Abstract: A power module system for a vehicle includes a circuit board, a power transistor mounted to the circuit board, and a temperature sensor mounted to the circuit board in a sensing location remote from the power transistor. The temperature sensor is configured to measure a real-time temperature at the sensing location. The system also includes a processor coupled to the temperature sensor to generate a predicted real-time silicon temperature for the power transistor from the measured real-time temperature at the sensing location. The predicted real-time silicon temperature is generated using a selected calibration curve that corresponds to a current operating state of the vehicle.

Abstract: A system for managing collateral allocations in Tri-Party repurchasing agreement(s) includes memory element(s) coupled to processor(s) and configured to store deal attributes including rule sets associated with a lender l, and collateral characteristic(s) for collateral provided by the borrower b that are associated with each of the Tri-Party repurchasing agreements. The system includes at least one collateral allocation module, configured through the processor(s) to optimize auto cash, an amount short, a cost of carry index, and optimize a collateralization index, associated with the Tri-Party repurchasing agreement(s). A similar system includes at least one collateral allocation module, configured through the processor(s) to optimize a settlement index, a collateralization index, and a cost of carry index, associated with the Tri-Party repurchasing agreement(s). Associated methods are also disclosed.

Abstract: The present invention relates to a device with portions of the device on plural substrate surfaces. The device includes a low resistivity substrate having first and second surfaces with a first electrically-conductive device component disposed over a first surface. An intermediate electrically-insulating layer may be disposed between the electrically-conductive component and the low resistivity substrate. A second electrically-conductive component is disposed over the second surface of the low resistivity substrate. A cavity formed in the low resistivity substrate is at least partially filled with a high resistivity material. One or more electrically-conducting pathways are formed in the high resistivity material electrically connecting the first electrically conductive component and the second electrically-conductive component to form a device. Exemplary devices include inductors, capacitors, antennas and active or passive devices incorporating such devices.

Abstract: A resistive memory device is provided that includes a barrier layer in between two metal oxide layers. The barrier layer prevents free flow of oxygen ions between the two metal oxide layers in order to increase the retention period for the data stored in the memory device.

Abstract: A power module system for a vehicle includes a circuit board, a power transistor mounted to the circuit board, and a temperature sensor mounted to the circuit board in a sensing location remote from the power transistor. The temperature sensor is configured to measure a real-time temperature at the sensing location. The system also includes a processor coupled to the temperature sensor to generate a predicted real-time silicon temperature for the power transistor from the measured real-time temperature at the sensing location. The predicted real-time silicon temperature is generated using a selected calibration curve that corresponds to a current operating state of the vehicle.

Abstract: A one time programmable nonvolatile memory formed from metal-insulator-semiconductor cells. The cells are at the crosspoints of conductive gate lines and intersecting doped semiconductor lines formed in a semiconductor substrate.

Abstract: A memory device includes a cell stack and a select gate formed adjacent to the cell stack. The cell stack includes a tunneling dielectric layer, a charge storage layer, a blocking dielectric layer, and a control gate. Applying a positive bias to the control gate, the select gate and the source of the device injects negative charges from a channel region of a substrate by hot electron injection through the tunneling dielectric layer at a location near a gap between the select gate and the control gate into the charge storage layer to store negative charges in the charge storage layer. Applying a negative bias to the control gate directly tunnels positive charges from the channel region of the substrate through the tunneling dielectric layer and into the charge storage layer to store positive charges in the charge storage layer.

Abstract: A one time programmable nonvolatile memory formed from metal-insulator-semiconductor cells. The cells are at the crosspoints of conductive gate lines and intersecting doped semiconductor lines formed in a semiconductor substrate.

Abstract: Charge-trapping dielectric (160) in a nonvolatile memory cell is recessed from under the control gate's edge and/or from an edge of a substrate isolation region. The recessed geometry serves to reduce or eliminate charge trapping in regions from which the charge may be difficult to erase.

Abstract: Charge-trapping dielectric (160) in a nonvolatile memory cell is recessed from under the control gate's edge and/or from an edge of a substrate isolation region. The recessed geometry serves to reduce or eliminate charge trapping in regions from which the charge may be difficult to erase.

Abstract: A floating gate memory cell's channel region (104) is at least partially located in a fin-like protrusion (110P) of a semiconductor substrate. The floating gate's top surface may come down along at least two sides of the protrusion to a level below the top (110P-T) of the protrusion. The control gate's bottom surface may also comes down to a level below the top of the protrusion. The floating gate's bottom surface may comes down to a level below the top of the protrusion by at least 50% of the protrusion's height. The dielectric (120) separating the floating gate from the protrusion can be at least as thick at the top of the protrusion as at a level (L2) which is below the top of the protrusion by at least 50% of the protrusion's height. A very narrow fin or other narrow feature in memory and non-memory integrated circuits can be formed by providing a first layer (320) and then forming spacers (330) from a second layer without photolithography on sidewalls of features made from the first layer.

Abstract: Substrate isolation regions (570) initially protrude upward above a semiconductor substrate (520) but are later etched down. Before they are etched down, floating gate layer (590) is deposited and etched or polished off the top surfaces of the substrate isolation regions. The floating gate layer thus has upward protrusions overlying sidewalls of the substrate isolation regions. When the substrate isolation regions are etched down, the floating gate layer's upward protrusions' outer sidewalls become exposed. The upward protrusions serve to increase the capacitance between the floating and control gates. The floating gates' bottom surfaces are restricted to the active areas (564) not to overlie the substrate isolation regions. Other features are also provided.

Abstract: A method for forming very small isolated dots of a target material, e.g., a ferromagnetic material or phase change material, on a substrate includes providing a substrate having a layer of the target material disposed on a surface thereof, etching the layer of target material so as to form a plurality of lines of the material on the surface of the substrate, and etching the lines of the target material so as to form a rectangular matrix of substantially similar, very small isolated dots of the target material on the substrate. By the successive formation of orthogonally intersecting linear patterns on the substrate, including the formation and use of “hard” etch masks, spacer approach and selective etching techniques, the method enables very small (<65 nm) isolated dots of the target material to be formed on the substrate reliably and with the use of conventional 193 nm wavelength photolithographic methods and apparatus.

Abstract: Disclosed is a safe guidance method and Global Navigation Satellite System device thereof. The safe guidance method comprises steps: obtaining at least one caution zone from a map database of the Global Navigation Satellite System device; and playing a notification when approaching the caution zone according to a notifying rule. The safe guidance method further comprises a step of defining the caution zone before the step of obtaining the caution zone and a step of playing a warning after entering the caution zone. Furthermore, the notifying rule defines a distance near the caution zone for playing the notification. A user of the Global Navigation Satellite System device can define the caution zone and predetermine the aforesaid distance before the user travels on the road. The notification and the warning can be voice hints or image hints.

Abstract: Charge-trapping dielectric (160) in a nonvolatile memory cell is recessed from under the control gate's edge and/or from an edge of a substrate isolation region. The recessed geometry serves to reduce or eliminate charge trapping in regions from which the charge may be difficult to erase.

Abstract: A memory device having a cell stack and a select gate formed adjacent to the cell stack. The cell stack includes a first trap-free-nitride layer formed on a channel region of a substrate, a second nitride layer formed on the first nitride layer, an oxide layer formed on the second nitride layer, a control gate formed on the high-K oxide layer, and a poly spacer as the select gate formed adjacent to the control gate.

Abstract: Charge-trapping dielectric (160) in a nonvolatile memory cell is recessed from under the control gate's edge and/or from an edge of a substrate isolation region. The recessed geometry serves to reduce or eliminate charge trapping in regions from which the charge may be difficult to erase.

Abstract: The present disclosure provides a memory device having a cell stack and a select gate formed adjacent to the cell stack. The cell stack includes a tunneling dielectric layer, a charge storage layer, a blocking dielectric layer, a tantalum-nitride layer, and a control gate layer. When a positive bias is applied to the control gate and the select gate, negative charges are injected from a channel region of a substrate through the tunneling dielectric layer and into the charge storage layer to thereby store the negative charges in the charge storage layer. When a negative bias is applied to the control gate, negative charges are tunneled from the charge storage layer to the channel region of the substrate through the tunneling dielectric layer.

Abstract: A memory device includes a cell stack and a select gate formed adjacent to the cell stack. The cell stack includes a tunneling dielectric layer, a charge storage layer, a blocking dielectric layer, and a control gate. Applying a positive bias to the control gate, the select gate and the source of the device injects negative charges from a channel region of a substrate by hot electron injection through the tunneling dielectric layer at a location near a gap between the select gate and the control gate into the charge storage layer to store negative charges in the charge storage layer. Applying a negative bias is to the control gates directly tunnels positive charges from the channel region of the substrate through the tunneling dielectric layer and into the charge storage layer to store positive charges in the charge storage layer.

Abstract: In a NAND-type nonvolatile reprogrammable memory array, inter-cell coupling resistance between adjoining memory cells is reducing by forming metal silicide insets embedded in the diffusion zone of the inter-cell coupling region. The diffusion zone includes a shallow implant region and a deep implant region. In one embodiment, the shallow implant region defines shallow source/drain regions for floating gate transistors of the memory cells. The size of the metal silicide insets are controlled to not compromise isolation PN junctions defined by the shallow and deep implant region. In one embodiment, the metal silicide insets include nickel.