Abstract: A substrate having a spacer thereon and an optical device including the same are disclosed herein. In some embodiments, a substrate includes a base layer, a transparent column spacer formed on the base layer, and a black layer present between the transparent column spacer and the base layer. In some embodiments, an alignment film is present on the spacer.

Abstract: A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer has surface resistance of 20 ohm/square or greater.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer has surface resistance of 20 ohm/square or less.

Abstract: The present specification relates to a conductive structure body, and an electrode and a display device including the same.

Abstract: A metal pattern film including a substrate; a first adhesion promoting layer provided on a first surface of the substrate; a second adhesion promoting layer provided on a second surface of the substrate, which is opposite to the first surface of the substrate; a metal pattern provided on a surface of the first adhesion promoting layer opposite to a surface of the first adhesion promoting layer adjoining the substrate; a first adhesive layer provided on a surface of the metal pattern opposite to the first adhesion promoting layer so as to cover the metal pattern; and a second adhesive layer provided on a surface of the second adhesion promoting layer opposite to a surface of the second adhesion promoting layer adjoining the substrate. Each of the first adhesion promoting layer and the second adhesion promoting layer includes an inorganic oxide. A method for preparing a metal pattern film.

Abstract: The present application relates to a hydrophobic substrate and a method for manufacturing the same. The hydrophobic substrate according to an exemplary embodiment of the present application includes: a substrate; a first layer disposed on at least one surface on the substrate and including an aluminum oxide; and a second layer disposed on the first layer and including a hydrophobic material.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a light absorbing layer provided on the light reflective layer, wherein the light reflective layer is a discontinuous film.

Abstract: The present disclosure relates to a decoration element comprising a light reflective layer; and a color developing layer comprising a light absorbing layer provided on the light reflective layer, wherein the light absorbing layer comprises two or more points with different thicknesses.

Abstract: The present specification relates to a conductive structure body, a manufacturing method thereof, a touch panel including the same, and a display device including the same.

Abstract: The present disclosed relates to a decoration element and a method for preparing the decoration element. decoration element has dichroism expressing different colors depending on a viewing direction, and has improved visibility of the dichroism.

Abstract: The present specification relates to a conductive structure body and a method for manufacturing the same.

Abstract: The present application relates to an electrochromic element and a method for manufacturing the same. A method for manufacturing an electrochromic element according to an exemplary embodiment of the present application comprises: forming a first electrode on a first substrate, and then forming a first electrochromic unit on the first electrode; forming a second electrode on a second substrate, and then forming a second electrochromic unit on the second electrode; and forming an electrolyte layer between the first electrochromic unit and the second electrochromic unit, in which the forming of the first electrochromic unit is carried out by an E-beam deposition method (E-beam evaporation) using a carrier gas.

Abstract: Provided is an electrode structure having a transparent electrode, a light blocking pattern provided on the transparent electrode, an auxiliary electrode pattern provided on the light blocking pattern, and an organic insulating pattern covering the light blocking pattern and the auxiliary electrode pattern, wherein a line width of the light blocking pattern is larger than a line width of the auxiliary electrode pattern. Also provided are an electronic device including the electrode structure, and a method of manufacturing the electrode structure.

Abstract: The present specification relates to a conductive structure and a method for manufacturing the same.

Abstract: The present specification provides an organic solar cell and a method of manufacturing the same.

Abstract: The disclosed relates to a decoration element and a method for preparing the decoration element. The decoration element has dichroism expressing different colors depending on a viewing direction, and has improved visibility of the dichroism.

Abstract: The present specification relates to a conductive structure body and a method for manufacturing the same.

Abstract: The present application relates to an electrochromic device and a method for manufacturing the electrochromic device. The present application can provide an electrochromic device having increased productivity and improved electrochromic rate and durability, and a method for manufacturing the electrochromic device. The electrochromic device may be advantageously used in various devices such as smart windows, smart mirrors, displays, electronic papers and adaptive camouflage.

Abstract: The present application relates to an electrochromic element and a method for manufacturing the same. A method for manufacturing an electrochromic element according to an exemplary embodiment of the present application comprises: forming a first electrode on a first substrate, and then forming a first electrochromic unit on the first electrode; forming a second electrode on a second substrate, and then forming a second electrochromic unit on the second electrode; and forming an electrolyte layer between the first electrochromic unit and the second electrochromic unit, in which the forming of the first electrochromic unit is carried out by an E-beam deposition method (E-beam evaporation) using a carrier gas.