Abstract: A multi-domain ESD protection circuit structure is described. The preferred embodiment of the present invention selects power lines of an internal circuit as ESD buses. The power lines of the remaining internal circuits are coupled with the ESD buses through the ESD connection cells. In another embodiments of the preferred invention, the VDD power line from one internal circuit and the VSS power line from another circuit are selected as ESD buses. In yet another embodiment, either a VDD power line or a VSS power line of an internal circuit is selected as an ESD bus.

Abstract: Disclosed are architectures and method for semiconductor ESD protection using grouped diodes, with the diode groups being electrically separated by substrate resistance. The mixed diode/resistor groups are arranged to be in an off state under normal operating conditions and to discharge ESD current between power lines. The disclosed architectures and method protects circuits using different power supplies and/or voltage inputs.

Abstract: A semiconductor circuit comprises a semiconductor substrate, a semiconductor device having a drain region disposed in the substrate, and a reverse doped region laterally adjacent and laterally contacting the drain region wherein the reverse doped region has an opposite doping type from that of the drain region and a dopant concentration higher than that of the semiconductor substrate, the reverse doped region and the drain operable to form a p-n junction.

Abstract: A charge device model (CDM) immunity module used in a semiconductor circuit for CDM damage protection. The CDM immunity module comprises a CDM ground pad and a current directing device such as a diode coupled between the CDM ground pad and a substrate of at least one device in a core circuit to be protected, wherein the current directing device and the CDM ground pad dissipate CDM charges to avoid damage to an oxide layer of the protected device.

Abstract: A circuit structure for connecting a bonding pad with an electrostatic discharge protection circuit. The circuit structure includes a plurality of conductive layers, a first plurality of first vias, a first conductive line, a plurality of second conductive lines and a plurality of second vias. The conductive layers are parallel layers each at a different height level between the bonding pad and a substrate. The first vias connect the bonding pad electrically with a neighboring conductive layer as well as each neighboring conductive layer. The first conductive line connects electrically with the conductive layer nearest the substrate and the drain terminal of an ESD protection circuit. The second conductive lines are parallel lines each at a different height level between the first conductive line and the bonding pad. Each second conductive line connects electrically with the conductive layer at a corresponding height level.

Abstract: A circuit structure for connecting a bonding pad with an electrostatic discharge protection circuit. The circuit structure includes a plurality of conductive layers, a first plurality of first vias, a first conductive line, a plurality of second conductive lines and a plurality of second vias. The conductive layers are parallel layers each at a different height level between the bonding pad and a substrate. The first vias connect the bonding pad electrically with a neighboring conductive layer as well as each neighboring conductive layer. The first conductive line connects electrically with the conductive layer nearest the substrate and the drain terminal of an ESD protection circuit. The second conductive lines are parallel lines each at a different height level between the first conductive line and the bonding pad. Each second conductive line connects electrically with the conductive layer at a corresponding height level.

Abstract: A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region.

Abstract: A circuit structure for connecting a bonding pad with an electrostatic discharge protection circuit. The circuit structure includes a plurality of conductive layers, a first plurality of first vias, a first conductive line, a plurality of second conductive lines and a plurality of second vias. The conductive layers are parallel layers each at a different height level between the bonding pad and a substrate. The first vias connect the bonding pad electrically with a neighboring conductive layer as well as each neighboring conductive layer. The first conductive line connects electrically with the conductive layer nearest the substrate and the drain terminal of an ESD protection circuit. The second conductive lines are parallel lines each at a different height level between the first conductive line and the bonding pad. Each second conductive line connects electrically with the conductive layer at a corresponding height level.

Abstract: A double-triggered electrostatic discharge (ESD) protection circuit for coupling with a first voltage source and a second voltage source. The circuit includes a diode series and a transistor. The diode series comprises a plurality of serially connected diodes with the cathode of one diode connected to the anode of a subsequent diode. The positive terminal of the first diode in the diode series connects with the first voltage source. The gate terminal of the transistor connects with the anode of the last diode in the diode series. The substrate of the transistor connects with the cathode of the last diode in the diode series. The source terminal and the drain terminal of the transistor connect with the first voltage source and the second voltage source, respectively. By using double-triggered design, the ESD clamp device can be quickly triggered on to bypass ESD current.

Abstract: A circuit structure for connecting a bonding pad with an electrostatic discharge protection circuit. The circuit structure includes a plurality of conductive layers, a first plurality of first vias, a first conductive line, a plurality of second conductive lines and a plurality of second vias. The conductive layers are parallel layers each at a different height level between the bonding pad and a substrate. The first vias connect the bonding pad electrically with a neighboring conductive layer as well as each neighboring conductive layer. The first conductive line connects electrically with the conductive layer nearest the substrate and the drain terminal of an ESD protection circuit. The second conductive lines are parallel lines each at a different height level between the first conductive line and the bonding pad. Each second conductive line connects electrically with the conductive layer at a corresponding height level.

Abstract: A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region.

Abstract: A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region.

Abstract: A silicon-on-insulator low-voltage-triggered silicon controlled rectifier device structure that is built upon a substrate and an insulation layer. The insulation layer has a plurality of isolation structures thereon to define a device region. A first-type well and a second-type well are formed over the insulation layer. The first-type and second-type wells are connected. A first gate and a second gate are formed over the first-type well and the second-type well, respectively. The first-type well further includes a first second-type doped region and a first first-type doped region formed between the first second-type doped region and the isolation structure adjacent to the first second-type doped region. The first second-type doped region and the first first-type doped region together form a cathode of the SOI-SCR device. A second first-type doped region is formed within the first-type well between the first second-type doped region and the first gate structure adjacent to the first second-type doped region.

Abstract: A CDM protection is provided within an internal device region of an integrated circuit where a plurality of working components are formed. The CDM protection circuit comprises a plurality of CDM protection devices that are electrically connected to one another, and a grounded conductive pad electrically connected to one CDM protection device, the CDM protection devices including a plurality of dummy devices such as dummy metals in tapered shape. The CDM protection devices are distributed over the internal device region in a manner to achieve a global protection of the IC against CDM charges by absorbing and dissipating the CDM charges. To increase CDM protection, a capacitor is further disposed in a manner to surround the internal device region.

Abstract: A double-triggered electrostatic discharge (ESD) protection circuit for coupling with a first voltage source and a second voltage source. The circuit includes a diode series and a transistor. The diode series comprises a plurality of serially connected diodes with the cathode of one diode connected to the anode of a subsequent diode. The positive terminal of the first diode in the diode series connects with the first voltage source. The gate terminal of the transistor connects with the anode of the last diode in the diode series. The substrate of the transistor connects with the cathode of the last diode in the diode series. The source terminal and the drain terminal of the transistor connect with the first voltage source and the second voltage source, respectively. By using double-triggered design, the ESD clamp device can be quickly triggered on to bypass ESD current.