Patents by Inventor Steven R. J. Brueck

Steven R. J. Brueck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8557622
    Abstract: Exemplary embodiments provide semiconductor nanowires and nanowire devices/applications and methods for their formation. In embodiments, in-plane nanowires can be epitaxially grown on a patterned substrate, which are more favorable than vertical ones for device processing and three-dimensional (3D) integrated circuits. In embodiments, the in-plane nanowire can be formed by selective epitaxy utilizing lateral overgrowth and faceting of an epilayer initially grown in a one-dimensional (1D) nanoscale opening. In embodiments, optical, electrical, and thermal connections can be established and controlled between the nanowire, the substrate, and additional electrical or optical components for better device and system performance.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: October 15, 2013
    Assignee: STC.UNM
    Inventors: Seung Chang Lee, Steven R. J. Brueck
  • Patent number: 8526105
    Abstract: In accordance with the invention, there are imaging interferometric microscopes and methods for imaging interferometric microscopy using structural illumination and evanescent coupling for the extension of imaging interferometric microscopy. Furthermore, there are coherent anti-Stokes Raman (CARS) microscopes and methods for coherent anti-Stokes Raman (CARS) microscopy, wherein imaging interferometric microscopy techniques are applied to get material dependent spectroscopic information.
    Type: Grant
    Filed: January 6, 2012
    Date of Patent: September 3, 2013
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Yuliya Kuznetsova, Alexander Neumann
  • Patent number: 8426121
    Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: April 23, 2013
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Andrew Frauenglass, Alexander K. Raub, Dong Li
  • Patent number: 8404123
    Abstract: In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: March 26, 2013
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Deying Xia
  • Patent number: 8377390
    Abstract: In accordance with the invention, there are surfaces exhibiting anisotropic wetting, microfluidic devices and microreactors including the surfaces and methods of controlling anisotropic wetting behavior of the surfaces. The exemplary surface can include a substrate and a plurality of rectangular shaped structures arranged to form a macroscopic pattern over the substrate, wherein the plurality of rectangular shaped structures delineate a top surface of the rectangular structures from a surface of the substrate, the rectangular shaped structures including substantially vertical walls having a height of about 100 nm to about 10 ?m and wherein the shape of the macroscopic pattern, the height of the substantially vertical walls, and a surface chemistry of the top surface controls anisotropic wetting at the top surface of the rectangular structures.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: February 19, 2013
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Deying Xia
  • Patent number: 8313967
    Abstract: A method of epitaxial growth of cubic phase, nitrogen-based compound semiconductor thin films on a semiconductor substrate, for example a <001> substrate, which is periodically patterned with grooves oriented parallel to the <110> crystal direction and terminated in sidewalls, for example <111> sidewalls. The method can provide an epitaxial growth which is able to supply high-quality, cubic phase epitaxial films on a <001> silicon substrate. Controlling nucleation on sidewall facets, for example <111>, fabricated in every groove and blocking the growth of the initial hexagonal phase at the outer region of an epitaxial silicon layer with barrier materials prepared at both sides of each groove allows growth of cubic-phase thin film in each groove and either be extended to macro-scale islands or coalesced with films grown from adjacent grooves to form a continuous film. This can result in a wide-area, cubic phase nitrogen-based compound semiconductor film on a <001> substrate.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: November 20, 2012
    Assignee: STC.UNM
    Inventors: Seung-Chang Lee, Steven R. J. Brueck
  • Patent number: 8203782
    Abstract: Exemplary embodiments provide an image interferometric microscope (IIM) and methods for image interferometric microscopy. The disclosed IIM can approach the linear systems limits of optical resolution by using a plurality of off-axis illuminations to access high spatial frequencies along with interferometric reintroduction of a zero-order reference beam on the low-NA side of the optical system. In some embodiments, a thin object can be placed normal to the optical axis and the frequency space limit can be extended to about [(1+NA)n/?], where NA is the numerical-aperture of the objective lens used, n is the refraction index of the transmission medium and ? is an optical wavelength. In other embodiments, tilting the object plane can further allow collection of diffraction information up to the material transmission bandpass limited spatial frequency of about 2n/?.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: June 19, 2012
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Alexander Neumann, Yuliya V. Kuznetsova
  • Publication number: 20120105618
    Abstract: In accordance with the invention, there are imaging interferometric microscopes and methods for imaging interferometric microscopy using structural illumination and evanescent coupling for the extension of imaging interferometric microscopy. Furthermore, there are coherent anti-Stokes Raman (CARS) microscopes and methods for coherent anti-Stokes Raman (CARS) microscopy, wherein imaging interferometric microscopy techniques are applied to get material dependent spectroscopic information.
    Type: Application
    Filed: January 6, 2012
    Publication date: May 3, 2012
    Applicant: STC.UNM
    Inventors: Steven R. J. BRUECK, Yulia KUZNETSOVA, Alexander NEUMANN
  • Patent number: 8115992
    Abstract: In accordance with the invention, there are imaging interferometric microscopes and methods for imaging interferometric microscopy using structural illumination and evanescent coupling for the extension of imaging interferometric microscopy. Furthermore, there are coherent anti-Stokes Raman (CARS) microscopes and methods for coherent anti-Stokes Raman (CARS) microscopy, wherein imaging interferometric microscopy techniques are applied to get material dependent spectroscopic information.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: February 14, 2012
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Yulia Kuznetsova, Alexander Neumann
  • Patent number: 8105471
    Abstract: The invention includes nanochannel devices and methods for using such nanochannel devices for separating molecules, ions and biomolecules. The nanochannel devices have at least one nanochannel through which fluid can move, wherein ionic double layers form in the fluid near walls of the nanochannel and those ionic double layers overlap within the nanochannel. Electrical voltage can be applied to the nanochannel to modify an electrostatic potential in the nanochannel and thereby control movement of ions and biomolecules through the nanochannel. The invention also includes arrays and networks of such nanochannel devices.
    Type: Grant
    Filed: July 19, 2005
    Date of Patent: January 31, 2012
    Inventors: Sang M. Han, Steven R. J. Brueck, Cornelius F. Ivory, Gabriel P. Lopez, Dimiter N. Petsev
  • Publication number: 20110310920
    Abstract: Exemplary embodiments provide semiconductor nanowires and nanowire devices/applications and methods for their formation. In embodiments, in-plane nanowires can be epitaxially grown on a patterned substrate, which are more favorable than vertical ones for device processing and three-dimensional (3D) integrated circuits. In embodiments, the in-plane nanowire can be formed by selective epitaxy utilizing lateral overgrowth and faceting of an epilayer initially grown in a one-dimensional (1D) nanoscale opening. In embodiments, optical, electrical, and thermal connections can be established and controlled between the nanowire, the substrate, and additional electrical or optical components for better device and system performance.
    Type: Application
    Filed: September 1, 2011
    Publication date: December 22, 2011
    Applicant: STC.UNM
    Inventors: Seung Chang Lee, Steven R. J. Brueck
  • Patent number: 8030108
    Abstract: Exemplary embodiments provide semiconductor nanowires and nanowire devices/applications and methods for their formation. In embodiments, in-plane nanowires can be epitaxially grown on a patterned substrate, which are more favorable than vertical ones for device processing and three-dimensional (3D) integrated circuits. In embodiments, the in-plane nanowire can be formed by selective epitaxy utilizing lateral overgrowth and faceting of an epilayer initially grown in a one-dimensional (1D) nanoscale opening. In embodiments, optical, electrical, and thermal connections can be established and controlled between the nanowire, the substrate, and additional electrical or optical components for better device and system performance.
    Type: Grant
    Filed: June 26, 2009
    Date of Patent: October 4, 2011
    Assignee: STC.UNM
    Inventors: Seung Chang Lee, Steven R. J. Brueck
  • Publication number: 20110211253
    Abstract: Exemplary embodiments provide an image interferometric microscope (IIM) and methods for image interferometric microscopy. The disclosed IIM can approach the linear systems limits of optical resolution by using a plurality of off-axis illuminations to access high spatial frequencies along with interferometric reintroduction of a zero-order reference beam on the low-NA side of the optical system. In some embodiments, a thin object can be placed normal to the optical axis and the frequency space limit can be extended to about [(1+NA)n/?], where NA is the numerical-aperture of the objective lens used, n is the refraction index of the transmission medium and ? is an optical wavelength. In other embodiments, tilting the object plane can further allow collection of diffraction information up to the material transmission bandpass limited spatial frequency of about 2n/?.
    Type: Application
    Filed: April 14, 2011
    Publication date: September 1, 2011
    Inventors: Steven R. J. Brueck, Alexander Neumann, Yuliya V. Kuznetsova
  • Patent number: 7978403
    Abstract: Exemplary embodiments provide an image interferometric microscope (IIM) and methods for image interferometric microscopy. The disclosed IIM can approach the linear systems limits of optical resolution by using a plurality of off-axis illuminations to access high spatial frequencies along with interferometric reintroduction of a zero-order reference beam on the low-NA side of the optical system. In some embodiments, a thin object can be placed normal to the optical axis and the frequency space limit can be extended to about [(1+NA)n/?], where NA is the numerical-aperture of the objective lens used, n is the refraction index of the transmission medium and ? is an optical wavelength. In other embodiments, tilting the object plane can further allow collection of diffraction information up to the material transmission bandpass limited spatial frequency of about 2n/?.
    Type: Grant
    Filed: May 8, 2008
    Date of Patent: July 12, 2011
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Alexander Neumann, Yuliya V. Kuznetsova
  • Patent number: 7959861
    Abstract: Device and method for detecting the presence of known or unknown toxic agents in a fluid sample. Targets in the sample are bound to releasable receptors immobilized in a reaction region of a micro- or nano-fluidic device. The receptors are selected based on their affinity for classes of known toxic agents. The receptors are freed and the bound and unbound receptors separated based on differential electrokinetic mobilities while they travel to a detection device.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: June 14, 2011
    Assignee: STC.UNM
    Inventors: Gabriel Lopez, Linnea Ista, Steven R J Brueck, Aurelio Evangelista Lara, Mangesh Bore
  • Patent number: 7906275
    Abstract: In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: March 15, 2011
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Andrew Frauenglass, Alexander K. Raub, Dong Li
  • Publication number: 20110011794
    Abstract: In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
    Type: Application
    Filed: September 28, 2010
    Publication date: January 20, 2011
    Inventors: Steven R. J. Brueck, Deying Xia
  • Patent number: 7825037
    Abstract: In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: November 2, 2010
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Deying Xia
  • Patent number: RE42249
    Abstract: The present invention provides a nonostructured device comprising a substrate including nanotroughs therein; and a lipid bilayer suspended on or supported in the substrate. A separation method is also provided comprising the steps of supporting or suspending a lipid bilayer on a substrate; wherein the subtrate comprises nanostructures and wherein the lipid bilayer comprises at least one membrane associated biomolecule; and applying a driving force to the lipid bilayer to separate the membrane associated biomolecule from the lipid bilayer and to drive the membrane associated biomolecule into the nanostructures.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: March 29, 2011
    Assignee: STC.UNM
    Inventors: Gabriel P. Lopez, Steven R. J. Brueck, Linnea K. Ista
  • Patent number: RE42315
    Abstract: The present invention provides a nanostructured device comprising a substrate including nanotroughs therein; and a lipid bilayer suspended on or supported in the substrate. A separation method is also provided comprising the steps of supporting or suspending a lipid bilayer on a substrate; wherein the substrate comprises nanostructures and wherein the lipid bilayer comprises at least one membrane associated biomolecule; and applying a driving force to the lipid bilayer to separate the membrane associated biomolecule from the lipid bilayer and to drive the membrane associated biomolecule into the nanostructures.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: May 3, 2011
    Assignee: STC.UNM
    Inventors: Gabriel P. Lopez, Steven R. J. Brueck, Linnea K. Ista