Patents by Inventor Susumu Sakio

Susumu Sakio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220362888
    Abstract: A deposition mask includes a resin film defining a plurality of opening portions. Each opening portions extends through the resin film. The resin film includes a first surface and a second surface opposite to the first surface. The second surface is a surface faced to a vapor deposition source during vapor deposition. The resin film defines dents comprising laser marks on the first surface. A mask member for a deposition mask is also provided.
    Type: Application
    Filed: July 29, 2022
    Publication date: November 17, 2022
    Inventors: HIDEO TAKEI, SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Patent number: 11433484
    Abstract: A deposition mask in which a resin film can be completely removed in opening portions, a method of manufacturing the deposition mask, and a mask member for the deposition mask are provided. A light irradiation source for laser light is disposed on one side of a resin film (11) and emits the laser light for forming a pattern of opening portions. A reflective film (30) is provided on another side of the resin film (11) and reflects light having a wavelength of the laser light emitted from the light irradiation source for the laser light. The laser light reflected by the reflective film (30) is used to form the patterns of the opening portion (11a) in the resin film (11).
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: September 6, 2022
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Hideo Takei, Susumu Sakio, Katsuhiko Kishimoto
  • Publication number: 20220220600
    Abstract: A vapor deposition method and a vapor deposition apparatus that, when a vapor deposition material is deposited on a substrate, make it possible to form deposition layer pattern precisely so that the deposition layer pattern is formed uniformly without a gap formed between a deposition mask and the substrate. A deposition mask is disposed with its periphery held by a frame. A substrate on which a vapor deposition layer is to be formed is mounted over the deposition mask. A vapor deposition source is disposed facing the deposition mask and evaporates a vapor deposition material. The vapor deposition is performed while the substrate is pressed vertically at a position of a center of deflection of the deposition mask and on an upper surface of the substrate until that a length of the substrate substantially becomes identical to a length of the deposition mask being bowed down and expanded.
    Type: Application
    Filed: March 31, 2022
    Publication date: July 14, 2022
    Inventors: KOSHI NISHIDA, KOZO YANO, KATSUHIKO KISHIMOTO, SUSUMU SAKIO
  • Publication number: 20220181594
    Abstract: A metal layer is formed on a first surface of a flat-plate-like support member, and then a resin cured layer is formed on the metal layer. The resin cured layer is irradiated with laser light for fine processing to form a desired fine pattern, thereby manufacturing a resin film having a fine pattern. Subsequently, ultraviolet light having a wavelength different from that of the laser light for fine processing is irradiated toward a second surface of the support member, which is opposed to the first surface to detach the resin film from the support member.
    Type: Application
    Filed: March 27, 2019
    Publication date: June 9, 2022
    Inventors: KATSUHIKO KISHIMOTO, SUSUMU SAKIO
  • Patent number: 11319624
    Abstract: A vapor deposition method and a vapor deposition apparatus that, when a vapor deposition material is deposited on a substrate, make it possible to form deposition layer pattern precisely so that the deposition layer pattern is formed uniformly without a gap formed between a deposition mask and the substrate. A deposition mask is disposed with its periphery held by a frame. A substrate on which a vapor deposition layer is to be formed is mounted over an upper surface of the deposition mask. A vapor deposition source is disposed facing the deposition mask and evaporates a vapor deposition material. The vapor deposition is performed while the substrate is pressed vertically at a position of a center of deflection of the deposition mask and on an upper surface of the substrate until that a length of the substrate substantially becomes identical to a length of the deposition mask being bowed down and expanded.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: May 3, 2022
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Koshi Nishida, Kozo Yano, Katsuhiko Kishimoto, Susumu Sakio
  • Patent number: 11313027
    Abstract: A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: April 26, 2022
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Katsuhiko Kishimoto, Koshi Nishida, Kozo Yano
  • Publication number: 20220098720
    Abstract: A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal body formed on the resin layer, the method including the steps of: (A) providing a magnetic metal body having at least one first opening; (B) providing a substrate; (C) forming a resin layer by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate, and then performing a heat treatment thereon; (D) securing the resin layer formed on the substrate on the magnetic metal body so as to cover the at least one first opening; (E) forming a plurality of second openings in a region of the resin layer that is located in the at least one first opening of the magnetic metal body; and (F) after the step (E), removing the substrate from the resin layer.
    Type: Application
    Filed: December 14, 2021
    Publication date: March 31, 2022
    Inventors: Koshi NISHIDA, Susumu SAKIO, Katsuhiko KISHIMOTO
  • Publication number: 20220088715
    Abstract: A method for manufacturing a deposition mask having a plurality of openings arranged in a matrix pattern in an active region formation portion of a mask base, which is fixed to a frame while being tensioned, the method including: a step A of preparing a mask base of an initial state fixed to a frame while being tensioned in a predetermined condition so as to define an xy plane; a step B of preparing target coordinate data that identifies a position of each of the plurality of openings in the xy plane; a step C of predicting, for each of the plurality of openings, an amount of displacement from the target coordinate data caused by the formation of the openings to generate such correction data that reduces the amount of displacement; and a step D of forming each of the plurality of openings at a position that is identified based on the target coordinate data and the correction data, wherein: in the step C, the correction data for each of the plurality of openings is associated with an order in which the plurali
    Type: Application
    Filed: April 1, 2019
    Publication date: March 24, 2022
    Inventors: SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Patent number: 11230759
    Abstract: A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal body formed on the resin layer, the method including the steps of: (A) providing a magnetic metal body having at least one first opening; (B) providing a substrate; (C) forming a resin layer by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate, and then performing a heat treatment thereon; (D) securing the resin layer formed on the substrate on the magnetic metal body so as to cover the at least one first opening; (E) forming a plurality of second openings in a region of the resin layer that is located in the at least one first opening of the magnetic metal body; and (F) after the step (E), removing the substrate from the resin layer.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: January 25, 2022
    Assignee: Sakai Display Products Corporation
    Inventors: Koshi Nishida, Susumu Sakio, Katsuhiko Kishimoto
  • Patent number: 11233199
    Abstract: A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal layer formed on the resin layer, the method including the steps of: providing a substrate; forming a resin layer by applying a solution including a resin material or a precursor solution of a resin material on a surface of the substrate, and then performing a heat treatment thereon; forming a magnetic metal layer on the resin layer, mask portion including a solid portion where a metal film is present and a hollow portion where the metal film is absent; forming a plurality of openings in a region of the resin layer that is located in the hollow portion of the mask portion; and removing the resin layer from the substrate after forming a plurality of openings in a region of the resin layer.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: January 25, 2022
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Koshi Nishida, Kozo Yano, Katsuhiko Kishimoto, Susumu Sakio, Hideo Takei
  • Publication number: 20210273168
    Abstract: A rigid material whose linear expansion coefficient is small and whose relative density is small is used to provide a vapor-deposition mask using a lightweight and highly dimension-accurate frame. A frame (15) of the vapor-deposition mask disclosed in accordance with the present embodiment is formed with a carbon-fiber reinforced plastic (CFRP).
    Type: Application
    Filed: May 14, 2021
    Publication date: September 2, 2021
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Publication number: 20210265602
    Abstract: A vapor deposition mask (100) including: a magnetic metal member (20) including at least one first opening (25); and a layered member (30) that is arranged on the magnetic metal member (20) so as to cover the at least one first opening (25) and has a plurality of second openings (13) located in the at least one first opening (25), wherein: the layered member (30) includes a first layer (m1) and a second layer (m2) that is arranged between the first layer (m1) and the magnetic metal member (20); and in the at least one first opening (25), at a first temperature that is greater than or equal to room temperature, an elastic modulus E1 of the first layer, a thickness a1 of the first layer, an internal stress ?1 of the first layer, an elastic modulus E2 of the second layer, a thickness a2 of the second layer and an internal stress ?2 of the second layer (where ?1 and ?2 are positive for tensile stress) satisfy Expressions (1) and (2) below: ?1/E1??2/E2<0??(1) 0<a1×?1+a2×?2??(2).
    Type: Application
    Filed: August 8, 2018
    Publication date: August 26, 2021
    Inventors: SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Publication number: 20210265605
    Abstract: A film formation device according to an embodiment is provided with: a substrate holder for holding a substrate in an upright position relative to the horizontal plane, the substrate having a vapor deposition surface on which a vapor-deposited film is to be formed; and an evaporation source for spraying a vapor deposition material onto the vapor deposition surface while moving relative to the substrate holder upward and/or downward, the evaporation source being disposed in a region which the vapor deposition surface of the substrate held by the substrate holder is to face. The substrate holder is configured to hold the substrate in an inclined orientation relative to the vertical plane such that the upper end of the substrate is located away from the evaporation source.
    Type: Application
    Filed: May 10, 2021
    Publication date: August 26, 2021
    Inventors: HIDENORI OGATA, SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Publication number: 20210222282
    Abstract: A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
    Type: Application
    Filed: January 25, 2021
    Publication date: July 22, 2021
    Inventors: SUSUMU SAKIO, KATSUHIKO KISHIMOTO, KOSHI NISHIDA, KOZO YANO
  • Publication number: 20210189543
    Abstract: A vapor deposition method and a vapor deposition apparatus that, when a vapor deposition material is deposited on a substrate, make it possible to form deposition layer pattern precisely so that the deposition layer pattern is formed uniformly without a gap formed between a deposition mask and the substrate. A deposition mask is disposed with its periphery held by a frame. A substrate on which a vapor deposition layer is to be formed is mounted over an upper surface of the deposition mask. A vapor deposition source is disposed facing the deposition mask and evaporates a vapor deposition material. The vapor deposition is performed while the substrate is pressed vertically at a position of a center of deflection of the deposition mask and on an upper surface of the substrate until that a length of the substrate substantially becomes identical to a length of the deposition mask being bowed down and expanded.
    Type: Application
    Filed: July 22, 2016
    Publication date: June 24, 2021
    Applicants: HON HAI PRECISION INDUSTRY CO., LTD., HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: KOSHI NISHIDA, KOZO YANO, KATSUHIKO KISHIMOTO, SUSUMU SAKIO
  • Patent number: 11043635
    Abstract: A rigid material whose linear expansion coefficient is small and whose relative density is small is used to provide a vapor-deposition mask using a lightweight and highly dimension-accurate frame. A frame (15) of the vapor-deposition mask disclosed in accordance with the present embodiment is formed with a carbon-fiber reinforced plastic (CFRP).
    Type: Grant
    Filed: December 25, 2017
    Date of Patent: June 22, 2021
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Katsuhiko Kishimoto, Susumu Sakio
  • Patent number: 11038155
    Abstract: A film formation apparatus according to an embodiment comprising: a substrate holder for holding a substrate in a standing position relative to the horizontal plane, the substrate having a vapor deposition surface on which a vapor deposition layer is formed; and an evaporation source to supply a vapor deposition material onto the vapor deposition surface while moving relative to the substrate holder upward and/or downward, the evaporation source being disposed in a region which the vapor deposition surface of the substrate held by the substrate holder is to face. The substrate holder is configured to hold the substrate in an inclined orientation relative to the vertical plane such that the upper end of the substrate is located away from the evaporation source. The apparatus further comprises an adjustment means for reducing a variation in the thickness of the vapor deposition layer, which results from the inclination of the substrate.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: June 15, 2021
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Hidenori Ogata, Susumu Sakio, Katsuhiko Kishimoto
  • Patent number: 11008646
    Abstract: A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: May 18, 2021
    Assignee: Sakai Display Products Corporation
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Patent number: 10934614
    Abstract: A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: March 2, 2021
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Katsuhiko Kishimoto, Koshi Nishida, Kozo Yano
  • Patent number: 10927443
    Abstract: A deposition mask, which are capable of enhancing close contact between a substrate for vapor deposition and a peripheral region of each opening in the deposition mask during vapor deposition, suppressing the occurrences of film blurs and shadows during vapor deposition, and performing high definition patterning, a method for manufacturing the same, and a vapor deposition method using the deposition mask, are provided. A deposition mask (1) comprises a resin film (11) having a pattern of openings (12) for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition (2).
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: February 23, 2021
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Koshi Nishida, Katsuhiko Kishimoto