Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a stack of semiconductor nanostructures over a base structure and a first epitaxial structure and a second epitaxial structure sandwiching the semiconductor nanostructures. The semiconductor device structure also includes a gate stack wrapped around each of the semiconductor nanostructures and a backside conductive contact connected to the second epitaxial structure. A first portion of the backside conductive contact is directly below the base structure, and a second portion of the backside conductive contact extends upwards to approach a bottom surface of the second epitaxial structure. The semiconductor device structure further includes an insulating spacer between a sidewall of the base structure and the backside conductive contact.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a substrate including a base and a fin structure over the base. The fin structure includes a nanostructure. The semiconductor device structure includes a gate stack over the base and wrapped around the nanostructure. The gate stack has an upper portion and a sidewall portion, the upper portion is over the nanostructure, and the sidewall portion is over a first sidewall of the nanostructure. The semiconductor device structure includes a first inner spacer and a second inner spacer over opposite sides of the sidewall portion. A sum of a first width of the first inner spacer and a second width of the second inner spacer is greater than a third width of the sidewall portion as measured along a longitudinal axis of the fin structure.

Abstract: The present invention teaches an apparatus and method for line-illumination temporal focusing three-dimensional (3D) nano-fabrication, the apparatus and method comprising: a laser source (110) configured to emit a laser beam (111); a line-illumination pattern unit (150) forming a pre-determined line pattern from a line-shaped beam; a data acquisition unit (120) receiving input and transmitting output signals for movement synchronization of multiple devices; an optical imaging device (130) configured to monitor fabrication process in real time; a controller unit (140); and a substrate plane (170).

Abstract: A method includes forming a photoresist layer over a wafer; aligning a first photomask with a first area of the wafer; performing a first exposure process to a first portion of the photoresist layer within the first area of the wafer; aligning a second photomask with a second area of the wafer, wherein aligning the first photomask and aligning the second photomask are performed using an alignment mark within a stitching zone of the wafer, the stitching zone being an overlapping region of the first area and the second area; performing a second exposure process to a second portion of the photoresist layer within the second area of the wafer; and performing a development process to remove the first and second portions of the photoresist layer.

Abstract: A signal transporting system, comprising: a signal transporting circuit, configured to receive an input signal to generate an output signal; and a signal timing adjusting circuit, configured to adjust an output timing of the output signal according to a signal pattern of the input signal.

Abstract: A display may include an array of pixels such as light-emitting diode pixels. The pixels may include multiple circuitry decks that each include one or more circuit components such as transistors, capacitors, and/or resistors. The circuitry decks may be vertically stacked. Each circuitry deck may include a planarization layer formed from a siloxane material that conforms to underlying components and provides a planar upper surface. In this way, circuitry components may be vertically stacked to mitigate the size of each pixel footprint. The circuitry components may include capacitors that include both a high-k dielectric layer and a low-k dielectric layer. The display pixel may include a via with a width of less than 1 micron.

Abstract: Disclosed is a closed-loop wavefront shaping system, including: a parallel computing module; a task planning module; and a memory management module; wherein the system is implemented on: at least one computing device for generating digital holograms; at least one displaying device for displaying the digital holograms to control an incoming coherent light beam; and at least one sensor for detecting feedback signals.

Abstract: A semiconductor structure includes substrate, semiconductor layers, source/drain features, metal oxide layers, and a gate structure. The semiconductor layers extend in an X-direction and over the substrate. The semiconductor layers are spaced apart from each other in a Z-direction. The source/drain features are on opposite sides of the semiconductor layers in the X-direction. The metal oxide layers cover bottom surfaces of the semiconductor layers. The gate structure wraps around the semiconductor layers and the metal oxide layers. The metal oxide layers are in contact with the gate structure.

Abstract: The present invention relates to a sizing agent composition, a sizing agent, a carbon fiber covered with the sizing agent, and a composite material. The sizing agent composition includes a polyamic acid and an alkali agent. The alkali agent has a specific molecular weight, and there is a specific molar ratio between the polyamic acid and the alkali agent, such that emulsification stability of the polyamic acid and thermal stability of a sizing layer consisting of the sizing agent are enhanced, thereby increasing interlayer bonding strength in the composite material that is made by the carbon fiber covered with the sizing agent.

Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Abstract: The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beam lets of varying or identical intensity, and each beam let emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam.

Abstract: A method for outputting a grayscale data, a driving controller, and a display apparatus are provided. The method includes: in response to receiving a first input grayscale data which is not greater than a first threshold, generating a first output grayscale data without performing a dither computing on the first input grayscale data and outputting the first output grayscale data; in response to receiving a second input grayscale data which is greater than a second threshold, generating a first dithered grayscale data by performing a first dither computing on the second input grayscale data and outputting the first dithered grayscale data as a second output grayscale data. The second threshold is greater than the first threshold, and the second output grayscale data does not comprise any part of the second input grayscale data not processed by the first dither computing.

Abstract: In this application, a 2D or 3D optical storage and a physical encryption method with ultrahigh storage density are presented. Designed information patterns can be written in an expanded hydrogel via laser patterning, followed by volume shrinkage and dehydration of the hydrogel to achieve physical encryption, ultrahigh storage density, and long-term storage. For decryption, the dehydrated gel is re-expanded, and then immersed in a solution of fluorescent materials to retrieve the stored information via an imaging system.

Abstract: The disclosure relates to a method or a platform for hydrogel-based 3D fabrication, wherein the hydrogel is patterned with a programmable femtosecond light sheet with a power density of 0.1 to 100 TW/cm2.

Abstract: A microtome comprises a support assembly; an actuator, mounted to the support assembly; a pair of oscillating flexure assemblies, held by the support assembly and each of which being located on one side of the actuator and oscillated by the actuator; and a blade assembly, mounted to each of the oscillating flexure assemblies so as to move in a direction same as the oscillating flexure assemblies.

Abstract: The present invention provides a loading box, which includes a box body, a first groove set, and a first positioning member. The box body includes a base and a side wall protruding from the base along a plurality of sides of the base. The first groove set has a plurality of first grooves, and is disposed on the base along a first side. The first positioning member is arranged corresponding to the first groove set, and includes: a first baffle, detachably inserted into one of the first grooves in the first groove set; and a first supporting arm and a second supporting arm, respectively connected to the first baffle and protruding from the first baffle toward the side wall. One ends of the first supporting arm and the second supporting arm of the first positioning member away from the first baffle are detachably connected to the box body.

Abstract: In some embodiments, a control system, a control method and a storage medium are provided. In the method, first motion information of a machine acquired by a first sensor is received; the first motion information is inputted into a deep learning model to obtain a model output, the deep learning model comprising a convolutional neural network (CNN) and a long short-term memory (LSTM); the deep learning model is trained using the first motion information and second motion information acquired by a second sensor; the first sensor and the second sensor having different ways of detecting information and processing the detected information. The model output is used to control the machine.

Abstract: The present invention provides a loading box, which includes a box body, a first groove set, and a first positioning member. The box body includes a base and a side wall protruding from the base along a plurality of sides of the base. The first groove set has a plurality of first grooves, and is disposed on the base along a first side. The first positioning member is arranged corresponding to the first groove set, and includes: a first baffle, detachably inserted into one of the first grooves in the first groove set; and a first supporting arm and a second supporting arm, respectively connected to the first baffle and protruding from the first baffle toward the side wall. One ends of the first supporting arm and the second supporting arm of the first positioning member away from the first baffle are detachably connected to the box body.

Abstract: The disclosure relates to a method or a platform for hydrogel-based 3D fabrication, wherein the hydrogel is patterned with a programmable femtosecond light sheet with a power density of 0.1 to 100 TW/cm2.

Abstract: An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.