Patents by Inventor Shan Huang

Shan Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11037935
    Abstract: A semiconductor device includes: active regions arranged in a first grid oriented substantially parallel to a first direction; and gate electrodes arranged spaced apart in a second grid and overlying corresponding ones of the active regions, the second grid being oriented substantially parallel to a second direction, the second direction being substantially orthogonal to the first direction. The first gaps are interspersed correspondingly between neighboring ones of the active regions. For a flyover intersection at which a corresponding gate electrode crosses over a corresponding active region and for which the gate electrode is not functionally connected to the corresponding active region, the gate electrode does not extend substantially beyond the corresponding active region and so does not extend substantially into a corresponding one of the first gaps.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: June 15, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Jen Chen, Wen-Hsi Lee, Ling-Sung Wang, I-Shan Huang, Chan-yu Hung
  • Publication number: 20210173315
    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
    Type: Application
    Filed: July 18, 2018
    Publication date: June 10, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Marcel Joseph Louis BOONEN, Han-Kwang NIENHUYS, Jacob BRINKERT, Richard Joseph BRULS, Peter Conrad KOCHERSPERGER
  • Patent number: 11003095
    Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: May 11, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Krijn Frederik Bustraan, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Minkyu Kim, Jasper Anne Frido Marikus Simons, Theo Anjes Maria Ruijl, Ronald Josephus Maria Lamers
  • Publication number: 20210028290
    Abstract: A semiconductor device includes a channel component of a transistor and a gate component disposed over the channel component. The gate component includes: a dielectric layer, a first work function metal layer disposed over the dielectric layer, a fill-metal layer disposed over the first work function metal layer, and a second work function metal layer disposed over the fill-metal layer.
    Type: Application
    Filed: November 22, 2019
    Publication date: January 28, 2021
    Inventors: Ru-Shang Hsiao, Ching-Hwanq Su, Pohan Kung, Ying Hsin Lu, I-Shan Huang
  • Patent number: 10841679
    Abstract: A microelectromechanical systems package structure includes a first substrate, a transducer unit, a semiconductor chip and a second substrate. The first substrate defines a through hole. The transducer unit is electrically connected to the first substrate, and includes a base and a membrane. The membrane is located between the through hole and the base. The semiconductor chip is electrically connected to the first substrate and the transducer unit. The second substrate is attached to the first substrate and defines a cavity. The transducer unit and the chip are disposed in the cavity, and the second substrate is electrically connected to the transducer unit and the semiconductor chip through the first substrate.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: November 17, 2020
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Hsu-Liang Hsiao, Yu-Hsuan Tsai, Pu Shan Huang, Ching-Han Huang, Lu-Ming Lai
  • Publication number: 20200333717
    Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.
    Type: Application
    Filed: November 7, 2018
    Publication date: October 22, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Yang-Shan HUANG, Pieter Cornelis Johan DE JAGER, Rob REILINK, Christiaan Louis VALENTIN, Jasper Leonardus Johannes SCHOLTEN, Antonie Hendrik VERWEIJ, Edwin VAN HORNE
  • Publication number: 20200284848
    Abstract: Inspection apparatus is provided for inspecting a first electronic device and a second electronic device. The inspection apparatus includes a first signal transfer unit, a second signal transfer unit, a first signal output unit and a second signal output unit. The first signal transfer unit is adapted to receive a first input signal. The second signal transfer unit is adapted to receive a second input signal. The first signal output unit is selectively coupled to the first signal transfer unit or the second signal transfer unit to output a first output signal to inspect the first electronic device. The second signal output unit is selectively coupled to the first signal transfer unit or the second signal transfer unit to output a second output signal to inspect the second electronic device. The inspection apparatus can realize automatic inspection.
    Type: Application
    Filed: June 26, 2019
    Publication date: September 10, 2020
    Inventors: Chung Kai HAN, Yu Shan HUANG, Po-Chuan KU, Chun Yen TSAI
  • Publication number: 20200277211
    Abstract: In one aspect, oxidant is employed for enhancing Feammox activity. Briefly, a medium comprises an ammonium containing contaminant, an iron component, an oxidant, and a Feammox bacterium and/or enzyme thereof capable of oxidizing ammonium with reduction of Fe(II) to Fe(III), wherein the oxidant regenerates Fe(III) via Fe(II) oxidation. In some embodiments, the medium is soil and/or water.
    Type: Application
    Filed: September 25, 2018
    Publication date: September 3, 2020
    Inventors: Peter R. JAFFE, Shan HUANG
  • Publication number: 20200225591
    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
    Type: Application
    Filed: July 18, 2018
    Publication date: July 16, 2020
    Applicants: ASML Netherlands B,V., ASML Holding N.V.
    Inventors: Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
  • Publication number: 20200214698
    Abstract: The present application provides a linear stapler with an adjusting mechanism, comprising an adjusting shift lever with at least one step surface on each of an upper end and a lower end, an adjusting slider with at least three different step surfaces on an end surface close to the adjusting shift lever, and an adjusting chassis having at least three different step surfaces on an end surface close to the adjusting shift lever; when an adjusting knob is shifted, the adjusting shift lever rotates therewith, so that the adjusting shift lever generates relative displacement in a direction vertical to the step surface with the adjusting slider at one end, and generates relative displacement in a direction vertical to the step surface with the adjusting chassis at the other end, and further drives a nail abutting seat subassembly to generate rotation relative to a nail bin seat, until the thickness of clamped tissue is consistent in the near end and the far end.
    Type: Application
    Filed: July 9, 2018
    Publication date: July 9, 2020
    Inventors: Honglin NIE, Shan HUANG, Jun YANG, Anhua LI, Guang YANG, Jidong CHEN
  • Patent number: 10705438
    Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
  • Publication number: 20200203167
    Abstract: The semiconductor structure includes first and second active regions arranged in a first grid oriented in a first direction. The semiconductor structure further includes gate electrodes arranged spaced apart in a second grid and on corresponding ones of the active regions, the second grid being oriented in a second direction, the second direction being substantially perpendicular to the first direction. The first and second active regions are separated, relative to the second direction, by a gap. Each gate electrode includes a first segment and a gate extension. Each gate extension extends, relative to the second direction, beyond the corresponding active region and into the gap by a height HEXT, where HEXT?150 nanometers (nm). Each gate extension, relative to a plane defined by the first and second directions, is substantially rectangular.
    Type: Application
    Filed: August 30, 2019
    Publication date: June 25, 2020
    Inventors: Yu-Jen CHEN, Ling-Sung WANG, I-Shan HUANG, Chan-yu HUNG
  • Publication number: 20200183288
    Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool includes a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.
    Type: Application
    Filed: July 19, 2018
    Publication date: June 11, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yang-Shan HUANG, Andre Bernardus JEUNINK, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Victoria VORONINA
  • Publication number: 20200142326
    Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.
    Type: Application
    Filed: July 18, 2018
    Publication date: May 7, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Yang-Shan HUANG, Daniel Nathan BURBANK, Marco Koert STAVENGA
  • Publication number: 20200124977
    Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
    Type: Application
    Filed: May 17, 2018
    Publication date: April 23, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Franciscus Martinus D'ACHARD VAN ENSCHUT, Tamara DRUZHININA, Nitisb KUMAR, Sarathi ROY, Yang-Shan HUANG, Arie Jeffrey DEN BOEF, Han-Kwang NIENHUYS, Pieter-Jan VAN ZWOL, Sander Bas ROC-SOL
  • Publication number: 20200117097
    Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
    Type: Application
    Filed: December 17, 2019
    Publication date: April 16, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
  • Patent number: 10571814
    Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
  • Publication number: 20200030956
    Abstract: A heatsink structure for a pile driver includes a rotation seat, a pivot base, a pile driver gear unit, and at least one radiating pipe. The rotation seat is pivotally connected with the pivot base. The pile driver gear unit is mounted in the pivot base and includes a receiving space and a vibration device. A pump device is mounted in the receiving space of the pile driver gear unit. The at least one radiating pipe is mounted on the pivot base. Thus, the lubricating oil in the receiving space of the pile driver gear unit is pumped by the pump device during operation and is delivered to the at least one radiating pipe so that the at least one radiating pipe cools down and carries away the heat of the lubricating oil.
    Type: Application
    Filed: July 30, 2018
    Publication date: January 30, 2020
    Inventor: Chuan-Shan Huang
  • Publication number: 20190364368
    Abstract: A speaker cone comprises an upper speaker cone and a lower speaker cone, which are arranged in a horn shape. The upper and lower speaker cones are disposed symmetrically with respect to the center thereof. The peak of the upper speaker cone is opposite to and adhered to the peak of the lower speaker cone to form a speaker cone assembly, and the middle portion of which extends out a mounting cylinder. In comparison, the upper and lower speaker cones in the symmetric configuration replace the single-layer speaker cone used in the prior art. This effectively reduces the area occupied by the speaker cone in the height direction. In addition, the double speaker cone structure enhances the sound level while reduces the distortion rate of the speaker, greatly improving the quality of sound. A speaker using the speaker cone is also provided.
    Type: Application
    Filed: September 14, 2018
    Publication date: November 28, 2019
    Inventor: Ching Shan Huang
  • Patent number: 10490947
    Abstract: An electrical connector used for mating with a mating connector includes: an insulating body, having a base and a tongue extending from the base; a metal shell, wrapping the insulating body and forming a mating cavity with the tongue; two rows of terminals, fixedly disposed on the insulating body and exposed on the tongue, one of the two rows of terminals having at least one ground terminal; and a middle shielding sheet, disposed on the insulating body and located between the two rows of terminals. Each of the at least one ground terminal has an extending portion, and the extending portion extends away from the middle shielding sheet and abuts the metal shell.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: November 26, 2019
    Assignee: LOTES CO., LTD
    Inventor: Zhen Shan Huang