Patents by Inventor Su-min Kim

Su-min Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250101023
    Abstract: The present invention relates to a heteroaryl derivative, a stereoisomer thereof, a hydrate thereof, a solvate thereof, or a pharmaceutically acceptable salt thereof, a method for preparing the same, and a pharmaceutical composition for preventing or treating cancer comprising the same as an active ingredient. The heteroaryl derivative of the present invention exhibits high inhibitory activity against overexpressed HER2, and thus, a pharmaceutical composition containing the same as an active ingredient can be usefully used for preventing or treating HER-2 positive cancer.
    Type: Application
    Filed: January 19, 2023
    Publication date: March 27, 2025
    Applicants: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY), KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Gu KONG, Ratnakar Reddy KUCHUKULLA, Su Min KIM, So Jeong MOON, Woo Young HUR, In Jeong HWANG
  • Publication number: 20240366607
    Abstract: The present invention relates to a composition for preventing or treating inflammatory or autoimmune skin disease. The composition of the present invention may be useful as a fundamental therapeutic composition that is able to efficiently ameliorate skin tissue damage caused by inflammation while having a minimized impact on systemic immune activity by specifically inhibiting the activity of skin-specific T cells. The present invention also provides a screening method capable of quickly and highly reliably identifying promising therapeutic candidates that are able to alleviate various autoimmune and inflammatory damages occurring in skin tissue by inhibiting the activity of skin-specific T cells.
    Type: Application
    Filed: September 6, 2022
    Publication date: November 7, 2024
    Inventors: Chang Ook PARK, Yu Ri KIM, Su Min KIM, Hye Li KIM, Kelun ZHANG
  • Patent number: 12134390
    Abstract: An embodiment sensor information fusion method includes estimating, by a host vehicle, reliability of shared sensor fusion information received from a neighboring vehicle, the shared sensor fusion information being generated by the neighboring vehicle, and generating, based on the estimated reliability, fusion track information of an object located near the host vehicle or the neighboring vehicle using host vehicle sensor fusion information generated by the host vehicle and the shared sensor fusion information.
    Type: Grant
    Filed: March 4, 2022
    Date of Patent: November 5, 2024
    Assignees: Hyundai Motor Company, Kia Corporation
    Inventors: Woo Young Lee, Su Min Jo, Su Min Kim
  • Publication number: 20240325400
    Abstract: The present invention relates to a composition for prevention or treatment of inflammatory or autoimmune skin diseases. The composition of the present invention may be useful as a fundamental therapeutic composition that is able to efficiently ameliorate skin tissue damage caused by inflammation while having a minimized impact on systemic immune activity by specifically inhibiting the activity of skin-specific T cells. In addition, the composition of the present invention may be efficiently delivered to the stratum corneum of the skin, so that it is able to exert a lesion-specific and intensive immune control effect as a composition for topical application to the skin. Moreover, it shows little toxicity to normal skin tissue, and thus is suitable even for long-term administration for the treatment of atopic dermatitis, a chronic disease.
    Type: Application
    Filed: November 4, 2022
    Publication date: October 3, 2024
    Inventors: Chang Ook PARK, Yu Ri KIM, Su Min KIM, Hye Li KIM, Kelun ZHANG, Hyun Soo KIM
  • Publication number: 20240203651
    Abstract: A multilayer electronic component includes a body including a dielectric layer and internal electrodes alternately disposed with the dielectric layer; and external electrodes disposed on the body. The dielectric layer includes N-doped polydopamine.
    Type: Application
    Filed: April 21, 2023
    Publication date: June 20, 2024
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Yong PARK, Jong Ho LEE, Jung Jin PARK, Su Min KIM, Eun Jung LEE, Yong Min HONG, Ji Hyeon LEE, Sim Chung KANG, Min Woo KIM, Jung Tae PARK
  • Patent number: 11681219
    Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,
    Type: Grant
    Filed: August 12, 2020
    Date of Patent: June 20, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yechan Kim, Su Min Kim, Ju-Young Kim, Jinjoo Kim, Hyunwoo Kim, Juhyeon Park, Hyunji Song, Songse Yi, Suk Koo Hong
  • Publication number: 20230178511
    Abstract: A method for manufacturing a semiconductor device is provided. The method for manufacturing a semiconductor device which uses an apparatus for manufacturing the semiconductor device including: a chamber, a support structure provided inside the chamber, and configured to support a bonding structure that comprises a first substrate structure, a second substrate structure, and a bonding metal layer provided between the first substrate structure and the second substrate structure, and a laser device which is provided above the chamber, the semiconductor device manufacturing method comprising: irradiating a laser beam to the bonding structure using the laser device.
    Type: Application
    Filed: October 27, 2022
    Publication date: June 8, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young Chul SHIN, MinWoo RHEE, Su Min KIM, Il Young HAN, Nung Pyo HONG, Seung Don LEE, Kyeong Bin LIM
  • Publication number: 20230170144
    Abstract: A method of manufacturing a dielectric slurry, includes supplying a dielectric slurry including dielectric particles and a solvent to a slurry supply module, dispersing the dielectric slurry by inserting the dielectric slurry into a particle dispersing module, classifying the dielectric particles according to particle size by inserting the dispersed dielectric slurry into a classifying module, recovering at least a portion of the dielectric particles to the slurry supply module, and redispersing the dielectric slurry including the dielectric particles recovered to the slurry supply module to the particle dispersing module.
    Type: Application
    Filed: May 2, 2022
    Publication date: June 1, 2023
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jung Jin Park, Su Min Kim, Ho Sam Choi, Kyu Jeong Sim, Jeong Ha Yoon, Jong Ho Lee
  • Publication number: 20230156896
    Abstract: A film for manufacturing an electronic component includes: a polymer layer; and metal nanowires dispersed in the polymer layer. The polymer layer may include a polyester-based compound such as polyethylene terephthalate. The metal nanowire may include a ferromagnetic metal such as at least one of nickel (Ni), cobalt (Co), and iron (Fe), or alloys thereof.
    Type: Application
    Filed: June 2, 2022
    Publication date: May 18, 2023
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Dae Jin SHIM, Jung Jin PARK, Su Min KIM, Jong Ho LEE, Eun Jung LEE, Jung Jin PARK
  • Publication number: 20230123035
    Abstract: The present disclosure relates to a polymer for photoresist and a photoresist composition including the same. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.
    Type: Application
    Filed: May 27, 2022
    Publication date: April 20, 2023
    Inventors: Juhyeon PARK, Hyunwoo KIM, Suk Koo HONG, Su Min KIM, Yechan KIM, Jicheol PARK, Honggu IM
  • Publication number: 20230055049
    Abstract: A soft magnetic core of an inductor or a motor core includes an alloy having a composition of Fe, Si, B, P, Cu, and Y, and the soft magnetic core or the motor core has a composite structure in which crystal grains including Fe are dispersed in an amorphous phase. Also, the alloy is expressed by the compositional formula FeaSibBcPdCueYfCg, wherein a to g satisfy 80?a?87, 0?b?9, 3?c?14, 1?d?8, 0.2?e?2.5, 0?f?3.0, 0?g?4.0, and 0?(e/f)?4 in terms of atomic percentage value.
    Type: Application
    Filed: January 15, 2021
    Publication date: February 23, 2023
    Inventors: Su Min KIM, Choongnyun Paul KIM
  • Publication number: 20230010470
    Abstract: An apparatus for manufacturing metal powder according to the present invention is a metal powder manufacturing apparatus, in which molten metal is broken up, and liquid droplets of the atomized molten metal are cooled by spraying cooling water using a cooling water spraying nozzle provided inside a chamber. The cooling water spraying nozzle is provided such that cooling water is sprayed in a fan shape, and cooling water spraying nozzles provided at different heights have increasing angles of inclination with respect to the inner wall of the chamber as the heights thereof are reduced, thereby decreasing a deviation between flying distances of the molten metal liquid droplets to efficiently manufacture metal powder having uniform properties.
    Type: Application
    Filed: October 28, 2020
    Publication date: January 12, 2023
    Inventors: Yong Hwan JI, Kyoung Hwa KIM, Mi So LIM, Shin KIM, Won Kyu SUH, Su Min KIM
  • Publication number: 20220416753
    Abstract: A method of designing an impedance matching circuit for an input circuit is provided. The method includes receiving a user input identifying a section of the input circuit for matching an impedance to generate a characteristic impedance value; dividing the section into a first portion and a second portion; determining a first partial matching circuit of the first portion and a second partial matching circuit of the second portion using component information about electrical components connected to the section and the generated characteristic impedance value; and combining the first partial matching circuit and the second partial matching circuit to generate an ideal matching circuit.
    Type: Application
    Filed: June 27, 2022
    Publication date: December 29, 2022
    Inventor: SU MIN KIM
  • Publication number: 20220332327
    Abstract: An embodiment sensor information fusion method includes estimating, by a host vehicle, reliability of shared sensor fusion information received from a neighboring vehicle, the shared sensor fusion information being generated by the neighboring vehicle, and generating, based on the estimated reliability, fusion track information of an object located near the host vehicle or the neighboring vehicle using host vehicle sensor fusion information generated by the host vehicle and the shared sensor fusion information.
    Type: Application
    Filed: March 4, 2022
    Publication date: October 20, 2022
    Inventors: Woo Young Lee, Su Min Jo, Su Min Kim
  • Publication number: 20220297117
    Abstract: Disclosed is a blood-brain barrier vascular network implemented in a microfluidic chip. The blood-brain bather vascular network structure (BBB on a chip) (in vitro blood-brain bather (BBB)-on-a chip) formed in a microfluidic chip manufactured by a present manufacturing method of the in vitro blood-brain barrier (BBB)-on-a chip may reconstruct the blood-brain barrier in a real human body more similarly due to a specific cell configuration, compared to the conventional in vitro blood-brain barrier (BBB)-on-a chip, and thus may be used as a more accurate in vitro blood-brain barrier, and may be used for the development of various cellular therapeutic agents or drugs that work in the treatment of various brain diseases.
    Type: Application
    Filed: March 30, 2021
    Publication date: September 22, 2022
    Applicants: UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY, SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Young-Sook SON, Su-Min KIM, Noo Li JEON, Somin LEE, Minhwan CHUNG
  • Patent number: 11336931
    Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: May 17, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Han-jin Park, Su-min Kim, Seock-young Shim, Ji-eun Lee, Sung-min Lim
  • Patent number: 11159722
    Abstract: A method for processing an image signal, an image signal processor, and an image sensor chip are disclosed. A method for processing an image signal includes generating Bayer order status information indicating whether a Bayer order of a Bayer pattern image has been changed, based on translation information of gyro information, performing translation correction about the Bayer pattern image using the translation information, and performing interpolation about the Bayer pattern image in which the translation correction has been performed, based on the Bayer order status information.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: October 26, 2021
    Assignee: SK hynix Inc.
    Inventors: Jae Ho An, Su Min Kim, Jin Su Kim, Tae Hyun Kim, Jae Yoon Yoo, Chang Hee Pyeoun
  • Publication number: 20210263411
    Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,
    Type: Application
    Filed: August 12, 2020
    Publication date: August 26, 2021
    Inventors: Yechan KIM, Su Min KIM, Ju-Young KIM, Jinjoo KIM, Hyunwoo KIM, Juhyeon PARK, Hyunji SONG, Songse YI, Suk Koo HONG
  • Publication number: 20210255544
    Abstract: A resist composition including a polymer; a photoacid generator; and a material represented by Formula 1:
    Type: Application
    Filed: August 26, 2020
    Publication date: August 19, 2021
    Inventors: Yechan KIM, Suk Koo HONG, Su Min KIM, Ju-Young KIM, Jinjoo KIM, Hyunwoo KIM, Juhyeon PARK, Hyunji SONG, Songse YI
  • Publication number: 20210240079
    Abstract: A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A: in Formula 4A, R1 to R5 are each independently hydrogen or iodine, at least one of R1 to R5 being iodine.
    Type: Application
    Filed: August 26, 2020
    Publication date: August 5, 2021
    Inventors: Juhyeon PARK, Su Min KIM, Yechan KIM, Ju-Young KIM, Jinjoo KIM, Hyunwoo KIM, Hyunji SONG, Songse YI, Suk Koo HONG