Patents by Inventor Takahiro Kishioka

Takahiro Kishioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10437151
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Shigeo Kimura, Yuki Usui, Tomoya Ohashi, Takahiro Kishioka
  • Publication number: 20190211242
    Abstract: A novel photosensitive adhesive composition including the following components (A), (B), (C), and (D): Component (A): a polymer having a structural unit of the following formula (1) and a structure of the following formula (2) at a terminal, Component (B): a polymer having the structural unit of formula (1), and a carboxy group or hydroxy group at a terminal, Component (C): a radical photopolymerization initiator, and Component (D): a solvent, wherein the content by mass of the component (B) is larger than that of the component (A), (wherein X is a C1-6 alkyl group, a vinyl group, an allyl group, or a glycidyl group, m and n are each independently 0 or 1, Q is a divalent C1-16 hydrocarbon group, Z is a divalent C1-4 linking group, the divalent linking group being bonded to an —O— group in formula (1), and R1 is a hydrogen atom or a methyl group.
    Type: Application
    Filed: August 25, 2017
    Publication date: July 11, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Takuya OHASHI, Tomoyuki ENOMOTO, Takahiro KISHIOKA
  • Publication number: 20190177475
    Abstract: There is provided a composition for forming a novel resist underlayer film that has a high dry etching rate, functions as an anti-reflective coating during exposure, and fills a recess having a narrow space and a high aspect ratio. A composition for forming a resist underlayer film comprising a copolymer having a structural unit of the following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent. (wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.
    Type: Application
    Filed: February 23, 2017
    Publication date: June 13, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto OGATA, Yuki USUI, Mamoru TAMURA, Takahiro KISHIOKA
  • Publication number: 20190163064
    Abstract: A composition for forming a protective film against basic aqueous hydrogen peroxide solution, including a crosslinker having, in one molecule, two or more groups at least one selected from the group consisting of a glycidyl group, a terminal epoxy group, an epoxycyclopentyl group, an epoxycyclohexyl group, an oxetanyl group, a vinyl ether group, an isocyanate group, and a blocked isocyanate, a compound having a group of Formula (1): (wherein X1 is a substituent reacting with the crosslinker, R0 is a direct bond or a C1-2 alkylene group, X2 is a C1-2 alkyl group, C1-2 alkoxy group, or fluoro group, a is an integer of 0-2, b is an integer of 1-3, c is an integer of 0-4, and b and c satisfy a relational expression of 1?(b+c)?5) on a side chain or a terminal and having a weight average molecular weight of 800 or more, and an organic solvent.
    Type: Application
    Filed: April 21, 2017
    Publication date: May 30, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Tomoya OHASHI, Hiroto OGATA, Yuto HASHIMOTO, Yuki USUI, Yasushi SAKAIDA, Takahiro KISHIOKA
  • Publication number: 20190163063
    Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.
    Type: Application
    Filed: April 11, 2017
    Publication date: May 30, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Yasushi SAKAIDA, Kenji TAKASE, Takahiro KISHIOKA, Rikimaru SAKAMOTO
  • Publication number: 20190092681
    Abstract: A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin. The method is applied to a light extraction layer of an LED or a low-reflective glass of a solar cell.
    Type: Application
    Filed: September 15, 2016
    Publication date: March 28, 2019
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keisuke HASHIMOTO, Yasunobu SOMEYA, Takahiro KISHIOKA, Rikimaru SAKAMOTO
  • Patent number: 10240122
    Abstract: A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: March 26, 2019
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., KYOTO UNIVERSITY
    Inventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Otani, Kenichiro Kamei, Li Liu, Yong Chen
  • Publication number: 20190086806
    Abstract: The invention provides a resist underlayer film forming composition which contains a compound having a glycoluril skeleton and which prevents collapse of a resist pattern formed on a substrate in a lithography process during semiconductor production; a resist underlayer film which uses this composition; and a method for producing a semiconductor device. The compound is of formula (1-1), wherein each of R1-R4 represents a C2-C10 alkyl group wherein a hydrogen atom is substituted by at least one substituent selected from the group consisting of a hydroxy group, a thiol group, a carboxyl group, C1-C5 alkoxyethyl groups, C1-C5 alkylsulfanyl groups and organic groups containing an ester bond, or a C2-C10 alkenyl group; the R1-R4 moieties may be the same as or different from each other; and each of R5 and R6 represents a hydrogen atom or a group selected from among C1-C10 alkyl groups and a phenyl group.
    Type: Application
    Filed: March 29, 2017
    Publication date: March 21, 2019
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Yuki USUI, Takahiro KISHIOKA, Yasushi SAKAIDA, Hiroto OGATA
  • Patent number: 10222697
    Abstract: The invention provides a fiber containing (A) a polymer compound containing a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: March 5, 2019
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., TOYAMA PREFECTURE
    Inventors: Takahiro Kishioka, Yoshiyuki Yokoyama
  • Patent number: 10202528
    Abstract: There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: February 12, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Mamoru Tamura, Takuya Ohashi, Takahiro Kishioka, Tomoyuki Enomoto
  • Patent number: 10092687
    Abstract: This is to provide a blood filter comprising a porous element; and a copolymer which exists in at least a part of a surface of the porous element, and which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b), wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An? are as defined in the present specification and the claims.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: October 9, 2018
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tatsuro Kanaki, Takahiro Kishioka, Taito Nishino, Yoshiomi Hiroi, Ayako Otani, Tomoyuki Ozawa
  • Publication number: 20180148859
    Abstract: The invention provides a method capable of conveniently producing an intricate and fine resist pattern. The invention also provides a fiber containing a positive-type or negative-type photosensitive material.
    Type: Application
    Filed: April 22, 2016
    Publication date: May 31, 2018
    Applicants: Nissan Chemical Industries, Ltd., Toyama Prefecture
    Inventors: Takahiro KISHIOKA, Yoshiyuki YOKOYAMA
  • Patent number: 9957644
    Abstract: The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: May 1, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Otani
  • Publication number: 20180081274
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Application
    Filed: March 18, 2016
    Publication date: March 22, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto OGATA, Shigeo KIMURA, Yuki USUI, Tomoya OHASHI, Takahiro KISHIOKA
  • Publication number: 20180010115
    Abstract: The invention provides a ligand-bonded fiber in which a ligand having affinity for a cell membrane receptor is immobilized on a fiber precursor, and a cell culture substrate capable of repeating ex vivo amplification of a cell expressing a cell membrane receptor by using the ligand-bonded fiber.
    Type: Application
    Filed: October 30, 2015
    Publication date: January 11, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko UMEZAKI, Takahiro KISHIOKA, Taito NISHINO, Ayako AIHARA, Shunsuke IWAMOTO, Daisuke SAKUMA
  • Patent number: 9822330
    Abstract: There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: November 21, 2017
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., UNIVERSITY OF TOYAMA
    Inventors: Takahiro Kishioka, Shigeo Kimura, Yoshiomi Hiroi, Yuki Usui, Hiromi Kitano, Tadashi Nakaji, Makoto Gemmei
  • Patent number: 9678427
    Abstract: A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, X1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X1 is an —O— group, Z is a divalent group having at least one sulfur atom.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: June 13, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Takahiro Kishioka, Yoshiomi Hiroi, Tomoya Ohashi, Yuki Usui
  • Publication number: 20170044491
    Abstract: A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.
    Type: Application
    Filed: February 13, 2015
    Publication date: February 16, 2017
    Applicants: NISSAN CHEMICAL INDUSTRIES, LTD., KYOTO UNIVERSITY
    Inventors: Makiko UMEZAKI, Takahiro KISHIOKA, Taito NISHINO, Ayako OTANI, Kenichiro KAMEI, Li LIU, Yong CHEN
  • Publication number: 20170038687
    Abstract: A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent. wherein A is a divalent organic group containing a triazine ring, X1 is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X1 is an —O— group, Z is a divalent group having at least one sulfur atom.
    Type: Application
    Filed: December 10, 2014
    Publication date: February 9, 2017
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto OGATA, Takahiro KISHIOKA, Yoshiomi HIROI, Tomoya OHASHI, Yuki USUI
  • Patent number: 9524871
    Abstract: A composition for forming a resist underlayer film for lithography, including: as a silane, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, or a hydrolysis-condensation product of the hydrolyzable organosilane, wherein the hydrolyzable organosilane is a compound of Formula (1): [(R1)aSi(R2)(3?a)]b(R3)??Formula (1) [in Formula (1), R3 is an organic group having a sulfonyl group and a light-absorbing group and is bonded to a Si atom through a Si—C bond; R1 is an alkyl, aryl, aralkyl, halogenated alkyl, halogenated aryl, halogenated aralkyl, alkenyl, an organic group having an epoxy, acryloyl, methacryloyl, mercapto, alkoxyaryl, acyloxyaryl, isocyanurate, hydroxy, cyclic amino, or a cyano group, or a combination of any of these groups and is bonded to a Si atom through a Si—C bond; R2 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 0 to 2; and b is an integer of 1 to 3].
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: December 20, 2016
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makoto Nakajima, Daisuke Sakuma, Yuta Kanno, Takahiro Kishioka