Abstract: A video encoding method and apparatus is provided. The method includes determining a chroma format of a video frame, determining, for a currently decoded first quantization matrix (QM), a size of the first QM according to the determined chroma format and a size of a luma transform block (TB) when the first QM is a chroma QM, and decoding the first QM when the size of the first QM is greater than zero. Thus, a size of a chroma QM is flexibly determined according to a chroma format and a size of a luma TB, rather than a fixed size predefined according to an identifier of the QM, thereby improving flexibility during encoding and decoding of the chroma QM. Apparatus and non-transitory computer-readable storage medium counterpart embodiments are also provided.

Abstract: An autonomous cleaning device and a noise reduction air duct device are provided for autonomous cleaning device. The autonomous cleaning device includes a body and a motor arranged on the body, and the noise reduction air duct device is mounted on the body. The noise reduction air duct device includes an upper housing, a lower housing and a support noise reduction structure made of elastic material. The lower housing and the upper housing enclose to form an air duct, an air inlet is arranged at a position of the air duct corresponding to the motor, and an air outlet is arranged on a side of the air duct away from the air inlet; the support noise reduction structure has a first end fixed on the lower housing, and a second end abutting against a lower surface of the upper housing.

Abstract: A thin film transistor includes a gate electrode, a gate insulating layer, a carbon nanotube structure, a source electrode and a drain electrode. The gate insulating layer is located on the gate electrode. The carbon nanotube structure is located on the gate insulating layer. The source electrode and the drain electrode are arranged at intervals and electrically connected to the carbon nanotube structure respectively. The thin film transistor further includes an interface charge layer, and the interface charge layer is located between the carbon nanotube structure and the gate insulating layer.

Abstract: Provided are transaminase mutants and uses thereof. The transaminase mutant is obtained by one or more amino acid mutations occurring in SEQ ID NO: 2 or is a mutant with a conserved amino acid mutation obtained by taking the sequence SEQ ID NO: 1 of a wild-type CvTA transaminase as a reference. Compared with wild-type transaminases, the catalytic activity of the mutant is improved to different degrees, so that the production efficiency of chiral amine compound synthesis may be improved.

Abstract: An anti-BCMA antibody or an antigen-binding fragment thereof, and an application thereof in the treatment or prevention of tumor.

Abstract: The present disclosure provides a preparation method of an easy-to-cook whole grain based on microwave-induced cracking, and belongs to the technical field of food processing. In the present disclosure, the preparation method of an easy-to-cook whole grain includes the following steps: subjecting a whole grain to a heat-moisture treatment, and conducting short-time microwave-induced cracking, tempering, and cooling to obtain the easy-to-cook whole grain. The easy-to-cook whole grain obtained by the preparation method of the present disclosure has a complete grain, a slightly-expanded volume, and fine cracks on its surface. Compared with unprocessed whole grains, the easy-to-cook whole grain has a water absorption increased from 1.35 times to 1.9 times an original weight of the unprocessed whole grains during rice steaming.

Abstract: A method for making a field effect transistor includes providing a graphene nanoribbon composite structure. The graphene nanoribbon composite structure includes a substrate and a plurality of graphene nanoribbons spaced apart from each other. The substrate includes a plurality of protrusions spaced apart from each other, and one of the plurality of graphene nanoribbons is on the substrate and between two adjacent protrusions. An interdigital electrode is placed on the graphene nanoribbon composite structure, and the interdigital electrode covers the plurality of protrusions and is electrically connected to the plurality of graphene nanoribbons.

Abstract: A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube layer on a substrate; depositing a chrome layer on the carbon nanotube layer, wherein the chrome layer includes a first patterned chrome layer and a second patterned chrome layer, the first patterned chrome layer is located on the carbon nanotube layer, and the second patterned chrome layer is deposited on the substrate corresponding to holes of the carbon nanotube layer; transferring the carbon nanotube layer with the first patterned chrome layer thereon from the substrate to a base, and the carbon nanotube layer being in contact with the base; and depositing a cover layer on the first patterned chrome layer.

Abstract: The present application belongs to the technical field of solar cells, and relates to a p-type bifacial solar cell with partial rear surface field passivation and a preparation method therefor. The solar cell includes a p-type silicon substrate. At the bottom portion of the p-type silicon substrate are arranged, from top to bottom, a silicon oxide passivation layer, an aluminum oxide passivation layer and a rear side silicon nitride anti-reflection layer. A plurality of boron source-doped layers are embedded in the bottom portion of the p-type silicon substrate. Connected to the bottom of each of the boron source-doped layers is a rear side metal electrode layer, which penetrates each of the silicon oxide passivation layer, the aluminum oxide passivation layer and the rear side silicon nitride anti-reflection layer.

Abstract: A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube composite structure, wherein the carbon nanotube composite structure comprises a carbon nanotube layer and a chrome layer coated on the carbon nanotube layer; locating the carbon nanotube composite structure on a substrate to expose partial surfaces of the substrate; and depositing a cover layer on the carbon nanotube composite structure.

Abstract: Aspects of the disclosure provide methods and apparatuses for point cloud compression and decompression. In some examples, an apparatus for point cloud compression/decompression includes processing circuitry. In some examples, the processing circuitry receives a bitstream carrying compressed data for a point cloud. The processing circuitry determines that a current node in an octree structure is eligible for an isolated mode. The octree structure corresponds to three dimensional (3D) partitions of a space of the point cloud. Then the processing circuitry determines, based on information of one or more other nodes, a single isolated point flag for the current node that indicates whether the current node is coded with a single isolated point.

Abstract: Method, apparatus, and system for merging multiple attribute maps for mesh compression may be provided. The process may include obtaining multiple attribute maps associated with a mesh including one or more texture maps. The multiple attribute maps may be concatenated into a single concatenated map and concatenated UV coordinates for each of the multiple attribute maps may be generated based on re-computing original UV coordinates of each of the multiple attribute maps within the single concatenated map.

Abstract: Embodiments of a wet etch process and methods are disclosed herein to provide uniform wet etching of material within high aspect ratio features. In the present disclosure, a wet etch process is used to etch material within high aspect ratio features, such as deep trenches and holes, provided on a patterned substrate. Uniform wet etching is provided in the present disclosure by ensuring that wall surfaces of the material being etched (or wall surfaces adjacent to the material being etched) exhibit a neutral surface charge when exposed to the etch solution used to etch the material.

Abstract: A substrate includes a driving backplane, a plurality of first connecting lines and a plurality of second connecting lines. The driving backplane includes a base substrate, at least one first lead group and at least one second lead group. Each first lead group includes a plurality of first leads, and each second lead group includes a plurality of second leads. A first lead group and a corresponding second lead group is disposed in a peripheral region. The plurality of first connecting lines are disposed on at least one side face of the driving backplane, each first connecting line is electrically connected to at least one first lead. The plurality of second connecting lines are disposed on the at least one side face of the driving backplane, each second connecting line is electrically connected to at least one second lead, and is in contact with a corresponding first connecting line.

Abstract: An indication to remove one or more data in a time series database is received. A metadata index associated with the time series database is updated to indicate a soft removal of each data of the one or more data. A data hole index associated with the time series database is updated to indicate a data hole at a location of each data of the one or more data in the time series database. Responsive to an input/output rate for the time series database being below a threshold, the data hole of each data of the one or more data is optimized.

Abstract: A method, computer program, and computer system is provided for decoding point cloud data. Data corresponding to a point cloud is received. A number of contexts associated with the received data is reduced based on reducing a size of an array corresponding to syntax elements for predictive tree-based coding of the point cloud. The data corresponding to the point cloud is decoded based on the reduced number of contexts.

Abstract: In a method, a base mesh is generated from a down-sampled input mesh in a current frame, where the base mesh includes a plurality of vertices. A prediction mode to be applied to the base mesh is determined. The prediction mode is an inter prediction mode or an intra prediction mode. Based on the prediction mode being determined as the intra prediction mode, duplicate vertices among the plurality of vertices in the base mesh are merged to generate a subset of the plurality of vertices. At least the subset of the plurality of vertices is encoded based on the determined intra prediction mode to generate prediction information of at least the subset of the plurality of vertices.

Abstract: Embodiments of a wet etch process and methods are disclosed herein to provide uniform wet etching of material formed within features (e.g., trenches, holes, slits, etc.), and on more planar areas of a patterned substrate, when a critical dimension (CD) of the features is relatively small compared to the more planar areas of the patterned substrate. In the present disclosure, uniform wet etching is provided by ensuring that wall surfaces adjacent to the material being etched exhibit a neutral surface charge when exposed to the etch solution used to etch the material.

Abstract: The present disclosure combines chemical mechanical polishing (CMP), wet etch and deposition processes to provide improved processes and methods for planarizing an uneven surface of a material layer deposited over a plurality of structures formed on a substrate. A CMP process is initially used to smooth the uneven surface and provide complete local planarization of the material layer above the plurality of structures. After achieving complete local planarization, a wet etch process is used to etch the material layer until a uniform recess is formed between the plurality of structures and the material layer is provided with a uniform thickness across the substrate. In some embodiments, an additional material layer may be deposited and a second CMP process may be used to planarize the additional material layer to provide the substrate with a globally planarized surface.

Abstract: A method of encoding includes receiving a polygon mesh comprising a plurality of original vertices. The method further includes deriving an initial base mesh from the polygon mesh, the initial base mesh including a first set of base mesh vertices. The method further includes performing a symmetrize process on the initial base mesh to generate a symmetrical base mesh that includes a first side having the first set of base mesh vertices and a second side having a second set of base mesh vertices, each base mesh vertex in the first set of base mesh vertices having a corresponding symmetric vertex in the second set of base mesh vertices. The method further includes determining a first displacement between each original vertex in the polygon mesh located on the second side of the symmetrical base mesh and a nearest vertex included in the second set of base mesh vertices.