Patents by Inventor Tadashi Kitamura
Tadashi Kitamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7660455Abstract: First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2.Type: GrantFiled: January 28, 2005Date of Patent: February 9, 2010Assignee: Nanogeometry Research Inc.Inventors: Masahiro Yamamoto, Tadashi Kitamura
-
Patent number: 7566377Abstract: A liquid crystal sealing agent composition that is a one-component light and heat-curable resin composition containing: (1) a solid epoxy resin having a ring and ball method softening temperature of 40° C. or above; (2) an acrylate monomer and/or a methacrylate monomer, or an oligomer thereof; (3) a thermoplastic polymer having a ring and ball method softening temperature of 50 to 120° C., the thermoplastic polymer being obtained by copolymerizing an acrylate monomer and/or a methacrylate monomer with a monomer copolymerizable therewith; (4) a light-activated radical polymerization initiator; and (5) a latent epoxy curing agent.Type: GrantFiled: September 19, 2003Date of Patent: July 28, 2009Assignees: Mitsui Chemicals, Inc., Sharp Kabushiki KaishaInventors: Takahisa Miyawaki, Yasushi Mizuta, Fumito Takeuchi, Kenji Itou, Tadashi Kitamura, Hiroyuki Asakura, Kenichi Yashiro, Kei Nagata
-
Patent number: 7541075Abstract: A sealant composition for a plastic liquid display cell is composed of a one-component epoxy resin composition of a base resin liquid and a curing agent liquid, wherein the base resin is a liquid epoxy resin having from 1.7 to 6 in weight average of epoxy groups in one molecule and an ionic conductivity of 2 mS/m or less; and the curing agent has an ionic conductivity of 0.6 mS/m or less. The sealant composition facilitates the fabrication of plastic liquid crystal displays having enhanced durability and sealant properties, particularly in high temperature and high humidity environments.Type: GrantFiled: May 26, 2005Date of Patent: June 2, 2009Assignee: Mitsui Chemicals, Inc.Inventors: Tadashi Kitamura, Hiroshi Kondo, Sunao Maeda
-
Publication number: 20080130982Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: ApplicationFiled: December 4, 2007Publication date: June 5, 2008Inventors: Tadashi Kitamura, Toshiaki Hasebe, Masatoshi Tsuneoka
-
Publication number: 20070179221Abstract: A method for producing a liquid crystal display cell comprising processes of applying a sealing agent on a sealing portion of at least one liquid crystal display cell substrate, dropping liquid crystal on the substrate, and bonding substrates to each other under vacuum, wherein the sealing agent comprising a material to be cured and a curing agent is applied to the sealing portion without mixing the material to be cured and the curing agent, and then the substrates are bonded to each other under vacuum at room temperature to cure the sealing agent, is disclosed. A sealing agent for a liquid crystal display cell wherein the above material to be cured comprise a radically polymerizable resin and an organic peroxide, and the above curing agent comprises a radically polymerizable resin and a decomposition accelerator, is also disclosed.Type: ApplicationFiled: April 3, 2007Publication date: August 2, 2007Inventor: Tadashi Kitamura
-
Publication number: 20060245636Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected.Type: ApplicationFiled: May 17, 2006Publication date: November 2, 2006Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Toshiaki Hasebe
-
Publication number: 20060009579Abstract: A liquid crystal sealing agent composition that is a one-component light and heat-curable resin composition containing: (1) a solid epoxy resin having a ring and ball method softening temperature of 40° C. or above; (2) an acrylate monomer and/or a methacrylate monomer, or an oligomer thereof; (3) a thermoplastic polymer having a ring and ball method softening temperature of 50 to 120° C., the thermoplastic polymer being obtained by copolymerizing an acrylate monomer and/or a methacrylate monomer with a monomer copolymerizable therewith; (4) a light-activated radical polymerization initiator; and (5) a latent epoxy curing agent.Type: ApplicationFiled: September 19, 2003Publication date: January 12, 2006Applicant: MITSUI CHEMICALS AND AND SHARP KABUSHIKI KAISHAInventors: Takahisa Miyawaki, Yasushi Mizuta, Fumito Takeuchi, Kenji Itou, Tadashi Kitamura, Hiroyuki Asakura, Kenichi yashiro, Kei Nagata
-
Publication number: 20050249891Abstract: A two-component sealant composition for a plastic liquid crystal display cell of the invention contains the following components (1) to (6): (1) a liquid epoxy resin having from 1.7 to 6 in weight average of epoxy groups in one molecule and an ionic conductivity of an aqueous solution obtained by extraction separation by contact mixing with 10 times by weight of pure water at from 40 to 80° C. of 2 mS/m or less, (2) a curing agent containing one or a mixture of two or more selected from a tetrafunctional mercapto compound, a modified polymercapto derivative, a micro-encapsulated imidazole compound, or a methyl methacrylate adduct of an alicyclic diamine, having an ionic conductivity of an aqueous solution obtained by extraction separation by contact mixing with 10 times by weight of pure water at from 40 to 80° C. of 0.6 mS/m or less, (3) a curing accelerator,(4) an inorganic filler,(5) a silane coupling agent, and (6) rubbery polymer fine particles having a softening temperature of 0° C.Type: ApplicationFiled: May 26, 2005Publication date: November 10, 2005Applicant: Mitsui Chemicals Inc.Inventors: Tadashi Kitamura, Hiroshi Kondo, Sunao Maeda
-
Publication number: 20050226494Abstract: First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2.Type: ApplicationFiled: January 28, 2005Publication date: October 13, 2005Inventors: Masahiro Yamamoto, Tadashi Kitamura
-
Publication number: 20050146714Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: ApplicationFiled: February 16, 2005Publication date: July 7, 2005Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto
-
Patent number: 6913798Abstract: A sealant composition for a plastic liquid crystal display cell is composed of a two-component epoxy resin composition of a base resin liquid and a curing agent liquid, wherein the base resin is a liquid epoxy resin having from 1.7 to 6 in weight average of epoxy groups in one molecule and an ionic conductivity of 2 mS/m or less; and the curing agent has an ionic conductivity of 0.6 mS/m or less. The sealant composition facilitates the fabrication of plastic liquid crystal displays having enhanced durability and sealant properties, particularly in high temperature and high humidity environments.Type: GrantFiled: June 21, 2001Date of Patent: July 5, 2005Assignee: Mitsui Chemicals, Inc.Inventors: Tadashi Kitamura, Hiroshi Kondo, Sunao Maeda
-
Publication number: 20050143513Abstract: A method for producing a liquid crystal display cell comprising processes of applying a sealing agent on a sealing portion of at least one liquid crystal display cell substrate, dropping liquid crystal on the substrate, and bonding substrates to each other under vacuum, wherein the sealing agent comprising a material to be cured and a curing agent is applied to the sealing portion without mixing the material to be cured and the curing agent, and then the substrates are bonded to each other under vacuum at room temperature to cure the sealing agent, is disclosed. A sealing agent for a liquid crystal display cell wherein the above material to be cured comprise a radically polymerizable resin and an organic peroxide, and the above curing agent comprises a radically polymerizable resin and a decomposition accelerator, is also disclosed.Type: ApplicationFiled: January 31, 2003Publication date: June 30, 2005Applicant: Mitsui Chemicals, Inc.Inventor: Tadashi Kitamura
-
Patent number: 6868175Abstract: First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1 can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2 can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2.Type: GrantFiled: August 25, 2000Date of Patent: March 15, 2005Assignee: Nanogeometry ResearchInventors: Masahiro Yamamoto, Tadashi Kitamura
-
Patent number: 6812065Abstract: Provided is an anisotropic conductive paste in which an aqueous solution obtained by admixing the anisotropic conductive paste with purified water has an ionic conductivity of 1 mS/m or less; the B stage-reduced composition has a viscosity of 50 to 10000 Pa.s at 80 to 100° C.; and the cured matter of the anisotropic conductive paste has a linear expansion coefficient of 10×10−5 mm/mm/° C. or less at 0 to 100° C., a heat deformation temperature Tg of 100° C. or higher, a water absorption coefficient of 2 mass % or less and a specific resistance of 1×109&OHgr;.cm or more.Type: GrantFiled: November 30, 2000Date of Patent: November 2, 2004Assignees: Mitsui Chemicals, Inc., Sharp Kabushiki KaishaInventor: Tadashi Kitamura
-
Publication number: 20040081350Abstract: A pattern inspection apparatus inspects fine patterns such as semiconductors (LSI), liquid crystal panels, and masks (reticles) for those. The pattern inspection apparatus includes a storage device for storing said reference pattern, an image generator for scanning the pattern to-be-inspected with a charged particle beam to produce an image of the pattern to-be-inspected, an input device for inputting the image of the pattern to-be-inspected, an inspection device for inspecting the pattern to-be-inspected by comparing an edge of the inputted image of the pattern to-be-inspected and an edge of the stored reference pattern with each other, and an output device for outputting a result of the inspection of the pattern to-be-inspected.Type: ApplicationFiled: October 21, 2003Publication date: April 29, 2004Inventors: Tadashi Kitamura, Kazufumi Kubota, Masahiro Yamamoto
-
Publication number: 20040075802Abstract: A sealant for a liquid crystal display cell which has a water absorption coefficient of 2 mass % or less, and a composition for a liquid crystal display cell sealant comprising an epoxy resin (1), a curing agent (2) comprising at least one selected from polyphenol compounds, polyphenol resins and esterified products thereof and a curing accelerator (3) comprising at least one selected from alkylurea derivatives and phosphazene compounds. A liquid crystal display element produced by using the composition is capable of securing long time display (quality) stability under high temperature and high humidity.Type: ApplicationFiled: October 10, 2003Publication date: April 22, 2004Applicant: MITSUI CHEMICALS, INC.Inventors: Tadashi Kitamura, Sunao Maeda
-
Patent number: 6555187Abstract: Provided is a liquid crystal sealant composition in which an aqueous solution obtained by admixing the epoxy resin composition with purified water has an ionic conductivity of 1 mS/m or less; the B stage-reduced product has a viscosity of 50 to 10000 Pa·s at 80 to 100° C.; the cured matter of the above composition has a linear expansion coefficient of 10×10−5 mm/mm/° C. or less and a glass transition temperature Tg of 100° C. or higher; and the above cured matter has a moisture permeability of 200 g/m2·24 hours or less at 80° C. and which can meet a liquid crystal display element (cell) produced by a single layer press hot bonding system and exhibits high adhesion reliability and makes it possible to produce a homogeneous liquid crystal display element having a high quality.Type: GrantFiled: November 30, 2000Date of Patent: April 29, 2003Assignee: Mitsui Chemicals, Inc.Inventor: Tadashi Kitamura
-
Publication number: 20020176046Abstract: An object of the invention is to provide a sealant composition for a plastic liquid crystal display cell that is capable of being applied to a sheet heat press adhesion method and of producing a plastic liquid crystal display cell having high reliability under a high temperature and high humidity environment.Type: ApplicationFiled: February 21, 2002Publication date: November 28, 2002Inventors: Tadashi Kitamura, Hiroshi Kondo, Sunao Maeda
-
Patent number: 6399953Abstract: A method for automatically recognizing a stage position of a feature of a semiconductor wafer comprises the steps of identifying a feature of a semiconductor wafer disposed at a predetermined distance from an alignment mark on the semiconductor wafer and obtaining an electron beam image, an optical image or a differential image thereof of the feature of the semiconductor wafer. A normalized correlation coefficient from the image of the feature is then calculated, and a stage position of the feature of the semiconductor wafer is automatically recognized in accordance with the normalized correlation coefficient.Type: GrantFiled: January 8, 1999Date of Patent: June 4, 2002Assignee: Seiko Instruments Inc.Inventor: Tadashi Kitamura
-
Patent number: 5633317Abstract: A resin composition containing graft copolymer having at least one isocyanate group and 10,000 to 20,000 number-average molecular weight or high-molecular-weight polymer having at least one isocyanate group and 10,000 to 200,000 number-average molecular weight, and low-molecular-weight polymer having or not having an isocyanate group and 500 to 8,000 number-average molecular weight. This resin composition has tackiness at ordinary temperature, and long pot life. It can be used for reactive hot melt type adhesives (which can omit hot press process), reactive hot melt type pressure-sensitive adhesives, or coating material.Type: GrantFiled: September 7, 1994Date of Patent: May 27, 1997Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Eiichi Kawasaki, Kiyoto Doi, Tadashi Kitamura, Kousuke Suewaka, Kazuya Shinkoda