Patents by Inventor Suresh M

Suresh M has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4824690
    Abstract: In a pulsed radio frequency plasma deposition process the pulse repetition frequency is matched to the gas exchange rate. This is achieved by using a pulse width of 50 to 500 microseconds and a pulse repetition rate corresponding to the time within which gas is exchanged in the reaction region.
    Type: Grant
    Filed: November 3, 1987
    Date of Patent: April 25, 1989
    Assignee: Standard Telephones and Cables Public Limited Company
    Inventors: Rudolf A. H. Heinecke, Suresh M. Ojha, Ian P. Llewellyn
  • Patent number: 4795918
    Abstract: A temperature compensated bandgap voltage reference circuit employs an npn transistor based bypass circuit to maintain a constant collector current within the reference circuit. This bypass circuit draws a nominal current from the bandgap voltage reference circuit. The value of this current is set by a bias circuit responsive to changes in the supply voltage. As the supply voltage changes, the bias circuit varies the conductance of a bypass transistor to draw more or less current and thereby maintain the collector current within the reference circuit constant.
    Type: Grant
    Filed: May 1, 1987
    Date of Patent: January 3, 1989
    Assignee: Fairchild Semiconductor Corporation
    Inventors: Suresh M. Menon, Jay L. Cohan
  • Patent number: 4755558
    Abstract: A method is provided for quantitatively monitoring the deprotection and coupling reactions employed in the solid phase synthesis of peptides. The method entails synthesizing a peptide on a support matrix that has a first marker associated therewith. The amino acids employed in the peptide synthesis procedure have a second marker attached thereto, which can be the blocking group used for the amino acid. After the coupling or deprotection step a portion of the support matrix is processed to release first and second identifers from the first and second markers, respectively. The completeness of the coupling or deprotection step can be determined by comparing the relative amounts of the detected first and second identifiers. Novel compositions of matter are used in or produced during this method, including support matrixes having pyrolyzable markers attached thereto.
    Type: Grant
    Filed: May 30, 1986
    Date of Patent: July 5, 1988
    Assignee: Beckman Instruments, Inc.
    Inventor: Suresh M. Kalbag
  • Patent number: 4684535
    Abstract: Discontinuities, e.g. scratches, in a plastics surface are removed by exposing the surface to a pulsed radio frequency plasma comprising a mixture of argon and hydrogen. After melting has been effected the surface is exposed to an argon plasma to effect cross-linking to form a smooth surface layer.
    Type: Grant
    Filed: July 28, 1986
    Date of Patent: August 4, 1987
    Assignee: Standard Telephones & Cables
    Inventors: Rudolf A. H. Heinecke, Suresh M. Ojha, Ian P. Llewellyn
  • Patent number: 4656248
    Abstract: The preparation of [1-(.beta.-mercapto-.beta.,.beta.-cyclopentamethylenepropionic acid)-2-(O-ethyl-D-tyrosine)-4-valine-8-arginine-9-desglycine]vasopressin by oxidation of the corresponding dimercaptan is improved by using a copper II salt.
    Type: Grant
    Filed: April 23, 1985
    Date of Patent: April 7, 1987
    Assignee: SmithKline Beckman Corporation
    Inventors: Suresh M. Kalbag, Paul J. Voelker
  • Patent number: 4409064
    Abstract: This invention relates to an improved process for reducing solute in a vapor stream and, particularly, to the adaption of this process in concentrating solutions in an evaporator wherein the solution is heated to volatilize solvent. The improvement for reducing solute in the vapor stream resides in (a) the utilization of a wire mesh mist eliminator pad having a wire diameter of from 0.001-0.05 inches, an interfacial area from 50-200 ft.sup.2 /ft.sup.3, a void space of about 90-99 percent and a packing thickness of 4-16 inches and (b) spraying a liquid through the mist eliminator pad, the liquid being sprayed uniformly over the surface of the mist eliminator pad at a rate of 0.6-2.5 pounds liquid per pound of vapor to provide a wetting rate of 0.1-0.25 gallons per minute per square foot of mist eliminator surface area. The process has been particularly advantageous in the multistage concentration of corrosive products particularly in the concentration of a 60-70% sulfuric acid solution to about 93 percent.
    Type: Grant
    Filed: November 9, 1981
    Date of Patent: October 11, 1983
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Suresh M. Vora, William J. Mazzafro, Pierre L. T. Brian, Michael S. K. Chen