Abstract: The present invention provides an optical amplifying device which can be easily downsized, increased in output, and stabilized. An optical amplifying device 1A includes an optical amplifier 10A and an energy supplier 30. The optical amplifier 10A includes an optical amplifying medium 11 and a transparent medium 12. The energy supplier 30 supplies excitation energy (for example, excitation light) to the optical amplifying medium 11. The optical amplifying medium 11 is supplied with the excitation light to amplify light and output it. To-be-amplified light passes through the transparent medium 12 in the optical amplifying medium 11 a plurality of times. The transparent medium 12 can propagate the to-be-amplified light, for example, zigzag inside.

Abstract: A cylindrical lens (4) diverges a laser beam (L1) in the Y-axis direction (i.e., within the YZ plane) but neither diverges nor converges it in the X-axis direction (i.e., within the ZX plane). An objective lens (5) converges the laser beam (L1) emitted from the cylindrical lens (4) into a point P1 in the Y-axis direction and into a point P2 in the X-axis direction. A pair of knife edges (13) adjust the divergence angle (?) of the laser beam (L1) incident on the objective lens (5) in the Y-axis direction. As a consequence, the cross section of the laser beam (L1) becomes an elongated form extending in the Y-axis direction at the point P2, while the maximum length in the Y-axis direction is regulated. Therefore, locating the point P2 on the front face of a work (S) can form an elongated working area extending in the Y-axis direction by a desirable length on the front face of the work (S).

Abstract: A cylindrical lens (4) diverges a laser beam (L1) in the Y-axis direction (i.e., within the YZ plane) but neither diverges nor converges it in the X-axis direction (i.e., within the ZX plane). An objective lens (5) converges the laser beam (L1) emitted from the cylindrical lens (4) into a point P1 in the Y-axis direction and into a point P2 in the X-axis direction. As a consequence, the cross section of the laser beam (L1) becomes elongated forms extending in the X- and Y-axis directions at the points P1, P2, respectively. Therefore, when the points P1, P2 are located on the outside and inside of the work (S), respectively, an elongated working area extending in the Y-axis direction can be formed in a portion where the point P2 is positioned within the work (S).

Abstract: A single terahertz wave time-waveform measuring device 1 acquires information on an object to be measured 9 by using a terahertz wave, and includes a light source 11, a beam diameter adjuster 12, a separator 13, a terahertz wave generator 21, a light path length difference adjuster 31, a pulse front tilting unit 32, a polarizer 33, a wave synthesizer 41, an electro-optic crystal 42, an analyzer 43, and a photodetector 44. The terahertz wave generator 21 generates a pulse terahertz wave in response to an input of pump light and outputs the pulse terahertz wave. The pulse front tilting unit 32 makes pulse fronts of the terahertz wave and the probe light when being input into the electro-optic crystal 42 nonparallel to each other by tilting the pulse front of the probe light.

Abstract: A total reflection terahertz wave measuring apparatus 1 includes a light source 11, a branching part 12, a chopper 13, an optical path length difference adjusting part 14, a polarizer 15, a beam splitter 17, a terahertz wave generating element 20, a filter 25, an internal total reflection prism 31, a terahertz wave detecting element 40, a ¼ wavelength plate 51, a polarization split element 52, a photodetector 53a, a photodetector 53b, a differential amplifier 54, and a lock-in amplifier 55. The internal total reflection prism 31 is a so-called aplanatic prism, and has an entrance surface 31a, an exit surface 31b, and a reflection surface 31c. The terahertz wave generating element 20 and the filter 25 are provided to be integrated with the entrance surface 31a of the internal total reflection prism 31, and the terahertz wave detecting element 40 is provided to be integrated with the exit surface 31b of the internal total reflection prism 31.

Abstract: A total reflection terahertz wave measuring apparatus 1 is configured to acquire information on a subject S by a total reflection measurement method by use of a terahertz wave, and includes a light source 11, a branching part 12, a chopper 13, an optical path length difference adjusting part 14, a polarizer 15, a separator 17, a terahertz wave generating element 20, an internal total reflection prism 31, a terahertz wave detecting element 40, a ¼ wavelength plate 51, a polarization split element 52, a photodetector 53A, a photodetector 53B, a differential amplifier 54, and a lock-in amplifier 55. The internal total reflection prism 31 is a so-called aplanatic prism, and has an entrance plane 31a, an exit plane 31b, and a reflection plane 31c.

Abstract: A cylindrical lens (4) diverges a laser beam (L1) in the Y-axis direction (i.e., within the YZ plane) but neither diverges nor converges it in the X-axis direction (i.e., within the ZX plane). An objective lens (5) converges the laser beam (L1) emitted from the cylindrical lens (4) into a point P1 in the Y-axis direction and into a point P2 in the X-axis direction. A pair of knife edges (13) adjust the divergence angle (?) of the laser beam (L1) incident on the objective lens (5) in the Y-axis direction. As a consequence, the cross section of the laser beam (L1) becomes an elongated form extending in the Y-axis direction at the point P2, while the maximum length in the Y-axis direction is regulated. Therefore, locating the point P2 on the front face of a work (S) can form an elongated working area extending in the Y-axis direction by a desirable length on the front face of the work (S).

Abstract: A cylindrical lens (4) diverges a laser beam (L1) in the Y-axis direction (i.e., within the YZ plane) but neither diverges nor converges it in the X-axis direction (i.e., within the ZX plane). An objective lens (5) converges the laser beam (L1) emitted from the cylindrical lens (4) into a point P1 in the Y-axis direction and into a point P2 in the X-axis direction. As a consequence, the cross section of the laser beam (L1) becomes elongated forms extending in the X- and Y-axis directions at the points P1, P2, respectively. Therefore, when the points P1, P2 are located on the outside and inside of the work (S), respectively, an elongated working area extending in the Y-axis direction can be formed in a portion where the point P2 is positioned within the work (S).

Abstract: A total reflection terahertz wave measuring apparatus 1 includes a light source 11, a branching part 12, a chopper 13, an optical path length difference adjusting part 14, a polarizer 15, a beam splitter 17, a terahertz wave generating element 20, a filter 25, an internal total reflection prism 31, a terahertz wave detecting element 40, a ¼ wavelength plate 51, a polarization split element 52, a photodetector 53a, a photodetector 53b, a differential amplifier 54, and a lock-in amplifier 55. The internal total reflection prism 31 is a so-called aplanatic prism, and has an entrance surface 31a, an exit surface 31b, and a reflection surface 31c. The terahertz wave generating element 20 and the filter 25 are provided to be integrated with the entrance surface 31a of the internal total reflection prism 31, and the terahertz wave detecting element 40 is provided to be integrated with the exit surface 31b of the internal total reflection prism 31.

Abstract: An optical element 20A which is composed of a light transmission characteristic medium, that has a refractive index higher than a refractive index of air, the optical element causes an incident laser beam to be propagated inside while reflecting the laser beam by a wall surface 20a a plurality of times, the optical element includes an incident window 21 which is located in a part of the wall surface 20a, that is for allowing the laser beam to be incident, an emitting window 22 which is located in a part of the wall surface 20a, that is for allowing the laser beam propagated inside to be emit, and wavelength dispersion compensating units 31 and 32 which are integrally located in parts of the medium, the wavelength dispersion compensating units compensate for wavelength dispersion by causing the laser beam to be transmitted or reflected at least twice.

Abstract: In a grating device (1), a plurality of projections (3) that extend in a predetermined direction and projections (4) that extend in a direction substantially perpendicular to the predetermined direction on both sides of the projections (3) in the predetermined direction and that are connected to the end portions of the projections (3) are formed on the surface (2a) of a substrate (2). Thus, since the projections (3) are highly reinforced by the projections (4), it is possible to prevent the projections (3) of a grating portion (6) from being damaged. Moreover, since the surface (5a) of a substrate (5) is joined to the top portions (3a) and (4a) of the projections (3) and (4), it is possible to prevent the intrusion of particles into the area between the projections (3).

Abstract: A single terahertz wave time-waveform measuring device 1 acquires information on an object to be measured 9 by using a terahertz wave, and includes a light source 11, a beam diameter adjuster 12, a separator 13, a terahertz wave generator 21, a light path length difference adjuster 31, a pulse front tilting unit 32, a polarizer 33, a wave synthesizer 41, an electro-optic crystal 42, an analyzer 43, and a photodetector 44. The terahertz wave generator 21 generates a pulse terahertz wave in response to an input of pump light and outputs the pulse terahertz wave. The pulse front tilting unit 32 makes pulse fronts of the terahertz wave and the probe light when being input into the electro-optic crystal 42 nonparallel to each other by tilting the pulse front of the probe light.

Abstract: A total reflection terahertz wave measuring apparatus 1 is configured to acquire information on a subject S by a total reflection measurement method by use of a terahertz wave, and includes a light source 11, a branching part 12, a chopper 13, an optical path length difference adjusting part 14, a polarizer 15, a separator 17, a terahertz wave generating element 20, an internal total reflection prism 31, a terahertz wave detecting element 40, a ¼ wavelength plate 51, a polarization split element 52, a photodetector 53A, a photodetector 53B, a differential amplifier 54, and a lock-in amplifier 55. The internal total reflection prism 31 is a so-called aplanatic prism, and has an entrance plane 31a, an exit plane 31b, and a reflection plane 31c.

Abstract: The present invention provides an optical amplifying device which can be easily downsized, increased in output, and stabilized. An optical amplifying device 1A includes an optical amplifier 10A and an energy supplier 30. The optical amplifier 10A includes an optical amplifying medium 11 and a transparent medium 12. The energy supplier 30 supplies excitation energy (for example, excitation light) to the optical amplifying medium 11. The optical amplifying medium 11 is supplied with the excitation light to amplify light and output it. To-be-amplified light passes through the transparent medium 12 in the optical amplifying medium 11 a plurality of times. The transparent medium 12 can propagate the to-be-amplified light, for example, zigzag inside.

Abstract: In an imaging apparatus, a detection section 9 detects a beam LF having passed through an aperture 5 in a first direction and a location designation beam LB having passed through the aperture 5 in the opposite direction is made incident to a position (x,y) in a first light image IM1 on an image pickup surface corresponding to a specific position (x,y) in a second light image IM2, whereby the result of detection of the beam LF detected at the detection section 9 indicates data at a specific position in an incoming light image designated by the location designation beam LB, regardless of whether there is a mechanical error in movement of the aperture 5.

Abstract: A light pulse from an ultrashort pulse light source 11 is split by a beam splitter 12 and guided, to a detection medium 4, as an excitation pulse and probe pulse having respective predetermined linearly polarized states by an excitation optical system 2 and probe optical system 3, respectively. A light track region which is generated in the detection medium 4 by incidence of the excitation pulse, and in which the refractive index is changed by a nonlinear optical effect, is irradiated with the probe pulse. Of components which have passed through the detection medium 4, a probe pulse component whose polarized state has changed through the light track region is detected by a camera 53 via an analyzer 51 in a photodetection part 5. This realizes a light track observation apparatus capable of directly observing the light track of an excitation pulse.

Abstract: A fluorescence component that passes through a region of a detection medium where a change in refractive index has been induced through a nonlinear optical effect produced in the detection medium by a gate pulse is observed as a fluorescence image by utilizing a change in polarization state. By observing the change in position of the fluorescence image while correlating with the change over time in the fluorescence, a fluorescence lifetime measuring apparatus is realized with which the change over time in the fluorescence, in particular the fluorescence lifetime, can be measured efficiently with high temporal resolution.

Abstract: The transparent medium processing device comprises: a light control section 2 for performing variable control for the status of the laser beam emitted from the light source section 1, and a light status measurement section 4 for measuring the status of the laser beam inside the processing target TG. The light control section is adjusted based on the output of the light status measurement section so that the status of the laser beam inside the processing target becomes a desired status. Since the status of the laser beam inside the processing target, which is made of such a transparent medium as glass, is measured by the light status measurement section, and is fed back to the light control section, laser processing can be executed while maintaining an optimum status at a processing point inside the processing target.

Abstract: In an imaging apparatus, a detection section 9 detects a beam LF having passed through an aperture 5 in a first direction and a location designation beam LB having passed through the aperture 5 in the opposite direction is made incident to a position (x,y) in a first light image IM1 on an image pickup surface corresponding to a specific position (x,y) in a second light image IM2, whereby the result of detection of the beam LF detected at the detection section 9 indicates data at a specific position in an incoming light image designated by the location designation beam LB, regardless of whether there is a mechanical error in movement of the aperture 5.

Abstract: The transparent medium processing device comprises: a light control section 2 for performing variable control for the status of the laser beam emitted from the light source section 1, and a light status measurement section 4 for measuring the status of the laser beam inside the processing target TG. The light control section is adjusted based on the output of the light status measurement section so that the status of the laser beam inside the processing target becomes a desired status. Since the status of the laser beam inside the processing target, which is made of such a transparent medium as glass, is measured by the light status measurement section, and is fed back to the light control section, laser processing can be executed while maintaining an optimum status at a processing point inside the processing target.