Patents by Inventor Shinji Nagai

Shinji Nagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11272608
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
    Type: Grant
    Filed: April 9, 2021
    Date of Patent: March 8, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Shinji Nagai
  • Publication number: 20210364928
    Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.
    Type: Application
    Filed: August 10, 2021
    Publication date: November 25, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Gota NIIMI, Yoshifumi UENO, Shinji NAGAI
  • Publication number: 20210235571
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
    Type: Application
    Filed: April 9, 2021
    Publication date: July 29, 2021
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Shinji NAGAI
  • Patent number: 11042102
    Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: June 22, 2021
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Takashi Saito
  • Publication number: 20200406341
    Abstract: A continuous casting method includes, conveying a cast slab from a casting mold, stirring a non-solidified portion in the cast slab with a first electromagnetic stirring device, stirring the non-solidified portion with a second electromagnetic stirring device disposed downstream of the first electromagnetic stirring device in a conveyance direction of the cast slab, and subsequently, rolling the cast slab with a reduction roll, in which, the first electromagnetic stirring device alternately imparts the cast slab with electromagnetic force in one direction to cause the non-solidified portion to flow toward one width direction side of the cast slab at a flow rate of at least 5 cm/s, and with electromagnetic force in another direction to cause the non-solidified portion to flow toward another width direction side of the cast slab at a flow rate of at least 5 cm/s.
    Type: Application
    Filed: March 1, 2019
    Publication date: December 31, 2020
    Applicant: NIPPON STEEL CORPORATION
    Inventors: Shinji NAGAI, Toshiaki MIZOGUCHI, Kenji KUBO, Makoto ISHII
  • Patent number: 10820400
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: October 27, 2020
    Assignee: Gigaphoton Inc.
    Inventors: Hiroaki Tomuro, Shinji Nagai, Yoshiyuki Honda
  • Publication number: 20200301285
    Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.
    Type: Application
    Filed: June 5, 2020
    Publication date: September 24, 2020
    Applicant: Gigaphoton Inc.
    Inventors: Shinji NAGAI, Takashi SAITO
  • Patent number: 10764986
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: September 1, 2020
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
  • Publication number: 20200077501
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
    Type: Application
    Filed: November 8, 2019
    Publication date: March 5, 2020
    Applicant: Gigaphoton Inc.
    Inventors: Hiroaki TOMURO, Shinji NAGAI, Yoshiyuki HONDA
  • Patent number: 10532386
    Abstract: A continuous-cast slab is provided where central porosity is reduced by surly crushing the slab. A method and apparatus of manufacturing the slab is also provided. The continuous-cast slab having horizontally symmetrical granular equiaxed crystals at least in the center in the thickness direction includes a first reduction dent and a second reduction dent that further dents from the bottom surface of the first reduction dent and is narrower than the first reduction dent at least on one long side surface. Such a configuration can makes it possible to achieve the continuous-cast slab of no more than 2.5×10?4 cm3/g in a maximum porosity volume while segregation is reduced.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: January 14, 2020
    Assignee: NIPPON STEEL CORPORATION
    Inventors: Toshiaki Mizoguchi, Hiroaki Uchiyama, Hideaki Sakurai, Ryousuke Takata, Shinji Nagai, Shuntaro Imai, Daisuke Sakai
  • Patent number: 10314152
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: June 4, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
  • Patent number: 10268119
    Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: April 23, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Atsushi Ueda, Takashi Saito
  • Patent number: 10136510
    Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: November 20, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Georg Soumagne, Toshihiro Nishisaka
  • Publication number: 20180224748
    Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
    Type: Application
    Filed: April 4, 2018
    Publication date: August 9, 2018
    Applicant: GIGAPHOTON INC.
    Inventors: Shinji NAGAI, Atsushi UEDA, Takashi SAITO
  • Publication number: 20180206671
    Abstract: A liquid cooling device that is capable of efficiently cooling a liquid in the inside of a liquid holding container, and a beverage forming device including the liquid cooling device are provided. The liquid cooling device includes the liquid holding container that has an open portion; a container mounting part on which the liquid holding container is to be mounted; an air passage; and an airflow generating unit. The air passage is located directly above the open portion (4b), and at least a part of an outer periphery of the air passage extends along a peripheral edge of the open portion (4b). The airflow generating unit generates, within the air passage, an airflow flowing along the air passage. A hole portion (33) that communicates with the open portion (4b) is provided in a lower surface of the air passage.
    Type: Application
    Filed: July 22, 2016
    Publication date: July 26, 2018
    Inventors: Masaaki KODAMA, Toshinori OKADA, Daisuke TAKAHASHI, Motoyasu YOSHII, Hitoshi KIJI, Jun GOTO, Shinji NAGAI, Daiki ENDO, Norio KANETSUKI, Yukari MORIOKA
  • Patent number: 10001706
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: June 19, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Shinji Nagai
  • Publication number: 20180140128
    Abstract: A disc-shaped stirring element (100A) includes at least one projecting portion (102) at a position on a lower surface (103a) separated from a rotation center, the projecting portion (102) projecting toward a bottom surface (51a) of a stirring container (51), and an upper surface (103b) of the stirring element (100A) is planar.
    Type: Application
    Filed: May 16, 2016
    Publication date: May 24, 2018
    Inventors: Masaaki KODAMA, Toshinori OKADA, Daisuke TAKAHASHI, Norio KANETSUKI, Shinji NAGAI, Daiki ENDO, Hitoshi KIJI, Motoyasu YOSHII
  • Patent number: 9872372
    Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: January 16, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Shinji Nagai, Yoshifumi Ueno, Tamotsu Abe
  • Publication number: 20180009015
    Abstract: A primary object of the present invention is to provide a continuous-cast slab where central porosity is reduced by surly crushing the slab, and a method and apparatus of manufacturing the same. The continuous-cast slab 1 having horizontally symmetrical granular equiaxed crystals at least in the center in the thickness direction includes a first reduction dent 2 and a second reduction dent 3 that further dents from the bottom surface of the first reduction dent 2 and is narrower than the first reduction dent 2 at least on one long side surface. Such a configuration can makes it possible to achieve the continuous-cast slab 1 of no more than 2.5×10?4 cm3/g in a maximum porosity volume while segregation is reduced.
    Type: Application
    Filed: January 13, 2016
    Publication date: January 11, 2018
    Applicant: NIPPONSTEEL & SUMITOMO METAL CORPORATION
    Inventors: Toshiaki MIZOGUCHI, Hiroaki UCHIYAMA, Hideaki SAKURAI, Ryousuke TAKATA, Shinji NAGAI, Shuntaro IMAI, Daisuke SAKAI
  • Publication number: 20170315446
    Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
    Type: Application
    Filed: July 17, 2017
    Publication date: November 2, 2017
    Applicant: GIGAPHOTON INC.
    Inventors: Atsushi UEDA, Shinji NAGAI