Patents by Inventor Shun Chen

Shun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10727061
    Abstract: An exemplary method includes forming a hard mask layer over an integrated circuit layer and implanting ions into a first portion of the hard mask layer without implanting ions into a second portion of the hard mask layer. An etching characteristic of the first portion is different than an etching characteristic of the second portion. After the implanting, the method includes annealing the hard mask layer. After the annealing, the method includes selectively etching the second portion of the hard mask layer, thereby forming an etching mask from the first portion of the hard mask layer. The method can further include using the etching mask to pattern the integrated circuit layer.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: July 28, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD
    Inventors: Tsung-Lin Yang, Hua Feng Chen, Kuei-Shun Chen, Min-Yann Hsieh, Po-Hsueh Li, Shih-Chi Fu, Yuan-Hsiang Lung, Yan-Tso Tsai
  • Patent number: 10718928
    Abstract: On embodiment of the invention provides an optical lens includes a lens barrel, a first lens group and a photo interrupter disposed in the lens barrel, a light-shading sheet and a power machine. The photo interrupter has an optical transmitter and an optical receiver, the optical transmitter emits a light beam in a first direction, and the optical receiver receives the light beam. The light-shading sheet is disposed in a propagation path of the light beam and has two shading parts with mutually different lengths. The power machine is linked to a kinetic machine part, and the kinetic machine part is connected to the first lens group.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: July 21, 2020
    Assignee: YOUNG OPTICS INC.
    Inventors: Wen-Zhou Chen, You-Ting Huang, Chao-Shun Chen
  • Publication number: 20200217322
    Abstract: A series-connected fan includes a first fan and a second fan. The first fan includes a first frame, a first base, first static blades and a first impeller. The second fan includes a second frame, a second base, second static blades and a second impeller. A first underframe of the first frame is connected to a second underframe of the second frame. The first static blades are disposed around the first base and connected to the first base and the first underframe. The second static blades are disposed around the second base and connected to the second base and the second underframe. The first impeller includes a first hub and first rotor blades. The second impeller includes a second hub and second rotor blades. The cross-sectional area of the first hub increases along a direction from the top of the first hub to the bottom of the first hub.
    Type: Application
    Filed: October 3, 2019
    Publication date: July 9, 2020
    Inventors: Shun-Chen CHANG, PO-CHENG KUNG
  • Publication number: 20200215812
    Abstract: A three-dimensional printing apparatus includes a container and a projecting structure. The container is configured to contain a liquid photosensitive material. The projecting structure is configured to provide a variety of molding beams to irradiate the liquid photosensitive material. The photoinitiator is suitable for polymerizing with a monomer after receiving the first molding beam with the first wavelength to form a solidified layer with a first color, and the photoinitiator is suitable for polymerizing with the monomer after receiving the second molding beam with the second wavelength to form a solidified layer with a second color, wherein the first color is different from the second color. The projecting structure comprises a light combiner module, disposed on the transmission paths of a variety of light beams. The wavelengths of the first molding beam and the second molding beam are between 355 nm to 415 nm.
    Type: Application
    Filed: March 13, 2020
    Publication date: July 9, 2020
    Inventors: Chao-Shun Chen, Keng-Han Chuang
  • Patent number: 10705828
    Abstract: A method and apparatus for updating an application are disclosed. According to the method, an update tag corresponding to a target application is pushed to a terminal when determining that the target application is required to be updated, the target application being an application downloaded and installed in the background of the terminal. An acquisition request sent by the terminal based on the update tag is received, the acquisition request being used for requesting to acquire target update content corresponding to the target application. The target update content is pushed to the terminal based on the update tag, such that the terminal opens the target application of a latest version by loading the target update content.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: July 7, 2020
    Assignee: Beijing Xiaomi Mobile Software Co., Ltd.
    Inventors: Hongguang Dong, Shun Chen, Wei Tong
  • Publication number: 20200204178
    Abstract: A replaceable key structure includes a key holder and a circuit board. The key holder is disposed above a circuit board. The key holder is formed with a mounting slot for selectively receiving a first key module or a second key module therein. A magnetic sensor and a contact connector are disposed on the circuit board positionally corresponding to the mounting slot of the key holder. The first key module has a shaft, and a magnetic element disposed on the bottom of the shaft. The magnetic sensor can output an analog signal when the magnetic element approaches. The second key module has a trigger switch which has two electrical terminals disposed on the bottom surface of the second key module. When the second key module is installed in the mounting slot, the electrical terminals can be electrically connected to the contact connector.
    Type: Application
    Filed: December 20, 2018
    Publication date: June 25, 2020
    Inventor: YI-SHUN CHEN
  • Publication number: 20200192114
    Abstract: An illumination system is configured to provide an illumination beam. The illumination system includes at least one light source, a composite unit and an actuator. The at least one light source is configured to provide at least one light beam. The composite unit includes a diffusion surface and an optical surface opposite to each other, wherein the composite unit is disposed on a transmission path of the at least one light beam and configured to enable the at least one light beam to pass through. The actuator is connected to the composite unit for driving the composite unit to move along at least one direction, and the at least one direction is perpendicular to a normal direction of a plane on which the composite unit is located. A projection apparatus including the illumination system is also provided.
    Type: Application
    Filed: December 3, 2019
    Publication date: June 18, 2020
    Applicant: Coretronic Corporation
    Inventors: Yu-Shan Chen, Ko-Shun Chen, Ming-Tsung Weng, Chen-Wei Fan
  • Publication number: 20200166047
    Abstract: A fan impeller includes a hub, a shaft, a metal housing, a magnetic ring and a plurality of blades. The outer periphery of the hub has a curved surface. The shaft is disposed in the hub and connected to the hub. The metal housing has an annular shape and is disposed in the hub. The magnetic ring is disposed at the inner side of the metal housing. The blades are disposed around the outer periphery of the hub.
    Type: Application
    Filed: October 3, 2019
    Publication date: May 28, 2020
    Inventors: Shun-Chen CHANG, Chao-Fu YANG
  • Patent number: 10658184
    Abstract: A method for semiconductor manufacturing includes providing a substrate and a patterning layer over the substrate; forming a hole in the patterning layer; applying a first directional etching along a first direction to inner sidewalls of the hole; and applying a second directional etching along a second direction to the inner sidewalls of the hole, wherein the second direction is different from the first direction.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: May 19, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang, Chih-Yuan Ting, Kuei-Shun Chen, Ru-Gun Liu, Wei-Liang Lin, Ya Hui Chang, Yuan-Hsiang Lung, Yen-Ming Chen, Yung-Sung Yen
  • Publication number: 20200150546
    Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.
    Type: Application
    Filed: January 10, 2020
    Publication date: May 14, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi CHUNG, Yung-Cheng CHEN, Fei-Gwo TSAI, Chi-Hung LIAO, Shih-Chi FU, Wei-Ti HSU, Jui-Ping CHUANG, Tzong-Sheng CHANG, Kuei-Shun CHEN, Meng-Wei CHEN
  • Publication number: 20200134250
    Abstract: A semiconductor device includes a first active fin on a substrate; a second active fin on the substrate and separate from the first active fin; and a first fin stub on the substrate, wherein the first fin stub connects a first end of the first active fin and a first end of the second active fin, wherein the fin stub is lower than both the first and the second active fins in height, wherein from a top view the first active fin is oriented lengthwise in a first direction, and the first fin stub is oriented lengthwise in a second direction that is different from the first direction.
    Type: Application
    Filed: December 23, 2019
    Publication date: April 30, 2020
    Inventors: Chung-Ming Wang, Chih-Hsiung Peng, Chi-Kang Chang, Kuei-Shun Chen, Shih-Chi Fu
  • FAN
    Publication number: 20200124051
    Abstract: A fan includes a frame, an impeller and a motor. The frame includes a base, a frame housing and a plurality of static blades. The frame housing includes an outlet. The static blades are disposed around the outer periphery of the base and connect between the base and the frame housing. A distance is provided between the outlet and the ends of the static blades located adjacent to the outlet, and the static blades are not protruding from the outlet. The impeller includes a hub and a plurality of rotor blades. The hub has a curved surface. The slopes of the straight lines connecting any two points on the curved surface are not equal. The rotor blades are disposed around the outer periphery of the hub. The motor is disposed on the base, and connects with and drives the impeller to rotate.
    Type: Application
    Filed: June 10, 2019
    Publication date: April 23, 2020
    Inventors: Shun-Chen CHANG, Chao-Fu YANG
  • Patent number: 10625497
    Abstract: A three-dimensional printing apparatus includes a container and a projecting structure. The container is configured to contain a liquid photosensitive material. The liquid photosensitive material includes a variety of photoinitiators and a monomer. The projecting structure is configured to provide a variety of molding beams to irradiate the liquid photosensitive material. The variety of molding beams have different wavelengths and are used to actuate a polymerization between one of the variety of photoinitiators and the monomer respectively thereby forming a solidified layer. A three-dimensional printing method is also provided.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: April 21, 2020
    Assignee: YOUNG OPTICS INC.
    Inventors: Chao-Shun Chen, Keng-Han Chuang
  • Publication number: 20200116159
    Abstract: An impeller includes a hub and blades. In radial direction, an upper surface of the blade near the outer edge includes a groove structure, a lower surface of the blade relating to the groove structure includes a peak structure, the lower surface of the blade includes a recess structure aside the trailing edge or the leading edge. The recess structure is connected to the peak structure. The blade has at least five airfoils from the inner edge to the outer edge. The blade is defined by continuously connecting the at least five airfoils at different sections in sequence so as to form the groove structure and the peak structure respectively on the upper surface and the lower surface. The groove structure and the peak structure are aside the outer edge of the blade.
    Type: Application
    Filed: December 11, 2019
    Publication date: April 16, 2020
    Inventors: Chao-Fu YANG, Li-Han HUNG, Jen-Bo HUANG, Shun-Chen CHANG, Kuo-Tung HSU
  • Publication number: 20200086626
    Abstract: A three-dimensional printing apparatus includes a liquid tank capable of accommodating a photosensitive liquid. The liquid tank includes a film, a plurality of side walls, a plate and a motor. The film has a workpiece curing area. The plurality of side walls surrounds the film. The plate is capable of supporting the film and having at least one fluid tunnel extending from a first surface of the plate contacting the film to a second surface of the plate. The motor is connected to the liquid tank to incline the liquid tank. A gap is formed between the plat and one of the plurality of side walls of the liquid tank, and the film is communicated with an outside space via the gap.
    Type: Application
    Filed: November 25, 2019
    Publication date: March 19, 2020
    Inventors: Li-Han Wu, Chien-Hsing Tsai, Chao-Shun Chen, Tsung-Yu Liu
  • Publication number: 20200058595
    Abstract: A method for forming a semiconductor device structure is provided. The method includes forming a first overlay grating over a substrate. The method includes forming a layer over the first overlay grating. The method includes forming a second overlay grating over the layer. The second overlay grating has a third strip portion and a fourth strip portion, the third strip portion and the fourth strip portion are elongated in the first elongated axis and are spaced apart from each other, there is a second distance between a third sidewall of the third strip portion and a fourth sidewall of the fourth strip portion, the third sidewall faces away from the fourth strip portion, the fourth sidewall faces the third strip portion, the first distance is substantially equal to the second distance, and the first trench extends across the third strip portion and the fourth strip portion.
    Type: Application
    Filed: October 24, 2019
    Publication date: February 20, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Long-Yi CHEN, Jia-Hong CHU, Chi-Wen LAI, Chia-Ching LIANG, Kai-Hsiung CHEN, Yu-Ching WANG, Po-Chung CHENG, Hsin-Chin LIN, Meng-Wei CHEN, Kuei-Shun CHEN
  • Publication number: 20200058762
    Abstract: In a method of manufacturing a semiconductor device, a layout is prepared. The layout includes active region patterns, each of the active region patterns corresponding to one or two fin structures, first fin cut patterns and second fin cut patterns. At least one pattern selected from the group consisting of the first fin cut patterns and the second fin cut patterns has a non-rectangular shape. The layout is modified by adding one or more dummy active region patterns and by changing the at least one pattern to be a rectangular pattern. Base fin structures are formed according to a modified layout including the active region patterns and the dummy active region patterns. Part of the base fin structures is removed according to one of a modified layout of the first fin cut patterns and a modified layout of the second fin cut patterns.
    Type: Application
    Filed: July 10, 2019
    Publication date: February 20, 2020
    Inventors: Chi-Wen HSIEH, Chien-Ping HUNG, Chi-Kang CHANG, Shih-Chi FU, Kuei-Shun CHEN
  • Patent number: 10564958
    Abstract: A method and apparatus for updating an application are disclosed. According to the method, an update tag corresponding to a target application is pushed to a terminal when determining that the target application is required to be updated, the target application being an application downloaded and installed in the background of the terminal. An acquisition request sent by the terminal based on the update tag is received, the acquisition request being used for requesting to acquire target update content corresponding to the target application. The target update content is pushed to the terminal based on the update tag, such that the terminal opens the target application of a latest version by loading the target update content.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: February 18, 2020
    Assignee: Beijing Xiaomi Mobile Software Co., Ltd.
    Inventors: Hongguang Dong, Shun Chen, Wei Tong
  • Patent number: 10556353
    Abstract: A robot arm control device includes a pressure sensing module, a workspace defining module and a control module. The pressure sensing module, arranged on a robot arm, detects whether an object hits or touches the robot arm to switch the operating mode of the robot arm. The workspace defining module includes a sensing region arranged on a peripheral area around the robot arm. The workspace defining module determines whether the object enters an operating space according to the position of the object in the sensing region, and sets the working range and the working mode of the robot arm according to which operating space the object has entered. The control module, connected to the robot arm, the pressure sensing module and the workspace defining module, switches the operating mode and outputs a motor driving signal to the robot arm according to the working mode of the robot arm.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: February 11, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jui-Yiao Su, Yan-Chen Liu, Chang-Yi Chen, Ching-Shun Chen, Wen-Ching Ko, Hung-Hsiu Yu, Jwu-Sheng Hu
  • Patent number: 10557476
    Abstract: A mixed-flow fan includes a base including a bottom channel, an outer cover disposed on the base, a motor disposed on the base, a hub located between the outer case and the motor, and a blade connected to the hub. A main channel is formed between the outer cover and the hub, and is connected to the bottom channel. The main channel extends in the first direction, and the bottom channel extends in the second direction.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: February 11, 2020
    Assignee: DELTA ELECTRONICS, INC.
    Inventors: Shih-Di Chen, Shun-Chen Chang