Abstract: Exemplary embodiments of the present disclosure provide for an electronic reservation environment connecting potential travelers with operators that provide non-scheduled chartered transportation. The electronic reservation environment can be programmed to accept aggregate booking requests from potential travelers to allow travelers to share non-scheduled chartered transportation. Shared transportation criteria can be specified to determine whether to present an aggregate booking request to an operator.

Abstract: System and methods for accurate measurement and real-time feedback of solar ultraviolet exposure for management of ultraviolet dose. The systems can include a wearable device and a mobile device, the system performing accurate measurement of UV exposure.

Abstract: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function.

Abstract: System and methods for accurate measurement and real-time feedback of solar ultraviolet exposure for management of ultraviolet dose. The systems can include a wearable device and a mobile device, the system performing accurate measurement of UV exposure.

Abstract: A mechanism is provided in a data processing system for detecting lithographic hotspots. The mechanism receives a design layout. The mechanism generates spatial pattern clips from the design layout. The mechanism performs a transform on the spatial pattern clips to form frequency domain pattern clips. The mechanism performs feature extraction on the frequency domain pattern clips to form frequency domain features. The mechanism utilizes the extracted features on a set of training samples to train a machine learning classifier model. The mechanism classifies a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots.

Abstract: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for modeling at least one feature in an integrated circuit (IC) layout for an inter-layer effect. In some cases, approaches include a computer-implemented method of modeling at least one feature in an IC layout for an inter-level effect, the method including: building a set of shape measurement regions each connected with an edge of the at least one feature; determining a set of shape parameters for each shape measurement region in the set of shape measurement regions; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature, wherein the inter-layer effect includes a physical relationship between the at least one feature and another feature on a distinct level of the IC layout.

Abstract: System and methods for accurate measurement and real-time feedback of solar ultraviolet exposure for management of ultraviolet dose. The systems can include a wearable device and a mobile device, the system performing accurate measurement of UV exposure.

Abstract: System and methods for accurate measurement and real-time feedback of solar ultraviolet exposure for management of ultraviolet dose. The systems can include a wearable device and a mobile device, the system performing accurate measurement of UV exposure.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for modeling at least one feature in an integrated circuit (IC) layout for an inter-layer effect. In some cases, approaches include a computer-implemented method of modeling at least one feature in an IC layout for an inter-level effect, the method including: building a set of shape measurement regions each connected with an edge of the at least one feature; determining a set of shape parameters for each shape measurement region in the set of shape measurement regions; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature, wherein the inter-layer effect includes a physical relationship between the at least one feature and another feature on a distinct level of the IC layout.

Abstract: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for modeling at least one feature in an integrated circuit (IC) layout for an inter-layer effect. In some cases, approaches include a computer-implemented method of modeling at least one feature in an IC layout for an inter-level effect, the method including: building a set of shape measurement regions each connected with an edge of the at least one feature; determining a set of shape parameters for each shape measurement region in the set of shape measurement regions; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature, wherein the inter-layer effect includes a physical relationship between the at least one feature and another feature on a distinct level of the IC layout.

Abstract: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for verifying an integrated circuit (IC) layout. In some cases, approaches include a computer-implemented method of verifying an IC layout, the method including: obtaining data about a process variation band for at least one physical feature in the IC layout; determining voltage-based process variation band thresholds for the at least one physical feature in the IC layout; determining whether the process variation band for the at least one physical feature in the IC layout meets design specifications for the IC layout based upon the voltage-based process variation band thresholds for the at least one physical feature in the IC layout; and modifying the IC layout in response to a determination that the process variation band for the at least one physical feature does not meet the design specifications.

Abstract: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for modeling at least one feature in an integrated circuit (IC) layout for an inter-layer effect. In some cases, approaches include a computer-implemented method of modeling at least one feature in an IC layout for an inter-level effect, the method including: building a set of shape measurement regions each connected with an edge of the at least one feature; determining a set of shape parameters for each shape measurement region in the set of shape measurement regions; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature, wherein the inter-layer effect includes a physical relationship between the at least one feature and another feature on a distinct level of the IC layout.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for verifying an integrated circuit (IC) layout. In some cases, approaches include a computer-implemented method of verifying an IC layout, the method including: obtaining data about a process variation band for at least one physical feature in the IC layout; determining voltage-based process variation band thresholds for the at least one physical feature in the IC layout; determining whether the process variation band for the at least one physical feature in the IC layout meets design specifications for the IC layout based upon the voltage-based process variation band thresholds for the at least one physical feature in the IC layout; and modifying the IC layout in response to a determination that the process variation band for the at least one physical feature does not meet the design specifications.

Abstract: A mechanism is provided in a data processing system for detecting lithographic hotspots. The mechanism receives a design layout. The mechanism generates spatial pattern clips from the design layout. The mechanism performs a transform on the spatial pattern clips to form frequency domain pattern clips. The mechanism performs feature extraction on the frequency domain pattern clips to form frequency domain features. The mechanism utilizes the extracted features on a set of training samples to train a machine learning classifier model. The mechanism classifies a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots.

Abstract: The present application relates to a method for continuously moving displayed information on an electronic display device according to the physical movement of a user so as to maintain the focus of the user's eyes on the content, and display apparatus thereof. By way of an example, this application will enable reading from an electronic display apparatus while the user and/or the display apparatus is in a dynamic environment, such as, while in a moving vehicle like car, train or bus and/or while working out in a cardiovascular machine like treadmills, elliptical machines, stairmasters, stepmills or stationary bikes. The method described herein includes continuously detecting the physical movement of the user using either (i) motion sensors attached to the person, or (ii) a camera to continuously capture the image of the user's face and/or the image of an identifiable object attached to the user.

Abstract: A mechanism is provided in a data processing system for clustering lithographic hotspots based on frequency domain encoding. The mechanism receives a design layout and generates spatial pattern clips from the design layout. The mechanism performs a transform on the spatial pattern clips to form frequency domain pattern clips and performs feature extraction on the frequency domain pattern clips to form frequency domain features. The mechanism clusters the frequency domain features into a plurality of clusters and identifying a set of hotspot clusters within the plurality of clusters. Each hotspot cluster can be used to drive a fixing action such as change in RET or ground rules, without having to process each individual hotspot, thus greatly reducing technology development efforts.