Abstract: A voltage tracking circuit is provided. The voltage tracking circuit includes first and second P-type transistors and a control circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The gate and the drain of the second P-type transistor are respectively coupled to the first voltage terminal and a second voltage terminal. The control circuit is coupled to the first and second voltage terminals and generates a control voltage according to the first voltage and the second voltage. The sources of the first and second P-type transistors are coupled to an output terminal of the voltage tracking circuit, and the output voltage is generated at the output terminal. In response to the second voltage being higher than the first voltage, the control circuit generates the control signal to turn off the first P-type transistor.

Abstract: A voltage tracking circuit is provided. The voltage tracking circuit includes first and second P-type transistors and a control circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The gate and the drain of the second P-type transistor are respectively coupled to the first voltage terminal and a second voltage terminal. The control circuit is coupled to the first and second voltage terminals and generates a control voltage according to the first voltage and the second voltage. The sources of the first and second P-type transistors are coupled to an output terminal of the voltage tracking circuit, and the output voltage is generated at the output terminal. In response to the second voltage being higher than the first voltage, the control circuit generates the control signal to turn off the first P-type transistor.

Abstract: A semiconductor structure, including a substrate, a first well, a second well, a first doped region, a second doped region, a first gate structure, a first insulating layer, and a first field plate structure. The first and second wells are disposed in the substrate. The first doped region is disposed in the first well. The second doped region is disposed in the second well. The first gate structure is disposed between the first and second doped regions. The first insulating layer covers a portion of the first well and a portion of the first gate structure. The first field plate structure is disposed on the first insulating layer, and it partially overlaps the first gate structure. Wherein the first field plate structure is segmented into a first partial field plate and a second partial field plate separated from each other along a first direction.

Abstract: A semiconductor structure is provided. At least one first well region is disposed in a semiconductor substrate and has a first conductivity type. At least one gate of a transistor is disposed over the first well region and extends in a first direction. At least one second well region and at least one third well region are disposed on opposite sides of the first well region and extend in the first direction. The second and third well regions have a second conductivity type. A first shielding structure is disposed on at least one end of the gate and partially overlaps the first well region in a vertical projection direction. The first shielding structure is separated from the end of the gate. A bulk ring is disposed in the semiconductor substrate and surrounds the gate, the second well region, the third well region, and the first shielding structure.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a gate disposed on the semiconductor substrate. The semiconductor device structure also includes a source doped region and a drain doped region on two opposite sides of the gate. The semiconductor device structure further includes a source protective circuit and a drain protective circuit. From a side perspective view, a first drain conductive element of the source protective circuit partially overlaps a first source conductive element of the drain protective circuit.

Abstract: An electrostatic discharge (ESD) protection circuit including a detection circuit, a voltage-divider element, and a discharge element is provided. The detection circuit is coupled between a first power line and a second power line. In response to an ESD event, the detection circuit enables a turn-on signal. The voltage-divider element is coupled between the first power line and a third power line and receives the turn-on signal. The discharge element is coupled between the second and third power lines. In response to the turn-on signal being enabled, the first discharge element discharges an ESD current.

Abstract: An ESD protection circuit includes a buffer circuit, a driving circuit, and a power-clamping circuit. The buffer circuit includes first and second transistors having a first conductivity type coupled in a cascade configuration between a first node and a first power supply node. A bonding pad is coupled to the first node. The drive circuit determines a state of at least one of the first and second transistors according to a control voltage. The drive circuit includes a third transistor having a second conductivity type, which is coupled between a second power supply node and a gate of the first transistor and is controlled by the control signal. The power-clamping circuit is coupled to the bonding pad and a gate of the third transistor at a second node. The control voltage is generated at the second node and determined by a voltage at the bonding pad.

Abstract: An electrostatic discharge (ESD) protection circuit including a detection circuit, a voltage-divider element, and a discharge element is provided. The detection circuit is coupled between a first power line and a second power line. In response to an ESD event, the detection circuit enables a turn-on signal. The voltage-divider element is coupled between the first power line and a third power line and receives the turn-on signal. The discharge element is coupled between the second and third power lines. In response to the turn-on signal being enabled, the first discharge element discharges an ESD current.

Abstract: A voltage tracking circuit is provided and includes first and second P-type transistors and a voltage reducing circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The voltage reducing circuit is coupled between the first voltage terminal and the gate of the first P-type transistor. The voltage reducing circuit reduces a first voltage at the first voltage terminal by a modulation voltage to generate a control voltage and provides the control voltage to the gate of the first P-type transistor. The gate of the second P-type transistor is coupled to the first voltage terminal, and the drain thereof is coupled to a second voltage terminal. The source of the first P-type transistor and the source of the second P-type transistor are coupled to the output terminal of the voltage tracking circuit. The output voltage is generated at the output terminal.

Abstract: A semiconductor structure, including a substrate, a first well, a second well, a first doped region, a second doped region, a first gate structure, a first insulating layer, and a first field plate structure. The first and second wells are disposed in the substrate. The first doped region is disposed in the first well. The second doped region is disposed in the second well. The first gate structure is disposed between the first and second doped regions. The first insulating layer covers a portion of the first well and a portion of the first gate structure. The first field plate structure is disposed on the first insulating layer, and it partially overlaps the first gate structure. Wherein the first field plate structure is segmented into a first partial field plate and a second partial field plate separated from each other along a first direction.

Abstract: A semiconductor structure including a substrate, a first well, a second well, a first doped region, a second doped region, a gate electrode, an insulating layer, a field plate, and a tunable circuit is provided. The first and second wells are formed on the substrate. The first doped region is formed in the first well. The second doped region is formed in the second well. The gate electrode is disposed over the substrate. The gate electrode, the first doped region, and the second doped region constitute a transistor. The insulating layer is disposed on the substrate and overlaps the gate electrode. The field plate overlaps the insulating layer and the gate electrode. The tunable circuit provides either a first short-circuit path between the field plate and the gate electrode, or a second short-circuit path between the field plate and the first doped region.

Abstract: A semiconductor structure including a substrate, a first well, a second well, a first doped region, a second doped region, a gate electrode, an insulating layer, a field plate, and a tunable circuit is provided. The first and second wells are formed on the substrate. The first doped region is formed in the first well. The second doped region is formed in the second well. The gate electrode is disposed over the substrate. The gate electrode, the first doped region, and the second doped region constitute a transistor. The insulating layer is disposed on the substrate and overlaps the gate electrode. The field plate overlaps the insulating layer and the gate electrode. The tunable circuit provides either a first short-circuit path between the field plate and the gate electrode, or a second short-circuit path between the field plate and the first doped region.

Abstract: The protection circuit includes a detection circuit and a discharge circuit. The detection circuit is coupled to first and second power bonding pads and detects whether an ESD event or an EOS event occurs at the first power bonding pad. The detection circuit controls a detection voltage on a detection node according to a detection result. The first and second power bonding pads belong to different power domains. The discharge circuit is coupled to the detection node and the first power pad. In response to the ESD event occurring at the first power bonding pad, the discharge circuit provides a discharge path between the first power bonding pad and a ground terminal according to the detection voltage. In response to the EOS event occurring at the first power bonding pad, the detection circuit activates a second discharge path between the first power bonding pad and the ground terminal.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a gate disposed on the semiconductor substrate. The semiconductor device structure also includes a source doped region and a drain doped region on two opposite sides of the gate. The semiconductor device structure further includes a source protective circuit and a drain protective circuit. From a side perspective view, a first drain conductive element of the source protective circuit partially overlaps a first source conductive element of the drain protective circuit.

Abstract: A voltage tracking circuit is provided and includes first and second P-type transistors and a voltage reducing circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The voltage reducing circuit is coupled between the first voltage terminal and the gate of the first P-type transistor. The voltage reducing circuit reduces a first voltage at the first voltage terminal by a modulation voltage to generate a control voltage and provides the control voltage to the gate of the first P-type transistor. The gate of the second P-type transistor is coupled to the first voltage terminal, and the drain thereof is coupled to a second voltage terminal. The source of the first P-type transistor and the source of the second P-type transistor are coupled to the output terminal of the voltage tracking circuit. The output voltage is generated at the output terminal.

Abstract: A protection circuit including a detection circuit, a current discharge element, a first transistor, and a second transistor is provided. The detection circuit is coupled between a first pad and a second pad to detect ESD events. In response to an ESD event, the detection circuit sets the detection signal to a predetermined level. The current discharge element is coupled between the first and second pads. In response to the detection signal being at the predetermined level, the current discharge element is turned on so that the ESD current passes through the current discharge element. The first transistor is coupled between a core circuit and the second pad. The second transistor is coupled between the first transistor and the second pad. In response to the detection signal being at the predetermined level, the second transistor is turned on to turn off the first transistor.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a gate disposed on the semiconductor substrate. The semiconductor device structure also includes a source doped region and a drain doped region on two opposite sides of the gate. The semiconductor device structure further includes a source protective circuit and a drain protective circuit. From a side perspective view, a first drain conductive element of the source protective circuit partially overlaps a first source conductive element of the drain protective circuit.

Abstract: A protection circuit including a detection circuit, a current discharge element, a first transistor, and a second transistor is provided. The detection circuit is coupled between a first pad and a second pad to detect ESD events. In response to an ESD event, the detection circuit sets the detection signal to a predetermined level. The current discharge element is coupled between the first and second pads. In response to the detection signal being at the predetermined level, the current discharge element is turned on so that the ESD current passes through the current discharge element. The first transistor is coupled between a core circuit and the second pad. The second transistor is coupled between the first transistor and the second pad. In response to the detection signal being at the predetermined level, the second transistor is turned on to turn off the first transistor.

Abstract: An operating circuit is provided. A first N-type transistor determines whether to create an open circuit between a core circuit and a ground terminal according to the voltage level of a specific node. An electrostatic discharge (ESD) protection circuit is coupled between an input/output pad and the core circuit to prevent an ESD current from passing through the core circuit. The ESD protection circuit includes a detection circuit and a releasing element. The detection circuit determines whether there is an ESD event at the input/output pad and generates a first detection signal according to the detection of the ESD event at the input/output pad. The releasing element provides a release path according to the first detection signal to release the ESD current. A control circuit controls the voltage level of the specific node according to the first detection signal.

Abstract: An electrostatic discharge (ESD) blocking circuit including an internal circuit, a first Schottky diode, and an ESD releasing element is provided. The first Schottky diode is coupled between a specific node and the internal circuit. The ESD releasing element is coupled between the specific node and the first power terminal. In response to an ESD event occurring at the specific node, the ESD releasing element is turned on to release the ESD current from the specific node to the first power terminal.