signal by comparing a reference voltage to the divided voltage; an oscillator configured to generate an oscillation signal according to the detection signal; and a pump configured to generate the internal voltage according to the oscillation signal.

Abstract: A power control circuit includes a power control signal generation circuit configured to generate a voltage control signal according to a deep sleep command for operating a semiconductor apparatus in a deep sleep mode; a voltage divider circuit having a division ratio that is changed according to the voltage control signal, and configured to generate a divided voltage by dividing an internal voltage at the changed division ratio; a comparator configured to generate a detection signal by comparing a reference voltage to the divided voltage; an oscillator configured to generate an oscillation signal according to the detection signal; and a pump configured to generate the internal voltage according to the oscillation signal.

Abstract: A composition for depositing a high quality silicon nitride is introduced into a reactor that contains a substrate, followed by introduction of a plasma that includes an ammonia source. The composition includes a silicon precursor compound having Formula as defined herein.

Abstract: The present invention pertains to a dosing regimen for treating influenza virus diseases, and more specifically, to a method for treating influenza virus-related diseases through the administration of a mixed composition of monoclonal antibodies having a neutralizing activity against the influenza A virus. The treatment method according to the present invention enables influenza A virus-related diseases to be treated through the intravenous administration of a mixed composition of monoclonal antibodies having a neutralizing activity against the influenza A virus. In addition, the treatment method according to the present invention can satisfy unmet medical needs for biological therapeutic agents for influenza virus-related diseases.

Abstract: A method for forming a silicon nitride film that may be carbon doped via a plasma ALD process includes introducing a substrate into a reactor, which is heated to up to about 600° C. At least one silicon precursor as defined herein and having one or two Si—C—Si linkages is introduced to form a chemisorbed film on the substrate. The reactor is then purged of any unconsumed precursors and/or reaction by-products with a suitable inert gas. A plasma comprising nitrogen is introduced into the reactor to react with the chemisorbed film to form the silicon nitride film that may be carbon doped. The reactor is again purged of any reaction by-products with a suitable inert gas. The steps are repeated as necessary to bring the deposited silicon nitride film that may be carbon doped to a predetermined thickness.