Abstract: A trailing arm assembly for a suspension includes at least first and second cast components. The first and second cast components are welded to each other to substantially surround an outer perimeter of an axle member. The first cast component is then welded to one side of the axle member at a first weld and the second cast component is welded to an opposite side of the axle member at a second weld. A bushing tube is then welded to one of the first and second cast components and is subsequently attached to a vehicle frame member. The first weld area comprises a pair of laterally spaced window welds and the second weld area comprises a single window weld.

Abstract: An apparatus for teaching rhythm includes a housing having a plurality of tempo indicator lights and a plurality of beat indicator lights corresponding to the tempo indicator lights, such that the beat indicator lights can be selectively illuminated to indicate a desired beat in a rhythm. Circuitry illuminates the tempo indicator lights in sequence and the selected beat indicator lights in sequence, so that a user may attempt to manually generate a sequence of sounds synchronous with the selectively illuminated beat indicator lights.

Abstract: Particles have an ultrathin, conformal coating are made using atomic layer deposition methods. The base particles include ceramic and metallic materials. The coatings can also be ceramic or metal materials that can be deposited in a binary reaction sequence. The coated particles are useful as fillers for electronic packaging applications, for making ceramic or cermet parts, as supported catalysts, as well as other applications.

Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

Abstract: A photodetector and method of detecting far infrared optical signals. In one embodiment of the present invention, the photodetctor has a plurality of N barriers, N being an integer greater than 1, each barrier being a layer of a material made from a first and a second group III elements and a first group V element and characterized by a bandgap. The photodetector further has a plurality of N?1 emitters, each emitter being a layer of material made from a third group III element and a second group V element and characterized by a bandgap different from that of the barriers and having at least one free carrier responsive to optical signals, wherein each emitter is located between two barriers so as to form a heterojunction at each interface between an emitter and a barrier.

Abstract: Parametric characterization of nitric oxide (NO) gas exchange using a two-compartment model of the lungs is a non-invasive technique to characterize inflammatory lung diseases. The technique applies the two-compartment model to parametric characterization of NO gas exchange from a tidal breathing pattern. The model is used to estimate up to six flow-independent parameters, and to study alternate breathing patterns.

Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

Abstract: An apparatus and method to characterize NO gas exchange dynamics in human lungs comprising the steps of: (1) performing a series of breath hold maneuvers of progressively increasingly breath hold times, each breath hold maneuver comprising a) inhaling a gas, b) holding a breath for a selected time duration, and c) exhaling at a flow rate which is uncontrolled but which is effective to ensure evacuation of the airway space and (2) measuring airway NO parameters during consecutive breath hold maneuvers. As a result disease states of the lungs are diagnosed using the measured airway NO parameters.

Abstract: A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.

Abstract: In a first aspect, a first method of creating a programmable link delay during cycle simulation of a system is provided. The first method includes the steps of (1) modeling a system for cycle simulation, wherein the system includes (a) a plurality of links; (b) link transmitting logic adapted to transmit data on the plurality of links; (c) link receiving logic adapted to receive data from the plurality of links; and (d) link training logic coupled to the link receiving logic and adapted to compensate for skew between links; and (2) employing delay logic, coupled to the plurality of links, in the modeled system to create a known skew between links during cycle simulation. Numerous other aspects are provided.

Abstract: The method of the present invention is useful in detecting the lack of majority cluster nodes within a cluster, and reorganizes the cluster membership to allow for running with less than a majority of nodes connected. As nodes become alive, they are added to the cluster until the original majority is reached, which then allows for the cluster to return to normal operation. Thus, the method of the present invention allows for the revival and reconstitution of a majority node set of clusters.

Abstract: The present invention generally is a method for forming a high-k dielectric layer, comprising depositing a hafnium compound by atomic layer deposition to a substrate, comprising, delivering a hafnium precursor to a surface of the substrate, reacting the hafnium precursor and forming a hafnium containing layer to the surface, delivering a nitrogen precursor to the hafnium containing layer, forming at least one hafnium nitrogen bond and depositing the hafnium compound to the surface.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a substrate. This method includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, calculating a metric representing variation of the separate responses for individual source points with defocus and adjusting an illumination arrangement based on analysis of the metric.

Abstract: Tissue engineering holds enormous potential to replace or restore function to a wide range of tissues. However, the most successful applications have been limited to thin avascular tissues in which delivery of essential nutrients occurs primarily by diffusion. Pursuant to the present invention, a prevascularized, thick tissue construct is created having a network of capillaries with lumens capable of nutrient and origin delivery and forming anastamoses to host vasculature. A tissue transplantation strategy is comprised of (1) in vitro vascularization of a tisue construct, (2) transplantation of prevascularized tissue to wound bed of host where vessels of implantable tissue and host rapidly anastomose, and (3) host-directed remodeling and reorganization of the tissue and vascular network.

Abstract: The method of the present invention is useful in a computer system including at least two server nodes, each of which can execute clustered server software. The program executes a method for providing data to restore clustering when clustering services fail. The method includes the step of comparing current configuration data to previous configuration data. Next, the method compares the current configuration data to a standard configuration data. Finally, the method compares a set of operations to a standard clustering functionality.

Abstract: Micro-mechanical devices, such as MEMS, having layers thereon, and methods of forming the layers, are disclosed. In one aspect, a method may include forming a layer including an oxide of aluminum over at least a portion of a micro-mechanical device, and coating the layer by bonding material to surface hydroxyl groups of the layer. In another aspect, a method may include introducing a micro-mechanical device into an atomic layer deposition chamber, and substantially filling nanometer sized voids of the micro-mechanical device by using atomic layer deposition to introduce material into the voids. In a still further aspect, a method may include introducing an alkylaminosilane to a micro-mechanical device having a surface hydroxyl group, and bonding a silane to the micro-mechanical device by reacting the alkylaminosilane with the surface hydroxyl group.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using full resist calculation, the lithographic apparatus comprising an illuminator, a projection system, and a mask having a pattern to be printed in a layer of photoresist material formed on a substrate. This method includes defining a lithographic 0problem, which may include a lithographic pattern to be printed on a wafer; choosing a resist model of a resist process to be used to print a pattern in the layer of photoresist material; selecting a grid of source points in a pupil plane of the illuminator; calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the resist model; and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

Abstract: Apparatus (10) is shown for providing a flow of humidified air at a selected humidity level, and a method is disclosed of monitoring olfactory parameters of a sample gas or vapour to provide a “finger print” or profile of an odour. The flow of humidified air is used to set a level of humidity in a sensor chamber (36) which is the same as the level of humidity in a sample chamber (44) containing the sample of gas or vapour. The sample gas or vapour is then introduced into the sensor chamber (36), where an array of olfactory sensors record the odour profile, without a sudden change of humidity level when the sample gas or vapour is admitted. The flow of humidified air at a selected humidity level is obtained from a generator (10) having a controllable valve 14 for directing a clean dry air stream along either of two paths (17,18), one of which includes a humidifier 22.

Abstract: A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.