Abstract: The present disclosure relates to a layout arrangement and method to minimize the area overhead associated with a transition between a semiconductor device array and background features. A nearly buffer zone free layout methodology is proposed, wherein an array of square unit cells with a first pattern density value is surrounded by background features with a second pattern density value. A difference between the first pattern density value and second pattern density value results in a density gradient at an edge of the array. Unit cells on the edge of the array which are impacted by a shape tolerance stress resulting from the density gradient are identified and reconfigured from a square shape aspect ratio to a rectangular shape aspect ratio with along axis of the unit cell oriented in a direction parallel to the variation induced shape tolerance stress to alleviate the variation.

Abstract: A circuit includes a comparator unit, a capacitive device, and a switching network. The comparator unit is configured to set a control signal at a first logical value when an output voltage reaches a first voltage value from being less than the first voltage value, and to set the control signal at a second logical value when the output voltage reaches a second voltage value from being greater than the second voltage. The capacitive device provides the output voltage. The switching network is configured to charge or discharge the capacitive device based on the control signal.

Abstract: A circuit includes a comparator unit and a switching network. The comparator unit is configured to receive a first voltage value, a second voltage value and a third voltage value of a voltage node, and to provide a control signal. The switching network includes the voltage node and is configured to operate in a first condition or in a second condition based on the control signal. Based on the first condition, the voltage node is configured to have a voltage value increase to the first voltage value.

Abstract: The present disclosure relates to a layout arrangement and method to minimize the area overhead associated with a transition between a semiconductor device array and background features. A nearly buffer zone free layout methodology is proposed, wherein an array of square unit cells with a first pattern density value is surrounded by background features with a second pattern density value. A difference between the first pattern density value and second pattern density value results in a density gradient at an edge of the array. Unit cells on the edge of the array which are impacted by a shape tolerance stress resulting from the density gradient are identified and reconfigured from a square shape aspect ratio to a rectangular shape aspect ratio with along axis of the unit cell oriented in a direction parallel to the variation induced shape tolerance stress to alleviate the variation.

Abstract: A transformer with power factor compensation and a DC/AC inverter constructed thereby are presented. The power factor compensation transformer includes a primary winding, a secondary winding, and a power factor compensation capacitor bank, while the secondary winding having a coupling winding and a power factor compensation winding. The primary winding connects to a power grid in parallel, the coupling winding connects to an AC output port of a passive trigger type DC/AC inverter, and the power factor compensation winding serially connects with the power factor compensation capacitor bank. Besides, a triggered switch serially connecting with the power factor compensation winding and power factor compensation capacitor bank is provided when an inductor with air gap links the passive trigger type DC/AC inverter and the coupling winding. Consequently, a function of power factor correction is achieved.