Patents by Inventor Shinichi Nishimura

Shinichi Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10384939
    Abstract: In an ozone generation apparatus, a discharge cell includes a first electrode part, a second electrode part, and a dielectric partition plate. The first electrode part and the second electrode part face each other, and the dielectric partition plate is provided between the first and second electrode parts.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: August 20, 2019
    Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro Tabata, Yujiro Okihara, Shinichi Nishimura
  • Publication number: 20190226091
    Abstract: With respect to a dielectric electrode, gas-jetting holes and gas-jetting holes formed in two rows along the X direction are provided as three or more gas-jetting holes along the X direction in a central region. By providing a difference in the X direction between the position where the gas-jetting hole is formed and the position where the gas-jetting hole is formed, the gas-jetting holes and the gas-jetting holes disposed in two rows are provided such that gas-jetting holes and gas-jetting holes are alternately disposed along the X direction.
    Type: Application
    Filed: June 28, 2016
    Publication date: July 25, 2019
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Shinichi NISHIMURA, Kensuke WATANABE, Yoshihito YAMADA
  • Patent number: 10341592
    Abstract: A pixel is included, the pixel including a photoelectric conversion portion configured to convert incident light to a charge by photoelectric conversion and accumulate the charge, a charge transfer unit configured to transfer the charge generated in the photoelectric conversion portion, a diffusion layer to which the charge is transferred through the charge transfer unit, the diffusion layer having a predetermined storage capacitance, a conversion unit configured to convert the charge transferred to the diffusion layer to a pixel signal, and connection wiring configured to connect the diffusion layer and the conversion unit. The connection wiring is connected to the diffusion layer and the conversion unit through contact wiring extending in a vertical direction with respect to a semiconductor substrate on which the diffusion layer is formed and is formed closer to the semiconductor substrate than other wiring provided in the pixel.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: July 2, 2019
    Assignee: Sony Semiconductor Solutions Corporation
    Inventors: Takeshi Yanagita, Masaaki Takizawa, Yuuji Nishimura, Shinichi Arakawa, Yuugo Nakamura, Yohei Chiba
  • Publication number: 20190157046
    Abstract: An activated gas generation apparatus includes a gas jet flow straightener below an activated gas generating electrode group and a nozzle constituent part. The gas jet flow straightener receives a plurality of nozzle passing activated gases as a whole at an inlet part of a gas flow-straightening passage. The gas flow-straightening passage is formed so that the outlet opening area of an outlet part is set to be narrower than the inlet opening area of the inlet part, and the cylindrical gas jet of each of the plurality of nozzle passing activated gases is converted into a linear flow-straightened activated gas by the flow-straightening action of the gas flow-straightening passage.
    Type: Application
    Filed: May 27, 2016
    Publication date: May 23, 2019
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Kensuke WATANABE, Shinichi NISHIMURA, Yoshihito YAMADA
  • Publication number: 20190122900
    Abstract: The method of the present invention improves quality and reliability of resin mold-type semiconductor devices. The method includes the steps of placing a lead frame such that cavities of a mold match with device formation regions of the lead frame, respectively, and forming encapsulation bodies that encapsulate semiconductor chips by flowing encapsulating resin into the cavities. The mold with an upper mold half and a lower mold half clamped together has a plurality of first gates that allow the cavities to communicate with a runner, and a dummy-cavity gate that allows a dummy cavity to communicate with the runner. During a resin molding process, from the time when the resin starts flowing into the mold to the time when the encapsulation bodies are formed, an orifice of each cavity gate is larger in size than an orifice of the dummy-cavity gate.
    Type: Application
    Filed: July 30, 2018
    Publication date: April 25, 2019
    Inventors: Shoji HASHIZUME, Shinichi NISHIMURA
  • Publication number: 20190055648
    Abstract: A gas ejector of a gas supply apparatus includes a nozzle portion. The opening of a first-stage restricting cylinder constituting the nozzle portion has a circular cross-sectional shape with a diameter r1. A second-stage restricting cylinder is continuously formed with the first-stage restricting cylinder along a Z direction. The opening of the second-stage restricting cylinder has a circular cross-sectional shape with a diameter r2, and supplies a source gas supplied from the first-stage restricting cylinder to a low-vacuum processing chamber below. At this time, the diameter r2 is set to satisfy “r2>r1”.
    Type: Application
    Filed: January 6, 2016
    Publication date: February 21, 2019
    Applicant: Toshiba Mitsubishi-Electric Insustrial Systems Cor
    Inventor: Shinichi NISHIMURA
  • Publication number: 20180291509
    Abstract: In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.
    Type: Application
    Filed: January 18, 2016
    Publication date: October 11, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Kensuke WATANABE, Shinichi NISHIMURA, Yoichiro TABATA
  • Patent number: 10061042
    Abstract: A radiation imaging apparatus includes a housing including an incident surface of radiation, an imaging panel stored in the housing and including an effective region for detecting radiation incident through the incident surface, a buffer member arranged between the incident surface and the imaging panel, and an electrically conductive member fixed to the buffer member. An edge of the electrically conductive member surrounds an edge of the effective region in a planar view with respect to the incident surface.
    Type: Grant
    Filed: April 5, 2016
    Date of Patent: August 28, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masataka Suzuki, Motoki Tagawa, Hiroto Kondo, Shinichi Nishimura, Takashi Sato
  • Publication number: 20180223433
    Abstract: The present invention has an object to provide, as a film formation process system of remote plasma type, a radical gas generation system in which a process can be performed evenly on, for example, a target object having a large area through the use of a radical gas. In a radical gas generation system (500) according to the present invention, a process chamber apparatus (200) includes a table (201) that causes a target object (202) to rotate. A radical gas generator (100) includes a plurality of discharge cells (70). Each of the plurality of discharge cells (70) includes an opening (102). The opening (102) is connected to the inside of the process chamber apparatus (200) and faces the target object (202). Through the opening (102), a radical gas (G2) is output.
    Type: Application
    Filed: October 29, 2014
    Publication date: August 9, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Kensuke WATANABE, Yoichiro TABATA, Shinichi NISHIMURA
  • Publication number: 20180200687
    Abstract: A gas jetting apparatus capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus includes a gas jetting cell unit for jetting a gas toward a treatment-target object. The gas jetting cell unit includes a first cone-shaped member and a second cone-shaped member. A gap is formed between a side surface of a first cone shape and a side surface of the second cone-shaped member. Apex sides of the cone-shaped members face the treatment-target object.
    Type: Application
    Filed: October 29, 2014
    Publication date: July 19, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Patent number: 9906696
    Abstract: A first magnetic body is arranged between a coil and an image pickup element, and has an opening through which light directed from an imaging optical system toward the image pickup element passes. A second magnetic body is arranged at a position on the coil side with respect to the first magnetic body in an optical axis direction of the imaging optical system. The second magnetic body is arranged such that at least a portion thereof overlaps the first magnetic body when seen in the optical axis direction, at a position on the coil side with respect to the opening. The second magnetic body is made of a ferromagnetic material having higher relative permeability than that of the first magnetic body, and has a smaller area than that of the first magnetic body when seen in the optical axis direction.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: February 27, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventor: Shinichi Nishimura
  • Patent number: 9848484
    Abstract: A power supply apparatus includes a controller that performs the following action. The controller determines a target direct-current electric amount value in accordance with an external input. Then, the controller performs feedback control in such a manner that an amount of direct-current electric power input to an inverter reaches the target direct-current electric amount value.
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: December 19, 2017
    Assignee: Toshiba Misubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro Tabata, Yujiro Okihara, Noriyuki Nakamura, Shinichi Nishimura
  • Patent number: 9806354
    Abstract: To provide a manufacturing method of a membrane electrode assembly which improves the reliability of seal, mechanical strength, and handling ability of a solid polymer type fuel cell. The manufacturing method of a membrane electrode assembly according to the present invention prepares a membrane electrode assembly which differs in size of gas diffusion layers at an anode side and cathode side, provides the outer peripheral edge of the membrane electrode assembly with a resin frame by molding, and, at that time, provides projections or a concave part and convex part at a top mold and bottom mold used for the molding so as to keep to a minimum the penetration of the resin frame material to the gas diffusion layers and/or electrode layers and prevent warping of the outer peripheral edges of the larger gas diffusion layer etc.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: October 31, 2017
    Assignee: W. L. Gore & Associates, Co., Ltd.
    Inventors: Yoichi Suzuki, Tomoya Nomura, Takuya Kosaka, Shinichi Nishimura
  • Publication number: 20170275758
    Abstract: The present invention provides a gas jetting apparatus for a film formation apparatus. The gas jetting apparatus is capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus (100) according to the present invention includes a gas jetting cell unit (23) for rectifying a gas and jetting the rectified gas into the film formation apparatus (200). The gas jetting cell unit (23) has a fan shape internally formed with a gap (d0) serving as a gas route. A gas in a gas dispersion supply unit (99) enters from a wider-width side of the fan shape into the gap (d0), and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus (200).
    Type: Application
    Filed: October 29, 2014
    Publication date: September 28, 2017
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Patent number: 9774775
    Abstract: An imaging apparatus includes a first magnetic core and a first coil wound around the first magnetic core, a second magnetic core and a second coil wound around the second magnetic core, an imaging element provided between the first coil and the second coil, and a magnetic member, wherein the magnetic member includes a first magnetic portion arranged between the first coil and one surface serving as a light-receiving surface side of the imaging element, a second magnetic portion arranged between the second coil and the other surface side opposite to the light-receiving surface side of the imaging element, and a third magnetic portion which connects the first magnetic portion and the second magnetic portion, and wherein the first magnetic portion is arranged so as to face the first magnetic core, and/or the second magnetic portion is arranged so as to face the second magnetic core.
    Type: Grant
    Filed: June 21, 2016
    Date of Patent: September 26, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventor: Shinichi Nishimura
  • Publication number: 20170267525
    Abstract: In an ozone generation apparatus, a discharge cell includes a first electrode part, a second electrode part, and a dielectric partition plate. The first electrode part and the second electrode part face each other, and the dielectric partition plate is provided between the first and second electrode parts.
    Type: Application
    Filed: October 29, 2014
    Publication date: September 21, 2017
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Yujiro OKIHARA, Shinichi NISHIMURA
  • Patent number: 9750121
    Abstract: A power supply apparatus outputs an alternating-current voltage to a plasma generator being a capacitive load and the power supply apparatus has a configuration that a transformer included in the power supply apparatus has a secondary-side magnetizing inductance more than five times as great as a leakage inductance.
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: August 29, 2017
    Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro Tabata, Yujiro Okihara, Noriyuki Nakamura, Shinichi Nishimura
  • Publication number: 20170241021
    Abstract: An electric discharge generator and power supply device of electric discharge generator includes a radical gas generation apparatus, a process chamber apparatus, and an n-phase inverter power supply device. The radical gas generation apparatus is located adjacent to the process chamber apparatus. The radical gas generation apparatus includes a plurality of (n) discharge cells. The n-phase inverter power supply device includes a power supply circuit configuration offering a means to control output of n-phase alternating current voltages and variably controls, according to positions of the plurality of discharge cells, the alternating current voltages of different phases.
    Type: Application
    Filed: October 29, 2014
    Publication date: August 24, 2017
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Patent number: 9713244
    Abstract: A power supply apparatus includes a controller that performs the following action and resonance means for creating a resonance state between the power supply apparatus and a plasma generator. That is, the controller changes, when a value of electric power input equal to 100% (or a value of electric power input equal to or more than a threshold % and equal to or less than 100%) of a rated power is instructed, an inverter frequency and obtains an inverter output power factor for each of a plurality of inverter frequencies. Then, the controller determines, as a driving frequency of the inverter, one of the plurality of inverter frequencies at which the inverter output power factor is maximized.
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: July 18, 2017
    Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro Tabata, Yujiro Okihara, Noriyuki Nakamura, Shinichi Nishimura
  • Patent number: 9640338
    Abstract: When an operation body is urged upward by a flat spring and is in a return position, a projection disposed on the operation body is held between opposing positioning portions and the position of the operation body in an X-direction is set. When the operation body is pressed at a position away from a central portion of the operation body in the X-direction, the operation body pivots on one of retaining structures downward. At this time, the projection moves away from the opposing positioning portions, and resistance against a pressing operation can thereby be reduced.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: May 2, 2017
    Assignee: ALPS ELECTRIC CO., LTD.
    Inventors: Yoshibumi Abe, Zenko Motoki, Minoru Sato, Akira Kabamoto, Jun Taniguchi, Kohei Ishizawa, Shinichi Nishimura, Yukiteru Yano