Patents by Inventor Susumu Sakio

Susumu Sakio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190211436
    Abstract: A method for manufacturing a vapor deposition mask (100) including a resin layer (10), and a magnetic metal body (20) formed on the resin layer (10), the method including the steps of: (A) providing a magnetic metal body (20) having at least one first opening (25); (B) providing a substrate (60); (C) forming a resin layer (10) by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate (60), and then performing a heat treatment thereon; (D) securing the resin layer (10) formed on the substrate (60) on the magnetic metal body (20) so as to cover the at least one first opening (25); (E) forming a plurality of second openings (13) in a region of the resin layer (10) that is located in the at least one first opening (25) of the magnetic metal body (20); and (F) after the step (E), removing the substrate (60) from the resin layer (10).
    Type: Application
    Filed: January 31, 2017
    Publication date: July 11, 2019
    Applicant: Sakai Display Products Corporation
    Inventors: Koshi NISHIDA, Susumu SAKIO, Katsuhiko KISHIMOTO
  • Publication number: 20190106781
    Abstract: A deposition mask, which are capable of enhancing close contact between a substrate for vapor deposition and a peripheral region of each opening in the deposition mask during vapor deposition, suppressing the occurrences of film blurs and shadows during vapor deposition, and performing high definition patterning, a method for manufacturing the same, and a vapor deposition method using the deposition mask, are provided. A deposition mask (1) comprises a resin film (11) having a pattern of openings (12) for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition (2).
    Type: Application
    Filed: July 27, 2016
    Publication date: April 11, 2019
    Inventors: SUSUMU SAKIO, KOSHI NISHIDA, KATSUHIKO KISHIMOTO
  • Publication number: 20190100834
    Abstract: A vapor deposition mask (100) includes a resin layer (10) including a plurality of openings (11); a magnetic metal layer (20) located so as to overlap the resin layer, the magnetic metal layer including a mask portion (20a) having such a shape as to expose the plurality of openings and a peripheral portion (20b) located so as to enclose the mask portion; and a frame (30) secured to the peripheral portion of the magnetic metal layer. The resin layer is not joined to the mask portion of the magnetic metal layer but is joined to at least a part of the peripheral portion of the magnetic metal layer.
    Type: Application
    Filed: July 28, 2016
    Publication date: April 4, 2019
    Inventors: SUSUMU SAKIO, KATSUHIKO KISHIMOTO, KOSHI NISHIDA, KOZO YANO
  • Publication number: 20190084088
    Abstract: A deposition mask in which a resin film can be completely removed in opening portions, a method of manufacturing the deposition mask, and a mask member for the deposition mask are provided. A light irradiation source for laser light is disposed on one side of a resin film (11) and emits the laser light for forming a pattern of opening portions. A reflective film (30) is provided on another side of the resin film (11) and reflects light having a wavelength of the laser light emitted from the light irradiation source for the laser light. The laser light reflected by the reflective film (30) is used to form the patterns of the opening portion (11a) in the resin film (11).
    Type: Application
    Filed: July 22, 2016
    Publication date: March 21, 2019
    Inventors: HIDEO TAKEI, SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Publication number: 20190067578
    Abstract: A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the ((n+1)/2)th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a ?x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns. The steps B and C are performed after the step A.
    Type: Application
    Filed: August 31, 2017
    Publication date: February 28, 2019
    Inventors: Katsuhiko KISHIMOTO, Susumu SAKIO
  • Publication number: 20190055640
    Abstract: A deposition mask capable of performing high-definition patterning while suppressing position gap between a substrate for vapor deposition and an opening arrangement of the deposition mask during vapor deposition and a manufacturing method thereof are provided. A deposition mask (1) includes a resin film (2) having an opening (4) pattern for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition. The deposition mask (1) includes a low-emissivity layer (5) whose emissivity is lower than that of the resin film (2), which is formed at least partly on a surface of the resin film (2) facing a vapor deposition source, thereby suppressing temperature rise of the resin film (2) due to heat radiated from the vapor deposition source.
    Type: Application
    Filed: July 27, 2016
    Publication date: February 21, 2019
    Inventors: SUSUMU SAKIO, KATSUHIKO KISHIMOTO
  • Publication number: 20190044069
    Abstract: A method for producing a resin film by using a resin material and accurately forming a fine pattern as a vapor deposition mask or an optical element, a method for producing an organic EL display device, a base film for forming a fine pattern and a resin film with a supporting member are provided. A liquid resin material is applied onto a supporting member to form a resin coating film (S1), and a temperature of the resin coating film is increased to a temperature at which the resin material cures, to form a baked resin film (S2). Thereafter, a base film formed by the baked resin film attached to the supporting member is processed by irradiating with lasers, to form a resin film (1b) having a desired fine pattern and the supporting member (S3). Thereafter, the baked resin film on which the fine pattern is formed is peeled from the supporting member, and the resin film having the fine pattern is obtained (S5).
    Type: Application
    Filed: July 22, 2016
    Publication date: February 7, 2019
    Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: KOSHI NISHIDA, KOZO YANO, KATSUHIKO KISHIMOTO, SUSUMU SAKIO, HIDEO TAKEI
  • Publication number: 20190044070
    Abstract: A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal layer formed on the resin layer, the method including the steps of: providing a substrate; forming a resin layer by applying a solution including a resin material or a precursor solution of a resin material on a surface of the substrate, and then performing a heat treatment thereon; forming a magnetic metal layer on the resin layer, mask portion including a solid portion where a metal film is present and a hollow portion where the metal film is absent; forming a plurality of openings in a region of the resin layer that is located in the hollow portion of the mask portion; and removing the resin layer from the substrate after forming a plurality of openings in a region of the resin layer.
    Type: Application
    Filed: July 25, 2016
    Publication date: February 7, 2019
    Inventors: KOSHI NISHIDA, KOZO YANO, KATSUHIKO KISHIMOTO, SUSUMU SAKIO, HIDEO TAKEI
  • Patent number: 8685498
    Abstract: A coated film with no observable streak is formed. The landing positions of a first discharge liquid discharged through a first printing head and the landing positions of a second discharge liquid discharged through a second printing head are disposed in a mixed manner in an area on a substrate where the first printing head and the second printing head overlap. Which discharge liquids are to be landed is determined according to random numbers. Since a coated film which is formed with the first and second discharge liquids in a mixed manner is disposed between a coated film formed with the first discharge liquids and a coated film formed with the second discharge liquids, a boundary is obscured and no streak appears.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: April 1, 2014
    Assignee: Ulvac, Inc.
    Inventors: Takahiro Miyata, Masao Murata, Mitsuru Yahagi, Junpei Yuyama, Kyuzo Nakamura, Atsushi Kira, Kou Fuwa, Ai Tanaka, Tooru Okuno, Susumu Sakio
  • Publication number: 20110162710
    Abstract: A solar cell includes: a photoelectric converter in which a first electrode layer, a photoelectric conversion layer, and a second electrode layer are stacked on a substrate in order; and a texture layer that is disposed between the substrate and the first electrode layer, made of a transparent material in a visible light region, and has a continuous irregular configuration on a face that is in touch with the first electrode layer.
    Type: Application
    Filed: September 10, 2009
    Publication date: July 7, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Shunji Kuroiwa, Yusuke Mizuno, Susumu Sakio, Kensuke Hiraoka
  • Publication number: 20110120553
    Abstract: A method for manufacturing a solar cell, includes a scribing step in which grooves electrically-separating a photoelectric converter into a plurality of compartment sections are formed after the photoelectric converter is formed on a substrate by stacking a first-electrode layer, a photoelectric conversion layer, and a second-electrode layer in this order; a first groove, a second groove, a third groove, and a fourth groove are formed in the scribing step; the method including an insulating-layer forming step in which an insulating layer is formed after the scribing step and a wiring layer forming step in which a wiring layer is formed; the wiring layer passes from the first-electrode layer that is exposed at a bottom face of the second groove, through the inside of the second groove and a surface of the insulating layer, to a surface of the second-electrode layer that is disposed so as to be lateral to the fourth groove opposite to the second groove; and the wiring layer electrically connects the plurality o
    Type: Application
    Filed: July 3, 2009
    Publication date: May 26, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Susumu Sakio, Masafumi Wakai, Shunji Kuroiwa
  • Publication number: 20100310828
    Abstract: [Object]To provide a substrate processing method capable of forming a concavo-convex structure on a substrate surface while reducing the number of processes. [Solving Means] In a substrate processing method according to the present invention, particles are dispersed on a surface of a substrate, and a concavo-convex structure is formed on the surface of the substrate by etching the surface of the substrate with the particles as a mask and the mask is simultaneously removed by the etching. According to this method, a process of removing the mask from the substrate surface after the concavo-convex structure is formed becomes unnecessary. Accordingly, since the number of processes necessary to form the concavo-convex structure on the substrate surface is largely reduced, it becomes possible to greatly improve productivity.
    Type: Application
    Filed: November 13, 2008
    Publication date: December 9, 2010
    Applicant: ULVAC, INC.
    Inventors: Susumu Sakio, Hideo Takei, Kazuya Saito, Kazuhiro Watanabe, Shinsuke Iguchi, Hiroyuki Yamakawa, Kyuzou Nakamura, Yu-hsin Lin, Huang-choung Chang, Tung-jung Wu
  • Publication number: 20100112230
    Abstract: A coated film with no observable streak is formed. The landing positions of a first discharge liquid discharged through a first printing head and the landing positions of a second discharge liquid discharged through a second printing head are disposed in a mixed manner in an area on a substrate where the first printing head and the second printing head overlap. Which discharge liquids are to be landed is determined according to random numbers. Since a coated film which is formed with the first and second discharge liquids in a mixed manner is disposed between a coated film formed with the first discharge liquids and a coated film formed with the second discharge liquids, a boundary is obscured and no streak appears.
    Type: Application
    Filed: December 18, 2009
    Publication date: May 6, 2010
    Applicant: ULVAC, INC.
    Inventors: Takahiro Miyata, Masao Murata, Mitsuru Yahagi, Junpei Yuyama, Kyuzo Nakamura, Atsushi Kira, Kou Fuwa, Ai Tanaka, Tooru Okuno, Susumu Sakio
  • Publication number: 20090066976
    Abstract: A printing apparatus free from contamination of dust into a coated layer is provided. A printing apparatus of this application includes a first ejecting head and a printing head. The first ejecting head is located on a leading side in a moving direction D of the printing head. Since electric charge is removed from an object to be printed and dust is removed therefrom, by blowing an electric charge-removing gas through the first ejecting head before an ink lands on the object to be printed, dust does not contaminate a coated layer. In addition, since a suction hole is arranged between an ejecting hole and a nozzle zone, a stream of the electric charge-removing gas is not formed in the nozzle zone, and thus a meniscus of nozzles is not disturbed.
    Type: Application
    Filed: October 28, 2008
    Publication date: March 12, 2009
    Applicant: ULVAC, INC.
    Inventors: Hiroto UCHIDA, Susumu Sakio, Hideo Takei, Mitsuru Yahagi, Junpei Yuyama, Akira Sawamori, Shigeru Endoh, Michiharu Sugimoto
  • Patent number: 5958637
    Abstract: An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer which comprises a charge generation layer containing a charge generation material and a charge transport layer containing a charge transport material, the charge generation material comprising a phthalocyanine composition (A) which comprises a phthalocyanine, and the charge transport material comprising a benzidine derivative (B) represented by the following general formula (I) ##STR1## wherein each R.sup.1 independently is a halogen atom, an alkyl group, an alkoxy group, an aryl group, a fluoroalkyl group or a fluoroalkoxy group, each R.sup.2 independently is hydrogen atom or an alkyl group, m is an integer of 0 to 5, and when m is an integer of 2 to 5, the groups R.sup.1 are identical with or different from each other, and a coating solution for production of charge transport layers which contains the benzidine derivative (B).
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: September 28, 1999
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yoshii Morishita, Takayuki Akimoto, Megumi Matsui, Shigeru Hayashida, Susumu Sakio