Patents by Inventor Shunichi Suzuki

Shunichi Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8731131
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: May 20, 2014
    Assignees: Kabushiki Kaisha Toshiba, Ishikawajima-Harima Heavy Industries Co., Ltd., The Tokyo Electric Power Company, Incorporated
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Patent number: 8681925
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: March 25, 2014
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8637960
    Abstract: A nitride semiconductor substrate is provided in which leak current reduction and improvement in current collapse are effectively attained when using Si single crystal as a base substrate. The nitride semiconductor substrate is such that an active layer of a nitride semiconductor is formed on one principal plane of a Si single crystal substrate through a plurality of buffer layers made of a nitride, in the buffer layers, a carbon concentration of a layer which is in contact with at least the active layer is from 1×1018 to 1×1020 atoms/cm3, a ratio of a screw dislocation density to the total dislocation density is from 0.15 to 0.3 in an interface region between the buffer layer and the active layer, and the total dislocation density in the interface region is 15×109 cm?2 or less.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: January 28, 2014
    Assignee: Covalent Material Corporation
    Inventors: Yoshihisa Abe, Jun Komiyama, Hiroshi Oishi, Akira Yoshida, Kenichi Eriguchi, Shunichi Suzuki
  • Patent number: 8524476
    Abstract: A method for manufacturing a product of a reaction catalyzed by a protein having 2-oxoglutarate-dependent enzyme activity such as (2S,3R,4S)-4-hydroxy-L-isoleucine or a salt thereof using a bacterium transformed with a DNA fragment containing a gene coding for a protein having 2-oxoglutarate-dependent enzyme activity such as L-isoleucine dioxygenase activity; and wherein said bacterium has the ability to produce a product such as (2S,3R,4S)-4-hydroxy-L-isoleucine.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: September 3, 2013
    Assignee: Ajinomoto Co., Inc.
    Inventors: Sergey Vasilievich Smirnov, Natalia Nikolaevna Samsonova, Veronika Aleksandrovna Kotliarova, Natalia Yurievna Rushkevich, Olga Sergeevna Beznoschenko, Tatyana Aleksandrovna Bachina, Yuki Imabayashi, Masakazu Sugiyama, Shunichi Suzuki
  • Patent number: 8518665
    Abstract: It is an object of the present invention to provide a procedure for realizing inexpensive and simple production of 3-indole-pyruvic acid. A transformant is made using a polynucleotide having a specific nucleotide sequence encoding a protein having an oxidase activity, and oxidase is generated by culturing the transformant in a medium to accumulate the oxidase in the medium and/or the transformant. Further, tryptophan is converted into 3-indole-pyruvic acid in the presence of the transformant and/or a culture thereof to produce 3-indole-pyruvic acid.
    Type: Grant
    Filed: November 26, 2012
    Date of Patent: August 27, 2013
    Assignee: Ajinomoto Co., Inc.
    Inventors: Yasuaki Takakura, Seiichi Hara, Toshiki Taba, Shunichi Suzuki, Masakazu Sugiyama, Kunihiko Watanabe, Kenzo Yokozeki
  • Patent number: 8460902
    Abstract: The present invention provides a method of producing optically active amino acids from 5-substituted hydantoin by isolating a hydantoinase gene and an N-carbamyl-L-amino acid hydrolase gene involved in an ability to convert 5-substituted hydantoin or N-carbamylamino acid into optically active amino acids from a microorganism of the genus Microbacterium having the above ability and by improving gene amplification and transcriptional and translational activities thereby preparing a recombinant wherein the amount of the desired enzymes produced is increased. The hydantoinase gene is, for example, a DNA encoding for a protein having a hydantoinase activity, which has the nucleotide sequence of SEQ ID NO:1. The N-carbamyl-L-amino acid hydrolase gene is, for example, a DNA encoding for a protein having an N-carbamyl-L-amino acid hydrolase activity, which has the nucleotide sequence of SEQ ID NO:3.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: June 11, 2013
    Assignee: Ajinomoto Co., Inc.
    Inventors: Yasuhiro Takenaka, Shunichi Suzuki, Norimasa Onishi, Kenzo Yokozeki
  • Publication number: 20130084610
    Abstract: It is an object of the present invention to provide a procedure for realizing inexpensive and simple production of 3-indole-pyruvic acid. A transformant is made using a polynucleotide having a specific nucleotide sequence encoding a protein having an oxidase activity, and oxidase is generated by culturing the transformant in a medium to accumulate the oxidase in the medium and/or the transformant. Further, tryptophan is converted into 3-indole-pyruvic acid in the presence of the transformant and/or a culture thereof to produce 3-indole-pyruvic acid.
    Type: Application
    Filed: November 26, 2012
    Publication date: April 4, 2013
    Inventors: Yasuaki TAKAURA, Seiichi Hara, Toshiki Taba, Shunichi Suzuki, Masakazu Sugiyama, Kunihiko Watanabe, Kenzo Yokozeki
  • Publication number: 20130070888
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 21, 2013
    Applicants: KABUSHIKI KAISHA TOSHIBA, THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD.
    Inventors: Seiji YAMAMOTO, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Patent number: 8394940
    Abstract: It is an object of the present invention to provide a procedure for realizing inexpensive and simple production of 3-indole-pyruvic acid. A transformant is made using a polynucleotide having a specific nucleotide sequence encoding a protein having an oxidase activity, and oxidase is generated by culturing the transformant in a medium to accumulate the oxidase in the medium and/or the transformant. Further, tryptophan is converted into 3-indole-pyruvic acid in the presence of the transformant and/or a culture thereof to produce 3-indole-pyruvic acid.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: March 12, 2013
    Assignee: Ajinomoto Co., Inc.
    Inventors: Yasuaki Takakura, Seiichi Hara, Toshiki Taba, Shunichi Suzuki, Masakazu Sugiyama, Kunihiko Watanabe, Kenzo Yokozeki
  • Patent number: 8372607
    Abstract: The present invention describes a method for generating a serine derivative and an optically active isomer thereof by a convenient technique, and an enzyme and the like useful in the method. In the presence of the following protein (A) and/or (B) having an enzymatic activity, an ?-amino acid is reacted with an aldehyde to form a serine derivative: (A) a protein comprising the amino acid sequence of SEQ ID NO:5, and (B) a protein comprising an amino acid sequence of SEQ ID NO: 5, but which includes substitution, deletion, insertion and addition of one or more amino acids and is able to catalyze the reaction to form the serine derivative.
    Type: Grant
    Filed: July 15, 2010
    Date of Patent: February 12, 2013
    Assignee: Ajinomoto Co., Inc.
    Inventors: Shinji Kuroda, Masakazu Sugiyama, Kunihiko Watanabe, Shunichi Suzuki, Kenzo Yokozeki, Tatsuki Kashiwagi
  • Patent number: 8320514
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: November 27, 2012
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8295426
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: October 23, 2012
    Assignees: Kabushiki Kaisha Toshiba, Ishikawajima-Harima Heavy Industries Co., Ltd., The Tokyo Electric Power Company, Incorporated
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Publication number: 20120263269
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Application
    Filed: December 10, 2004
    Publication date: October 18, 2012
    Applicants: Kabushiki Kaisha Toshiba, THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Ishikawajima-Harima Heavy Industries Co., Ltd.
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Publication number: 20120211763
    Abstract: A nitride semiconductor substrate suitable for a normally-off type high breakdown-voltage device and a method of manufacturing the substrate are provided allowing both a higher threshold voltage and improvement in current collapse. In a nitride semiconductor substrate 10 having a substrate 1, a buffer layer 2 formed on one principal plane of the substrate 1, an intermediate layer 3 formed on the buffer layer 2, an electron transport layer 4 formed on the intermediate layer 3, and an electron supply layer 5 formed on the electron transport layer 4, the intermediate layer 3 has a thickness of 200 nm to 1500 nm and a carbon concentration of 5×1016 atoms/cm3 to 1×1018 atoms/cm3 and is of AlxGa1-xN (0.05?x?0.24), and the electron transport layer 4 has a thickness of 5 nm to 200 nm and is of AlyGa1-yN (0?y?0.04).
    Type: Application
    Filed: January 18, 2012
    Publication date: August 23, 2012
    Applicant: COVALENT MATERIALS CORPORATION
    Inventors: Akira Yoshida, Jun Komiyama, Yoshihisa Abe, Hiroshi Oishi, Kenichi Eriguchi, Shunichi Suzuki
  • Patent number: 8212288
    Abstract: A compound semiconductor substrate which inhibits the generation of a crack or a warp and is preferable for a normally-off type high breakdown voltage device, arranged that a multilayer buffer layer 2 in which AlxGa1-xN single crystal layers (0.6?X?1.0) 21 containing carbon from 1×1018 atoms/cm3 to 1×1021 atoms/cm3 and AlyGa1-yN single crystal layers (0.1?y?0.5) 22 containing carbon from 1×1017 atoms/cm3 to 1×1021 atoms/cm3 are alternately and repeatedly stacked in order, and a nitride active layer 3 provided with an electron transport layer 31 having a carbon concentration of 5×1017 atoms/cm3 or less and an electron supply layer 32 are deposited on a Si single crystal substrate 1 in order. The carbon concentrations of the AlxGa1-xN single crystal layers 21 and that of the AlGa1-yN single crystal layers 22 respectively decrease from the substrate 1 side towards the above-mentioned active layer 3 side. In this way, the compound semiconductor substrate is produced.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: July 3, 2012
    Assignee: Covalent Materials Corporation
    Inventors: Jun Komiyama, Kenichi Eriguchi, Hiroshi Oishi, Yoshihisa Abe, Akira Yoshida, Shunichi Suzuki
  • Publication number: 20120128111
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato OKAMURA, Tetsuo OOSATO, Seiji YAMAMOTO, Tadasu YOTSUYANAGI, Nagayoshi ICHIKAWA, Kenji YAMAZAKI, Junichi TAKAGI, Hidehiro URATA, Shunichi SUZUKI, Kenro TAKAMORI, Junichi SUZUKI
  • Publication number: 20120128886
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8172959
    Abstract: There are provided an austenitic stainless steel having high stress corrosion crack resistance, characterized by containing, in percent by weight, 0.030% or less C, 0.1% or less Si, 2.0% or less Mn, 0.03% or less P, 0.002% or less S, 11 to 26% Ni, 17 to 30% Cr, 3% or less Mo, and 0.01% or less N, the balance substantially being Fe and unavoidable impurities; a manufacturing method for an austenitic stainless steel, characterized in that a billet consisting of the said austenitic stainless steel is subjected to solution heat treatment at a temperature of 1000 to 1150° C.; and a pipe and a in-furnace structure for a nuclear reactor to which the said austenitic stainless steel is applied.
    Type: Grant
    Filed: January 13, 2005
    Date of Patent: May 8, 2012
    Assignees: Mitsubishi Heavy Industries, Ltd., The Tokyo Electric Power Company, Inc.
    Inventors: Yasuhiro Sakaguchi, Toshihiko Iwamura, Hiroshi Kanasaki, Hidehito Mimaki, Masaki Taneike, Shunichi Suzuki, Kenrou Takamori, Suguru Ooki, Naoki Anahara, Naoki Hiranuma, Toshio Yonezawa
  • Patent number: 8148753
    Abstract: The present invention provides a compound semiconductor substrate, including: a single-crystal silicon substrate having a crystal face with (111) orientation; a first buffer layer which is formed on the single-crystal silicon substrate and is constituted of an AlxGa1-xN single crystal (0<x?1); a second buffer layer which is formed on the first buffer layer and is composed of a plurality of first unit layers each having a thickness of from 250 nm to 350 nm and constituted of an AlyGa1-yN single crystal (0?y<0.1) and a plurality of second unit layers each having a thickness of from 5 nm to 20 nm and constituted of an AlzGa1-zN single crystal (0.9<z?1), said pluralities of first and second unit layers having been alternately superposed; and a semiconductor device formation region which is formed on the second buffer layer and includes at least one nitride-based semiconductor single-crystal layer.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: April 3, 2012
    Assignee: Covalent Materials Corporation
    Inventors: Hiroshi Oishi, Jun Komiyama, Kenichi Eriguchi, Yoshihisa Abe, Akira Yoshida, Shunichi Suzuki
  • Publication number: 20110262962
    Abstract: The present invention provides a method for producing a peptide, comprising culturing a transformant introduced with an expression vector to prepare a culture, and mixing the culture with a carboxy component and an amine component to form the peptide. The expression vector comprises a polynucleotide encoding a protein: (A) having selected deletions in the amino acid sequence of SEQ ID NO:2, (B) having a mutation of one or several amino acid residues in any protein selected from said group (A); (C) having 70% or more amino acid sequence identity to any protein selected from said group (A), (D) encoded by a polynucleotide that hybridizes under a stringent condition with a polynucleotide consisting of a nucleotide sequence complementary to a polynucleotide encoding any protein selected from said group (A), and (E) encoded by a polynucleotide having 70% or more nucleotide sequence identity to the polynucleotide encoding any protein selected from the group (A).
    Type: Application
    Filed: April 15, 2011
    Publication date: October 27, 2011
    Applicant: AJINOMOTO CO., INC.
    Inventors: ISAO ABE, NOBUHIRO HIRATSUKA, SONOKO TAKEUCHI, SHUNICHI SUZUKI, KENZO YOKOZEKI