Patents by Inventor Stefan Reber

Stefan Reber has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11915922
    Abstract: A silicon wafer for an electronic component, having an epitaxially grown silicon layer on a carrier substrate and the silicon layer is removed as a silicon wafer from the carrier substrate, in which at least one p-dopant and at least one n-dopant are introduced into the silicon layer during the epitaxial growth. The dopants are introduced into the silicon layer such that the silicon layer is formed having an electrically active p-doping and an electrically active n-doping, each greater than 1×1014 cm?3.
    Type: Grant
    Filed: March 18, 2021
    Date of Patent: February 27, 2024
    Assignee: NexWafe GmbH
    Inventors: Stefan Reber, Kai Schillinger, Frank Siebke
  • Patent number: 11862462
    Abstract: A method for the continuous vapour deposition of silicon on substrates, including the following steps: a) introducing at least one substrate into a reaction chamber; b) introducing a process gas and at least one gaseous silicon precursor compound into the reaction chamber; c) forming a gaseous mixture of at least one silicon-based intermediate product coexisting with the gaseous silicon precursor compound and the process gas; d) forming a silicon layer by vapour deposition of silicon from the gaseous silicon precursor compound and/or the silicon-based intermediate product on the substrate; e) discharging an excess of the gaseous mixture from the reaction chamber; f) returning at least one of the constituents of the excess of the gaseous mixture, selected from the silicon precursor compound, the silicon-based intermediate product and/or the process gas into the reaction chamber, wherein introducing the gaseous silicon precursor compound into the reaction chamber is regulated such that the molar ratio of the si
    Type: Grant
    Filed: October 25, 2018
    Date of Patent: January 2, 2024
    Assignee: Nexwafe GmbH
    Inventors: Stefan Reber, Kai Schillinger
  • Patent number: 11541748
    Abstract: A tank system for a construction machine includes a fuel tank having an outer tank wall that closes off a tank volume to the outside, a withdrawal tank volume, which is separated by a partition wall from a main tank volume of the tank volume and has a fuel-exchanging connection to the main tank volume, and a fuel withdrawal arrangement having a main fuel pump and a withdrawal line opening into the withdrawal tank volume for conveying fuel by the main fuel pump via the withdrawal line from the withdrawal tank volume to a fuel-consuming system region. The tank system also includes a fuel feed arrangement having an auxiliary fuel pump for conveying fuel from the main tank volume into the withdrawal tank volume.
    Type: Grant
    Filed: November 25, 2020
    Date of Patent: January 3, 2023
    Assignee: Hamm AG
    Inventors: Gerd Köstler, Stefan Reber, Armin Landstorfer
  • Publication number: 20220406590
    Abstract: A method for producing a wafer layer, including the method steps of: A) providing a carrier element; B) making the carrier element porous on at least one surface in order to produce a separating layer; C) applying a wafer layer to the separating layer of the carrier element by epitaxy; and D) detaching the wafer layer from the carrier element, with method steps B to D being repeated at least once, preferably multiple times, with the carrier element. The method step A includes the additional method steps of: A1) providing a carrier substrate; and A2) applying a seed layer to at least one surface and at least one lateral face of the carrier substrate by epitaxy in order to produce the carrier element. A carrier element for producing a wafer layer and an intermediate product are also provided.
    Type: Application
    Filed: October 15, 2020
    Publication date: December 22, 2022
    Applicant: NexWafe GmbH
    Inventors: Stefan REBER, Nena MILENKOVIC, Kai SCHILLINGER
  • Patent number: 11519094
    Abstract: An apparatus for etching one side of a semiconductor layer of a workpiece, including at least one etching basin for receiving an electrolyte, a first electrode which is provided for electrically contacting the electrolyte located in the etching basin, a second electrode which is provided for electrically contacting the semiconductor layer, a electrical power source which is electrically conductively connected to the first and the second electrodes for generating an etching current, and a transport apparatus for transporting the workpiece relative to the etching basin such that a semiconductor layer etching face to be etched can be wetted by the electrolyte in the etching basin.
    Type: Grant
    Filed: May 6, 2019
    Date of Patent: December 6, 2022
    Assignee: NexWafe GmbH
    Inventors: Stefan Reber, Kai Schillinger, Benjamin Reichhart, Nena Milenkovic
  • Patent number: 11505095
    Abstract: A seat device for a construction machine comprising a positioning device and a seat console having a seat arranged thereon, wherein the positioning device comprises a first pivot arm and a second pivot arm for guiding the seat console along a curved trajectory, wherein the pivot arms respectively comprise a first end and a second end, wherein the respective first end of the pivot arms is supported on the positioning device via a respective first rotary joint, and the respective second end of the pivot arms is connected to the seat console via a respective second rotary joint in a manner as spaced apart from each other.
    Type: Grant
    Filed: November 17, 2020
    Date of Patent: November 22, 2022
    Assignee: Hamm AG
    Inventors: Gernot Reif, Stefan Reber
  • Publication number: 20220275011
    Abstract: The invention relates to crystalline forms of 4-((R)-2-{[6-((S)-3-methoxy-pyrrolidin-1-yl)-2-phenyl-pyrimidine-4-carbonyl]-amino}-3-phosphono-propionyl)-piperazine-1-carboxylic acid butyl ester hydrochloride, processes for the preparation thereof, pharmaceutical compositions comprising said crystalline forms, pharmaceutical compositions prepared from such crystalline forms and their use as a medicament, especially as a P2Y12 receptor antagonist.
    Type: Application
    Filed: May 10, 2022
    Publication date: September 1, 2022
    Inventors: Daniel LEUENBERGER, Stefan REBER, Markus VON RAUMER
  • Patent number: 11427269
    Abstract: An articulated/swivel joint for the articulated connection between a rear section and a front section of a construction machine includes a joint mechanism assigned to a swivel-stop arrangement for limiting the swivel movement of a front joint part in relation to a rear joint part. The swivel-stop arrangement includes a first swivel stop for predetermining a maximum amount of swivel deflection during deflection of the front joint part in relation to the rear joint part in a first swivel-movement direction and a second swivel stop for predetermining a second maximum amount of swivel deflection during deflection of the front joint part in relation to the rear joint part in a second swivel-movement direction. When an articulated movement is performed, the maximum swivel-deflection range decreases as the amount of articulated deflection increases, starting from a neutral position of articulation of the front joint part in relation to the rear joint part.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: August 30, 2022
    Assignee: Hamm AG
    Inventors: Gerd Köstler, Stefan Reber
  • Patent number: 11365209
    Abstract: The invention relates to crystalline forms of 4-((R)-2-{[6-((S)-3-methoxy-pyrrolidin-1-yl)-2-phenyl-pyrimidine-4-carbonyl]-amino}-3-phosphono-propionyl)-piperazine-1-carboxylic acid butyl ester hydrochloride, processes for the preparation thereof, pharmaceutical compositions comprising said crystalline forms, pharmaceutical compositions prepared from such crystalline forms and their use as a medicament, especially as a P2Y12 receptor antagonist.
    Type: Grant
    Filed: July 24, 2020
    Date of Patent: June 21, 2022
    Assignee: IDORSIA PHARMACEUTICALS LTD
    Inventors: Daniel Leuenberger, Stefan Reber, Markus Von Raumer
  • Publication number: 20210363632
    Abstract: A process chamber guide, designed for linearly guiding a substrate carrier that can be displaced in the process chamber guide in a direction of guidance such that by displacement of the substrate carrier in a process position, an at least regional demarcation of a process chamber guide can be formed by the process chamber guide and substrate carrier. The invention is characterized in that the process chamber guide has a roller bearing for the substrate support and at least one sealing surface, which extends parallel to the direction of guidance and is designed and arranged in such a way that, whenever the substrate carrier arranged in the process chamber guide is in a process position, the sealing surface is spaced apart less than 1 mm from the substrate carrier. The invention further relates to a process chamber and to a method for guiding a substrate carrier in a processing position.
    Type: Application
    Filed: March 19, 2018
    Publication date: November 25, 2021
    Applicant: NexWafe GmbH
    Inventors: Stefan Reber, Kai Schillinger, Benjamin Reichhart
  • Publication number: 20210246546
    Abstract: An apparatus for etching one side of a semiconductor layer of a workpiece, including at least one etching basin for receiving an electrolyte, a first electrode which is provided for electrically contacting the electrolyte located in the etching basin, a second electrode which is provided for electrically contacting the semiconductor layer, a electrical power source which is electrically conductively connected to the first and the second electrodes for generating an etching current, and a transport apparatus for transporting the workpiece relative to the etching basin such that a semiconductor layer etching face to be etched can be wetted by the electrolyte in the etching basin.
    Type: Application
    Filed: May 6, 2019
    Publication date: August 12, 2021
    Applicant: NexWafe GmbH
    Inventors: Stefan REBER, Kai SCHILLINGER, Benjamin REICHHART, Nena MILENKOVIC
  • Publication number: 20210217607
    Abstract: A silicon wafer for an electronic component, having an epitaxially grown silicon layer on a carrier substrate and the silicon layer is removed as a silicon wafer from the carrier substrate, in which at least one p-dopant and at least one n-dopant are introduced into the silicon layer during the epitaxial growth. The dopants are introduced into the silicon layer such that the silicon layer is formed having an electrically active p-doping and an electrically active n-doping, each greater than 1×1014 cm?3.
    Type: Application
    Filed: March 18, 2021
    Publication date: July 15, 2021
    Applicant: NexWafe GmbH
    Inventors: Stefan REBER, Kai SCHILLINGER, Frank SIEBKE
  • Publication number: 20210202237
    Abstract: A method for the continuous vapour deposition of silicon on substrates, including the following steps: a) introducing at least one substrate into a reaction chamber; b) introducing a process gas and at least one gaseous silicon precursor compound into the reaction chamber; c) forming a gaseous mixture of at least one silicon-based intermediate product coexisting with the gaseous silicon precursor compound and the process gas; d) forming a silicon layer by vapour deposition of silicon from the gaseous silicon precursor compound and/or the silicon-based intermediate product on the substrate; e) discharging an excess of the gaseous mixture from the reaction chamber; f) returning at least one of the constituents of the excess of the gaseous mixture, selected from the silicon precursor compound, the silicon-based intermediate product and/or the process gas into the reaction chamber, wherein introducing the gaseous silicon precursor compound into the reaction chamber is regulated such that the molar ratio of the si
    Type: Application
    Filed: October 25, 2018
    Publication date: July 1, 2021
    Applicant: NexWage GmbH
    Inventors: Stefan REBER, Kai SCHILLINGER
  • Publication number: 20210170920
    Abstract: A seat device for a construction machine comprising a positioning device and a seat console having a seat arranged thereon, wherein the positioning device comprises a first pivot arm and a second pivot arm for guiding the seat console along a curved trajectory, wherein the pivot arms respectively comprise a first end and a second end, wherein the respective first end of the pivot arms is supported on the positioning device via a respective first rotary joint, and the respective second end of the pivot arms is connected to the seat console via a respective second rotary joint in a manner as spaced apart from each other.
    Type: Application
    Filed: November 17, 2020
    Publication date: June 10, 2021
    Applicant: Hamm AG
    Inventors: Gernot REIF, Stefan REBER
  • Publication number: 20210170864
    Abstract: A tank system for a construction machine includes a fuel tank having an outer tank wall that closes off a tank volume to the outside, a withdrawal tank volume, which is separated by a partition wall from a main tank volume of the tank volume and has a fuel-exchanging connection to the main tank volume, and a fuel withdrawal arrangement having a main fuel pump and a withdrawal line opening into the withdrawal tank volume for conveying fuel by the main fuel pump via the withdrawal line from the withdrawal tank volume to a fuel-consuming system region. The tank system also includes a fuel feed arrangement having an auxiliary fuel pump for conveying fuel from the main tank volume into the withdrawal tank volume.
    Type: Application
    Filed: November 25, 2020
    Publication date: June 10, 2021
    Inventors: Gerd Köstler, Stefan Reber, Armin Landstorfer
  • Patent number: D921055
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: June 1, 2021
    Assignee: HAMM AG
    Inventors: Axel Römer, Ulrich Ewringmann, Stefan Reber, Markus Beese, Thomas Häring, Gernot Reif, Gerd Köstler
  • Patent number: D921566
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: June 8, 2021
    Assignee: HAMM AG
    Inventors: Axel Römer, Ulrich Ewringmann, Stefan Reber, Markus Beese, Thomas Häring, Gernot Reif, Gerd Köstler
  • Patent number: D929467
    Type: Grant
    Filed: April 21, 2021
    Date of Patent: August 31, 2021
    Assignee: HAMM AG
    Inventors: Axel Römer, Ulrich Ewringmann, Stefan Reber, Markus Beese, Thomas Häring, Gernot Reif, Gerd Köstler
  • Patent number: D929470
    Type: Grant
    Filed: April 21, 2021
    Date of Patent: August 31, 2021
    Assignee: HAMM AG
    Inventors: Axel Römer, Ulrich Ewringmann, Stefan Reber, Markus Beese, Thomas Häring, Gernot Reif, Gerd Köstler
  • Patent number: D930045
    Type: Grant
    Filed: April 20, 2021
    Date of Patent: September 7, 2021
    Assignee: HAMM AG
    Inventors: Axel Römer, Ulrich Ewringmann, Stefan Reber, Markus Beese, Thomas Häring, Gernot Reif, Gerd Köstler