Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.

Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.

Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.

Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.

Abstract: A manufacturing method for a stone speaker is disclosed. The stone speaker is placed in a garden and blended with the environment. Raw stones of various sizes and colors are crashed and provided as a kind of material for the stone speaker. The manual painting spray step is neglected. The stone speakers has an appearance like real natural stone and no disadvantages of the stone speakers made by the manual painting spray step.

Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.

Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.

Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.

Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.

Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.

Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.

Abstract: A ceiling rack includes a pair of transverse beams parallel to each other, at least one mesh unit and at least four supporting units. Each transverse beam has a side wall and a U-shaped hook body, and an assembly groove having an opening on a top surface thereof is formed therebetween. The mesh unit has a U-shaped end body at two opposite end portions thereof, which is assembled in the assembly groove and engaged with the U-shaped hook body. The supporting units are assembled between the side walls of the two opposite end portions of the transverse beam and the ceiling. With the U-shaped end body, the U-shaped hook body and the assembly groove, the mesh unit can be assembled in the assembly groove and engaged with the U-shaped hook body without any locking element, thereby providing the convenience of assembly and disassembly.

Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Methods and systems using a purge ring are particularly useful for purging and cleaning porogens from a UV curing chamber. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.

Abstract: A ceiling rack includes a pair of transverse beams parallel to each other, at least one mesh unit and at least four supporting units. Each transverse beam has a side wall and a U-shaped hook body, and an assembly groove having an opening on a top surface thereof is formed therebetween. The mesh unit has a U-shaped end body at two opposite end portions thereof, which is assembled in the assembly groove and engaged with the U-shaped hook body. The supporting units are assembled between the side walls of the two opposite end portions of the transverse beam and the ceiling. With the U-shaped end body, the U-shaped hook body and the assembly groove, the mesh unit can be assembled in the assembly groove and engaged with the U-shaped hook body without any locking element, thereby providing the convenience of assembly and disassembly.

Abstract: A multi-function hook is provided. The multi-function hook includes a hook unit and a plug unit. The hook unit includes a fixing board and at least one hook body. The fixing board includes a first L-shaped sheet and a second L-shaped fixing sheet having a hole respectively. The fixing board further includes at least one first protruded hook member, and an assembling hole disposed corresponding to the second L-shaped fixing sheet. The hook body is fixed on the front surface of the fixing board. The plug unit is assembled to the assembling hole and is fixed on the fixing board. The plug unit includes a cover and at least one second protruded hook member connecting with the cover. The cover includes a hollow hole disposed corresponding to the second L-shaped fixing sheet.

Abstract: A method, system and program product for determining a number of concurrent users being served by a system at a given point-in-time is provided. The method includes running, at a pre-determined point-in-time, a collection script for collecting user data from one or more target systems, the user data collected including a number of concurrent users logged into each of the target systems at the pre-determined point-in-time. The method further includes generating one or more electronic transmissions for transmitting the user data collected, loading the one or more electronic transmissions generated into a monitoring system, and creating an output file containing the user data. Further, the loading step includes parsing the user data loaded, storing the user data collected and parsed into a database and updating the stored user data. Moreover, the method includes transmitting the output file from the monitoring system to one or more monitoring system clients.

Abstract: A method, system and program product for determining a number of concurrent users being served by a system at a given point-in-time is provided. The method includes running, at a pre-determined point-in-time, a collection script for collecting user data from one or more target systems, the user data collected including a number of concurrent users logged into each of the target systems at the pre-determined point-in-time. The method further includes generating one or more electronic transmissions for transmitting the user data collected, loading the one or more electronic transmissions generated into a monitoring system, and creating an output file containing the user data. Further, the loading step includes parsing the user data loaded, storing the user data collected and parsed into a database and updating the stored user data. Moreover, the method includes transmitting the output file from the monitoring system to one or more monitoring system clients.