Abstract: The present disclosure relates to a method for manufacturing a decoration element, the method including depositing a light reflective layer having a structure of two or more islands separated from each other on one surface of a light absorbing layer; and dry etching the light absorbing layer using the island as a mask, wherein a resistance value of the decoration element after the dry etching of the light absorbing layer increases by two times or more compared to before the dry etching of the light absorbing layer.

Abstract: A substrate having a spacer thereon and an optical device including the same are disclosed herein. In some embodiments, a substrate includes a base layer, a transparent column spacer formed on the base layer, and a black layer present between the transparent column spacer and the base layer. In some embodiments, an alignment film is present on the spacer.

Abstract: This specification relates to a decoration member including: a substrate; and a decoration layer provided on the substrate in which there are one or more combinations of viewing angles ? and ? in which a contrast parameter Cn represented by Equation 1 is 0.1 or more.

Abstract: The present disclosure relates to a method for manufacturing a film for a decoration element, the method including depositing two or more islands on one surface of a film; and forming a pattern portion by dry etching the film using the island as a mask.

Abstract: A metal pattern film including a substrate; a first adhesion promoting layer provided on a first surface of the substrate; a second adhesion promoting layer provided on a second surface of the substrate, which is opposite to the first surface of the substrate; a metal pattern provided on a surface of the first adhesion promoting layer opposite to a surface of the first adhesion promoting layer adjoining the substrate; a first adhesive layer provided on a surface of the metal pattern opposite to the first adhesion promoting layer so as to cover the metal pattern; and a second adhesive layer provided on a surface of the second adhesion promoting layer opposite to a surface of the second adhesion promoting layer adjoining the substrate. Each of the first adhesion promoting layer and the second adhesion promoting layer includes an inorganic oxide. A method for preparing a metal pattern film.

Abstract: An electrochromic film, which is a reflective electrochromic film, which includes an electrode layer, a light absorbing layer and an electrochromic layer. The film can improve an electrochromism rate and realize various colors or esthetic senses.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer, and a light absorbing layer provided on the light reflective layer and comprising Si.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light absorbing layer has surface resistance of 20 ohm/square or greater.

Abstract: The present application relates to a conductive structure body and a method for manufacturing the same. A conductive structure body according to an exemplary embodiment of the present application comprises a substrate; a metal layer provided on the substrate; and a light reflection reducing layer provided on at least one surface of the metal layer and comprising copper-manganese-nickel oxide.

Abstract: A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.

Abstract: The present application relates to a decoration member including a substrate layer having a convex structure or a concave structure arranged two-dimensionally, and a method for preparing the decoration member.

Abstract: The present application relates to an electrochromic device and a method for manufacturing the electrochromic device. The present application can provide an electrochromic device having increased productivity and improved electrochromic rate and durability, and a method for manufacturing the electrochromic device. The electrochromic device may be advantageously used in various devices such as smart windows, smart mirrors, displays, electronic papers and adaptive camouflage.

Abstract: A decoration element including: a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on a surface of the color developing layer. The substrate comprises a pattern layer, and the light absorbing layer comprises an aluminum oxynitride (AlaObNc).

Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.

Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the eth substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.

Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a color developing layer comprising a light absorbing layer provided on the light reflective layer, wherein the light absorbing layer comprises two or more points with different thicknesses.

Abstract: The present specification relates to a method for manufacturing a fine aluminum pattern, an aluminum pattern manufactured by the manufacturing method, and a conductive film including the same.

Abstract: Provided is an electrode structure having a transparent electrode, a light blocking pattern provided on the transparent electrode, an auxiliary electrode pattern provided on the light blocking pattern, and an organic insulating pattern covering the light blocking pattern and the auxiliary electrode pattern, wherein a line width of the light blocking pattern is larger than a line width of the auxiliary electrode pattern. Also provided are an electronic device including the electrode structure, and a method of manufacturing the electrode structure.

Abstract: A conductive laminate and an electrochromic device including the conductive laminate are disclosed. The conductive laminate includes a metal oxynitride layer, a metal oxide layer, and a conductive layer. The metal oxynitride layer, the metal oxide layer or both may comprise monovalent cations. The metal oxynitride layer may be represented by MoaTibOxNy where a>0, b>0, x>0, y>0, 0.5<a/b<4.0, and 0.005<y/x<0.02. The metal oxide layer may comprise a reducing electrochromic material or an oxidizing electrochromic material. The electroconductive laminate and the electrochromic device have excellent durability, excellent color-switching speed, and can stepwise control optical properties.