Abstract: An estimation apparatus acquires stance phases of both feet and estimates a risk of abnormality of a lower limb on the basis of the difference between the stance phases of the both feet.

Abstract: A risk estimation apparatus includes a data acquisition unit that acquires measured data of foot pressures of the left foot and the right foot obtained by sensors that are provided in shoes and measure the foot pressures, a stance phase identification unit that identifies a starting timing and an ending timing of a stance phase of each of the left foot and the right foot from the measured data of the foot pressures, and a risk estimation unit that estimates a risk of abnormality of a lower limb on the basis of asymmetry between the foot pressures of the left foot and the right foot during the stance phase.

Abstract: An estimation apparatus acquires stance phases of both feet and estimates a risk of abnormality of a lower limb on the basis of the difference between the stance phases of the both feet.

Abstract: An estimation apparatus acquires stance phases of both feet and estimates a risk of abnormality of a lower limb on the basis of the difference between the stance phases of the both feet.

Abstract: A risk estimation apparatus includes a data acquisition unit that acquires measured data of foot pressures of the left foot and the right foot obtained by sensors that are provided in shoes and measure the foot pressures, a stance phase identification unit that identifies a starting timing and an ending timing of a stance phase of each of the left foot and the right foot from the measured data of the foot pressures, and a risk estimation unit that estimates a risk of abnormality of a lower limb on the basis of asymmetry between the foot pressures of the left foot and the right foot during the stance phase.

Abstract: A risk estimation apparatus includes a data acquisition unit that acquires measured data of foot pressures of the left foot and the right foot obtained by sensors that are provided in shoes and measure the foot pressures, a stance phase identification unit that identifies a starting timing and an ending timing of a stance phase of each of the left foot and the right foot from the measured data of the foot pressures, and a risk estimation unit that estimates a risk of abnormality of a lower limb on the basis of asymmetry between the foot pressures of the left foot and the right foot during the stance phase.

Abstract: A risk estimation apparatus includes a data acquisition unit that acquires measured data of foot pressures of the left foot and the right foot obtained by sensors that are provided in shoes and measure the foot pressures, a stance phase identification unit that identifies a starting timing and an ending timing of a stance phase of each of the left foot and the right foot from the measured data of the foot pressures, and a risk estimation unit that estimates a risk of abnormality of a lower limb on the basis of asymmetry between the foot pressures of the left foot and the right foot during the stance phase.

Abstract: The present invention facilitates adjustment of the strength of an elastic orthotic that assists the movement of an orthotics user by whom the elastic orthotic is worn. This calculation device for calculating the optimum elastic strength of an elastic includes a storage unit in which elastic strength or kinematic properties established through experiments in which a plurality of people wear elastic orthotics are stored in advance, and a mathematical optimization processing unit that calculates the optimal elastic strength on the basis of a prescribed evaluation index on the basis of the kinematic limitations of an orthotics user and the elastic strength or kinetic properties.

Abstract: An electrochemical device of an embodiment includes: an electrochemical cell including a first electrode having a first flow path, a second electrode having a second flow path, and a separating membrane sandwiched between the first electrode and the second electrode; a gas-liquid separation tank which is connected to the first flow path of the first electrode and to which a product produced at the first electrode and water permeating from the second electrode to the first electrode are sent at an operation time; and a water sealing pipe which is connected to a liquid portion of the gas-liquid separation tank, and to send water in the gas-liquid separation tank to the first flow path of the first electrode at a stop time.

Abstract: An electrochemical reaction device of an embodiment includes: an electrochemical reaction cell 1 that includes: a first electrode having a first flow path, a second electrode having a second flow path, and a separating membrane sandwiched between the first electrode and the second electrode; a liquid tank that contains a liquid to be treated supplied to the second flow path of the second electrode; a first pipe that connects an inlet of the second flow path and the liquid tank; a second pipe that connects an outlet of the second flow path and the liquid tank; and a backflow suppression mechanism that is provided in the second pipe to prevent backflow of the liquid to be treated flowing in the second pipe or reduce a backflow speed.

Abstract: An electrochemical device of an embodiment includes: an electrochemical cell including a first electrode having a first flow path, a second electrode having a second flow path, and a separating membrane sandwiched between the first electrode and the second electrode; a gas-liquid separation tank which is connected to the first flow path of the first electrode and to which a product produced at the first electrode and water permeating from the second electrode to the first electrode are sent at an operation time; and a water sealing pipe which is connected to a liquid portion of the gas-liquid separation tank, and to send water in the gas-liquid separation tank to the first flow path of the first electrode at a stop time.

Abstract: The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).

Abstract: A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.

Abstract: A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.

Abstract: The fan scrubber is provided with a casing having a gas draw-in port and a gas ejection port, a fan disposed in the casing, a nozzle from which a liquid is jetted into the casing, and a canned motor connected to the fan. The canned motor has a main shaft connected to the fan, a rotor which rotates integrally with the main shaft, a stator disposed on the periphery of the rotor, a motor casing in which the rotor and the stator are housed, and a can which partitions the interior of the motor casing into a rotor chamber in which the rotor is disposed and a stator chamber in which the stator is disposed.

Abstract: The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).

Abstract: The fan scrubber is provided with a casing having a gas draw-in port and a gas ejection port, a fan disposed in the casing, a nozzle from which a liquid is jetted into the casing, and a canned motor connected to the fan. The canned motor has a main shaft connected to the fan, a rotor which rotates integrally with the main shaft, a stator disposed on the periphery of the rotor, a motor casing in which the rotor and the stator are housed, and a can which partitions the interior of the motor casing into a rotor chamber in which the rotor is disposed and a stator chamber in which the stator is disposed.

Abstract: A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.

Abstract: A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.

Abstract: A turbo vacuum pump comprising a suction part 23A that sucks gas in an axial direction; a discharge part 50 that discharges the gas sucked by the suction part 23A, the discharge part 50 having a plurality of rotating impellers 70, 80 and a stationary impeller 71 arranged so as to be opposed to each of the plurality of rotating impellers 70, 80; and a rotating shaft 21 that rotates the plurality of rotating impellers 70, 80, wherein the plurality of rotating impellers 70, 80 include at least one stage of a first turbine impeller 70 for discharging the sucked gas in the axial direction, the first turbine impeller 70 being fixed to a suction-part-side end face 15 of the rotating shaft 21, and at least one stage of a second turbine impeller 80 fixed to the rotating shaft 21 that extends through the second turbine impeller 80, the second turbine impeller 80 being arranged downstream of the first turbine impeller 70.