Abstract: A method for identifying an unclonable chip uses hardware intrinsic keys and authentication responses employing intrinsic parameters of memory cells invariant and unique to the unclonable chip, wherein intrinsic parameters that characterize the chip can extend over its lifetime. The memory cells having a charge-trap behavior are arranged in an NOR type memory array, allowing to create a physically unclonable fuse (PUF) generation using non-programmed memory cells, while stringing non-volatile bits in programmed memory cells. The non-volatile memory cell bits are used for error-correction-code (ECC) for the generated PUF. The invention can further include a public identification using non-volatile bits, allowing hand shaking authentication using computer with dynamic challenge.

Abstract: The present disclosure generally relates to a wiring structure for a fuse component and corresponding methods of fabrication. A wiring structure for a fuse component according to the present disclosure can include: a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged.

Abstract: The present disclosure generally relates to a wiring structure for a fuse component and corresponding methods of fabrication. A wiring structure for a fuse component according to the present disclosure can include: a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged.

Abstract: Embodiments of the invention relate to processor arrays, and in particular, a processor array with interconnect circuits for bonding semiconductor dies. One embodiment comprises multiple semiconductor dies and at least one interconnect circuit for exchanging signals between the dies. Each die comprises at least one processor core circuit. Each interconnect circuit corresponds to a die of the processor array. Each interconnect circuit comprises one or more attachment pads for interconnecting a corresponding die with another die, and at least one multiplexor structure configured for exchanging bus signals in a reversed order.

Abstract: A method of implementing three-dimensional (3D) integration of multiple integrated circuit (IC) devices includes forming a first insulating layer over a first IC device; forming a second insulating layer over a second IC device; forming a 3D, bonded IC device by aligning and bonding the first insulating layer to the second insulating layer so as to define a bonding interface therebetween, defining a first set of vias within the 3D bonded IC device, the first set of vias landing on conductive pads located within the first IC device, and defining a second set of vias within the 3D bonded IC device, the second set of vias landing on conductive pads located within the second device, such that the second set of vias passes through the bonding interface; and filling the first and second sets of vias with a conductive material.

Abstract: Embodiments of the invention relate to processor arrays, and in particular, a processor array with interconnect circuits for bonding semiconductor dies. One embodiment comprises multiple semiconductor dies and at least one interconnect circuit for exchanging signals between the dies. Each die comprises at least one processor core circuit. Each interconnect circuit corresponds to a die of the processor array. Each interconnect circuit comprises one or more attachment pads for interconnecting a corresponding die with another die, and at least one multiplexor structure configured for exchanging bus signals in a reversed order.

Abstract: The present disclosure generally relates to a wiring structure for a fuse component and corresponding methods of fabrication. A wiring structure for a fuse component according to the present disclosure can include: a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged.

Abstract: After forming a plurality of gate structures over a substrate having a plurality of active regions separated from each other by at least one shallow trench isolation (STI) regions, inter-gate dielectric contact structures extending through an interlevel dielectric (ILD) layer that surrounds the gate structures are formed. Each inter-gate dielectric contact structure encloses a corresponding gate structure and is in contact with a dielectric gate cap and a dielectric gate spacer of the corresponding gate structure and a portion of the at least one STI region abutting the dielectric gate spacer of the corresponding gate structure. The inter-gate dielectric contact structure is electrically insulated from a gate conductor in the corresponding gate structure by the dielectric gate cap and the dielectric gate spacer and serves as a control gate in a memory cell of a flash memory array.

Abstract: The embodiments of the present invention relate generally to the fabrication of integrated circuits, and more particularly to a structure and method for fabricating a 3D integration scheme for multiple semiconductor wafers using an arrangement of intra-wafer through silicon vias (TSVs) to electrically connect the front side of a first integrated circuit (IC) chip to large back side wiring on the back side of the first IC chip and inter-wafer TSVs to electrically connect the first IC chip to a second IC chip.

Abstract: In a communication system where a primary cell is controlled by a first base station and a secondary cell is controlled by a second, different base station, flow control is performed between the primary cell and the secondary cell for data for a radio link control layer. According to the flow control, the data for the radio link control layer is communicated between the first and second base stations using a link between the first and second base stations. Flow control may be performed between the primary cell and the secondary cell by dynamically controlling a depth of queued radio link control data in the secondary cell for one or more UEs based on one or more factors, e.g., current/future loading of secondary cell, peak theoretical throughput for a UE in the secondary cell, and/or a UE's current channel quality information. Apparatus, methods, and computer program products are disclosed.

Abstract: A mechanism that provides a source of reliability concern is leveraged to establish a non-volatile memory element. A memory cell may be programmed to have a longer retention time or a shorter retention time. Such mechanisms include, but are not limited to, threshold voltage modulation by charge trapping in the gate dielectric of an access transistor of a dynamic random access memory (DRAM) cell. A memory cell is programmed with a voltage pulse into a long retention time mode or into a short retention time mode. The programmed mode of each memory cell may be read by storing electrical charges in the DRAM cells, and by measuring whether the electrical charges remain after a threshold retention time. Further, a dual mode memory cell may be operated as a conventional DRAM cell, or as a non-volatile memory storing retention time as data.

Abstract: The present invention provides antifuse structures having an integrated heating element and methods of programming the same, the antifuse structures comprising first and second conductors and a dielectric layer formed between the conductors, where one or both of the conductors functions as both a conventional antifuse conductor and as a heating element for directly heating the antifuse dielectric layer during programming.

Abstract: A mechanism that provides a source of reliability concern is leveraged to establish a non-volatile memory element. A memory cell may be programmed to have a longer retention time or a shorter retention time. Such mechanisms include, but are not limited to, threshold voltage modulation by charge trapping in the gate dielectric of an access transistor of a dynamic random access memory (DRAM) cell. A memory cell is programmed with a voltage pulse into a long retention time mode or into a short retention time mode. The programmed mode of each memory cell may be read by storing electrical charges in the DRAM cells, and by measuring whether the electrical charges remain after a threshold retention time. Further, a dual mode memory cell may be operated as a conventional DRAM cell, or as a non-volatile memory storing retention time as data.

Abstract: A method for identifying an unclonable chip uses hardware intrinsic keys and authentication responses employing intrinsic parameters of memory cells invariant and unique to the unclonable chip, wherein intrinsic parameters that characterize the chip can extend over its lifetime. The memory cells having a charge-trap behavior are arranged in an NOR type memory array, allowing to create a physically unclonable fuse (PUF) generation using non-programmed memory cells, while stringing non-volatile bits in programmed memory cells. The non-volatile memory cell bits are used for error-correction-code (ECC) for the generated PUF. The invention can further include a public identification using non-volatile bits, allowing hand shaking authentication using computer with dynamic challenge.

Abstract: The present disclosure generally relates to a wiring structure for a fuse component and corresponding methods of fabrication. A wiring structure for a fuse component according to the present disclosure can include: a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged.

Abstract: Embodiments of the present invention provide an authenticating service of a chip having an intrinsic identifier (ID). In a typical embodiment, an authenticating device is provided that includes an identification (ID) engine, a self-test engine, and an intrinsic component. The intrinsic component is associated with a chip and includes an intrinsic feature. The self-test engine retrieves the intrinsic feature and communicates it to the identification engine. The identification engine receives the intrinsic feature, generates a first authentication value using the intrinsic feature, and stores the authentication value in memory. The self-test engine generates a second authentication value using an authentication challenge. The identification engine includes a compare circuitry that compares the first authentication value and the second authentication value and generates an authentication output value based on the results of the compare of the two values.

Abstract: The embodiments of the present invention relate generally to the fabrication of integrated circuits, and more particularly to a structure and method for fabricating a 3D integration scheme for multiple semiconductor wafers using an arrangement of intra-wafer through silicon vias (TSVs) to electrically connect the front side of a first integrated circuit (IC) chip to large back side wiring on the back side of the first IC chip and inter-wafer TSVs to electrically connect the first IC chip to a second IC chip.

Abstract: A semiconductor device includes an epitaxy layer formed on semiconductor substrate, a device layer formed on the epitaxy layer, a trench formed within the semiconductor substrate and including a dielectric layer forming a liner within the trench and a conductive core forming a through-silicon via conductor, and a deep trench isolation structure formed within the substrate and surrounding the through-silicon via conductor. A region of the epitaxy layer formed between the through-silicon via conductor and the deep trench isolation structure is electrically isolated from any signals applied to the semiconductor device, thereby decreasing parasitic capacitance.

Abstract: An embedded Multi-Time-Read-Only-Memory having a (MOSFET) cells' array having an initial threshold voltage (VT0) including the MOSFETs arranged in a row and column matrix, having gates in each row coupled to a wordline (WL) running in a first direction and sources in each one of the columns coupled to a bitline (BL) running in a second direction; creating two dimensional meshed source line network running in the first and second directions, in a standby state, wherein BLs and MSLN are at a voltage (VDD), and the WLs are at ground; storing a data bit by trapping charges in a dielectric of a target MOSFET, VT0 of target MOSFET increasing to another voltage (VT1) by a predetermined amount (?VT); reading a data bit by using the MOSFET threshold voltage having one of VT0 or VT1 to determine a trapped or de-trapped charge state, and resetting the data bit to a de-trapped state by de-trapping the charge.

Abstract: Embodiments of the present invention provide an authenticating service of a chip having an intrinsic identifier (ID). In a typical embodiment, an authenticating device is provided that includes an identification (ID) engine, a self-test engine, and an intrinsic component. The intrinsic component is associated with a chip and includes an intrinsic feature. The self-test engine retrieves the intrinsic feature and communicates it to the identification engine. The identification engine receives the intrinsic feature, generates a first authentication value using the intrinsic feature, and stores the authentication value in memory. The self-test engine generates a second authentication value using an authentication challenge. The identification engine includes a compare circuitry that compares the first authentication value and the second authentication value and generates an authentication output value based on the results of the compare of the two values.