Patents by Inventor Shine Chung

Shine Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7369425
    Abstract: This invention discloses a dynamic random access memory (DRAM) device comprising a first bit-line coupled to a first terminal of at least one memory cell capacitor through one or more pass transistors, a second bit-line coupled to a first terminal of at least one reference cell capacitor through one or more pass transistors, and a cell plate connected to both a second terminal of at least one memory cell capacitor and a second terminal of at least one reference cell capacitor, wherein the cell plate is biased at approximately one half of a voltage difference between a positive supply voltage (Vdd) and a complementary lower supply voltage (Vss), and wherein the reference cell capacitor does not store any charge prior to a reading operation, and wherein both the first and second bit-lines are pre-charged to either Vdd or Vss prior to the reading operation.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: May 6, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Shine Chung
  • Publication number: 20080062795
    Abstract: This invention discloses a dynamic random access memory (DRAM) device comprising a first bit-line coupled to a first terminal of at least one memory cell capacitor through one or more pass transistors, a second bit-line coupled to a first terminal of at least one reference cell capacitor through one or more pass transistors, and a cell plate connected to both a second terminal of at least one memory cell capacitor and a second terminal of at least one reference cell capacitor, wherein the cell plate is biased at approximately one half of a voltage difference between a positive supply voltage (Vdd) and a complementary lower supply voltage (Vss), and wherein the reference cell capacitor does not store any charge prior to a reading operation, and wherein both the first and second bit-lines are pre-charged to either Vdd or Vss prior to the reading operation.
    Type: Application
    Filed: September 8, 2006
    Publication date: March 13, 2008
    Inventor: Shine Chung
  • Publication number: 20080061354
    Abstract: A split gate memory cell. First and second well regions of respectively first and second conductivity types are formed in the substrate. A floating gate is disposed on a junction of the first and second well regions and insulated from the substrate. A control gate is disposed over the sidewall of the floating gate and insulated from the substrate and the floating gate and partially extends to the upper surface of the floating gate. A doping region of the first conductivity type is formed in the second well region. The first well region and the doping region respectively serve as source and drain regions of the split gate memory cell.
    Type: Application
    Filed: September 13, 2006
    Publication date: March 13, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yue-Der Chih, Shine Chung, Wen-Ting Chu
  • Publication number: 20080012663
    Abstract: A waveguide in semiconductor integrated circuit is disclosed, the waveguide comprises a horizontal first metal plate, a horizontal second metal plate above the first metal plate, separated by an insulation material, and a plurality of metal vias positioned in two parallel lines, running vertically through the insulation material in contacts with both the first and second metal plates, wherein the first and second metal plates and the plurality of metal vias form a metal enclosure in a cross-sectional view that can serve as a waveguide.
    Type: Application
    Filed: July 14, 2006
    Publication date: January 17, 2008
    Inventors: Shine Chung, Fu-Lung Hsueh
  • Publication number: 20080002489
    Abstract: A method for testing a memory with cell plates and bit-line plates comprises putting the memory in a test mode, applying a test pattern to the memory, then providing a first voltage higher than Vdd/2 to the cell plate when writing a ‘1’ to a predetermined cell, providing a second voltage lower than Vdd/2 to the cell plate when writing a ‘0’ to a predetermined cell, wherein the first and second voltages are applied to emulate weak charge storage in the memory cell, similarly, providing a third voltage higher than Vdd/2 to the bit-line plate when expecting to read a ‘1’ from a predetermined cell, and providing a fourth voltage lower than Vdd/2 to the bit-line plate when expecting to read a ‘0’ from a predetermined cell, wherein the third and fourth voltages are applied to emulate charge decay in the memory cell.
    Type: Application
    Filed: June 29, 2006
    Publication date: January 3, 2008
    Inventor: Shine Chung
  • Patent number: 7310281
    Abstract: The present invention discloses a semiconductor memory having an array of storage cells with at least one PMOS transistor, the semiconductor memory comprising at least one mode bit for representing data stored in the array of storage cells are either true or inverted, a plurality of read-toggle drivers coupled on a plurality of data output paths for inverting the data outputs only when the mode bit indicates that the array of storage cells are storing inverted data, and a plurality of write-toggle drivers coupled on a plurality of data input paths for inverting the data inputs only when the mode bit indicates that the array of storage cells are storing inverted data and for writing back inverted data into the array of storage cells during a refreshing cycle.
    Type: Grant
    Filed: September 1, 2006
    Date of Patent: December 18, 2007
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Fu-Lung Hsueh, Shine Chung
  • Publication number: 20070281398
    Abstract: A circuit and method are disclosed for reducing device mismatch due to trench isolation related stress. One or more extended active regions are formed on the substrate, wherein the active regions being extended from one or more ends thereof, and one or more operational devices are placed on one or more active regions, wherein the extended active region has at least a length twice as much as a distance between gates of two neighboring operational devices.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 6, 2007
    Inventors: Shine Chung, David Lu
  • Publication number: 20070279816
    Abstract: A method and system is disclosed for protecting electrical fuse circuitry. A electrical fuse circuit with electrostatic discharge (ESD) protection has at least one electrical fuse, a programming device coupled in series with the electrical fuse having at least a transistor for receiving a control signal for controlling a programming current flowing through the electrical fuse, a voltage source coupled to the fuse and the programming device for providing the programming current, and a protection module coupled to a gate of the transistor at its first end for reducing charges accumulated at the gate of the transistor due to electric static charges arriving at the voltage source, thereby preventing the programming device from accidentally programming the fuse.
    Type: Application
    Filed: August 16, 2007
    Publication date: December 6, 2007
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shine Chung, Jiann-Tseng Huang, Shao-Chang Huang
  • Patent number: 7271988
    Abstract: A method and system is disclosed for protecting electrical fuse circuitries. A electrical fuse circuit with electrostatic discharge (ESD) protection has at least one electrical fuse, a programming device coupled in series with the electrical fuse having at least a transistor for receiving a control signal for controlling a programming current flowing through the electrical fuse, a voltage source coupled to the fuse and the programming device for providing the programming current, and a protection module coupled to a gate of the transistor at its first end for reducing charges accumulated at the gate of the transistor due to electric static charges arriving at the voltage source, thereby preventing the programming device from accidentally programming the fuse.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: September 18, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Shine Chung, Jiann-Tseng Huang, Shao-Chang Huang
  • Publication number: 20070136626
    Abstract: A method and system is disclosed for conducting built-in-self-test (BIST) in a circuit under test. After allocating at least one memory segment with a predetermined size in at least one memory module as a test result module, the built-in-self-test is conducted for the circuit under test without testing the test result module. The test results are stored in the test result module.
    Type: Application
    Filed: December 9, 2005
    Publication date: June 14, 2007
    Inventor: Shine Chung
  • Publication number: 20070053219
    Abstract: A micro-motor memory device includes at least one rotor having at least one indicator for rotating about an axis; and at least one stator placed adjacent to the rotor for electromagnetically or physically engaging the rotor to rotate the indicator to at least one predetermined angular position for representing stored data. The rotor and the stator are constructed on a semiconductor substrate by using micro-electro-mechanic-system technology.
    Type: Application
    Filed: August 22, 2005
    Publication date: March 8, 2007
    Inventor: Shine Chung
  • Publication number: 20070026628
    Abstract: A circuit and method are disclosed for reducing device mismatch due to trench isolation related stress. One or more extended active regions are formed on the substrate, wherein the active regions being extended from one or more ends thereof, and one or more operational devices are placed on one or more active regions, wherein the extended active region has at least a length twice as much as a distance between gates of two neighboring operational devices.
    Type: Application
    Filed: July 26, 2005
    Publication date: February 1, 2007
    Inventors: Shine Chung, David Lu
  • Patent number: 7135914
    Abstract: A high voltage switch circuit is disclosed for reducing high voltage junction stresses. The circuit contains a cascode device structure having one or more transistors of a same type connected in a series and being operable with a normal operating voltage and a high operating voltage. The cascode device structure comprises a high operating voltage coupled to a first end of the device structure, a low voltage coupled to a second end, and one or more control voltages controllably coupled to the gates of the transistors, wherein at least one of the control voltages coupled to the gate of at least one transistor is raised to a medium voltage level that is higher than a normal operating voltage when operating under the high operating voltage for tolerating stress imposed thereon by the high operating voltage.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: November 14, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yue-Der Chih, Shine Chung
  • Publication number: 20060238220
    Abstract: A method is disclosed for utilizing mixed low threshold voltage (low-Vt) and high threshold voltage (high-Vt) devices in a cell-based design such that a tradeoff of both the circuit speed and power performance may be achieved. Using cells having non-uniform threshold devices for designing circuit, the speed or/and power optimization is comparable to fully custom designs.
    Type: Application
    Filed: April 20, 2005
    Publication date: October 26, 2006
    Inventors: Shine Chung, Cliff Hou, Mark Chen, Lee-Chung Lu
  • Publication number: 20060197185
    Abstract: The present invention discloses a bipolar device. An emitter is formed in a semiconductor substrate. A collector is laterally spaced from the emitter in the substrate. A gate terminal is formed on the substrate, defining a space between the emitter and the collector. An extrinsic base is formed on the substrate with a predetermined distance from either the emitter or the collector, wherein the base, the emitter, the collector and the gate terminal are located in an active area defined by a hole in a surrounding isolation structure in the substrate.
    Type: Application
    Filed: March 7, 2005
    Publication date: September 7, 2006
    Inventor: Shine Chung
  • Publication number: 20060197178
    Abstract: The present disclosure provides an electrical fuse cell with redundancy features and the method for operating the same. The fuse cell includes a first set of electrical fuses having at least one electrical fuse contained therein, and a second set of electrical fuses having at least one electrical fuse for providing redundancy to at least one fuse of the first set, wherein if one of the first set of electrical fuses is defective, at least one of the second set of the electrical fuses can be programmed to provide a redundancy function of the defective fuse.
    Type: Application
    Filed: March 7, 2005
    Publication date: September 7, 2006
    Inventor: Shine Chung
  • Publication number: 20060028777
    Abstract: A method and system is disclosed for protecting electrical fuse circuitries. A electrical fuse circuit with electrostatic discharge (ESD) protection has at least one electrical fuse, a programming device coupled in series with the electrical fuse having at least a transistor for receiving a control signal for controlling a programming current flowing through the electrical fuse, a voltage source coupled to the fuse and the programming device for providing the programming current, and a protection module coupled to a gate of the transistor at its first end for reducing charges accumulated at the gate of the transistor due to electric static charges arriving at the voltage source, thereby preventing the programming device from accidentally programming the fuse.
    Type: Application
    Filed: December 10, 2004
    Publication date: February 9, 2006
    Inventors: Shine Chung, Jiann-Tseng Huang, Shao-Chang Huang
  • Publication number: 20050275037
    Abstract: The present invention provides improve device designs for high voltage tolerance and methods for making the same. In one embodiment, a low doped drain extension (LDD) region is extended to sustain higher voltages with minimal extra space and processing. In another example, a trench isolation barrier is placed between the gate and an active region in a well. In another example, an additional trench isolation barrier is placed under the middle of the gate. The trench is filled with dielectric such as oxides, with a small upper portion replaced with recrystallized silicon. These disclosed transistor devices can have parameters controlled so that predetermined performances of the transistor devices can be achieved.
    Type: Application
    Filed: March 11, 2005
    Publication date: December 15, 2005
    Inventor: Shine Chung
  • Publication number: 20050269666
    Abstract: An electrical fuse is disclosed. It is formed by a silicide layer on a polysilicon layer, with a first dielectric section separating the electrical fuse from a semiconductor substrate and a second dielectric section separating the electrical fuse from at least one electrical conductor directly above the fuse. The polysilicon layer is at least 2000 Angstroms in thickness and no more than 0.14 um in width and the second dielectric section contains substantially low-K materials.
    Type: Application
    Filed: February 11, 2005
    Publication date: December 8, 2005
    Inventors: Shine Chung, Chine-Gie Lou
  • Publication number: 20050259495
    Abstract: Fuse circuit designs and the use thereof are disclosed. In one example, a fuse circuit providing predictable total resistances for multiple rounds of programming comprises a predetermined number of fuse stages coupled in series. Each stage comprises a first and a second connecting nodes, a fuse connected between the first and second connecting nodes, a first resistor with its first end connected to the first connecting node, and a second resistor with its first end connected to the second connecting node, wherein the first and second resistors connect to a third and a fourth connecting nodes, which are the first and second connecting nodes of a next fuse stage respectively, through their second ends.
    Type: Application
    Filed: November 19, 2004
    Publication date: November 24, 2005
    Inventor: Shine Chung