Patents by Inventor Shinji Nagai
Shinji Nagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9872372Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.Type: GrantFiled: December 14, 2016Date of Patent: January 16, 2018Assignee: Gigaphoton Inc.Inventors: Atsushi Ueda, Shinji Nagai, Yoshifumi Ueno, Tamotsu Abe
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Publication number: 20180009015Abstract: A primary object of the present invention is to provide a continuous-cast slab where central porosity is reduced by surly crushing the slab, and a method and apparatus of manufacturing the same. The continuous-cast slab 1 having horizontally symmetrical granular equiaxed crystals at least in the center in the thickness direction includes a first reduction dent 2 and a second reduction dent 3 that further dents from the bottom surface of the first reduction dent 2 and is narrower than the first reduction dent 2 at least on one long side surface. Such a configuration can makes it possible to achieve the continuous-cast slab 1 of no more than 2.5×10?4 cm3/g in a maximum porosity volume while segregation is reduced.Type: ApplicationFiled: January 13, 2016Publication date: January 11, 2018Applicant: NIPPONSTEEL & SUMITOMO METAL CORPORATIONInventors: Toshiaki MIZOGUCHI, Hiroaki UCHIYAMA, Hideaki SAKURAI, Ryousuke TAKATA, Shinji NAGAI, Shuntaro IMAI, Daisuke SAKAI
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Publication number: 20170315446Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.Type: ApplicationFiled: July 17, 2017Publication date: November 2, 2017Applicant: GIGAPHOTON INC.Inventors: Atsushi UEDA, Shinji NAGAI
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Publication number: 20170238407Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.Type: ApplicationFiled: May 1, 2017Publication date: August 17, 2017Applicant: Gigaphoton Inc.Inventors: Shinji NAGAI, Georg SOUMAGNE, Toshihiro NISHISAKA
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Publication number: 20170094767Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.Type: ApplicationFiled: December 14, 2016Publication date: March 30, 2017Applicant: Gigaphoton Inc.Inventors: Atsushi UEDA, Shinji NAGAI, Yoshifumi UENO, Tamotsu ABE
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Publication number: 20170064800Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: November 9, 2016Publication date: March 2, 2017Applicant: GIGAPHOTON INC.Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Publication number: 20170049717Abstract: A drug for treatment of patients having tinnitus associated with sudden hearing loss, comprising neramexane or a pharmaceutically acceptable salt thereof, wherein the morbidity period of the patient having tinnitus associated with sudden hearing loss is 48 months or longer.Type: ApplicationFiled: April 27, 2015Publication date: February 23, 2017Applicant: KYORIN PHARMACEUTICAL CO., LTD.Inventors: Yoshifumi HIRAHARA, Shinji NAGAI, Ai USHIWATA, Ikuyo NIWAYAMA, Koichi WATANABE, Madoka TOMINAGA, Takafumi KUROSE, Shinichi YAMADA, Takehiro SHINOZAKI, Janos CSIKOS, Roman GORTELMEYER, Barbara ELLERS-LENZ, Michael ALTHAUS, Ulli BANKSTAHL
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Publication number: 20170049718Abstract: A drug for treatment of patients having tinnitus associated with age-related hearing loss, comprising neramexane or a pharmaceutically acceptable salt thereof.Type: ApplicationFiled: April 27, 2015Publication date: February 23, 2017Applicant: KYORIN PHARMACEUTICAL CO., LTD.Inventors: Katsumi DOI, Yoshifumi HIRAHARA, Shinji NAGAI, Ai USHIWATA, Ikuyo NIWAYAMA, Koichi WATANABE, Madoka TOMINAGA, Takafumi KUROSE, Shinichi YAMADA, Takehiro SHINOZAKI, Janos CSIKOS, Roman GORTELMEYER
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Publication number: 20170055336Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: November 9, 2016Publication date: February 23, 2017Applicant: GIGAPHOTON INC.Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Patent number: 9510433Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: September 9, 2014Date of Patent: November 29, 2016Assignee: GIGAPHOTON INC.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Patent number: 9465307Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.Type: GrantFiled: May 31, 2013Date of Patent: October 11, 2016Assignee: GIGAPHOTON INC.Inventors: Hakaru Mizoguchi, Shinji Nagai
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Publication number: 20150296604Abstract: An extreme ultraviolet light generation system may include a beam focusing optics configured such that a pre-pulse laser beam and a main pulse laser beam are focused on a plasma generation region, and that a beam path axis of the pre-pulse laser beam and a beam path axis of the main pulse laser beam pass through the plasma generation region at an angle equal to or smaller than a loss-cone angle with respect to a central axis of a magnetic field that is generated by a magnetic field generator. A first laser apparatus and a second laser apparatus may be controlled such that, after a target outputted from a target generation unit has been irradiated with the pre-pulse laser beam in the plasma generation region, the target is irradiated with the main pulse laser beam with a delay time ranging from 0.5 ?s or longer to 7 ?s or shorter.Type: ApplicationFiled: June 3, 2015Publication date: October 15, 2015Inventors: Shinji NAGAI, Takashi SAITO
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Publication number: 20150008345Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: ApplicationFiled: September 9, 2014Publication date: January 8, 2015Inventors: Shinji NAGAI, Tamotsu ABE, Hitoshi NAGANO, Osamu WAKABAYASHI
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Patent number: 8901524Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.Type: GrantFiled: September 11, 2013Date of Patent: December 2, 2014Assignee: Gigaphoton Inc.Inventors: Takeshi Asayama, Kouji Kakizaki, Akira Endo, Shinji Nagai
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Patent number: 8901522Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.Type: GrantFiled: August 2, 2011Date of Patent: December 2, 2014Assignee: Gigaphoton Inc.Inventors: Yoshifumi Ueno, Shinji Nagai, Osamu Wakabayashi
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Patent number: 8902948Abstract: A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.Type: GrantFiled: July 22, 2013Date of Patent: December 2, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Fumika Yoshida, Osamu Wakabayashi, Kouji Kakizaki
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Patent number: 8891574Abstract: A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.Type: GrantFiled: March 21, 2012Date of Patent: November 18, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Fumika Yoshida, Osamu Wakabayashi, Kouji Kakizaki
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Patent number: 8884257Abstract: A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.Type: GrantFiled: July 31, 2012Date of Patent: November 11, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Junichi Fujimoto, Kouji Ashikawa
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Patent number: 8872142Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.Type: GrantFiled: May 17, 2012Date of Patent: October 28, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
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Patent number: 8855167Abstract: A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a <111> axis and a <001> axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their <111> axis.Type: GrantFiled: June 29, 2013Date of Patent: October 7, 2014Assignee: Gigaphoton Inc.Inventors: Shinji Nagai, Fumika Yoshida, Osamu Wakabayashi, Kouji Kakizaki