Abstract: When memory cells enter an operation mode which performs only data holding, a control circuit controls the memory cells and an ECC circuit as follows. A plurality of data are read out to generate and store a check bit for error detection and correction. Refreshing is performed in a period within the error occurrence allowable range of an error correcting operation performed by the ECC circuit by using the check bit. Before a normal operation mode is restored from the operation mode which performs only data holding, an error bit of the data is corrected by using the check bit. In an entry/exit period, read/write and an ECC operation are sequentially performed for all the memory cells by a page mode operation. Memory cells connected to a word line which is not accessed by the page mode operation are sequentially activated and refreshed.

Abstract: A semiconductor memory device includes a memory cell array including a plurality of memory blocks, a plurality of redundancy sections respectively provided for the plurality of memory blocks and configured to be substituted for defective memory cells, a test circuit that carries out a test on the memory cell array and outputs defective data, first and second memory circuit that temporarily store the defective data, a first write circuit that writes the defective data alternately in the first and second memory circuits, a first read circuit that reads the defective data alternately from the first and second memory circuits, a plurality of third memory circuits respectively provided for the plurality of memory blocks, that store the defective data, and a second write circuit that writes defective data read by the first read circuit in a third memory circuit corresponding to a memory block in which an error occurred.

Abstract: A semiconductor memory device has a memory cell array in which a plurality of memory cells are arranged and operates in sync with a clock signal. A read and write operations are performed in the same cycle of the clock signal. The read operation allows the read column selection lines that have been designated by a first column address to connect the read data bus to the bit lines. The write operation allows the write column selection lines that have been designated by a second column address to connect the write data bus to the bit lines. Further, in the write operation, the data obtained by combining the data that has been error-corrected by the syndrome generation circuit and correction circuit with the data that has been input to the input circuit is coded by the code generation circuit and written in the memory cells.

Abstract: A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.

Abstract: A semiconductor device includes first and second semiconductor layers and first and second MOS transistors. The first semiconductor layer is provided on and electrically connected to the semiconductor substrate. The second semiconductor layer is provided near the first semiconductor layer and formed above the semiconductor substrate via one of an insulating film and a cavity. The first and second MOS transistors are respectively provided on the first and second semiconductor layers, and each has a gate electrode arranged parallel to a boundary between the first and second semiconductor layers.

Abstract: A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.

Abstract: A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.

Abstract: A semiconductor device includes first and second semiconductor layers and first and second MOS transistors. The first semiconductor layer is provided on and electrically connected to the semiconductor substrate. The second semiconductor layer is provided near the first semiconductor layer and formed above the semiconductor substrate via one of an insulating film and a cavity. The first and second MOS transistors are respectively provided on the first and second semiconductor layers, and each has a gate electrode arranged parallel to a boundary between the first and second semiconductor layers.

Abstract: A semiconductor device includes first and second semiconductor layers and first and second MOS transistors. The first semiconductor layer is provided on and electrically connected to the semiconductor substrate. The second semiconductor layer is provided near the first semiconductor layer and formed above the semiconductor substrate via one of an insulating film and a cavity. The first and second MOS transistors are respectively provided on the first and second semiconductor layers, and each has a gate electrode arranged parallel to a boundary between the first and second semiconductor layers.

Abstract: A plurality of memory macros are laid out in a semiconductor chip. Macro ID generation circuits generate macro IDs for identifying the memory macros, and have different layouts. These macro ID generation circuits are arranged outside the memory macros in the semiconductor chip, so that test control blocks in the memory macros can use the same layouts between all the memory macros to reduce the design load.

Abstract: A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.

Abstract: A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.

Abstract: On a semiconductor substrate, there are formed a first macro cell having wiring layers of three layers each formed of a metal wiring layer (for example, an aluminum wiring) and a second macro cell having wiring layers of three layers each formed of a metal wiring layer similar to the first macro cell. The first macro cell is formed to have a wiring structure of three wiring layers though the originally necessary number of metal wiring layers is two. The metal wiring layer of each layer on the first macro cell is formed of the same material as the metal wiring layer of the corresponding each layer on the second macro cell. Moreover, the metal wiring layer of each layer is formed to have the same film thickness. In order to connect the first and second macro cells to each other, a macro interconnection wiring is formed to be included in the third wiring layer (uppermost wiring layer).

Abstract: On a semiconductor substrate, there are formed a first macro cell having wiring layers of three layers each formed of a metal wiring layer (for example, an aluminum wiring) and a second macro cell having wiring layers of three layers each formed of a metal wiring layer similar to the first macro cell. The first macro cell is formed to have a wiring structure of three wiring layers though the originally necessary number of metal wiring layers is two. The metal wiring layer of each layer on the first macro cell is formed of the same material as the metal wiring layer of the corresponding each layer on the second macro cell. Moreover, the metal wiring layer of each layer is formed to have the same film thickness. In order to connect the first and second macro cells to each other, a macro interconnection wiring is formed to be included in the third wiring layer (uppermost wiring layer).

Abstract: There is provided a memory-embedded semiconductor integrated circuit device capable of being tested in a shorter test time. The memory-embedded semiconductor integrated circuit device includes: a logic part provided on a semiconductor substrate; a memory macro provided on the semiconductor substrate to be consolidated with the logic part; a test input terminal for inputting a test input signal; a test circuit including a test signal generator for generating an output switching signal and a test signal, which serves to carry out a test operation of the memory macro, on the basis of the test input signal, and a switching circuit for selectively outputting one of an output of the memory macro, which has been test-operated by the test signal, and the test input signal in accordance with the output switching signal; and a test output terminal for receiving an output of the switching circuit to output the output of the switching circuit to the outside.

Abstract: In a structure and a designing method of a memory integrated with a logic, a memory macro comprises L memory array blocks 1-1, 1-2, . . . 1-L each including memory cell arrays each with a storage capacity of K bits and sense amplifiers. Memory array power source driver blocks 4-1, 4-2, . . . 4-L each including a circuit for generating a driver power source which drives a sense amplifier are arranged in a corresponding manner to memory array blocks 1-1, 1-2, . . . 1-L. The memory array blocks 1-1, 1-2, . . . 1-L are arranged along a column direction in an adjacent manner to one another and DQ line pairs extending along a column direction are arranged on the memory array blocks 1-1, 1-2, . . . 1-L. Source line blocks 6a-L, 6b-L, 7a, 7b, 8a, 8b are arranged at an end of the memory array blocks in a row direction. According to such a design, short design turnaround for design and shrinkage of occupying area of a memory macro can be realized.

Abstract: Where a first bit line pair comprises a first bit line and a second bit line, a first memory cell is located at an intersection between a selected word line and the first bit line. Where a second bit line pair comprises a third bit line and a fourth bit line, a second memory cell is located at an intersection between the selected word line and the fourth bit line. A data line pair comprises a first data line and a second data line. A first column switch comprises a first transistor connected between the first bit line and the first data line and a second transistor connected between the second bit line and the second data line. A second column switch comprises a third transistor connected between the third bit line and the first data line and a fourth transistor connected between the fourth bit line and the second data line.

Abstract: A delay circuit that delays a signal for controlling data read/write is composed of inverters, capacitors, and switches. The delay time that the delay circuit provides is set by selectively changing over the switches according to the storage capacity of a memory macro. Thus, the delay time most suitable for the storage capacity of the memory macro can be set, which allows the data read/write operation to be speeded up.

Abstract: On a semiconductor substrate, there are formed a first macro cell having wiring layers of three layers each formed of a metal wiring layer (for example, an aluminum wiring) and a second macro cell having wiring layers of three layers each formed of a metal wiring layer similar to the first macro cell. The first macro cell is formed to have a wiring structure of three wiring layers though the originally necessary number of metal wiring layers is two. The metal wiring layer of each layer on the first macro cell is formed of the same material as the metal wiring layer of the corresponding each layer on the second macro cell. Moreover, the metal wiring layer of each layer is formed to have the same film thickness. In order to connect the first and second macro cells to each other, a macro interconnection wiring is formed to be included in the third wiring layer (uppermost wiring layer).

Abstract: The practical operation speed of the memory device is increased by multiplexing input and output signals so as to increase the internal operation frequency higher than the external clock frequency. The feature of the memory device of the present invention is that it has the function of making the internal operation frequency higher than the external clock frequency by making the external bit width larger than the internal bit width, writing write data by dividing them successively by time division operation, into those having an internal bit width, and allocating read data to use an entire external bit width. According to the present invention, the practical operation speed of the memory device assembled on the board can be increased over the upper frequency limit of signals transmitted through the wiring on the board, and the high frequency performance of the memory device can be tested at the step of the die sorting test.