Patents by Inventor Shih-Yuan Wang

Shih-Yuan Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9960636
    Abstract: A DC converter includes a non-isolated conversion module and an isolated conversion module. The non-isolated conversion module is implemented based on a redundant structure and has a first power conversion loop, a second power conversion loop, and an energy storage element. The first and second power conversion loops are connected and share the energy storage element. The energy storage element is further connected to an input terminal of the isolated conversion module. The first and second conversion loops of the non-isolated conversion module convert DC power outputted from two battery sets and output the converted power to the isolated conversion module. The isolated conversion module further supplies DC power to a load. Accordingly, power supply systems using the foregoing DC converter can reduce the number of transformer therein and thus size reduction of the power supply system can be achieved.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: May 1, 2018
    Assignee: ACBEL POLYTECH INC.
    Inventors: Andrew Ferencz, Shih-Yuan Wang
  • Publication number: 20180109591
    Abstract: An adaptive server provides support for uninterrupted learning platform when connections to networks are unavailable or unstable. The adaptive server can communicate with a remote server through a local area network and switch to a cellular telecommunication network when the local area network is unavailable. The adaptive server can also act as a WiFi base station and accept connections from nearby student devices.
    Type: Application
    Filed: October 13, 2016
    Publication date: April 19, 2018
    Inventor: Shih-Yuan Wang
  • Publication number: 20180102442
    Abstract: Microstructure enhanced photodiodes and avalanche photodiodes are monolithically integrated with CMOS/BiCMOS circuitry such as transimpedance amplifiers. Microstructures, such as holes, can improve quantum efficiency in silicon and III-V materials and can also reduce avalanche voltages for avalanche photodiodes. Applications include optical communications within and between datacenters, telecommunications, LIDAR, and free space data communication.
    Type: Application
    Filed: October 30, 2017
    Publication date: April 12, 2018
    Inventors: Shih-Yuan WANG, Shih-Ping WANG, M. Saif Islam
  • Patent number: 9869836
    Abstract: Various embodiments of the present invention are directed to optical interconnects. In one embodiment of the present invention, an optical interconnect comprises a laser configured to output an optical signal and a laser-diode driver electronically coupled to the laser. The laser-diode driver induces the laser to output the optical signal in response to an electrical signal received by the laser-diode driver. The optical interconnect includes a diffractive optical element and a plurality of photodetectors. The optical interconnect is positioned to receive the optical signal and configured to split the optical signal into a plurality of optical signals, and each photodetector converts one of the plurality of optical signals into an electrical signal that is output on a separate signal line.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: January 16, 2018
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Michael Renne Ty Tan, Shih-Yuan Wang, Paul Kessler Rosenberg
  • Patent number: 9818893
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: November 14, 2017
    Assignee: W&WSENS DEVICES, INC.
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Patent number: 9793473
    Abstract: A memristor structure may be provided that includes a first electrode, a second electrode, and a buffer layer disposed on the first electrode. The memristor structure may include a switching layer interposed between the second electrode and the buffer layer to form, when a voltage is applied, a filament or path that extends from the second electrode to the buffer layer and to form a Schottky-like contact or a heterojunction between the filament and the buffer layer.
    Type: Grant
    Filed: September 5, 2013
    Date of Patent: October 17, 2017
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Shih-Yuan Wang, Jianhua Yang, Minxian Max Zhang, Alexandre M. Bratkovski, R. Stanley Williams
  • Publication number: 20170244028
    Abstract: Resistive RAM (RRAM) devices having increased uniformity and related manufacturing methods are described. Greater uniformity of performance across an entire chip that includes larger numbers of RRAM cells can be achieved by uniformly creating enhanced channels in the switching layers through the use of radiation damage. The radiation, according to various described embodiments, can be in the form of ions, electromagnetic photons, neutral particles, electrons, and ultrasound.
    Type: Application
    Filed: March 1, 2017
    Publication date: August 24, 2017
    Inventors: Shih-Yuan WANG, Shih-Ping WANG
  • Publication number: 20170194522
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Application
    Filed: November 17, 2015
    Publication date: July 6, 2017
    Inventors: Shih-Yuan WANG, Shih-Ping WANG
  • Patent number: 9647036
    Abstract: Resistive RAM (RRAM) devices having increased uniformity and related manufacturing methods are described. Greater uniformity of performance across an entire chip that includes larger numbers of RRAM cells can be achieved by uniformly creating enhanced channels in the switching layers through the use of radiation damage. The radiation, according to various described embodiments, can be in the form of ions, electromagnetic photons, neutral particles, electrons, and ultrasound.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: May 9, 2017
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Patent number: 9584373
    Abstract: A configurable Clos network includes leafs and spines and a switch fabric that connects the leafs and the spines. The switch fabric couples each leaf port of each leaf to at least one spine port of each spine.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: February 28, 2017
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Michael Schlansker, Jose Renato G Santos, Michael Renne Ty Tan, Guodong Zhang, Shih-Yuan Wang, Jean Tourrilhes
  • Publication number: 20170012083
    Abstract: Resistive RAM (RRAM) devices having increased uniformity and related manufacturing methods are described. Greater uniformity of performance across an entire chip that includes larger numbers of RRAM cells can be achieved by uniformly creating enhanced channels in the switching layers through the use of radiation damage. The radiation, according to various described embodiments, can be in the form of ions, electromagnetic photons, neutral particles, electrons, and ultrasound.
    Type: Application
    Filed: January 29, 2016
    Publication date: January 12, 2017
    Inventors: Shih-Yuan WANG, Shih-Ping WANG
  • Patent number: 9530905
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: December 27, 2016
    Assignee: W&WSENS DEVICES, INC.
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Patent number: 9525084
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: December 20, 2016
    Assignee: W&Wsens Devices, Inc.
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Patent number: 9515262
    Abstract: Resistive RAM (RRAM) devices having increased uniformity and related manufacturing methods are described. Greater uniformity of performance across an entire chip that includes larger numbers of RRAM cells can be achieved by uniformly creating enhanced channels in the switching layers through the use of radiation damage. The radiation, according to various described embodiments, can be in the form of ions, electromagnetic photons, neutral particles, electrons, and ultrasound.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: December 6, 2016
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Patent number: 9508928
    Abstract: A resistive memory structure includes two electrodes sandwiching an insulating region. The structure further includes a nanochannel array providing a conducting path between the two electrodes. The nanochannel array includes a plurality of nanowires that extends from one electrode to the other.
    Type: Grant
    Filed: May 15, 2013
    Date of Patent: November 29, 2016
    Assignee: Hewlett Packard Enterprise Development LP
    Inventors: Shih-Yuan Wang, Jianhua Yang
  • Publication number: 20160344478
    Abstract: Examples include generating a signal using a modulatable source. The signal may be propagated using a multi-mode fiber to receive the signal from the modulatable source. The fiber has a diameter d and a far-field divergence angle associated with the propagated signal that corresponds to a product of the diameter (d) and the far-field divergence angle. The product may be substantially between 1 micron radian and 4 micron radian. In some examples, the propagated signal may be received at a receiver from the multi-mode fiber.
    Type: Application
    Filed: August 5, 2016
    Publication date: November 24, 2016
    Inventors: Wayne V SORIN, Michael Renne Ty TAN, Shih-Yuan WANG
  • Patent number: 9496435
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures arc described. The microstructures, such as pillars and/or holes, effectively increase the effective absorption length resulting in a greater absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more.
    Type: Grant
    Filed: May 22, 2014
    Date of Patent: November 15, 2016
    Assignee: W&Wsens Devices, Inc.
    Inventors: Shih-Yuan Wang, Shih-Ping Wang
  • Publication number: 20160308075
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Application
    Filed: November 18, 2015
    Publication date: October 20, 2016
    Inventors: Shih-Yuan WANG, Shih-Ping Wang
  • Publication number: 20160307939
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as holes, effectively increase the absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more. Their thickness dimensions allow them to be conveniently integrated on the same Si chip with CMOS, BiCMOS, and other electronics, with resulting packaging benefits and reduced capacitance and thus higher speeds.
    Type: Application
    Filed: November 17, 2015
    Publication date: October 20, 2016
    Inventors: Shih-Yuan WANG, Shih-Ping WANG
  • Publication number: 20160254407
    Abstract: Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as pillars and/or holes, effectively increase the effective absorption length resulting in a greater absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more.
    Type: Application
    Filed: November 20, 2015
    Publication date: September 1, 2016
    Inventors: Shih-Yuan WANG, Shih-Ping WANG