Abstract: A decoration element is described. The decoration element includes a light reflective layer; a light absorbing layer provided on the light reflective layer; and a color developing layer comprising a color film, wherein the color developing layer is provided: on a surface of the light reflective layer opposite to a surface of the light reflective layer facing the light absorbing layer; between the light reflective layer and the light absorbing layer; or on a surface of the light absorbing layer opposite to a surface of the light absorbing layer facing the light reflective layer.

Abstract: Provided is yarn for a cell culture scaffold. The yarn for a cell culture scaffold according to an exemplary embodiment of the present invention includes slitting yarn produced by cutting a compressed nanofiber web to a predetermined width. Accordingly, by creating microenvironments suitable for migration, proliferation and differentiation of cells, cell viability may be enhanced and cells may be three-dimensionally proliferated. In addition, a scaffold according to the present invention has a mechanical strength sufficient for prevention of disruption of the scaffold which occurs during cell culture, such that cells may be stably proliferated. Further, the scaffold according to the present invention uses slitting yarn formed of the compressed nanofiber web, thereby having pores with various sizes, and therefore cell proliferation and cell viability may be enhanced by creation of an extracellular matrix-like environment.

Abstract: The present specification relates to a conductive structure body, a method for manufacturing the same, and an electrode and an electronic device including the conductive structure body.

Abstract: The present application relates to a decoration member including a substrate layer having a convex structure or a concave structure arranged two-dimensionally, and a method for preparing the decoration member.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light absorbing layer has surface resistance of 20 ohm/square or greater.

Abstract: A decoration element including: a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on a surface of the color developing layer. The substrate comprises a pattern layer, and the light absorbing layer comprises an aluminum oxynitride (AlaObNc).

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; a light absorbing layer provided on the light reflective layer; and a color developing layer comprising a color film provided on a surface opposite to the surface facing the light absorbing layer of the light reflective layer, between the light reflective layer and the light absorbing layer, or on a surface opposite to the surface facing the light reflective layer of the light absorbing layer.

Abstract: The present disclosure relates to a method for manufacturing a film for a decoration element, the method including depositing two or more islands on one surface of a film; and forming a pattern portion by dry etching the film using the island as a mask.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer, and a light absorbing layer provided on the light reflective layer and comprising Si.

Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the etch substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer is a discontinuous film.

Abstract: An electrochromic film, which is a reflective electrochromic film, which includes an electrode layer, a light absorbing layer and an electrochromic layer. The film can improve an electrochromism rate and realize various colors or esthetic senses.

Abstract: The disclosed relates to a decoration element and a method for preparing the decoration element. The decoration element has dichroism expressing different colors depending on a viewing direction, and has improved visibility of the dichroism.

Abstract: The present disclosed relates to a decoration element and a method for preparing the decoration element. decoration element has dichroism expressing different colors depending on a viewing direction, and has improved visibility of the dichroism.

Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.

Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.

Abstract: A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.

Abstract: A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer has surface resistance of 20 ohm/square or less.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer has surface resistance of 20 ohm/square or greater.